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1. 发明授权

US06676289B2 Temperature measuring method in pattern drawing apparatus 有权
标题翻译：图案绘图装置中的温度测量方法
公开(公告)号：US06676289B2
公开(公告)日：2004-01-13
申请号：US09933719
申请日：2001-08-22
申请人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
发明人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
IPC分类号： G01K1300
CPC分类号： G01K7/42
摘要： According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.
摘要翻译：根据本发明的一个实施例，本发明可以提供一种图形绘制装置中的温度测量方法，该图形绘制装置具有用于在待传送内部的基板上绘制图案的拉伸室，安装在拉伸室内的台，备用室连接到拉伸室，以及安装在备用室内的恒温装置，其特征在于，具有用于记录由温度测量装置测量的温度的温度测量装置和记录装置的虚拟基板被传送到恒温装置，然后转移进入拉伸室，然后放在平台上，由温度测量装置测量从恒温装置到载物台的传输路径中的虚拟基板的温度历史记录在记录装置中。

2. 发明授权

US06182369B2 Pattern forming apparatus 失效
标题翻译：图案形成装置
公开(公告)号：US06182369B2
公开(公告)日：2001-02-06
申请号：US09038038
申请日：1998-03-11
申请人： Ryoichi Hirano , Shusuke Yoshitake , Kazuto Matsuki , Toru Tojo
发明人： Ryoichi Hirano , Shusuke Yoshitake , Kazuto Matsuki , Toru Tojo
IPC分类号： G01B5004
CPC分类号： G03F7/70383 , G03F7/70433 , H01J37/3023 , H01J2237/30461 , H01J2237/31764
摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.
摘要翻译：一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由位置测量单元和由校正单元校正的各个区域的绘图位置。

3. 发明授权

US5912468A Charged particle beam exposure system 失效
标题翻译：带电粒子束曝光系统
公开(公告)号：US5912468A
公开(公告)日：1999-06-15
申请号：US841762
申请日：1997-04-28
申请人： Ryoichi Hirano , Souji Koikari , Kazuto Matsuki , Shusuke Yoshitake , Toru Tojo
发明人： Ryoichi Hirano , Souji Koikari , Kazuto Matsuki , Shusuke Yoshitake , Toru Tojo
IPC分类号： G21K5/04 , G01Q30/00 , G01Q70/02 , G03F7/20 , H01J37/317 , H01L21/027 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30455
摘要： An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.
摘要翻译：本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将图案精度高。根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块导电块。

4. 发明授权

US06281510B1 Sample transferring method and sample transfer supporting apparatus 有权
标题翻译：样品转印方法和样品转印支持装置
公开(公告)号：US06281510B1
公开(公告)日：2001-08-28
申请号：US09562181
申请日：2000-05-02
申请人： Shusuke Yoshitake , Yoshiaki Tsukumo , Ryoichi Hirano , Toru Tojo , Yoshiaki Tada , Makoto Kanda
发明人： Shusuke Yoshitake , Yoshiaki Tsukumo , Ryoichi Hirano , Toru Tojo , Yoshiaki Tada , Makoto Kanda
IPC分类号： A61N500
CPC分类号： H01L21/67748 , H01L21/67751 , Y10S438/949
摘要： A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulatively preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.
摘要翻译：将样品转移到保持在真空气氛中的处理室通过压力调节室的方法。在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。还公开了一种用于支持样品转印方法的装置。

5. 发明授权

US6090176A Sample transferring method and sample transfer supporting apparatus 失效
标题翻译：样品转印方法和样品转印支持装置
公开(公告)号：US6090176A
公开(公告)日：2000-07-18
申请号：US38037
申请日：1998-03-11
申请人： Shusuke Yoshitake , Yoshiaki Tsukumo , Ryoichi Hirano , Toru Tojo , Yoshiaki Tada , Makoto Kanda
发明人： Shusuke Yoshitake , Yoshiaki Tsukumo , Ryoichi Hirano , Toru Tojo , Yoshiaki Tada , Makoto Kanda
IPC分类号： B65G49/07 , H01L21/677 , B65D85/90
CPC分类号： H01L21/67748 , H01L21/67751 , Y10S438/949
摘要： A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulative preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.
摘要翻译：将样品转移到保持在真空气氛中的处理室通过压力调节准备室的方法。在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。还公开了一种用于支持样品转印方法的装置。

6. 发明授权

US06411023B1 Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons from ion pump 失效
标题翻译：能够抑制离子泵离子和电子泄漏的真空处理装置和离子泵
公开(公告)号：US06411023B1
公开(公告)日：2002-06-25
申请号：US09496643
申请日：2000-02-03
申请人： Katsuhito Ogura , Ryoichi Hirano , Toru Tojo
发明人： Katsuhito Ogura , Ryoichi Hirano , Toru Tojo
IPC分类号： H05H1900
CPC分类号： H01J37/18 , H01J2237/022
摘要： A vacuum processing apparatus performs processing such-as a pattern depiction with a charged beam within a process chamber evacuated to a high vacuum by an ion pump. The vacuum processing apparatus, which makes it possible to prevent the accuracy of the charged beam pattern depiction from being deteriorated by ions and electrons leaking from the ion pump, has a conductor and a voltage applying unit. The conductor is arranged in the vicinity of the suction port of the process chamber communicating with the ion pump such that the conductor is electrically insulated from the process chamber. The voltage applying unit imparts a potential differing from that of the process chamber to the conductor. Because of the potential difference between the conductor and the process chamber, the ions and electrons leaking from the ion pump are reflected or adsorbed by the conductor so as to suppress leakage of the ions and electrons into the process chamber.
摘要翻译：真空处理装置通过离子泵在被抽成高真空的处理室内进行诸如利用带电束的图案描绘的处理。能够防止带电波束图形的精度被从离子泵泄漏的离子和电子劣化的真空处理装置具有导体和电压施加单元。导体布置在与离子泵连通的处理室的吸入口附近，使得导体与处理室电绝缘。电压施加单元将不同于处理室的电位赋予导体。由于导体和处理室之间的潜在差异，离子泵泄漏的离子和电子被导体反射或吸收，以便抑制离子和电子向处理室的泄漏。

7. 发明授权

US06239443B1 Apparatus for emitting a beam to a sample used for manufacturing a semiconducor device 失效
标题翻译：用于向用于制造半导体器件的样品发射光束的装置
公开(公告)号：US06239443B1
公开(公告)日：2001-05-29
申请号：US09040286
申请日：1998-03-18
申请人： Toru Tojo , Ryoichi Hirano , Susumu Saito , Hitoshi Suzuki , Kazuo Abe , Shinya Watanabe
发明人： Toru Tojo , Ryoichi Hirano , Susumu Saito , Hitoshi Suzuki , Kazuo Abe , Shinya Watanabe
IPC分类号： G01N2186
CPC分类号： G03F9/7049
摘要： An apparatus for emitting a beam to a sample used for manufacturing a semiconductor device in order to process the sample, includes a chamber having an opening, a moving mechanism provided in the chamber, for moving the sample in X-, Y- and Z-axis directions, and a beam emitting system associated with the opening of the chamber, for emitting a beam to the sample in the chamber. The apparatus further includes an optical position detector for guiding a coherent light beam into the chamber and detecting a light beam output from the chamber. The optical position detector has light beam generating unit for generating a coherent light beam to be emitted to the sample, light-receiving unit for receiving a light beam from a surface of the sample, and converting unit for converting a signal output from the light-receiving unit into signals in the X-, Y- and Z-axis directions.
摘要翻译：用于向用于制造半导体器件的样品发射光束以便处理样品的装置包括具有开口的腔室，设置在腔室中的移动机构，用于将样品移动到X，Y和Z轴中，以及与室的开口相关联的光束发射系统，用于将光束发射到室中的样品。该装置还包括光学位置检测器，用于将相干光束引导到腔室中并检测从腔室输出的光束。光学位置检测器具有用于产生要发射到样品的相干光束的光束产生单元，用于接收来自样品表面的光束的光接收单元，以及用于转换从发光元件输出的信号的转换单元，接收单元进入X，Y和Z轴方向的信号。

8. 发明授权

US6080990A Position measuring apparatus 失效
标题翻译：位置测量仪
公开(公告)号：US6080990A
公开(公告)日：2000-06-27
申请号：US40391
申请日：1998-03-18
申请人： Shinya Watanabe , Hitoshi Suzuki , Kazuo Abe , Susumu Saito , Toru Tojo , Ryoichi Hirano
发明人： Shinya Watanabe , Hitoshi Suzuki , Kazuo Abe , Susumu Saito , Toru Tojo , Ryoichi Hirano
IPC分类号： G01D5/38 , G01B11/00 , G01B11/03 , G03F9/00 , H01L21/027 , G01B11/14
CPC分类号： G03F9/7026 , G03F9/7049 , G03F9/7065 , G03F9/7088
摘要： A position measuring apparatus includes a light source 1, an illumination optical system 100, a light-reception optical system 400 and a light-receiving unit 500. Illuminating beam emitted from the light source 1 is diffracted by a two-dimensional pattern on an object 10, and then enters the light-reception optical system 400. The light-receiving unit 500 receives diffracted lights consisting of a combination of a higher-order diffracted light appearing on the object side for the zero-order diffracted light in the receive diffracted lights with a zero-order diffracted light different in frequency from the higher-order diffracted light and another combination of higher-order diffracted lights different in frequency from one another and appearing on the object side for the zero-order diffracted light, thereby forming a position measuring interference measurement signal within the plane including the object. A signal processing unit is adapted to measure the position of the object 10 based on the phase of the position measuring interference measurement signal.
摘要翻译：位置测量装置包括光源1，照明光学系统100，光接收光学系统400和光接收单元500.从光源1发射的照明光束被物体上的二维图案衍射光接收单元500接收由接收衍射光中的零级衍射光在物体侧出现的高阶衍射光的组合构成的衍射光具有与高次衍射光不同的零级衍射光和频率彼此不同的高阶衍射光的另一组合，并且在物体侧出现零级衍射光，从而形成位置在包括物体的平面内测量干涉测量信号。信号处理单元适于基于位置测量干涉测量信号的相位来测量对象10的位置。

9. 发明授权

US07590277B2 Pattern inspecting method 失效
标题翻译：模式检查方法
公开(公告)号：US07590277B2
公开(公告)日：2009-09-15
申请号：US11175360
申请日：2005-07-07
申请人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
发明人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.
摘要翻译：本发明可以快速检测像图像中的像素位置偏差，扩张/收缩噪声或感测噪声那样的缺陷。在检查中识别出检查基准图案图像与待检查图案图像之间的关系，构成通过吸收（贴合）图像上的像素位置偏差，扩张/收缩噪声或感测噪声而获得的数学模型，以及通过比较通过模拟数学模型获得的新的检查参考图案图像（模型图像）和待检查的图案图像来检测缺陷。

10. 发明申请

US20080166054A1 PATTERN INSPECTION APPARATUS 有权
标题翻译：图案检查装置
公开(公告)号：US20080166054A1
公开(公告)日：2008-07-10
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/46
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域，对比方法。

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