会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 72. 发明授权
    • Semiconductor integrated electronic device and corresponding manufacturing method
    • 半导体集成电子器件及相应的制造方法
    • US06724009B2
    • 2004-04-20
    • US10199964
    • 2002-07-18
    • Gianfranco CerofoliniGiuseppe Ferla
    • Gianfranco CerofoliniGiuseppe Ferla
    • H01L3524
    • H01L21/28167H01L29/51
    • A method of fabricating a MOS transistor with a controllable and modulatable conduction path through a dielectric gate oxide is disclosed, wherein the transistor structure comprises a dielectric oxide layer formed between two silicon plates, and wherein the silicon plates overhang the oxide layer all around to define an undercut having a substantially rectangular cross-sectional shape. The method comprises the steps of: chemically altering the surfaces of the silicon plates to have different functional groups provided in the undercut from those in the remainder of the surfaces; and selectively reacting the functional groups provided in the undercut with an organic molecule having a reversibly reducible center and a molecular length substantially equal to the width of the undercut, thereby to establish a covalent bond to each end of the organic molecule.
    • 公开了一种通过电介质栅极氧化物制造具有可控和可调制传导路径的MOS晶体管的方法,其中晶体管结构包括在两个硅板之间形成的电介质氧化物层,并且其中硅板全部悬垂在氧化物层周围以限定 具有基本上矩形横截面形状的底切。 该方法包括以下步骤:将硅板的表面化学改变成在底切中提供的不同的官能团与其余表面中的不同的官能团; 并且将底切中提供的官能团选择性地与具有可逆还原中心和分子长度基本上等于底切宽度的有机分子反应,从而与有机分子的每个末端建立共价键。
    • 73. 发明授权
    • Low-noise amplifier stage with matching network
    • 具有匹配网络的低噪声放大器级
    • US06278329B1
    • 2001-08-21
    • US09466573
    • 1999-12-21
    • Giuseppe PalmisanoGiuseppe FerlaGiovanni Girlando
    • Giuseppe PalmisanoGiuseppe FerlaGiovanni Girlando
    • H03F304
    • H03F1/22H03F1/565H03F2200/294H03F2200/372
    • An amplifier stage having a first and a second transistor connected in series to each other between a first and a second reference potential line. The first transistor has a control terminal connected to an input of the amplifier stage through a first inductor, a first terminal connected to the second reference potential line through a second inductor, and a third terminal connected to a first terminal of the second transistor. The second transistor has a second terminal forming an output of the amplifier stage, and connected to the first reference potential line through a load resistor. To improve the noise figure, a matching capacitor is connected between the control terminal and the first terminal of the first transistor.
    • 具有在第一和第二参考电位线之间彼此串联连接的第一和第二晶体管的放大器级。 第一晶体管具有通过第一电感器连接到放大器级的输入的控制端子,通过第二电感器连接到第二参考电位线的第一端子和连接到第二晶体管的第一端子的第三端子。 第二晶体管具有形成放大器级的输出的第二端子,并通过负载电阻器连接到第一参考电位线。 为了提高噪声系数,在控制端子与第一晶体管的第一端子之间连接有匹配电容器。
    • 77. 发明授权
    • Process for producing a calibrated resistance element
    • 用于制造校准电阻元件的工艺
    • US4310571A
    • 1982-01-12
    • US34204
    • 1979-04-27
    • Vincenzo DanieleGiuseppe CordaAndrea RavagliaGiuseppe Ferla
    • Vincenzo DanieleGiuseppe CordaAndrea RavagliaGiuseppe Ferla
    • H01C17/24H01L21/02H01L21/033H01L21/82H01L21/822H01L27/04H01L27/10H01C17/06
    • H01L28/20H01L21/033Y10T29/49082Y10T29/49099
    • Filiform elements of predetermined resistivity, e.g. selectively destructible leads of an electrically programmable read-only memory, are formed on a semiconductor substrate such as a silicon body by first depositing thereon a layer of dielectric material such as SiO.sub.2 and topping that layer with a conductive or nonconductive coating which is resistant to a chemical such as hydrofluoric acid capable of attacking the dielectric layer. Next, the top coating is partly destroyed by photolithographic treatment to leave at least one substantially rectangular patch. Thereafter, the dielectric layer is isotropically attacked by the aforementioned chemical with resulting reduction to about half its original thickness and concurrent lateral erosion of a patch-supporting pedestal of that layer whereby channels of generally semicylindrical concavity are formed around the periphery of this pedestal. The patch, if composed of conductive or semiconductive material, is then clad in an insulating envelope whereupon the dielectric layer and the patch are covered with a deposit of the desired electrical conductivity which could consist of doped polycrystalline silicon or of metal. Finally, this deposit is removed by chemical or ionic etching except in the channels of the pedestal and along a pair of parallel strips adjoining opposite pedestal sides whereby these strips remain electrically interconnected by filiform inserts left in the undercuts of the other two sides.
    • 预定电阻率的丝状元素,例如 通过首先在诸如硅体的半导体衬底上沉积介电材料层(例如SiO 2)形成电可编程只读存储器的选择性可破坏的引线,并用导电或非导电涂层将该层顶起来,该导电或非导电涂层对 化学物质如能够侵蚀电介质层的氢氟酸。 接下来,通过光刻处理部分地破坏顶部涂层以留下至少一个基本上矩形的贴片。 此后,电介质层被上述化学物质各向同性地侵蚀,从而将其降低到其原始厚度的大约一半,并且该层的贴片支撑基座的同时横向侵蚀,从而在该基座的周边周围形成大致半圆柱形凹陷的通道。 如果由导电材料或半导体材料组成,则贴片被覆在绝缘包层中,由介电层和贴片用可掺杂多晶硅或金属的所需电导率的沉积物覆盖。 最后,通过化学或离子蚀刻除去基座的通道以及邻接相对的基座侧的一对平行条,除去这些沉积物,由此这些条通过留在另外两边的底切部中的丝状插入物而保持电互连。