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61. 发明申请

WO2006127891A2 SYSTEMS AND METHODS FOR IMPLEMENTING AN INTERACTION BETWEEN A LASER SHAPED AS A LINE BEAM AND A FILM DEPOSITED ON A SUBSTRATE 审中-公开
标题翻译：用于实现作为线束形成的激光与衬底上沉积的膜之间的相互作用的系统和方法
公开(公告)号：WO2006127891A2
公开(公告)日：2006-11-30
申请号：PCT/US2006/020223
申请日：2006-05-25
申请人： CYMER, INC , DAS, Palash, P. , HOFMANN, Thomas , DAVIS, Jesse, D. , SMITH, Scot, T. , PARTLO, William, N.
发明人： DAS, Palash, P. , HOFMANN, Thomas , DAVIS, Jesse, D. , SMITH, Scot, T. , PARTLO, William, N.
IPC分类号： A47C17/00 , A47C17/04
CPC分类号： B23K26/04 , B23K26/0622 , B23K26/0738
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

62. 发明申请

WO2006093826A3 LPP EUV DRIVE LASER 审中-公开
公开(公告)号：WO2006093826A3
公开(公告)日：2006-09-08
申请号：PCT/US2006/006597
申请日：2006-02-22
申请人： CYMER, INC. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FLEUROV, Vladimir, B. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FLEUROV, Vladimir, B. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S3/22 , H01S3/223
摘要： An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd: YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.

63. 发明申请

WO2006093783A2 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2006093783A2
公开(公告)日：2006-09-08
申请号：PCT/US2006/006410
申请日：2006-02-24
申请人： CYMER, INC. , ERSHOV, Alexander, L. , PARTLO, William, N. , BOWERING, Norbert, N.
发明人： ERSHOV, Alexander, L. , PARTLO, William, N. , BOWERING, Norbert, N.
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed that may include a laser source, e.g. CO 2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
摘要翻译：公开了一种EUV光源，其可以包括例如激光源。 CO 2激光器，等离子体室和用于将来自激光源的激光束传送到等离子体室中的光束传送系统。公开了可以包括以下中的一个或多个的实施例; 可以提供旁路管线以建立等离子体室和辅助室之间的流体连通，聚焦光学器件例如。用于将激光束聚焦到等离子体室中的焦点的反射镜，用于转向等离子体室中的激光束焦斑的转向光学元件，以及用于调整焦度的光学装置。

64. 发明申请

WO2005091879A3 EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005091879A3
公开(公告)日：2005-10-06
申请号：PCT/US2005/005935
申请日：2005-02-24
申请人： CYMER, INC. , PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
发明人： PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
IPC分类号： H01J35/20
摘要： A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).

65. 发明申请

WO2005001853A2 METHOD AND APPARATUS FOR COOLING MAGNETIC CIRCUIT ELEMENTS 审中-公开
标题翻译：用于冷却磁电元件的方法和装置
公开(公告)号：WO2005001853A2
公开(公告)日：2005-01-06
申请号：PCT/US2004/018941
申请日：2004-06-14
申请人： CYMER, INC. , NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
发明人： NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
IPC分类号： H01F
CPC分类号： H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要： An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a core support coolant outlet; a plurality of interconnected coolant flow passages contained within the core support member wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet. The core support member may comprise a flange extending from the core support member, the flange having an inner dimension and an outer dimension, which may also comprise a plurality of interconnected flange coolant flow passages extending alternatively toward the inner dimension and away from the outer dimension and then toward the outer dimension and away from the inner dimension, between the core support coolant inlet and the core support coolant outlet. The core and core support may be contained in a housing which may comprise a housing wall; a housing coolant inlet; a housing coolant outlet; and a plurality of interconnected housing coolant flow passages contained within the housing wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the housing wall along a coolant flow path within at least a substantial portion of the housing wall from the housing coolant inlet to the housing coolant outlet. The housing and core support may forma a part of at least a portion of an electrical current flow path forming two turns around the magnetic core. In another aspect of the invention buswork may be coated with a thin film of electrically conductive material.
摘要翻译：公开了一种用于向具有设置在具有至少一个芯支撑构件壁的中心定位的芯支撑构件周围的磁芯的磁路元件提供冷却的装置和方法，其可包括芯支撑冷却剂入口; 核心支撑冷却液出口; 多个互连的冷却剂流动通道，其容纳在所述芯部支撑构件壁内并且互连并且布置成沿着所述芯部支撑件的至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯部支撑构件壁内的下一个构件壁从芯部支撑冷却剂入口到芯部支撑冷却剂出口。该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。芯支撑构件可以包括从芯支撑构件延伸的凸缘，凸缘具有内部尺寸和外部尺寸，该凸缘还可以包括多个互连的凸缘冷却剂流动通道，所述凸缘冷却剂流动通道相对于内部尺寸交替地延伸并远离外部尺寸然后朝向外部尺寸并远离内部尺寸，在核心支撑冷却剂入口和芯部支撑冷却剂出口之间。芯和芯支撑件可以包含在可以包括壳体壁的壳体中; 壳体冷却剂入口; 外壳冷却液出口; 以及多个互连的壳体冷却剂流动通道，其容纳在所述壳体壁内并且被互连并且布置成将冷却剂沿着沿着所述壳体壁的至少大部分内的冷却剂流动路径从所述壳体壁在所述壳体壁内向下流动将冷却剂入口容纳到壳体冷却剂出口。壳体和芯部支撑件可以形成绕磁芯形成两圈的电流流路的至少一部分的一部分。在本发明的另一方面，母线可以涂覆有导电材料的薄膜。

66. 发明申请

WO2003096497A1 HIGH POWER DEEP ULTRAVIOLET LASER WITH LONG LIFE OPTICS 审中-公开
标题翻译：高功率深紫外线激光与长寿命光学
公开(公告)号：WO2003096497A1
公开(公告)日：2003-11-20
申请号：PCT/US2003/012819
申请日：2003-04-23
申请人： CYMER, INC. , YAGER, Thomas, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , PAN, Xiaojiang , MELCHIOR, John, T. , ALGOTS, John, M. , BALL, Matthew , ERSHOV, Alexander, I. , FLEUROV, Vladimir , GILLESPIE, Walter, D. , GLATZEL, Holger, K. , LUBLIN, Leonard , MARSH, Elizabeth , MORTON, Richard, D. , UJAZDOWKI, Richard, C. , WARKENTIN, David, J. , WEBB, R., Kyle
发明人： YAGER, Thomas, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , PAN, Xiaojiang , MELCHIOR, John, T. , ALGOTS, John, M. , BALL, Matthew , ERSHOV, Alexander, I. , FLEUROV, Vladimir , GILLESPIE, Walter, D. , GLATZEL, Holger, K. , LUBLIN, Leonard , MARSH, Elizabeth , MORTON, Richard, D. , UJAZDOWKI, Richard, C. , WARKENTIN, David, J. , WEBB, R., Kyle
IPC分类号： H01S3/22
CPC分类号： G03F7/7055 , H01S3/005 , H01S3/225
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF 2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75×10 6 Watts/cm 2 and with peak intensity or greater 3.5×10 6 Watts/cm 2 for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.
摘要翻译：本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案。实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

67. 发明申请

WO2003087867A2 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：WO2003087867A2
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01S
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high-energy photon source. Very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：在真空室中产生可靠的高重复率生产线相容的高能光子源，其中包含具有期望的极紫外（EUV）波长范围内的发射线的原子元素的热等离子体。 EUV光源单元直接集成到诸如步进机之类的光刻单元中。集成部件可以包括评论者，以及如（120）所示的固态脉冲功率单元和真空容器的压缩头。支撑设备位于支撑设备柜（122）中，粗抽真空泵和高压水泵位于第三柜（124）中。脉冲功率单元提供电脉冲，其具有足够的能量和电势，足以在连续的基础上以超过5瓦的速率在中间焦点产生EUV光，并且在突发的基础上超过20瓦。

68. 发明申请

WO2003078940A2 HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
标题翻译：高分辨率光谱测量装置
公开(公告)号：WO2003078940A2
公开(公告)日：2003-09-25
申请号：PCT/US2003/002052
申请日：2003-01-15
申请人： CYMER, INC. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
发明人： SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
IPC分类号： G01J
CPC分类号： G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/12 , G01J3/1804 , G01J3/22 , G01J9/02
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.
摘要翻译：高分辨率光谱测量装置。优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光器的光聚焦成漫射器，离散扩散器的散射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，例如约0.034pm（FWHM）和约0.091μm（95％积分）。通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。在第二实施例中，第二狭缝和光检测器被光电二极管阵列代替，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

69. 发明申请

WO2002082601A1 INJECTION SEEDED F2 LASER WITH WAVELENGTH CONTROL 审中-公开
标题翻译：注射种子F2激光与波长控制
公开(公告)号：WO2002082601A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/009625
申请日：2002-03-29
申请人： CYMER, INC. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
发明人： SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
IPC分类号： H01S3/22
CPC分类号： H01S3/105 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/10092 , H01S3/104 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem (seed laser) provides a very narrow band pulsed output beam which is used to injection seed the second laser subsystem (slave osc. or power amp.) where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply (pulse power) precisely times the discharges in the two laser subsystems so that the discharges are properly synchronized. The laser gas comprises F 2 at a partial pressure less than about 1 % with a buffer gas comprised of helium, neon, or a combination thereof. Control of the center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser subsystem: the total laser gas pressure, the relative concentration of helium or neon, F 2 partial pressure, laser gas temperature, discharge voltage and pulse energy.
摘要翻译：本发明提供一种具有两个激光子系统的窄带激光系统。第一个激光子系统（种子激光器）提供了一个非常窄的带状脉冲输出光束，用于对第二激光子系统（从属或功率放大器）进行种子注入，其中窄带脉冲种子光束被放大以产生窄带脉冲输出光束。脉冲电源（脉冲功率）精确地乘以两个激光子系统中的放电，使得放电正确同步。激光气体包含分压为小于约1％的F2，其中包含氦，氖或其组合的缓冲气体。通过调整第一激光子系统中的一个或多个以下参数来提供输出光束的中心波长的控制：总激光气体压力，氦或氖的相对浓度，F2分压，激光气体温度，放电电压和脉冲能量。

70. 发明公开

EP2630704A1 OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE 审中-公开
标题翻译：与激光种子保护研究EUV光源OSC-AMP DRIVE
公开(公告)号：EP2630704A1
公开(公告)日：2013-08-28
申请号：EP11834795.4
申请日：2011-09-06
申请人： Cymer, Inc.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J.w. , FOMENKOV, Ifor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1

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