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    • 61. 发明专利
    • SIGNAL TRANSMISSION SYSTEM OF ELECTRONIC DEVICE
    • JPS61253862A
    • 1986-11-11
    • JP9544585
    • 1985-05-07
    • HITACHI LTD
    • ISHIOKA YOSHIOTSUJI KAZUTAKATAKASAKI YUKIOSHIMOMOTO TAIJIMATSUBARA HIROKAZUHIRAI TADAAKI
    • H01L27/00G02B6/12G02B6/43H01L27/15H01L31/12
    • PURPOSE:To enable information to be transferred smoothly between electronic devices or between functional parts within a device, by providing a plurality of circuits, a plurality of light sources having different wavelengths, and light- receiving sections and photoelectric converting sections belonging to the respective circuits and arranged corresponding to the respective wavelengths. CONSTITUTION:Optical signal generators 10 and 11 belonging to a circuit 7 are provided by a layered structure of materials having different energy gaps. The layer 10 is made thicker than the layer 11. Consequently, the region 10 produces a narrower energy gap than the region 11 and the region 10 generates a longer wavelength while the region 11 generates a shorter wavelength. Light transmission paths 12 and 13 are also provided by a layered structure of differ ent materials, and the thicknesses of the layers are selected such that the layer 12 has a wider energy gap than the layer 13. If the optical signal generator 10 is driven, a signal is sent to a circuit 9. If the optical signal generator 11 is driven, on the contrary, the signal is sent to a circuit 8. Thus digital signals also can be transmitted by turning the optical signal generators ON and OFF. In this manner, information can be transferred very smoothly within the elec tronic device.
    • 62. 发明专利
    • Photodetector device
    • 光电设备
    • JPS59112663A
    • 1984-06-29
    • JP21618683
    • 1983-11-18
    • Hitachi Ltd
    • MARUYAMA EIICHIIMAMURA YOSHINORIADAKA SABUROUINAO KIYOHISATAKASAKI YUKIOTSUKADA TOSHIHISAHIRAI TADAAKI
    • H01J29/45H01L27/146H01L31/0248H01L31/0264H01L31/09H01L31/20H04N5/335H04N5/361H04N5/369
    • H01L31/095H01L31/202Y02E10/50Y02P70/521
    • PURPOSE:To obtain a preferable photodetector device by utilizing the fact that a thin amorphous film containing Si and H has less trap which facilitates to obtain a specific resistance of 10 OMEGAcm or higher and disturbs a light transfer carrier. CONSTITUTION:A transparent electrode 2 and an N type CeO2 film 9 are superposed on a galss plate 1. Then, a substrain is maintained at 100-300 deg.C in H2+ Ar, a reactive sputtering is performed with B-added Si as a target, and a photoconductive film 3 of P type amorphous Si having 100nm-20mum of thickness is superposed. H density in the film 3 is altered by varying H2 partial pressure of pressure 2X10 -1X10 Torr by 0-100% during discharging. The amorphous film which has optimum specific resistance of 10 OMEGAcm or higher and less trap density for a photodetector device of storage mode is obtained when the film contains 10-50 atomic % of H, and 50 atomic % or higher of contained Si, and the photodetector which has high resolution, fast responding speed, low dark current, no seizing phenomenon and extremely low image residual property can be obtained.
    • 目的:为了通过利用含有Si和H的薄的无定形薄膜具有较少的陷阱的优点来获得优选的光电检测器件,这有助于获得10 10欧姆·厘米或更高的电阻率并且干扰光传输载体。 构成:将透明电极2和N型CeO 2膜9叠加在galss板1上。然后,在H 2 + Ar中,将子串保持在100-300℃,用B加入的Si作为反应性溅射 靶,并且叠加具有100nm-20μm厚度的P型非晶Si的光电导膜3。 在放电期间,膜3中的H密度通过将压力2×10 -3 -1×10 -1乇变化0-100%来改变。 当该膜含有10-50原子%的H和50原子%以上的含有Si的非晶体膜时,获得具有10 10ΩEG·cm或更高的最佳电阻率和较低的存储模式的光电检测器件的陷阱密度的非晶膜 可以得到分辨率高,响应速度快,暗电流低,无卡死现象,图像残留特性极低的光检测器。
    • 66. 发明专利
    • SOLID-STATE IMAGE SENSING DEVICE
    • JPH02208974A
    • 1990-08-20
    • JP2861489
    • 1989-02-09
    • HITACHI LTD
    • OZAKI TOSHIBUMIKOIKE NORIOTAKASAKI YUKIOAKIYAMA TOSHIYUKI
    • H01L27/146H04N5/335H04N5/355H04N5/357H04N5/359H04N5/363H04N5/369H04N5/374H04N5/3745H04N5/378
    • PURPOSE:To enlarge an image sensing device in dynamic range by a method wherein the image sensing device is made to have such a photoelectric transfer characteristic that a signal current change to surface illuminance change is made small near a point where a signal current becomes saturated and a minimum planar illuminance corresponding to a saturated signal current is made large. CONSTITUTION:When light rays are incident on a photoconductive film a-Se 2, a signal current flows through a resistor 5 and the voltage of a storing capacitor 6-1 becomes higher than a video bias Vv. At this point, a voltage applied to a light- transmitting electrode 1 and a pixel electrode 3 decreases due to the voltage drop caused by the current which flows through the resistor 5, an electric field applied to the photoconductive film 2 decreases in intensity, and the signal current decreases in density. But, a signal current does not change in density in an electric field region A where photoelectric conversion takes place as far as illuminance is kept constant, and on the other hand, a current amplification action takes place in a region B as sensitivity increases corresponding to the intensity of an electric field. That is, a solid-state image sensing device is made to have a knee characteristic, whereby a saturated surface illuminance can be made large even if a saturated signal current is the same, so that the image sensing device can be made large in dynamic range.