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31. 发明授权

US07087899B2 Sample electrification measurement method and charged particle beam apparatus 有权
标题翻译：样品充电测量方法和带电粒子束装置
公开(公告)号：US07087899B2
公开(公告)日：2006-08-08
申请号：US11077130
申请日：2005-03-11
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

32. 发明授权

US07030376B2 Electron beam apparatus and method for production of its specimen chamber 有权
公开(公告)号：US07030376B2
公开(公告)日：2006-04-18
申请号：US10742901
申请日：2003-12-23
申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
发明人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
IPC分类号： G01N23/00
CPC分类号： H01J37/09 , H01J37/16 , H01J2237/1405 , H01J2237/16 , H01J2237/2614 , H01J2237/2617 , H01J2237/28
摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

33. 发明授权

US06646262B1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US06646262B1
公开(公告)日：2003-11-11
申请号：US10069571
申请日：2002-07-15
申请人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
发明人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
IPC分类号： H01J3720
CPC分类号： H01J37/26 , H01J37/244 , H01J37/28 , H01J2237/05 , H01J2237/2448 , H01J2237/24485 , H01J2237/26
摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要翻译：具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于还具有多孔结构设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

34. 发明授权

US5668368A Apparatus for suppressing electrification of sample in charged beam irradiation apparatus 失效
标题翻译：用于抑制带电束照射装置中样品带电的装置
公开(公告)号：US5668368A
公开(公告)日：1997-09-16
申请号：US643252
申请日：1996-05-02
申请人： Katsuhiko Sakai , Osamu Nasu , Yoichi Ose
发明人： Katsuhiko Sakai , Osamu Nasu , Yoichi Ose
IPC分类号： H01J37/02 , H01J37/30 , H05H3/00
CPC分类号： H01J37/026 , H01J2237/0041 , H01J2237/0044 , H01J2237/3175
摘要： When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting electric charge from a plasma generation unit to the vicinity of the sample surface ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface. Especially when there is a possibility that impurities other than the electric charge for neutralization affect the sample adversely, an impurity generation source is blind folded with a cover so as not to be seen through from the sample and charged beam so that the impurities may be prevented from impinging upon the sample surface or intersecting the charged beam path.
摘要翻译：当将带电束照射在样品上时，在样品表面上积累与带电束相同极性的电荷的充电。为了中和充电电荷，提供了一种用于抑制带电束照射装置中的样品带电的装置，其中在样品表面附近产生与带电束的极性相反极性的电荷以中和充电的光束或电荷样品表面上的电荷。用于中和的电荷是通过将电荷从等离子体产生单元接收到从样品表面产生的样品表面电离气体附近，通过使带电的束撞击气体或通过从样品上的电子源照射电子而产生的表面。特别是当除了中和电荷以外的杂质有可能不利地影响样品时，杂质产生源被遮盖物盲目地折叠，从而不能从样品和带电束中透过，从而可以防止杂质撞击在样品表面上或与带电光束相交。

35. 发明授权

US5633496A Mass spectrometry apparatus 失效
标题翻译：质谱仪
公开(公告)号：US5633496A
公开(公告)日：1997-05-27
申请号：US405767
申请日：1995-03-17
申请人： Minoru Sakairi , Tadao Mimura , Yoichi Ose , Atsumu Hirabayashi , Yasuaki Takada
发明人： Minoru Sakairi , Tadao Mimura , Yoichi Ose , Atsumu Hirabayashi , Yasuaki Takada
IPC分类号： G01N27/62 , G01N27/447 , G01N30/72 , H01J49/04 , H01J49/06 , B01D59/44 , H01J49/00
CPC分类号： H01J49/067 , G01N30/7233
摘要： A mass spectrometry apparatus which includes an ion source which ionizes a sample under atmospheric pressure and outputs the ionized sample, a differential pumping region, provided with apertures, for receiving under vacuum ions in the ionized sample from the ion source and outputting the ions and an ion accelerating and focusing region, having a plurality of ion accelerating electrodes each having applied thereto a voltage, for accelerating and focusing under vacuum the ions from the differential pumping region. The ions from the accelerating and focusing region are introduced under vacuum to a mass spectrometer which detects and analyzes the ions.
摘要翻译：一种质谱装置，其包括离子源，所述离子源在大气压下离子化样品并输出所述离子化样品，具有孔的差分泵浦区，用于在离子源的离子化样品中的真空离子下接收并输出离子，离子加速和聚焦区域，具有多个离子加速电极，每个离子加速电极都施加有电压，用于在真空下加速和聚焦来自差动泵浦区域的离子。来自加速和聚焦区域的离子被真空引入到检测和分析离子的质谱仪中。

36. 发明授权

US5089699A Secondary charged particle analyzing apparatus and secondary charged particle extracting section 失效
标题翻译：二次带电粒子分析装置和二次带电粒子提取部
公开(公告)号：US5089699A
公开(公告)日：1992-02-18
申请号：US491820
申请日：1990-03-12
申请人： Yoichi Ose , Yoshiya Higuchi , Kazuyoshi Miki
发明人： Yoichi Ose , Yoshiya Higuchi , Kazuyoshi Miki
IPC分类号： G01Q30/04 , H01J37/252 , H01J49/04 , H01J49/06
CPC分类号： H01J49/06 , H01J37/252 , H01J49/04 , H01J2237/0473 , H01J2237/2444 , H01J2237/24495 , H01J2237/2527
摘要： In a secondary charged particle analyzing apparatus such as a secondary ion mass analyzing apparatus, a scanning type electron mass analyzer, etc., in order to obtain a high resolving power and a high sensitivity, trajectories of secondary charged particles are corrected by means of an accelerating lens formed in a secondary charged particle extracting section disposed within the apparatus.
摘要翻译：在二次离子质量分析装置，扫描式电子质量分析装置等的二次带电粒子分析装置中，为了获得高分辨能力和高灵敏度，二次带电粒子的轨迹通过在设置在该装置内的二次带电粒子提取部分中形成的加速透镜。

37. 发明申请

US20130126731A1 Charged Particle Microscope and Ion Microscope 审中-公开
标题翻译：带电粒子显微镜和离子显微镜
公开(公告)号：US20130126731A1
公开(公告)日：2013-05-23
申请号：US13521588
申请日：2011-02-04
申请人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami
发明人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/08 , H01J37/28 , H01J2237/006 , H01J2237/0807
摘要： In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ion source of a charged particle microscope is equipped with a vacuum chamber in which are provided a vacuum chamber evacuation mechanism, an acicular emitter tip, an extraction electrode disposed facing the emitter tip, and a mechanism for supplying a gas to the vicinity of the emitter tip, and is configured so that the gas in the region around the tip of acicular ion emitter is ionized and extracted as an ion beam. Therein, the evacuation mechanism and the gas supply mechanism are connected, and a material for adhering the gas to be ionized is disposed between the evacuation mechanism and the gas supply mechanism.
摘要翻译：为了提供一种表现出优异的电离气体利用效率和经济效率的安全环保的带电气体微粒显微镜，带电微粒显微镜的气体离子源装备有真空室，真空室抽吸机构，针状发射极尖端，面向发射极尖端的引出电极和用于向发射极尖端附近提供气体的机构，并且被构造成使得针状离子发射体的尖端周围的区域中的气体为电离并提取为离子束。其中，排气机构和气体供给机构连接，并且用于将待离子化的气体粘附的材料设置在排气机构和气体供给机构之间。

38. 发明申请

US20100294929A1 Sample Electrification Measurement Method and Charged Particle Beam Apparatus 有权
标题翻译：样品电化测量方法和带电粒子束装置
公开(公告)号：US20100294929A1
公开(公告)日：2010-11-25
申请号：US12710679
申请日：2010-02-23
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

39. 发明授权

US07825377B2 Electron beam apparatus with aberration corrector 有权
标题翻译：具有像差校正器的电子束装置
公开(公告)号：US07825377B2
公开(公告)日：2010-11-02
申请号：US12153068
申请日：2008-05-13
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要翻译：提供具有使用多极透镜的像差校正器的电子束装置。电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得物镜的物体在任一种扫描模式下都不会改变。如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

40. 发明授权

US07612336B2 Scanning electron microscope having a monochromator 有权
标题翻译：具有单色仪的扫描电子显微镜
公开(公告)号：US07612336B2
公开(公告)日：2009-11-03
申请号：US11649882
申请日：2007-01-05
申请人： Wataru Mori , Makoto Ezumi , Yoichi Ose
发明人： Wataru Mori , Makoto Ezumi , Yoichi Ose
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/05 , H01J37/153 , H01J2237/057 , H01J2237/1501 , H01J2237/216
摘要： A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron beam entering the monochromator and a first astigmatism correcting lens for correcting astigmatism of the electron beam entering the monochromator. The microscope further includes a means of obtaining an image of an electron-beam adjustment sample disposed where the electron beam in the monochromator is focused, and based on the obtained image, driving the first focusing lens and the first astigmatism correcting lens so that the focusing and astigmatism of the electron beam entering the monochromator are adjusted.
摘要翻译：具有可自动调节进入单色仪的电子束和单色仪的操作条件的单色仪的扫描电子显微镜。具有单色仪的扫描电子显微镜在电子源和单色仪之间配备有用于调节进入单色仪的电子束的聚焦的第一聚焦透镜和用于校正进入单色仪的电子束的像散的第一散光校正透镜。显微镜还包括获得设置在单色仪中的电子束被聚焦的电子束调节样本的图像的装置，并且基于获得的图像，驱动第一聚焦透镜和第一散光校正透镜，使得聚焦并且调节进入单色仪的电子束的散光。

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