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    • 81. 发明授权
    • Method and its apparatus for inspecting a specimen
    • 检测样本的方法及其装置
    • US06553323B1
    • 2003-04-22
    • US09661182
    • 2000-09-13
    • Kenji ObaraYuji TakagiToshifumi HondaRyo NakagakiToshiei KurosakiYasuhiko Ozawa
    • Kenji ObaraYuji TakagiToshifumi HondaRyo NakagakiToshiei KurosakiYasuhiko Ozawa
    • G01B528
    • H01L22/20G01N21/88G01N2021/8861
    • The present invention improves inspection efficiency in detailed inspections of defects performed based on inspection information from a defect inspection. Particles and defects are detected by a defect inspection device 1. If the cause of the particles and defects are to be determined by performing a detailed inspection with a details inspection device 3 using an SEM or the like, attributes are determined on the particles and defects detected by the defects inspection device 1 before the detailed inspection is performed. The attributes are determined with an attribute inspection device using an optical microscope or the like. Based on these attributes, the defects and particles are separated into those that require detailed inspection and those that do not require detailed inspection or that cannot be inspected in detail. A details inspection device 3 is used to inspect the particles and defects requiring detailed inspection.
    • 本发明基于来自缺陷检查的检查信息进行的缺陷的详细检查,提高了检查效率。 通过缺陷检查装置1检测颗粒和缺陷。如果通过使用SEM等的细节检查装置3进行详细检查来确定颗粒和缺陷的原因,则根据颗粒和缺陷确定属性 在执行详细检查之前由缺陷检查装置1检测到。 属性由使用光学显微镜等的属性检查装置确定。 基于这些属性,缺陷和颗粒被分成需要详细检查的那些和不需要详细检查或者不能被详细检查的那些。 细节检查装置3用于检查需要详细检查的颗粒和缺陷。
    • 82. 发明授权
    • Defect judgement processing method and apparatus
    • 缺陷判断处理方法和装置
    • US06333992B1
    • 2001-12-25
    • US08967015
    • 1997-11-10
    • Hisae YamamuraYukio MatsuyamaToshifumi HondaLudwig Listl
    • Hisae YamamuraYukio MatsuyamaToshifumi HondaLudwig Listl
    • G06K900
    • G01N21/88G01N21/956
    • A defect judgement processing method and apparatus which can optimize image processing and defect judgement parameters for a detection image cut out by each inspection window to avoid erroneous judgement and defect missing and to realize reliable defect judgement. An image data generator cuts out ranges indicated by a plurality of predesignated inspection windows from a detected image and stores them in a memory, a window data generator generates window data having inspection conditions attached thereto with respect to the plurality of inspection windows and stores them in the memory, a feature extractor reads out detection images of the ranges indicated by the inspection windows from the memory and extracts a structural feature parameter therefrom on the basis of an image processing parameter conforming to the inspection condition obtained by the window data, and a defect judger performs its defect judging operation over the extracted structural feature parameter on the basis of a defect judgement parameter conforming to the inspection condition.
    • 一种缺陷判断处理方法和装置,其可以优化每个检查窗口切出的检测图像的图像处理和缺陷判断参数,以避免错误判断和缺陷缺失,并实现可靠的缺陷判断。 图像数据发生器从检测到的图像中切出由多个预先指定的检查窗口指示的范围并将其存储在存储器中,窗口数据生成器生成具有关于多个检查窗口附加到其上的检查条件的窗口数据,并将它们存储在 存储器中,特征提取器基于从窗口数据获得的检查条件的图像处理参数,从存储器读出由检查窗口指示的范围的检测图像,并从其提取结构特征参数,并且缺陷 基于符合检查条件的缺陷判断参数,判断器对提取的结构特征参数执行缺陷判断操作。
    • 84. 发明申请
    • DEFECT INSPECTION METHOD AND DEVICE THEREFOR
    • 缺陷检查方法及其设备
    • US20130293879A1
    • 2013-11-07
    • US13993888
    • 2011-11-08
    • Toshifumi HondaYukihiro ShibataAtsushi Taniguchi
    • Toshifumi HondaYukihiro ShibataAtsushi Taniguchi
    • G01N21/95
    • G01N21/00G01N21/8851G01N21/9501G01N21/956G01N2021/8896
    • To process a signal from a plurality of detectors without being affected by a variation in the height of a substrate, and to detect more minute defects on the substrate, a defect inspection device is provided with a photoelectric converter having a plurality of rows of optical sensor arrays in each of first and second light-collecting/detecting unit and a processing unit for processing a detection signal from the first and the second light-collecting/detecting unit to determine the extent to which the positions of the focal points of the first and the second light-collecting/detecting unit are misaligned with respect to the surface of a test specimen, and processing the detection signal to correct a misalignment between the first and the second light-collecting/detecting unit, and the corrected detection signal outputted from the first and the second light-collecting/detecting unit are combined together to detect the defects on the test specimen.
    • 为了处理来自多个检测器的信号而不受基板高度的变化的影响,并且在基板上检测更多的微小缺陷,缺陷检查装置设置有具有多行光学传感器的光电转换器 在第一和第二集光/检测单元中的每一个中的阵列,以及处理单元,用于处理来自第一和第二聚光/检测单元的检测信号,以确定第一和第二聚光/ 第二聚光/检测单元相对于试样的表面不对准,并且处理检测信号以校正第一和第二聚光/检测单元之间的未对准,并且校正的检测信号从 第一和第二聚光/检测单元组合在一起以检测试样上的缺陷。
    • 86. 发明授权
    • Scanning electron microscope and method for processing an image obtained by the scanning electron microscope
    • 扫描电子显微镜以及通过扫描电子显微镜获得的图像的处理方法
    • US08106357B2
    • 2012-01-31
    • US12016290
    • 2008-01-18
    • Kenji NakahiraToshifumi HondaAtsushi Miyamoto
    • Kenji NakahiraToshifumi HondaAtsushi Miyamoto
    • G01N23/00
    • G01N23/225G01N2223/401
    • In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.
    • 在通过扫描电子显微镜对样本进行成像的情况下,旨在获取具有降低噪声成分的高质量图像,从而提高图像处理的精度。 基于成像条件或样本信息计算光束的强度分布,并且通过使用除了光束强度分布之外的分辨力退化因子作为劣化模式的目标来执行图像恢复,使得高 可以在各种条件下获得分辨率的图像。 在用于半导体检查和半导体测量的扫描电子显微镜中,恢复的图像用于图案尺寸测量,缺陷检测,缺陷分类等,从而可以提高测量精度,从而可以使缺陷检测和分类 做出高精度。
    • 88. 发明申请
    • METHOD AND DEVICE FOR DEFECT INSPECTION
    • 缺陷检查的方法和装置
    • US20110188735A1
    • 2011-08-04
    • US13057782
    • 2009-06-05
    • Naoki HosoyaToshifumi HondaTakashi Hiroi
    • Naoki HosoyaToshifumi HondaTakashi Hiroi
    • G06K9/00
    • G01N21/956G01N2223/6116G06T7/0004G06T7/001G06T2207/10061G06T2207/30148
    • Provided are a method and a device for defect inspection, wherein, in a state where a few DOIs exist in a large number of nuisances, a classification performance can be improved by a few appropriate defect instructions and a high classification performance is ensured while mitigating the burden of user's defect instructions. The method and device for defect inspection is characterized by repeating extraction of one or more defects from a plurality of defects detected by imaging a sample, instruction of a classification class of the extracted defects, and calculation of a classification criterion and a classification performance from the image information and classification class of the defects, and determining, based on the finally obtained classification criterion, the classification class of the unknown defects. This makes it possible to improve a classification performance by a few appropriate defect instructions and ensure a high classification performance while mitigating the burden of user's defect instructions.
    • 提供了一种用于缺陷检查的方法和装置,其中,在少数DOI存在大量滋扰的状态下,可以通过少量适当的缺陷指令来提高分类性能,并且在减轻分类性能的同时确保高分类性能 用户的缺陷指示负担。 用于缺陷检查的方法和装置的特征在于,从通过成像样本检测到的多个缺陷中重复提取一个或多个缺陷,提取的缺陷的分类等级的指令,以及来自所述缺陷的分类标准和分类性能的计算 图像信息和分类类的缺陷,并根据最终获得的分类标准确定未知缺陷的分类等级。 这使得可以通过几个适当的缺陷指令提高分类性能,并确保高分类性能,同时减轻用户缺陷指令的负担。
    • 89. 发明授权
    • Method and apparatus for reviewing defects
    • 检查缺陷的方法和装置
    • US07657078B2
    • 2010-02-02
    • US11311254
    • 2005-12-20
    • Ryo NakagakiToshifumi Honda
    • Ryo NakagakiToshifumi Honda
    • G06K9/00
    • G06T7/001G06T2207/30148
    • An apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function of judging criticality or non-flat state of the defect by use of the estimation result. It becomes possible to establish both of a high-throughput image collecting sequence in which any reference image is not acquired and high-precision defect classification, and then to realize both of a high performance classifying function and a high-throughput image collecting function in a defect reviewing apparatus which automatically collects and classifies images of defects existing on a sample of a semiconductor wafer or the like.
    • 一种用于检查缺陷的装置,包括具有通过使用缺陷图像来估计存在缺陷的部分的非缺陷状态(参考图像)的功能的图像处理部分(缺陷分类装置部分),以及判断 通过使用估计结果,缺陷的关键性或非平坦状态。 可以建立不获取任何参考图像的高通量图像采集序列和高精度缺陷分类,然后实现高性能分类功能和高吞吐量图像采集功能 缺陷检查装置,其自动地收集和分类存在于半导体晶片等的样本上的缺陷的图像。