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1. 发明专利

JPH0644451B2 失效
公开(公告)号：JPH0644451B2
公开(公告)日：1994-06-08
申请号：JP11409085
申请日：1985-05-29
申请人： HITACHI LTD , JAPAN BROADCASTING CORP
发明人： TAKASAKI YUKIO , MAKISHIMA TATSUO , HIRAI TADAAKI , INOUE SHIGENORI , NONAKA IKUMITSU , OGINO TOSHIO , SHIDARA KEIICHI , YAMASHITA TAKASHI , KAWAMURA TATSURO , TANIOKA KENKICHI , HIRUMA SHIGEHISA
IPC分类号： H01J9/233

2. 发明专利

JPS61273829A MANUFACTURE OF IMAGE PICK-UP TUBE TARGET 失效
公开(公告)号：JPS61273829A
公开(公告)日：1986-12-04
申请号：JP11409085
申请日：1985-05-29
申请人： HITACHI LTD , JAPAN BROADCASTING CORP
发明人： TAKASAKI YUKIO , MAKISHIMA TATSUO , HIRAI TADAAKI , INOUE SHIGENORI , NONAKA IKUMITSU , OGINO TOSHIO , SHIDARA KEIICHI , YAMASHITA TAKASHI , KAWAMURA TATSURO , TANIOKA KENKICHI , HIRUMA SHIGEHISA
IPC分类号： H01J9/233
摘要： PURPOSE:To improve reproducibility of a property during the process of mass production by a method in which, when forming a photodiode type image pick-up tube target using a photoconductive film mainly composed of Se in a light receiving screen, the photoconductive films are vacuum evaporated while holding a substrate at a specific temperature. CONSTITUTION:A light-transmitting substrate 1 is provided with an n-type light-transmitting conductive film 2, p-type photoconductive films 3 and 4 mainly consisting of Se while containing Te not exceeding 40wt% on a part of its layer and forming rectifying contact in the interface with the n-type conductive film 2 and a porous scanning electron beam landing layer 5 for forming a photodiode type image pick-up tube target. Thereby, the photoconductive films 3 and 4 are vacuum evaporated in a state in which the substrate 1 is heated and held at a temperature not exceeding 60 deg.C. And an increase in baking, a fluctuation in a signal current and the instability of reproducibility of a property that largely depend upon the temperature of substrate 1 are sharply reduced. Accordingly, mass producibility can be improved while holding a good property for long hours.

3. 发明专利

JPH09325365A PRODUCTION OF LIQUID CRYSTAL DISPLAY ELEMENT AND LIQUID CRYSTAL DISPLAY DEVICE 失效
公开(公告)号：JPH09325365A
公开(公告)日：1997-12-16
申请号：JP14565696
申请日：1996-06-07
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO , HAYASHI NOBUAKI , TOMITA YOSHIFUMI
IPC分类号： G02B5/20 , B81B1/00 , B81C1/00 , G02F1/13 , G02F1/1335 , G02F1/1343 , G02F1/136 , G02F1/1368 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To make it possible to execute developing of a resist film, peeling of the residual resist and processing of metallic thin films and semiconductor films, etc., with a completely dry process by irradiating the resist film with an excimer laser beam and removing the resist film of the irradiated parts. SOLUTION: A glass substrate 100 coated with the resist film 300 is irradiated with the excimer laser beam via an exposure mask 400 consisting of dielectric multilayered films as opaque films and having required opening patterns. Consequently, the resist patterns from which the resist of the parts corresponding to the opening patterns of the exposure mask 400 is removed are worked by the application phenomenon of the excimer laser beam and the multilayered films 200 are exposed at the required patterns. The glass substrate is then subjected to wet etching or dry etching and, thereafter, the remaining resist films are removed by full-surface application processing to irradiate the entire surface of the pattern forming surface with the excimer laser beam. The glass substrate 100 formed with the multilayered films 200 patterned to the required patterns is obtd.

4. 发明专利

JPH08320482A WORKING METHOD OF LIQUID CRYSTAL DISPLAY ELEMENT 失效
公开(公告)号：JPH08320482A
公开(公告)日：1996-12-03
申请号：JP12816095
申请日：1995-05-26
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO
IPC分类号： G02B5/20 , G02F1/1335
摘要： PURPOSE: To make working of a liquid crystal display element possible in a fast and clean flattening process with high accuracy for a local area or a large area, by using ablation phenomenon by excimer laser light to shape projections of a protective film into a flat surface. CONSTITUTION: A filter part 3 having filter layers of plural colors divided by a black matrix or having a protective film to cover the plural color filter layers is formed on the surface of a substrate (SUB1) 2. A projection part 3a is formed into a long ridge perpendicular to the plane of the figure owing to the local bulging out of plural color filter layers or the protective film. Beams 4 of an excimer laser having an intensity profile 4a are made to irradiate the projection 3a to rip the bulging out into a flat surface. By this method, a color filter substrate for a liquid crystal display element can be flattened in a clean process with

5. 发明专利

JPH08146408A PRODUCTION OF COLOR FILTER SUBSTRATE FOR LIQUID CRYSTAL DISPLAY ELEMENT 失效
公开(公告)号：JPH08146408A
公开(公告)日：1996-06-07
申请号：JP29132694
申请日：1994-11-25
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO
IPC分类号： G02B5/20 , G02F1/1335
摘要： PURPOSE: To reduce the production process to form a black matrix and a color filter. CONSTITUTION: An opaque coating film 2 formed on a transparent substrate 1 is irradiated with excimer laser light 4 through a photomask 3 to form a pattern of a black matrix 2 by photolysis. Then color filters of specified colors are formed on this black matrix by photolithographic techniques or the same method as that for the formation of the black matrix. Then a protective film and a transparent electrode are formed to cover the all color filters.

6. 发明专利

JPH08241846A ALIGNER AND LASER PROCESSING DEVICE 失效
公开(公告)号：JPH08241846A
公开(公告)日：1996-09-17
申请号：JP4574395
申请日：1995-03-06
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO
IPC分类号： H01L21/027 , H01L21/268
摘要： PURPOSE: To align a photomask with a substrate work through a simple structure even if an excimer laser is used as a light source. CONSTITUTION: An excimer laser is used as a light source in this exposure system, light 1 is selectively projected onto a photoresist film formed on a substrate work 4 through the intermediary of a photomask 2, wherein an aligning mark 2A is provided onto the photomask 2, and a substrate capable of being replaced with the substrate work 4 corresponding positionally to it and emitting fluorescence from a spot where the aligning mark 2a of the photomask 2 is projected and a means which aligns the photomask with the substrate work basing on the fluorescence emitting spot of the substrate are provided.

7. 发明专利

JPS58221273A Boat for vapor deposition 失效
标题翻译：蒸汽沉积船
公开(公告)号：JPS58221273A
公开(公告)日：1983-12-22
申请号：JP10382982
申请日：1982-06-18
申请人： Hitachi Ltd
发明人： OGINO TOSHIO
IPC分类号： C23C14/26 , C23C14/24
CPC分类号： C23C14/243
摘要： PURPOSE:To prevent the leakage and exudation of a material from a boat for vapor deposition having a double boat structure composed of a top cover, an inner cover and a bottom cover, by cutting a groove around the material reservoir of the bottom cover boat and by attaching a return bent part corresponding to the groove to the inner cover boat. CONSTITUTION:A boat for vapor deposition is composed of a bottom cover boat 1, an inner cover boat 2 and a top cover boat 3, and a material reservoir 5 for holding a material for vapor deposition is formed in the boat 1. Vapor holes 2a, 3a through which an evaporated material flies out are pierced in the boats 2, 3. A groove 6 is cut around the reservoir 5 of the boat 1, a return bent part 7 corresponding to the groove 6 in the boat 1 is attached to the boat 2, and the part 7 is fitted to the groove 6.
摘要翻译：目的：为了防止材料从具有由顶盖，内盖和底盖构成的双船结构的蒸汽沉积物的泄漏和渗出，通过在底盖船的材料储存器周围切割槽，以及通过将对应于槽的返回弯曲部分附接到内盖船。构成：用于气相沉积的船由底盖船1，内盖船2和顶盖舟3组成，并且在船1中形成用于保持用于气相沉积的材料的材料储存器5.蒸气孔2a 3a中，蒸发的材料通过其流出在船2,3中。围绕船1的贮存器5切割槽6，对应于船1中的槽6的返回弯曲部分7附接到船2，部分7装配到槽6。

8. 发明专利

JPS5696443A MANUFACTURE OF GERMANIUMMOXIDE FILM FOR PICTURE TUBE TARGET 失效
公开(公告)号：JPS5696443A
公开(公告)日：1981-08-04
申请号：JP17450080
申请日：1980-12-12
申请人： HITACHI LTD
发明人： NONAKA IKUMITSU , OGINO TOSHIO
IPC分类号： H01J9/233 , H01L31/00
摘要： PURPOSE:To obtain a target with a decreased dark-current value by preserving a base plate with relative humidity less than the prescribed level and a nesa film set on the base plate before a germanium-oxide film is formed over the base plate and the nesa film, and followed by the formation of a photoconductive layer either straight on the germanium-oxide film or with a cerium-oxide film interposed between the germanium-oxide film and the photoconductive layer. CONSTITUTION:A nesa film 2 and a germanium-oxide film 3 are formed over a glass base-plate 1, in that order. Next, a photoconductive layer 5 is formed through vacuum evaporation either straight on the film 3 or with a thin conductive layer 4 made of a composite material which comprises not less than one of zinc selenide, zinc oxide and cerium oxide, thus a target being constituted. Before forming the film 3, the base plate 1 and the nesa film 2 should be preserved in a place where relative humidity is below 10%. As a result, no adhesive moisture is allowed to occur between the nesa film 2 and the film 3, and the deterioration of the hole injection- proof effect which is caused from the nesa-film side is prevented. Consequently, a target with an effectively small value of dark current can be obtained.

9. 发明专利

JPH11212267A ABLATION ALIGNER 失效
公开(公告)号：JPH11212267A
公开(公告)日：1999-08-06
申请号：JP1587798
申请日：1998-01-28
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO
IPC分类号： G02B5/00 , B23K26/00 , G02B5/20 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To improve the productivity of processed goods by forming a partial ultraviolet light pulse in a slit state and enhancing ablation rate with respect to a material to be processed. SOLUTION: This aligner includes a pulse laser 1 generating an ultraviolet light pulse, integrator lenses 3X and 3Y, and field lenses 5X and 5Y, and is provided with an illumination optical system of processing the ultraviolet light pulse and projecting it to a mask 6, an image formation lens 7 image-forming the ultraviolet light pulse transmitted through the mask 6 and projecting it on a base plate to be processed 8, and moving stages 9a and 9b moving the mask 6 and the base plate 8 in the longitudinal and lateral directions; and the illumination optical system has an ultraviolet light pulse dividing means dividing the incident ultraviolet light pulse into plural slit state partial ultraviolet light pulses having uniform light intensity, desirably a microprism 11.

10. 发明专利

JPH1124103A LIQUID CRYSTAL DISPLAY ELEMENT AND MANUFACTURING METHOD AND DEVICE THEREFOR 失效
公开(公告)号：JPH1124103A
公开(公告)日：1999-01-29
申请号：JP17591797
申请日：1997-07-01
申请人： HITACHI LTD
发明人： SUZUKI KENKICHI , MATSUDA MASAAKI , OGINO TOSHIO
IPC分类号： G02F1/1339 , G02F1/136 , G02F1/1368
摘要： PROBLEM TO BE SOLVED: To make it possible to display a high quality image by arranging spacers regularly arrayed in a given portion except pixel portion comprising pixel forming electrodes between a pair of substrates of a liquid crystal display element. SOLUTION: Each pixel comprises thin film transistors (TFT1, 2) a transparent pixel electrode ITO1, and a holding capacitance element Cadd, and has a source electrode SD1, a drain electrode SD2, a black matrix BM, and color filters FIL. In order to set a spacing between one substrate on which the color filters are formed and the other substrate on which TFTs are formed, namely, a cell gap, spacers (spherical beads) SPC are scattered on a data line DL part avoiding pixel electrodes ITO between both substrates. Therefore, the spacing length between the substrates is determined by the spacers SPC arranged on the data line DL, and a predetermined cell gap is maintained, and no spacer exists on the pixel data ITO constituting the pixel portion.

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