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    • 2. 发明申请
    • MODULE FOR OZONE CURE AND POST-CURE MOISTURE TREATMENT
    • 臭氧固化和固化后水分处理模块
    • WO2012048044A2
    • 2012-04-12
    • PCT/US2011054984
    • 2011-10-05
    • APPLIED MATERIALS INCLUBOMIRSKY DMITRYPINSON II JAY DFLOYD KIRBY HKHAN ADIBVENKATARAMAN SHANKAR
    • LUBOMIRSKY DMITRYPINSON II JAY DFLOYD KIRBY HKHAN ADIBVENKATARAMAN SHANKAR
    • H01L21/3105H01L21/68
    • F26B25/004C23C16/401C23C16/56H01L21/02126H01L21/02337H01L21/3105H01L21/67178H01L21/6719H01L21/67196H01L21/67201H01L21/67207
    • A substrate processing system that has a plurality of deposition chambers, and a first robotic arm operable to move a substrate between one of the deposition chambers and a load-lock substrate holding area. The system may also have a second robotic arm operable to move the substrate between the load-lock substrate holding area and a curing chamber of a substrate curing and treatment module. The substrate curing and treatment module is attached to the load- lock substrate holding area, and may include: The curing chamber for curing a dielectric layer in an atmosphere comprising ozone, and a treatment chamber for treating the cured dielectric layer in an atmosphere comprising water vapor. The curing chamber may be vertically positioned with respect to the treatment chamber. The module may also include a heating system operatively coupled to the curing chamber and the treatment chamber, where the heating system is operative to adjust a first temperature of the curing chamber to from about 150°C to about 200°C, and to adjust a second temperature of the treatment chamber to from about 80°C to about 100°C. The module may still further include an access door on both the curing chamber and the treatment chamber. Each of the access doors are operable to be moved to an open position to receive a substrate, and operable to be moved to a closed sealed position during while the substrate is being cured or treated.
    • 一种具有多个沉积室的基板处理系统,以及可操作以在沉积室之一与负载锁定基板保持区域之间移动基板的第一机器人臂。 该系统还可以具有第二机器人臂,该第二机器人臂可操作以在加载锁定衬底保持区域和衬底固化和处理模块的固化室之间移动衬底。 基板固化和处理模块附接到负载锁定基板保持区域,并且可以包括:用于在包含臭氧的气氛中固化介电层的固化室和用于在包含水的气氛中处理固化的介电层的处理室 汽。 固化室可以相对于处理室垂直定位。 模块还可以包括可操作地连接到固化室和处理室的加热系统,其中加热系统可操作以将固化室的第一温度调节到从大约150℃到大约200℃,并且调节 处理室的第二温度从约80℃至约100℃。 该模块还可以在固化室和处理室两者上包括通道门。 每个入口门可操作地移动到打开位置以接收基底,并且可操作以在基底正在固化或处理期间移动到封闭的密封位置。