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1. 发明申请

WO2022029471A1 SMART AQUACULTURE GROW OUT SYSTEM 审中-公开
公开(公告)号：WO2022029471A1
公开(公告)日：2022-02-10
申请号：PCT/IB2020/057416
申请日：2020-08-05
申请人： RYNAN TECHNOLOGIES PTE. LTD. , NGUYEN, My T. , TRAN, Toan Q. , HONG, Cuong Q. , LAM, Tuan T. , NGUYEN, Thong A. , BUI, Dat T. , DOAN, Nam Q. , BUI, Chau M. , VO, Khanh V. , TRAN, Toan Q.
发明人： NGUYEN, My T. , TRAN, Toan Q. , HONG, Cuong Q. , LAM, Tuan T. , NGUYEN, Thong A. , BUI, Dat T. , DOAN, Nam Q. , BUI, Chau M. , VO, Khanh V. , TRAN, Toan Q.
IPC分类号： A01K61/80 , A01K61/59 , A01K61/85
摘要： There is provided a smart aquaculture grow out system for aquatic species, the system includes a feeder adapted to store aquafeed, the feeder comprising a feed dispensing nozzle, a feed dispenser operable to measure and project aquafeed via the feed dispensing nozzle, and a controller operatively being operable to selectively activate and deactivate the feed dispenser. A set of sensors are operable to acquire sensor data comprising water quality parameters of a pond adjacent to the feeder and images of aquatic species in the pond. A processor receives the sensor data of the grow out system, and determines, based on the sensor data of the grow out system, a metered quantity of aquafeed to provide. The processor transmits a control signal to the controller causing activation of the feed dispenser to measure and project the metered quantity of aquafeed via the feed dispensing nozzle.

2. 发明申请

WO2018045458A1 IRRIGATION SYSTEM AND METHOD 审中-公开
标题翻译：灌溉系统和方法
公开(公告)号：WO2018045458A1
公开(公告)日：2018-03-15
申请号：PCT/CA2017/051045
申请日：2017-09-07
申请人： RYNAN TECHNOLOGIES PTE. LTD. , NGUYEN, My T. , HONG, Cuong Q. , TRUONG, Luong V. , TRAN, Toan Q. , LE, Trieu T. , MAI, Bien T. , TRINH, An , NGUYEN, Thong A. , DUONG, Khang M.
发明人： NGUYEN, My T. , HONG, Cuong Q. , TRUONG, Luong V. , TRAN, Toan Q. , LE, Trieu T. , MAI, Bien T. , TRINH, An , NGUYEN, Thong A. , DUONG, Khang M.
IPC分类号： A01G25/16 , A01G25/00
摘要： A method and system for irrigating a field adjacent a watercourse is disclosed comprising a plurality of pumps along the watercourse and measuring from time to time at a plurality of measuring locations the salinity, the pH, the temperature and the turbidity of the water. The measuring locations are different from the pumping locations. A real time salinity, pH, temperature and turbidity at the pumping locations is predicted from the measured values and the pumps selectively disabled or enabled on the predicted salinity, pH, temperature and/or the turbidity. Additionally, there is disclosed an Alternate Wetting and Drying (AWD) method/system for irrigating a field using a pump comprising an outlet supplying water to the field and an inlet connected to a water source. The method/system comprises a sensor placed at a location in the field for sensing a water depth below a surface of the field and transmitting the water depth to a controller located remotely from the sensing location using a wireless connection. The controller enables the pump when the sensed water depth is below a threshold depth and disables the pump when the sensed water depth is above a threshold depth.
摘要翻译：公开了一种用于灌溉水道附近的田地的方法和系统，其包括沿水道的多个泵，并且在多个测量位置不时地测量盐度，pH值，温度和水的浊度。测量位置与泵送位置不同。根据测量值预测泵送位置处的实时盐度，pH，温度和浊度，并且选择性地禁用或启用泵上预测的盐度，pH，温度和/或浊度。另外，公开了一种使用泵来灌溉田地的交替湿润和干燥（AWD）方法/系统，该泵包括向田地供应水的出口和连接到水源的入口。该方法/系统包括放置在现场的位置处的传感器，用于感测场地表面下方的水深并且使用无线连接将水深传送到位于远离感测位置的控制器。当感测到的水深低于阈值深度时，控制器启动泵，并且当感测到的水深高于阈值深度时停用泵。

3. 发明申请

WO2011009002A3 FLOW CONTROL FEATURES OF CVD CHAMBERS 审中-公开
公开(公告)号：WO2011009002A3
公开(公告)日：2011-01-20
申请号：PCT/US2010/042194
申请日：2010-07-15
申请人： APPLIED MATERIALS, INC. , CHUC, Kien, N. , LIANG, Qiwei , NGUYEN, Hanh, D. , CHEN, Xinglong , MILLER, Matthew , PARK, Soonam , TRAN, Toan, Q. , KHAN, Adib , YANG, Jang-Gyoo , LUBOMIRSKY, Dmitry , VENKATARAMAN, Shankar
发明人： CHUC, Kien, N. , LIANG, Qiwei , NGUYEN, Hanh, D. , CHEN, Xinglong , MILLER, Matthew , PARK, Soonam , TRAN, Toan, Q. , KHAN, Adib , YANG, Jang-Gyoo , LUBOMIRSKY, Dmitry , VENKATARAMAN, Shankar
IPC分类号： H01L21/205
摘要： Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.

4. 发明申请

WO2011009002A2 FLOW CONTROL FEATURES OF CVD CHAMBERS 审中-公开
标题翻译：化学气相沉积室的流动控制特性
公开(公告)号：WO2011009002A2
公开(公告)日：2011-01-20
申请号：PCT/US2010042194
申请日：2010-07-15
申请人： APPLIED MATERIALS INC , CHUC KIEN N , LIANG QIWEI , NGUYEN HANH D , CHEN XINGLONG , MILLER MATTHEW , PARK SOONAM , TRAN TOAN Q , KHAN ADIB , YANG JANG-GYOO , LUBOMIRSKY DMITRY , VENKATARAMAN SHANKAR
发明人： CHUC KIEN N , LIANG QIWEI , NGUYEN HANH D , CHEN XINGLONG , MILLER MATTHEW , PARK SOONAM , TRAN TOAN Q , KHAN ADIB , YANG JANG-GYOO , LUBOMIRSKY DMITRY , VENKATARAMAN SHANKAR
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , C23C16/452 , C23C16/45574 , H01J37/3244 , H01J37/32449 , Y10T137/85938
摘要： Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.
摘要翻译：提供了用于气体分配组件的设备和方法。在一个方面中，提供了一种气体分配组件，其包括环形主体，该环形主体包括具有内环形壁，外壁，上表面和底表面的环形环，形成在上表面中的上凹部以及形成的座进入内部环形壁，位于上部凹部中的上部板，其包括具有穿过其形成的多个第一孔的盘形主体以及定位在该底座上的底板，该底部板包括盘形主体，该盘形主体具有多个第二形成在其中的与第一孔对齐的孔，以及形成在第二孔与底板之间的多个第三孔，底板密封地联接到上板，以将多个第一孔和第二孔与多个第三孔。

5. 发明申请

WO2009061737A1 COUNTER-BALANCED SUBSTRATE SUPPORT 审中-公开
标题翻译：计数平衡基板支持
公开(公告)号：WO2009061737A1
公开(公告)日：2009-05-14
申请号：PCT/US2008/082365
申请日：2008-11-04
申请人： APPLIED MATERIALS, INC. , LUBOMIRSKY, Dmitry , TRAN, Toan, Q. , TSUEI, Lun , HERNANDEZ, Manuel, A. , FLOYD, Kirby, H. , YIEH, Ellie Y.
发明人： LUBOMIRSKY, Dmitry , TRAN, Toan, Q. , TSUEI, Lun , HERNANDEZ, Manuel, A. , FLOYD, Kirby, H. , YIEH, Ellie Y.
IPC分类号： H01L21/00 , G03F7/20
CPC分类号： H01L21/6719 , H01L21/67017 , H01L21/68742 , H01L21/68792
摘要： A semiconductor processing chamber having an interior capable of holding an internal chamber pressure below ambient atmospheric pressure and a pumping system coupled to the chamber and adapted to remove material from trie processing chamber, and a substrate support pedestal, where the substrate support pedestal is rigidly coupled to a substrate support shaft extending through a wall of the processing chamber. A bracket located outside the chamber is rigidly or rotatably coupled to the substrate support shaft. A motor coupled to the bracket vertically translates the substrate support pedestal, shaft and bracket closer to a processing plate. A piston mounted on an end of the bracket provides a counter-balancing force to a tilting force generated by a change in the internal chamber pressure and causes a deflection in the position of the bracket and the substrate support, thereby reducing the deflection of the bracket and the substrate support.
摘要翻译：具有能够将内部室压力保持在低于环境大气压力的内部的半导体处理室以及耦合到该室并适于从三维处理室移除材料的泵送系统以及衬底支撑基座，其中衬底支撑基座刚性地联接通过延伸穿过处理室的壁的衬底支撑轴。位于室外的支架刚性或可旋转地联接到基板支撑轴。耦合到支架的马达将基板支撑基座，轴和支架垂直地平移到更靠近处理板。安装在托架的端部上的活塞提供与由内部室压力变化产生的倾斜力的反平衡力并引起支架和基板支撑件位置的偏转，从而减小支架的偏转和基板支撑。

6. 发明申请

WO2012093983A3 REMOTE PLASMA SOURCE SEASONING 审中-公开
标题翻译：远程等离子体源头季节
公开(公告)号：WO2012093983A3
公开(公告)日：2012-10-04
申请号：PCT/US2010045938
申请日：2010-08-18
申请人： APPLIED MATERIALS INC , PARK SOONAM , JEON SOO , TRAN TOAN Q , YANG JANG-GYOO , LIANG QIWEI , LUBOMIRSKY DMITRY
发明人： PARK SOONAM , JEON SOO , TRAN TOAN Q , YANG JANG-GYOO , LIANG QIWEI , LUBOMIRSKY DMITRY
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： C23C16/4404 , C23C16/401 , C23C16/4405 , H01J37/32357 , H01J37/32862 , Y10S438/905
摘要： Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.
摘要翻译：描述了调制远程等离子体系统的方法。这些方法包括将含硅前体流入远程等离子体区域以将含硅膜沉积在远程等离子体系统的内表面上的步骤。该方法在沉积过程中减少了与经调节的壁的反应，从而提高了沉积速率，改善了沉积均匀性，并降低了后续沉积时的缺陷率。

7. 发明申请

WO2021250444A1 INSECT MONITORING SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2021250444A1
公开(公告)日：2021-12-16
申请号：PCT/IB2020/055427
申请日：2020-06-09
申请人： RYNAN TECHNOLOGIES PTE. LTD. , NGUYEN, My T. , HONG, Cuong Q. , TRAN, Toan Q. , SON, Phuong H. , PHAM, Luom H. , PHAN, Quy M.
发明人： NGUYEN, My T. , HONG, Cuong Q. , TRAN, Toan Q. , SON, Phuong H. , PHAM, Luom H. , PHAN, Quy M. , DOAN, Nam Q.
IPC分类号： A01M1/02 , A01M1/04 , A01M1/08 , G01N21/84 , G06K9/62 , G06N20/00 , G06Q30/06 , A01M1/026
摘要： An insect monitoring system (ISM), method of operating and related e-commerce system are provided. The ISM includes an insect attracting light, an intake, a channel between intake and exhaust, an insect collecting net (ICN) in the channel, a fan for airflow in the channel, and one or more cameras pointed on the ICN. The insect attracting light and the fan are activated such that insects are drawn into the intake and trapped against the ICN. The cameras acquire images of the ICN. The images are processed and analyzed using a machine learning algorithm to recognize a type and number of insects. Recommendations are provided based on the analysis. In some aspects, the insect monitoring system is connected to electronic devices over a communication network. The electronic devices are provided with an e-commerce application for sale of products and services responsive to the recommendations or otherwise marketable to the user.

8. 发明申请

WO2018027292A1 WATER METERING SYSTEM WITH PIGGY BACKED E-COMMERCE 审中-公开
标题翻译：水计量系统与PIGGY BACKED电子商务
公开(公告)号：WO2018027292A1
公开(公告)日：2018-02-15
申请号：PCT/CA2016/051363
申请日：2016-11-22
申请人： RYNAN TECHNOLOGIES PTE. LTD. , NGUYEN, My T. , TRUONG, Luong V. , HONG, Cuong Q. , TRINH, An , LE, Trieu T. , NGUYEN, Thong A. , DUONG, Khang M. , TRAN, Toan Q. , NGUYEN, Hien H. , MAI, Bien T.
发明人： NGUYEN, My T. , TRUONG, Luong V. , HONG, Cuong Q. , TRINH, An , LE, Trieu T. , NGUYEN, Thong A. , DUONG, Khang M. , TRAN, Toan Q. , NGUYEN, Hien H. , MAI, Bien T.
IPC分类号： G01F15/06 , G01F3/10 , G06Q30/06 , G06Q50/06 , H04W84/00
摘要： A water meter/e-commerce is disclosed wherein a wide area network (WAN) and an application on a smartphone or the like can be used to retrieve a measured water consumption from a water meter while accessing an e-commerce system. The application displays the retrieved water consumption together with at least one product, and further wherein the at least one product may be purchased from the e-commerce system using the application.
摘要翻译：公开了一种水表/电子商务，其中可以使用广域网（WAN）和智能电话等上的应用来从水表中检索测量的水消耗，同时访问电子商务系统。应用程序将所检索的水消耗与至少一个产品一起显示，并且另外其中可以使用应用程序从电子商务系统购买至少一个产品。

9. 发明申请

WO2012093983A2 REMOTE PLASMA SOURCE SEASONING 审中-公开
标题翻译：远程等离子源调理
公开(公告)号：WO2012093983A2
公开(公告)日：2012-07-12
申请号：PCT/US2010/045938
申请日：2010-08-18
申请人： APPLIED MATERIALS, INC. , PARK, Soonam , JEON, Soo , TRAN, Toan Q. , YANG, Jang-Gyoo , LIANG, Qiwei , LUBOMIRSKY, Dmitry
发明人： PARK, Soonam , JEON, Soo , TRAN, Toan Q. , YANG, Jang-Gyoo , LIANG, Qiwei , LUBOMIRSKY, Dmitry
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： C23C16/4404 , C23C16/401 , C23C16/4405 , H01J37/32357 , H01J37/32862 , Y10S438/905
摘要： Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.
摘要翻译：描述调制远程等离子体系统的方法。该方法包括将含硅前体流入远程等离子体区域以在远程等离子体系统的内表面上沉积含硅膜的步骤。这些方法减少沉积过程中与经过老化的壁面的反应，导致沉积速率提高，沉积均匀性改善并且在随后的沉积期间减少缺陷率。

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