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1. 发明申请

WO2005089130A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：高重复率激光器生产等离子体光源
公开(公告)号：WO2005089130A2
公开(公告)日：2005-09-29
申请号：PCT/US2005007056
申请日：2005-03-03
申请人： CYMER INC , AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
发明人： AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
摘要翻译：公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。目标跟踪系统可以提供能够创建激光点火控制信号的信息，并且可以包括液滴检测器，该液滴检测器包括指向与靶的投影传送路径上的点相交的准直光源，具有相应的相对设置的光检测器检测目标通过相应点的通道，或包括与坐标轴对准的多个光敏元件的线性阵列的检测器，来自光源的光与目标的投影传送路径相交，至少一个其可以包括平面截距检测装置。液滴检测器可以包括以不同光频率操作的多个液滴检测器，或者具有视场的摄像机和成像视场的二维像素阵列。该装置和方法可以包括静电等离子体容纳装置，其在点火时在目标点火点处或附近提供等离子体限制场，目标跟踪系统提供能够控制静电等离子体容纳装置的信号。该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。该装置和方法可以包括磁性等离子体限制机构，其在目标点火点附近产生磁场，以将等离子体限制在目标点火位置，该目标点火点可以是脉冲的并且可以使用来自目标跟踪系统的输出进行控制。

2. 发明申请

WO2006060360A3 LINE NARROWING MODULE 审中-公开
标题翻译：线路延迟模块
公开(公告)号：WO2006060360A3
公开(公告)日：2006-10-26
申请号：PCT/US2005043056
申请日：2005-11-28
申请人： CYMER INC , ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
发明人： ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.
摘要翻译：一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角波长选择光学; 第二调谐机构部分地通过改变色散中心波长选择光学器件相对于线条变窄模块的标称光路的位置来选择包含相应脉冲的激光束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

3. 发明申请

WO2007005409A2 LPP EUV PLASMA SOURCE MATERIAL TARGET DELIVERY SYSTEM 审中-公开
标题翻译： LPP EUV等离子体源材料目标传送系统
公开(公告)号：WO2007005409A2
公开(公告)日：2007-01-11
申请号：PCT/US2006024941
申请日：2006-06-27
申请人： CYMER INC , BYKANOV ALEXANDER N , ALGOTS MARTIN J , KHODYKIN OLEH , HEMBERG OSCAR
发明人： BYKANOV ALEXANDER N , ALGOTS MARTIN J , KHODYKIN OLEH , HEMBERG OSCAR
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site. The apparatus and method may further comprise a droplet detection mechanism that may comprise a droplet detection radiation detector positioned to detect droplet detection radiation reflected from a plasma source material droplet.
摘要翻译：公开了一种EUV发光系统和方法，其可以包括产生等离子体源材料的液滴发生器，目标液滴朝向等离子体源材料靶照射部位附近传播; 驱动激光器具有第一操作中心波长范围的驱动激光聚焦光学元件; 具有第二操作中心波长范围的液滴检测辐射源; 驱动激光操纵元件，其包括在第一波长范围的至少一部分内具有高度反射性的材料，并且在第二中心波长范围的至少一部分内具有高度透射性; 液滴检测辐射瞄准机构，其引导液滴检测辐射通过驱动激光转向元件和透镜，以聚焦在液滴发生器和照射部位之间的选定液滴检测位置。该装置和方法还可以包括液滴检测机构，其可以包括液滴检测放射线检测器，其被定位成检测从等离子体源物质液滴反射的液滴检测辐射。

4. 发明公开

EP1726028A4 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028A4
公开(公告)日：2010-12-08
申请号：EP05724572
申请日：2005-03-03
申请人： CYMER INC
发明人： AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
IPC分类号： H01J35/20 , G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008

5. 发明公开

EP1831974A4 LINE NARROWING MODULE 有权转让
标题翻译： LINIENVERSCHMÄLERUNGSMODUL
公开(公告)号：EP1831974A4
公开(公告)日：2010-11-24
申请号：EP05826233
申请日：2005-11-28
申请人： CYMER INC
发明人： ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251

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