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41. 发明授权

US4532423A IC Tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be tested 失效
标题翻译： IC测试仪使用能够容易地设置用于晶片和封装IC的探针卡单元的电子束进行测试
公开(公告)号：US4532423A
公开(公告)日：1985-07-30
申请号：US495486
申请日：1983-05-17
申请人： Toru Tojo , Kazuyoshi Sugihara
发明人： Toru Tojo , Kazuyoshi Sugihara
IPC分类号： H01J37/28 , G01R1/073 , G01R31/26 , G01R31/302 , G01R31/305 , H01L21/66 , G01R31/02 , G01N23/00
CPC分类号： H01L22/00 , G01R31/305 , H01L2924/0002
摘要： An IC tester including a specimen chamber and an electron optical column for radiating an electron beam to a specimen placed in the specimen chamber, wherein a fixed table is attached to a Z table in the specimen chamber and includes downwardly protruding spring contact pins which are connected to lead wires led outside of the specimen chamber. A probe card unit for testing an IC wafer is provided on the upper surface of the fixed table and includes electric terminals having the same positional relation as that of the spring contact pins. A probe card unit fixing mechanism is attached to the undersurface of the fixed table and is so arranged that the probe card unit can be slid laterally along the undersurface of the fixed table and then upward to press the probe card unit against the undersurface of the fixed table and to bring the spring contact pins into electrical contact with their corresponding probe card terminals.
摘要翻译：一种IC测试仪，包括用于向放置在样本室中的样本辐射电子束的样本室和电子光学柱，其中固定台附着在样品室中的Z台上，并且包括连接的向下突出的弹簧接触针将导线引导到样品室外。用于测试IC晶片的探针卡单元设置在固定台的上表面上，并且包括具有与弹簧接触针相同的位置关系的电端子。探针卡单元固定机构安装在固定台的下表面上，并且布置成使得探针卡单元可沿着固定台的下表面横向滑动，然后向上以将探针卡单元压靠固定的下表面并将弹簧触针与其相应的探针卡端子电接触。

42. 发明授权

US4408126A Cassette retaining device of electron beam apparatus 失效
标题翻译：电子束装置的盒式保持装置
公开(公告)号：US4408126A
公开(公告)日：1983-10-04
申请号：US250386
申请日：1981-04-02
申请人： Toru Tojo , Kazuyoshi Sugihara , Shuntaro Hata , Hirooki Numaga , Haruhisa Mukooyama , Yoshio Suzuki
发明人： Toru Tojo , Kazuyoshi Sugihara , Shuntaro Hata , Hirooki Numaga , Haruhisa Mukooyama , Yoshio Suzuki
IPC分类号： H01L21/027 , G21K5/08 , H01J37/20 , H01L21/673 , G21K5/10
CPC分类号： H01J37/20 , G21K5/08
摘要： A cassette retaining device comprises a pair of retaining mechanisms disposed respectively on both sides of the top surface of a sample table and pressing respectively on both sides of the top surface of a cassette to hold the cassette in said predetermined position between said retaining mechanisms and the sample table. Each retaining mechanism includes a presser capable of moving between a first position where the presser presses on a side portion of the top surface of the cassette to hold the cassette and a second position where the presser is separated from the top surface of the sample table to allow the cassette to be inserted or removed from between the presser and the sample table, a rocking arm rockable around a first pin relatively to the sample table and bearing the presser so that the presser may rock around a second pin parallel to the first pin, and a spring urging the rocking arm to rock in one direction, thereby locating the presser in the first position.
摘要翻译：盒保持装置包括分别位于样品台的顶表面的两侧上的一对保持机构，分别在盒的顶表面的两侧上按压以将盒保持在所述保持机构和所述保持机构的所述预定位置之间样品表。每个保持机构包括能够在第一位置和第二位置之间移动的压力器，第一位置和第二位置之间，压缩机压在盒的顶表面的侧面部分以保持盒子;第二位置，其中压脚与样品台的顶表面分离，允许盒子从压脚和样品台之间插入或取出，摆动臂可相对于样品台围绕第一销摆动并承载压脚，使得压脚可绕平行于第一销的第二销摆动，以及促使摇臂沿一个方向摇动的弹簧，从而将压脚定位在第一位置。

43. 发明授权

US07421109B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07421109B2
公开(公告)日：2008-09-02
申请号：US10642760
申请日：2003-08-19
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00 , G01B11/00 , G01J1/10
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要翻译：一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同成像装置。

44. 发明申请

US20050128451A1 Alignment method 有权
标题翻译：对齐方法
公开(公告)号：US20050128451A1
公开(公告)日：2005-06-16
申请号：US11012257
申请日：2004-12-16
申请人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
发明人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： H01L21/681
摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.
摘要翻译：基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及旋转机制。

45. 发明申请

US20050052634A1 Automatic focusing apparatus 有权
标题翻译：自动对焦装置
公开(公告)号：US20050052634A1
公开(公告)日：2005-03-10
申请号：US10897120
申请日：2004-07-23
申请人： Shinji Sugihara , Riki Ogawa , Toru Tojo
发明人： Shinji Sugihara , Riki Ogawa , Toru Tojo
IPC分类号： G01B11/02 , G02B7/28 , G02B21/26 , G03B27/52 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7088 , G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.
摘要翻译：一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

46. 发明申请

US20050002020A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 有权
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20050002020A1
公开(公告)日：2005-01-06
申请号：US10852434
申请日：2004-05-25
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01N21/88
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

47. 发明授权

US06676289B2 Temperature measuring method in pattern drawing apparatus 有权
标题翻译：图案绘图装置中的温度测量方法
公开(公告)号：US06676289B2
公开(公告)日：2004-01-13
申请号：US09933719
申请日：2001-08-22
申请人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
发明人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
IPC分类号： G01K1300
CPC分类号： G01K7/42
摘要： According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.
摘要翻译：根据本发明的一个实施例，本发明可以提供一种图形绘制装置中的温度测量方法，该图形绘制装置具有用于在待传送内部的基板上绘制图案的拉伸室，安装在拉伸室内的台，备用室连接到拉伸室，以及安装在备用室内的恒温装置，其特征在于，具有用于记录由温度测量装置测量的温度的温度测量装置和记录装置的虚拟基板被传送到恒温装置，然后转移进入拉伸室，然后放在平台上，由温度测量装置测量从恒温装置到载物台的传输路径中的虚拟基板的温度历史记录在记录装置中。

48. 发明授权

US4811062A Method for aligning first and second objects relative to each other and apparatus for practicing this method 失效
标题翻译：用于使第一和第二物体相对于彼此对准的方法以及用于实施该方法的装置
公开(公告)号：US4811062A
公开(公告)日：1989-03-07
申请号：US214821
申请日：1988-07-01
申请人： Mitsuo Tabata , Toru Tojo , Hiroaki Shimozono
发明人： Mitsuo Tabata , Toru Tojo , Hiroaki Shimozono
IPC分类号： H01L21/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G01B11/26
CPC分类号： G03F9/7049
摘要： In a method for aligning first and second objects relative to each other, according to this invention, the first and second objects are arranged opposite to each other, and are aligned in a direction perpendicular to their opposing direction. A grating pattern is formed, as an alignment mark, on the first object, and a checkerboard-like grating pattern is formed, also as an alignment mark, on the second object. A light beam emitted from an alignment light source is radiated onto the checkerboard-like grating pattern of the second object. The light beam diffracted by the checkerboard-like grating pattern is guided onto the grating pattern of the first object. The light beam diffracted by the grating pattern of the first object is detected by a detector. Since the light beam emitted from the light source is diffracted by the checkerboard-like grating pattern, a relative position of the first and second objects can be detected, irrespective of the distance therebetween. The first and second objects are accurately aligned, based on the detection result. This invention can be applied to a method for aligning a mask and a wafer when a circuit pattern pre-formed on the mask is to be transferred onto the wafer.
摘要翻译：在第一和第二物体相对于彼此对准的方法中，根据本发明，第一和第二物体彼此相对布置，并且在垂直于它们的相反方向的方向上对齐。在第一物体上形成作为对准标记的光栅图案，并且在第二物体上形成棋盘状光栅图案，也作为对准标记。从对准光源发射的光束被辐射到第二物体的棋盘状光栅图案上。由棋盘状光栅图案衍射的光束被引导到第一物体的光栅图案上。由第一物体的光栅图案衍射的光束由检测器检测。由于从光源发射的光束被棋盘状光栅图案衍射，所以可以检测第一和第二物体的相对位置，而与它们之间的距离无关。基于检测结果，第一和第二物体被精确对准。当将掩模上预先形成的电路图案转印到晶片上时，本发明可以应用于将掩模和晶片对准的方法。

49. 发明授权

US4480284A Electrostatic chuck plate 失效
标题翻译：静电吸盘
公开(公告)号：US4480284A
公开(公告)日：1984-10-30
申请号：US428341
申请日：1982-09-29
申请人： Toru Tojo , Ichiro Mori , Shunichi Sano
发明人： Toru Tojo , Ichiro Mori , Shunichi Sano
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6831 , H01L21/6833
摘要： An electrostatic chuck plate comprises an electrode plate made of electrically conductive material and a dielectric layer formed on one surface of the electrode plate by flame-spraying dielectric material. The surface region of the dielectric layer is impregnated with plastic material, and the surface of the dielectric layer is smooth and flat. A sample is electrostatically attracted toward the electrode plate and is thus held on the smooth and flat surface of the dielectric layer.
摘要翻译：静电卡盘包括由导电材料制成的电极板和通过火焰喷涂介电材料形成在电极板的一个表面上的电介质层。电介质层的表面区域用塑料材料浸渍，电介质层的表面光滑平坦。样品被静电吸引到电极板上，因此被保持在电介质层的光滑平坦的表面上。

50. 发明授权

US4467210A Electron-beam image transfer device 失效
标题翻译：电子束图像传输装置
公开(公告)号：US4467210A
公开(公告)日：1984-08-21
申请号：US379712
申请日：1982-05-18
申请人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
发明人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
IPC分类号： H01L21/027 , B65G49/07 , H01J37/18 , H01L21/30 , H01L21/677 , H01L21/68 , B23Q3/157
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/2037 , H01J37/18 , H01L21/30 , H01L21/67766 , H01L21/67796 , H01L21/682
摘要： An electron-beam image transfer device includes an evacuated vessel having a main chamber and spare chamber extended therefrom and a specimen holder and mask holder disposed in the main chamber. A subchamber is formed near the spare chamber to house a specimen. The specimen in the subchamber is transferred to the spare chamber by a movable support through an opening which is always kept in an airtight state, and then brought to the specimen holder by a transferring mechanism.
摘要翻译：电子束图像转印装置包括具有从其延伸的主室和备用室的抽真空容器和设置在主室中的试样保持器和掩模保持架。在备用室附近形成一个子室以容纳样品。子室中的样品通过可移动的支撑件通过总是保持在气密状态的开口转移到备用室，然后通过传送机构带到样品保持器。

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