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1. 发明授权

US4408126A Cassette retaining device of electron beam apparatus 失效
标题翻译：电子束装置的盒式保持装置
公开(公告)号：US4408126A
公开(公告)日：1983-10-04
申请号：US250386
申请日：1981-04-02
申请人： Toru Tojo , Kazuyoshi Sugihara , Shuntaro Hata , Hirooki Numaga , Haruhisa Mukooyama , Yoshio Suzuki
发明人： Toru Tojo , Kazuyoshi Sugihara , Shuntaro Hata , Hirooki Numaga , Haruhisa Mukooyama , Yoshio Suzuki
IPC分类号： H01L21/027 , G21K5/08 , H01J37/20 , H01L21/673 , G21K5/10
CPC分类号： H01J37/20 , G21K5/08
摘要： A cassette retaining device comprises a pair of retaining mechanisms disposed respectively on both sides of the top surface of a sample table and pressing respectively on both sides of the top surface of a cassette to hold the cassette in said predetermined position between said retaining mechanisms and the sample table. Each retaining mechanism includes a presser capable of moving between a first position where the presser presses on a side portion of the top surface of the cassette to hold the cassette and a second position where the presser is separated from the top surface of the sample table to allow the cassette to be inserted or removed from between the presser and the sample table, a rocking arm rockable around a first pin relatively to the sample table and bearing the presser so that the presser may rock around a second pin parallel to the first pin, and a spring urging the rocking arm to rock in one direction, thereby locating the presser in the first position.
摘要翻译：盒保持装置包括分别位于样品台的顶表面的两侧上的一对保持机构，分别在盒的顶表面的两侧上按压以将盒保持在所述保持机构和所述保持机构的所述预定位置之间样品表。每个保持机构包括能够在第一位置和第二位置之间移动的压力器，第一位置和第二位置之间，压缩机压在盒的顶表面的侧面部分以保持盒子;第二位置，其中压脚与样品台的顶表面分离，允许盒子从压脚和样品台之间插入或取出，摆动臂可相对于样品台围绕第一销摆动并承载压脚，使得压脚可绕平行于第一销的第二销摆动，以及促使摇臂沿一个方向摇动的弹簧，从而将压脚定位在第一位置。

2. 发明授权

US4469949A Electron beam pattern transfer device and method for aligning mask and semiconductor wafer 失效
标题翻译：用于对准掩模和半导体晶片的电子束图案转移装置和方法
公开(公告)号：US4469949A
公开(公告)日：1984-09-04
申请号：US374724
申请日：1982-05-04
申请人： Ichiro Mori , Kazuyoshi Sugihara , Toshiaki Shinozaki , Toru Tojo
发明人： Ichiro Mori , Kazuyoshi Sugihara , Toshiaki Shinozaki , Toru Tojo
IPC分类号： H01L21/027 , H01J37/304 , H01L21/30 , H01J37/00
CPC分类号： H01L21/30 , H01J37/3045
摘要： According to the invention an electron beam pattern transfer device with an improved alignment means is provided.A first and a second mark M.sub.1, M.sub.2 for alignment purposes are formed on the surface of the wafer and the wafer holder, respectively. The first mark M.sub.1 is formed on the wafer by conventional lithographic technique and the second mark M.sub.2 consists of a hole or a heavy metal, such as Ta or Ta.sub.2 O.sub.5. A third alignment mark M.sub.3 is provided on the photocathode mask having a position corresponding to M.sub.2 on the wafer holder and spaced a known distance L.sub.2 from an imaginary reference position M.sub.4 on the mask. The first step of the alignment process requires the detection of a relative distance L.sub.1 between the first and second marks M.sub.1, M.sub.2 by conventional detecting means, such as an optical measuring means. In the next step, the relative position of the photocathode mask and the wafer holder is adjusted so that the distance between the marks M.sub.2 and M.sub.3 is made substantially equal to the difference between the distance L.sub.1 and the known distance L.sub. 2.
摘要翻译：根据本发明，提供了具有改进的对准装置的电子束图案转印装置。分别在晶片和晶片保持器的表面上形成用于对准目的的第一和第二标记M1，M2。第一标记M1通过常规平版印刷技术在晶片上形成，第二标记M2由孔或重金属如Ta或Ta2O5组成。第三对准标记M3设置在光电阴极掩模上，其具有对应于晶片保持器上的M2的位置，并且与掩模上的假想参考位置M4隔开已知距离L2。对准处理的第一步骤需要通过诸如光学测量装置的常规检测装置检测第一和第二标记M1，M2之间的相对距离L1。在下一步骤中，调整光电阴极掩模和晶片保持器的相对位置，使得标记M2和M3之间的距离基本上等于距离L1和已知距离L 2之间的差。

3. 发明授权

US4467210A Electron-beam image transfer device 失效
标题翻译：电子束图像传输装置
公开(公告)号：US4467210A
公开(公告)日：1984-08-21
申请号：US379712
申请日：1982-05-18
申请人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
发明人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
IPC分类号： H01L21/027 , B65G49/07 , H01J37/18 , H01L21/30 , H01L21/677 , H01L21/68 , B23Q3/157
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/2037 , H01J37/18 , H01L21/30 , H01L21/67766 , H01L21/67796 , H01L21/682
摘要： An electron-beam image transfer device includes an evacuated vessel having a main chamber and spare chamber extended therefrom and a specimen holder and mask holder disposed in the main chamber. A subchamber is formed near the spare chamber to house a specimen. The specimen in the subchamber is transferred to the spare chamber by a movable support through an opening which is always kept in an airtight state, and then brought to the specimen holder by a transferring mechanism.
摘要翻译：电子束图像转印装置包括具有从其延伸的主室和备用室的抽真空容器和设置在主室中的试样保持器和掩模保持架。在备用室附近形成一个子室以容纳样品。子室中的样品通过可移动的支撑件通过总是保持在气密状态的开口转移到备用室，然后通过传送机构带到样品保持器。

4. 发明授权

US4455501A Precision rotation mechanism 失效
标题翻译：精密旋转机构
公开(公告)号：US4455501A
公开(公告)日：1984-06-19
申请号：US429230
申请日：1982-09-30
申请人： Toru Tojo , Kazuyoshi Sugihara
发明人： Toru Tojo , Kazuyoshi Sugihara
IPC分类号： G03F7/20 , H01J37/20 , H01L21/68 , H01L41/09 , H01L41/08
CPC分类号： H02N2/023 , G03F7/70691 , H01J37/20 , H01L21/68 , H02N2/0095 , H02N2/101
摘要： In a precision rotation mechanism, first and second sections of a rotatable disk member are alternately rotated. The first and second sections are coupled together with an elastic hinge which is provided in the center region of the disk. The first and second sections are also coupled with piezoelectric elements. After the first section is locked by a stopper, the piezoelectric element is elongated in a direction and the piezoelectric element is contracted in a direction, whereby the second section is rotated in a direction. Then, the second section is locked by the stopper and the first section is released from the stopper. In this state, one piezoelectric element is contracted and the other piezoelectric element is elongated so that the first section is rotated.
摘要翻译：在精密旋转机构中，旋转盘构件的第一和第二部分交替旋转。第一和第二部分与提供在盘的中心区域中的弹性铰链联接在一起。第一和第二部分也与压电元件耦合。在第一部分被止动器锁定之后，压电元件在一个方向上伸长，并且压电元件沿一个方向收缩，由此第二部分沿一个方向旋转。然后，第二部分由止动器锁定，第一部分从止动件释放。在这种状态下，一个压电元件收缩，另一个压电元件是细长的，从而使第一部分旋转。

5. 发明授权

US4578607A Piezoelectric precise rotation mechanism for slightly rotating an object 失效
标题翻译：用于轻微旋转物体的压电精密旋转机构
公开(公告)号：US4578607A
公开(公告)日：1986-03-25
申请号：US664964
申请日：1984-10-26
申请人： Toru Tojo , Kazuyoshi Sugihara
发明人： Toru Tojo , Kazuyoshi Sugihara
IPC分类号： H02N2/00 , H01L41/09 , H02N2/10 , H01L41/08
CPC分类号： H02N2/101
摘要： In a precise rotation mechanism for slightly rotating an object, a drive disk is placed on a flat and smooth surface of a base and rotating disk is mounted on the disk surface of the drive disk and rotatably supported by a pivot bearing on a coupling section of the drive disk. Fixed sections of the drive disk are fixed on the base and movable sections of the drive disk are tiltably coupled to the fixed sections through the coupling section by elastic hinges and also coupled to the fixed sections by driving members made of piezoelectric elements, which are elongated/contracted upon application of a voltage to slightly move the movable sections. Fixing members made of the piezoelectric elements are respectively fixed to the movable sections. When one of the fixing members is contracted, the rotating disk is urged by one of the fixing members against the movable sections and is movable together with the movable sections.
摘要翻译：在用于稍微旋转物体的精确旋转机构中，驱动盘被放置在基座的平坦且平滑的表面上，并且旋转盘安装在驱动盘的盘表面上并且由枢转轴承可旋转地支撑在联接部分驱动盘。驱动盘的固定部分固定在基座上，驱动盘的可移动部分通过弹性铰链通过联接部分可转动地连接到固定部分，并且还通过由压电元件制成的驱动部件连接到固定部分施加电压以稍微移动可动部分时收缩。由压电元件制成的固定件分别固定在可动部分上。当固定构件中的一个收缩时，旋转盘被固定构件中的一个推压到可动部分上，并且与可动部分一起移动。

6. 发明授权

US4532423A IC Tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be tested 失效
标题翻译： IC测试仪使用能够容易地设置用于晶片和封装IC的探针卡单元的电子束进行测试
公开(公告)号：US4532423A
公开(公告)日：1985-07-30
申请号：US495486
申请日：1983-05-17
申请人： Toru Tojo , Kazuyoshi Sugihara
发明人： Toru Tojo , Kazuyoshi Sugihara
IPC分类号： H01J37/28 , G01R1/073 , G01R31/26 , G01R31/302 , G01R31/305 , H01L21/66 , G01R31/02 , G01N23/00
CPC分类号： H01L22/00 , G01R31/305 , H01L2924/0002
摘要： An IC tester including a specimen chamber and an electron optical column for radiating an electron beam to a specimen placed in the specimen chamber, wherein a fixed table is attached to a Z table in the specimen chamber and includes downwardly protruding spring contact pins which are connected to lead wires led outside of the specimen chamber. A probe card unit for testing an IC wafer is provided on the upper surface of the fixed table and includes electric terminals having the same positional relation as that of the spring contact pins. A probe card unit fixing mechanism is attached to the undersurface of the fixed table and is so arranged that the probe card unit can be slid laterally along the undersurface of the fixed table and then upward to press the probe card unit against the undersurface of the fixed table and to bring the spring contact pins into electrical contact with their corresponding probe card terminals.
摘要翻译：一种IC测试仪，包括用于向放置在样本室中的样本辐射电子束的样本室和电子光学柱，其中固定台附着在样品室中的Z台上，并且包括连接的向下突出的弹簧接触针将导线引导到样品室外。用于测试IC晶片的探针卡单元设置在固定台的上表面上，并且包括具有与弹簧接触针相同的位置关系的电端子。探针卡单元固定机构安装在固定台的下表面上，并且布置成使得探针卡单元可沿着固定台的下表面横向滑动，然后向上以将探针卡单元压靠固定的下表面并将弹簧触针与其相应的探针卡端子电接触。

7. 发明授权

US4572956A Electron beam pattern transfer system having an autofocusing mechanism 失效
标题翻译：具有自动聚焦机构的电子束图案转印系统
公开(公告)号：US4572956A
公开(公告)日：1986-02-25
申请号：US525419
申请日：1983-08-22
申请人： Toru Tojo , Ichiro Mori , Toshiaki Shinozaki , Kazuyoshi Sugihara , Mitsuo Tabata , Chikara Itoh
发明人： Toru Tojo , Ichiro Mori , Toshiaki Shinozaki , Kazuyoshi Sugihara , Mitsuo Tabata , Chikara Itoh
IPC分类号： G03F7/207 , H01J37/21 , H01J37/304 , H01J37/317 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J37/3175 , H01J2237/216 , H01J2237/30455 , H01J2237/31779 , Y10S505/879
摘要： An electron beam pattern transfer system is disclosed which includes a photoelectric transducing mask disposed within a vacuum container and adapted to transfer a photoelectron beam pattern corresponding to a pattern of the mask onto a sample according to an amount of an incident light, a DC voltage generator connected to vary a voltage applied between the mask and the sample, and a focusing coil of a superconductive magnet for creating a magnetic field of a predetermined intensity between the mask and the sample. When a mask-to-sample distance and/or magnetic field intensity varies undesirably, the variation is electrically detected by detectors. In order to compensate for the defocusing of the photoelectron beam pattern on the sample due to the above-mentioned variation, a microprocessor automatically calculates an amount of correction with respect to the intensity of the electric field between the mask and the sample, on a real-time basis and supplies its control signal to the DC voltage generator.
摘要翻译：公开了一种电子束图案转印系统，其包括设置在真空容器内并适于根据入射光量将对应于掩模图案的光电子束图案转移到样品上的光电转换掩模，直流电压发生器连接以改变施加在掩模和样品之间的电压，以及用于在掩模和样品之间产生预定强度的磁场的超导磁体的聚焦线圈。当掩模到采样距离和/或磁场强度变化不期望时，变化由检测器电检测。为了补偿由于上述变化而导致的样品上的光电子束图案的散焦，微处理器自动地计算相对于掩模和样品之间的电场强度的校正量，实际上并将其控制信号提供给直流电压发生器。

8. 发明授权

US07745073B2 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same 失效
标题翻译：半导体器件的制造方法，模板掩模及其制造方法
公开(公告)号：US07745073B2
公开(公告)日：2010-06-29
申请号：US12289895
申请日：2008-11-06
申请人： Kyoichi Suguro , Takeshi Shibata , Kazuyoshi Sugihara , Kouji Matsuo
发明人： Kyoichi Suguro , Takeshi Shibata , Kazuyoshi Sugihara , Kouji Matsuo
IPC分类号： G03F9/00
CPC分类号： B82Y10/00 , C23C14/042 , C23C14/48 , G03F1/20 , H01J2237/0453 , H01J2237/31788 , H01L21/266 , Y10T428/24273
摘要： Preparing a stencil mask comprising a silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to the semiconductor substrate using the stencil mask which is opposingly arranged on the semiconductor substrate.
摘要翻译：制备包括硅薄膜的模板掩模，其中用于选择性地将带电粒子照射到半导体基板的开口，并且其上照射有带电粒子的照射面被注入杂质，并且将带电粒子选择性地照射到半导体衬底使用相对设置在半导体衬底上的模板掩模。

9. 发明授权

US06316163B1 Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US06316163B1
公开(公告)日：2001-11-13
申请号：US09163421
申请日：1998-09-30
申请人： Shunko Magoshi , Masamitsu Itoh , Shinji Sato , Soichi Inoue , Kazuyoshi Sugihara , Katsuya Okumura
发明人： Shunko Magoshi , Masamitsu Itoh , Shinji Sato , Soichi Inoue , Kazuyoshi Sugihara , Katsuya Okumura
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/78 , G03F7/7045 , H01J37/3174
摘要： A method for forming patterns, in which pattern transfer to the same photosensitive material on a first layer is carried out using both light exposure and charged particle beam exposure, comprises the steps of performing a predetermined geometric operation between data associated with a pattern to be transferred to the first layer and data associated with a pattern to be transferred to a second layer different from the first layer, separating the pattern data associated with the pattern to be transferred to the first layer into first exposure pattern data for charged particle beam exposure and second exposure pattern data for light exposure, and performing pattern transfer on to the first layer based on the result of the separation.
摘要翻译：一种用于形成图案的方法，其中使用曝光和带电粒子束曝光两者进行对第一层上的相同感光材料的图案转印，包括以下步骤：在与待转印图案相关联的数据之间执行预定的几何运算将与要传送到不同于第一层的第二层的图案相关联的数据相关联的数据与将要传送到第一层的图案相关联的图案数据分离成用于带电粒子束曝光的第一曝光图案数据和第二层用于曝光的曝光图案数据，以及基于分离结果将图案转印到第一层上。

10. 发明授权

US6093931A Pattern-forming method and lithographic system 失效
标题翻译：图案形成方法和平版印刷系统
公开(公告)号：US6093931A
公开(公告)日：2000-07-25
申请号：US410018
申请日：1999-10-01
申请人： Kazuyoshi Sugihara , Hiromi Niiyama , Shunko Magoshi , Atsushi Ando , Tetsuro Nakasugi , Shinji Sato , Yumi Watanabe , Yosimitu Kato , Toru Shibata , Katsuya Okumura
发明人： Kazuyoshi Sugihara , Hiromi Niiyama , Shunko Magoshi , Atsushi Ando , Tetsuro Nakasugi , Shinji Sato , Yumi Watanabe , Yosimitu Kato , Toru Shibata , Katsuya Okumura
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/203 , G03F7/2059 , G03F7/7045 , H01J37/3174
摘要： A rough pattern exceeding the resolution limit of light exposure is formed by light resolution. A fine pattern not exceeding the resolution limit of light exposure is formed by charge-beam exposure. Combining the rough pattern and the fine pattern produces a desired pattern. The sharing of the work between light exposure and charge-beam exposure exhibits the high throughput of light exposure and the excellent resolving power of charge-beam exposure.
摘要翻译：通过光分辨率形成超过曝光分辨率极限的粗糙图案。通过电荷束曝光形成不超过曝光的分辨率极限的精细图案。结合粗糙图案和精细图案产生期望的图案。曝光和电荷束曝光之间的工作共享表现出高曝光量和电荷束曝光的优异分辨能力。

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