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71. 发明专利

AT527678T 未知
公开(公告)号：AT527678T
公开(公告)日：2011-10-15
申请号：AT09450211
申请日：2009-11-05
申请人： IMS NANOFABRICATION AG
发明人： FRAGNER HEINRICH , PLATZGUMMER ELMAR , NOWAK ROBERT , BUERLI ADRIAN
IPC分类号： H01J37/317

72. 发明专利

AT504936T 未知
公开(公告)号：AT504936T
公开(公告)日：2011-04-15
申请号：AT08450077
申请日：2008-05-13
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/147
摘要： A multi-beam pattern definition device (300) for use in a particle-beam processing or inspection apparatus, which is set up to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming beamlets, which are imaged onto a target. A deflection array means (302) has a plurality of electrostatic deflector electrodes (321) for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes (311) are electrically connected to a counter potential independently of the deflection array means through a counter-electrode array means (301). The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode (311), each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode.

73. 发明专利

NL2004846A WERKWIJZE VOOR MASKERLOZE DEELTJESBUNDELBELICHTING. 未知
公开(公告)号：NL2004846A
公开(公告)日：2010-07-19
申请号：NL2004846
申请日：2010-06-08
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/317

74. 发明专利

NL2001369C WERKWIJZE VOOR MASKERLOZE DEELTJESBUNDELBELICHTING. 未知
公开(公告)号：NL2001369C
公开(公告)日：2010-06-14
申请号：NL2001369
申请日：2008-03-13
申请人： IMS NANOFABRICATION AG
发明人： FRAGNER HEINRICH , PLATZGUMMER ELMAR
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/302 , H01J2237/30483

75. 发明专利

NL2001066C2 Deeltjesbundelinrichting met verbeterd Wien-filter. 未知
公开(公告)号：NL2001066C2
公开(公告)日：2010-01-28
申请号：NL2001066
申请日：2007-12-07
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/317 , H01J37/05

76. 发明专利

NL1035095A1 Multi-bundel afbuiger-array-inrichting voor maskerloze deeltjesbundel verwerking. 未知
公开(公告)号：NL1035095A1
公开(公告)日：2008-09-01
申请号：NL1035095
申请日：2008-02-27
申请人： IMS NANOFABRICATION AG , INST FÜR MIKROELEKTRONIK STUTT
发明人： PLATZGUMMER ELMAR , LOESCHNER HANS , KVASNICA SAMUEL , SPRINGER REINHARD , IRMSCHER MATHIAS , LETZKUS FLORIAN , BUTSCHKE JOERG
IPC分类号： H01J37/317

77. 发明专利

GB2411741B Compensation of magnetic fields 未知
公开(公告)号：GB2411741B
公开(公告)日：2008-06-11
申请号：GB0404805
申请日：2004-03-03
申请人： IMS NANOFABRICATION GMBH , IMS NANOFABRICATION AG
发明人： BUSCHBECK HERBERT , STENGL GERHARD
IPC分类号： G05F7/00 , H01J37/20 , H01H47/00 , H01L21/027
摘要： For compensation of a magnetic field in an operating region a number of magnetic field sensors (S 1 , S 2 ) and an arrangement of compensation coils (Hh) surrounding said operating region is used. The magnetic field is measured by at least two sensors (S 1 , S 2 ) located at different positions outside the operating region, preferably at opposing positions with respect to a symmetry axis of the operating region, generating respective sensor signals (s 1 , s 2 ), the sensor signals of said sensors are superposed to a feedback signal (ms, fs), which is converted by a controlling means to a driving signal (d 1 ), and the driving signal is used to steer at least one compensation coil (Hh). To further enhance the compensation, the driving signal is also used to derive an additional input signal (cs) for the superposing step to generate the feedback signal (fs).

78. 发明专利

NL1034588A1 Inrichting voor het belichten met geladen deeltjes. 未知
公开(公告)号：NL1034588A1
公开(公告)日：2008-05-06
申请号：NL1034588
申请日：2007-10-29
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/317

79. 发明公开

EP3258479A1 METHOD FOR COMPENSATING PATTERN PLACEMENT ERRORS CAUSED BY VARIATION OF PATTERN EXPOSURE DENSITY IN A MULTI-BEAM WRITER 有权转让
标题翻译：用于补偿由多光束写入器中的图案曝光密度的变化引起的图案放置错误的方法
公开(公告)号：EP3258479A1
公开(公告)日：2017-12-20
申请号：EP17175033.4
申请日：2017-06-08
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3177 , H01J2237/304 , H01J2237/30433 , H01J2237/30461
摘要： A method for compensating pattern placement errors during writing a pattern on a target in a charged-particle multi-beam exposure apparatus is presented. A layout is generated by exposing a plurality of beam field frames using a beam of electrically charged particles, wherein each beam field frame has a respective local pattern density, corresponding to exposure doses imparted to the target when exposing the respective beam field frames. During writing the beam field frames, the actual positions thereof deviate from their respective nominal positions by a placement error as a result of build-up effects within said exposure apparatus, depending on the local pattern density evolution during writing the beam field frames. To compensate this displacement, a displacement behavior model established beforehand is employed to predict the displacements; a local pattern density evolution is determined, displacements of the beam field frames are predicted based on the local pattern density evolution and the displacement behavior model, and the beam field frames are repositioned accordingly based on the predicted values.
摘要翻译：提出了一种用于补偿在带电粒子多束曝光设备中的目标上写入图案期间的图案布置误差的方法。通过使用带电粒子束暴露多个射束场帧来产生布局，其中每个射束场帧具有各自的局部图案密度，对应于当暴露各个射束场帧时赋予目标的曝光剂量。在写入光束场帧期间，根据在写入光束场帧期间的局部图案密度演变，由于所述曝光设备内的积聚效应，其实际位置偏离其各自的标称位置一个放置误差。为了补偿这种位移，采用预先建立的位移行为模型来预测位移; 确定局部图案密度演变，基于局部图案密度演变和位移特性模型预测射束场的位移，并且基于预测值相应地重新定位射束场帧。

80. 发明授权

EP3070528B1 MULTI-BEAM WRITING OF PATTERN AREAS OF RELAXED CRITICAL DIMENSION 有权转让
标题翻译：放松临界尺寸图案区域的多束写作
公开(公告)号：EP3070528B1
公开(公告)日：2017-11-01
申请号：EP16160622.3
申请日：2016-03-16
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar , Schiessl, Klaus
IPC分类号： G03F7/20 , H01J37/04 , H01J37/28 , H01J37/317 , H01J37/302
CPC分类号： G03F7/70466 , H01J37/3026 , H01J37/3177 , H01J2237/0435 , H01J2237/31764 , H01J2237/31769

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