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    • 10. 发明授权
    • Method for forming LDD/offset structure of thin film transistor
    • 薄膜晶体管的LDD /偏移结构的形成方法
    • US06576502B1
    • 2003-06-10
    • US09693992
    • 2000-10-23
    • Hye-dong Kim
    • Hye-dong Kim
    • H01L2100
    • H01L29/66757H01L29/4908H01L29/78621
    • A method for fabricating a thin film transistor. An active layer is first formed on a substrate, then a first insulating layer is formed on the active layer. Next, a gate electrode pattern is formed on the first insulating layer and an LDD region is formed by lightly doping ions in the active layer using the gate electrode pattern as a mask. A polymer layer is formed on a surface of the gate electrode pattern using an electrochemical polymerizing process, and source and drain contact layers are formed by densely doping ions in the active layer using the gate electrode pattern deposited with the polymer layer. A second insulating layer is then formed on a surface of the first insulating layer while covering the gate electrode pattern. Contact holes are formed through the insulating layers, and metal material is sputtered in the contact holes to form the source and drain electrodes.
    • 一种制造薄膜晶体管的方法。 首先在衬底上形成有源层,然后在有源层上形成第一绝缘层。 接下来,在第一绝缘层上形成栅电极图案,并使用栅电极图案作为掩模,通过在有源层中轻掺杂离子形成LDD区。 使用电化学聚合方法在栅电极图案的表面上形成聚合物层,并且通过使用沉积有聚合物层的栅电极图案在有源层中密集掺杂离子形成源极和漏极接触层。 然后在覆盖栅电极图案的同时,在第一绝缘层的表面上形成第二绝缘层。 通过绝缘层形成接触孔,在接触孔中溅射金属材料,形成源极和漏极。