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1. 发明申请

WO2011009002A2 FLOW CONTROL FEATURES OF CVD CHAMBERS 审中-公开
标题翻译：化学气相沉积室的流动控制特性
公开(公告)号：WO2011009002A2
公开(公告)日：2011-01-20
申请号：PCT/US2010042194
申请日：2010-07-15
申请人： APPLIED MATERIALS INC , CHUC KIEN N , LIANG QIWEI , NGUYEN HANH D , CHEN XINGLONG , MILLER MATTHEW , PARK SOONAM , TRAN TOAN Q , KHAN ADIB , YANG JANG-GYOO , LUBOMIRSKY DMITRY , VENKATARAMAN SHANKAR
发明人： CHUC KIEN N , LIANG QIWEI , NGUYEN HANH D , CHEN XINGLONG , MILLER MATTHEW , PARK SOONAM , TRAN TOAN Q , KHAN ADIB , YANG JANG-GYOO , LUBOMIRSKY DMITRY , VENKATARAMAN SHANKAR
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , C23C16/452 , C23C16/45574 , H01J37/3244 , H01J37/32449 , Y10T137/85938
摘要： Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.
摘要翻译：提供了用于气体分配组件的设备和方法。在一个方面中，提供了一种气体分配组件，其包括环形主体，该环形主体包括具有内环形壁，外壁，上表面和底表面的环形环，形成在上表面中的上凹部以及形成的座进入内部环形壁，位于上部凹部中的上部板，其包括具有穿过其形成的多个第一孔的盘形主体以及定位在该底座上的底板，该底部板包括盘形主体，该盘形主体具有多个第二形成在其中的与第一孔对齐的孔，以及形成在第二孔与底板之间的多个第三孔，底板密封地联接到上板，以将多个第一孔和第二孔与多个第三孔。

2. 发明申请

WO2012093983A3 REMOTE PLASMA SOURCE SEASONING 审中-公开
标题翻译：远程等离子体源头季节
公开(公告)号：WO2012093983A3
公开(公告)日：2012-10-04
申请号：PCT/US2010045938
申请日：2010-08-18
申请人： APPLIED MATERIALS INC , PARK SOONAM , JEON SOO , TRAN TOAN Q , YANG JANG-GYOO , LIANG QIWEI , LUBOMIRSKY DMITRY
发明人： PARK SOONAM , JEON SOO , TRAN TOAN Q , YANG JANG-GYOO , LIANG QIWEI , LUBOMIRSKY DMITRY
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： C23C16/4404 , C23C16/401 , C23C16/4405 , H01J37/32357 , H01J37/32862 , Y10S438/905
摘要： Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.
摘要翻译：描述了调制远程等离子体系统的方法。这些方法包括将含硅前体流入远程等离子体区域以将含硅膜沉积在远程等离子体系统的内表面上的步骤。该方法在沉积过程中减少了与经调节的壁的反应，从而提高了沉积速率，改善了沉积均匀性，并降低了后续沉积时的缺陷率。

3. 发明公开

KR20180038412A 순환적 선택적 재료 제거 및 에칭을 위한 프로세스 챔버 审中-公开
公开(公告)号：KR20180038412A
公开(公告)日：2018-04-16
申请号：KR20177027489
申请日：2016-08-02
申请人： APPLIED MATERIALS INC
发明人： TRAN TOAN Q , PARK SOONAM , KIM JUNGHOON , LUBOMIRSKY DMITRY
IPC分类号： H01L21/02 , H01L21/205 , H01L21/683 , H05H1/46
CPC分类号： H01J37/32357 , H01J37/32082 , H01J37/32449 , H01J37/32834 , H01L21/311 , H01L21/67069 , H01L21/6831
摘要： 본명세서에서는기판에칭을위한방법및 장치가설명된다. 본명세서에서설명되는처리챔버는소스모듈, 프로세스모듈, 유동모듈, 및배기모듈을포함한다. RF 소스는챔버에결합될수 있고, 원격플라즈마는소스모듈내에서발생될수 있고, 직접플라즈마는프로세스모듈내에서발생될수 있다. 설명되는순환적에칭프로세스들은기판을에칭하기위해라디칼플라즈마와직접플라즈마를교대로사용할수 있다.

4. 发明专利

JP2008298280A Slit valve 审中-公开
标题翻译： SLIT VALVE
公开(公告)号：JP2008298280A
公开(公告)日：2008-12-11
申请号：JP2007226706
申请日：2007-08-31
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： TRAN TOAN Q , LUBORMIRSKY DIMITRY , TSUEI LUN , BANG WON
IPC分类号： F16K3/02 , F16K51/02
CPC分类号： H01L21/67126
摘要： PROBLEM TO BE SOLVED: To provide an embodiment of a valve assembly for a process chamber having improved seal performance.
SOLUTION: In some embodiments, a valve assembly for a process chamber includes a housing having an opening disposed in a wall thereof and through which a substrate may be transferred; a door movably coupled to the housing in a plane generally parallel with the wall of the housing for selectively sealing the opening; a compressible sealing member disposed at least partly between an upper surface of the door and a corresponding surface of the housing for forming a seal therebetween by compression of the compressible sealing member in a direction generally perpendicular to the wall when the door is in a closed position; and a mechanism for restricting the exposure of the compressible sealing member to an environment on a process chamber side of the housing.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有改进的密封性能的处理室的阀组件的实施例。解决方案：在一些实施例中，用于处理室的阀组件包括壳体，该壳体具有设置在其壁中的开口，基板可以通过该开口传送; 一个可移动地联接到壳体的门，该平面大致平行于壳体的壁，用于选择性地密封开口; 至少部分地设置在所述门的上表面和所述壳体的相应表面之间的可压缩密封构件，用于通过在所述门处于关闭位置时沿大致垂直于所述壁的方向压缩所述可压缩密封构件而形成密封件 ; 以及用于限制可压缩密封构件暴露于壳体的处理室侧的环境的机构。版权所有（C）2009，JPO＆INPIT

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