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21. 发明公开

KR1020120007341A 구리계 금속막용 포지티브형 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 无效
标题翻译：用于基于铜箔的金属膜组合物的正电子照相机和使用其的光电子发送器的方法
公开(公告)号：KR1020120007341A
公开(公告)日：2012-01-20
申请号：KR1020100068056
申请日：2010-07-14
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 장원영 , 윤종흠
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0044 , G03F7/0223 , H01L21/0273 , H01L21/0274
摘要： PURPOSE: A positive photo-resist composition for a copper-based metal film and a method for forming a photo-resist pattern using the same are provided to prevent the collapse and the delamination of patterns in a developing process or an etching process. CONSTITUTION: A positive photo-resist composition includes 10-25 weight% of an alkali-soluble resin, 1-10 weight% of a photo-sensitive compound, 0.01-0.1 weight% of a compound represented by chemical formula 1, and remaining amount of a solvent based on the total weight of the composition. In the chemical formula 1, the R1 is hydrogen or hydroxyl group. The R2 and the R3 are respectively hydrogen, C1 to C5 alkyl group, or C6 to C15 aryl group. The alkali-soluble resin is a novolak resin.
摘要翻译：目的：提供一种用于铜基金属膜的正型光致抗蚀剂组合物和使用其的形成光致抗蚀剂图案的方法，以防止在显影过程或蚀刻工艺中图案的塌陷和分层。构成：正光致抗蚀剂组合物包含10-25重量％的碱溶性树脂，1-10重量％的光敏化合物，0.01-0.1重量％的化学式1表示的化合物和剩余量基于组合物的总重量的溶剂。在化学式1中，R1是氢或羟基。 R2和R3分别为氢，C1至C5烷基或C6至C15芳基。碱溶性树脂是酚醛清漆树脂。

22. 发明公开

KR1020110129692A 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴의 형성 방법 无效
标题翻译：光刻胶组合物和使用其形成光刻胶图案的方法
公开(公告)号：KR1020110129692A
公开(公告)日：2011-12-02
申请号：KR1020100049211
申请日：2010-05-26
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 전우석 , 박정민 , 김병욱 , 윤혁민 , 구기혁 , 최수연 , 김진선
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： G03F7/0007 , G02F1/13439 , G03F7/0236 , G03F7/0382 , G03F7/0223 , H01L21/0274
摘要： PURPOSE: A photo-resist composition and a method for forming a photo-resist pattern using the same are provided to prevent the generation of an under-cut phenomenon in the pattern and to improve the developing characteristic of the pattern according to thicknesses. CONSTITUTION: A photo-resist composition includes 10-45 parts by weight of an alkaline soluble binder resin, 0.1-5 parts by weight of a photo-acid generator, 1-5 parts by weight of a cross-linking agent, 0.3-3 parts by weight of a quinonediazide-based compound, and remaining parts by weight of a solvent. The alkaline soluble binder resin includes a hydroxyl group. The cross-linking agent forms the cross-linkage of the alkaline soluble binder resin. The photo-resist composition is applied on a target(10) to form a photo-resist film(20). The photo-resist film is exposed. The photo-resist film is partially eliminated to form a photo-resist pattern.
摘要翻译：目的：提供光致抗蚀剂组合物和使用其的光致抗蚀剂图案的形成方法，以防止图案中产生底切现象，并根据厚度改善图案的显影特性。构成：光致抗蚀剂组合物包含10-45重量份碱溶性粘合剂树脂，0.1-5重量份光酸发生剂，1-5重量份交联剂，0.3-3重量份重量份的基于醌二叠氮化物的化合物和剩余的重量份的溶剂。碱溶性粘合剂树脂包括羟基。交联剂形成碱溶性粘合剂树脂的交联。将光致抗蚀剂组合物施加到靶（10）上以形成光致抗蚀剂膜（20）。曝光光刻胶膜。部分地去除光致抗蚀剂膜以形成光致抗蚀剂图案。

23. 发明公开

KR1020110068924A 포지티브형 감방사선성 조성물, 층간 절연막 및 그 형성 방법 无效
标题翻译：正性辐射敏感性组合物，层间绝缘膜及其形成方法
公开(公告)号：KR1020110068924A
公开(公告)日：2011-06-22
申请号：KR1020100128175
申请日：2010-12-15
申请人： 제이에스알 가부시끼가이샤
发明人： 이치노헤다이고 , 하나무라마사아키
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0223 , G03F7/0392 , G03F7/075 , H01L21/0273 , H01L21/0274
摘要： PURPOSE: A polysiloxane system positive type radiation-sensitive composition, an inter-layer insulating film for a display device using thereof, and a producing method thereof are provided to secure the excellent heat resistance, transparency, and solvent resistance. CONSTITUTION: A polysiloxane system positive type radiation-sensitive composition contains a siloxane polymer, a quinonediazide compound, and a copolymer of a polymerizable unsaturated compound containing a compound marked with chemical formula 1, a compound marked with chemical formula 2, and a group marked with chemical formula 3.
摘要翻译：目的：提供聚硅氧烷系阳性辐射敏感性组合物，其用于显示装置的层间绝缘膜及其制造方法，以确保优异的耐热性，透明性和耐溶剂性。构成：聚硅氧烷系阳性辐射敏感性组合物含有硅氧烷聚合物，醌二叠氮化合物和含有化学式1所示化合物的可聚合不饱和化合物，标有化学式2的化合物和标有化学式3。

24. 发明公开

KR1020120110860A 감광성 화합물 및 이의 제조방법, 및 이를 포함하는 감광성 조성물 审中-实审
标题翻译：光敏化合物及其制造方法以及包含其的感光性组合物
公开(公告)号：KR1020120110860A
公开(公告)日：2012-10-10
申请号：KR1020110029021
申请日：2011-03-30
申请人： 금호석유화학 주식회사
发明人： 이종범 , 강석찬 , 손경철
IPC分类号： G03F7/022 , G03F7/004
CPC分类号： G03F7/0223 , G03F7/004 , G03F7/0045 , G03F7/0047 , G03F7/022
摘要： PURPOSE: A photo-sensitive compound, a method for preparing the same, and a photo-sensitive composition including the same are provided to improve the verticality of a pattern film and to improve the insulating characteristic of the pattern film. CONSTITUTION: A photo-sensitive compound is made of a naphthoquinone diazide sulfonic ester compound containing at least one naphthoquinone diazide sulfoxy group and at least one C1-8 carbamate group in one molecule. The sulfonic ester compound is represented by chemical formula 1. In chemical formula 1, R1, R2, and R3 are respectively hydrogen atoms, halogen atoms, C1-8 alkyl groups, C1-8 ether groups, C1-8 ester groups, C1-8 alkoxy groups, C1-8 carbamate groups, C1-8 thioether groups, or a naphthoquinone diazide sulfoxy group(-ODNQ); and R is at least one compound group selected from a group represented by chemical formula 1A and other chemical formulas.
摘要翻译：目的：提供光敏化合物，其制备方法和包含该光敏化合物的感光性组合物，以改善图案膜的垂直度并提高图案膜的绝缘特性。构成：光敏化合物由在一个分子中含有至少一个萘醌二叠氮基亚砜氧基和至少一个C 1-8氨基甲酸酯基团的萘醌二叠氮磺酸酯化合物制成。磺酸酯化合物由化学式1表示。在化学式1中，R1，R2和R3分别是氢原子，卤原子，C1-8烷基，C1-8醚基，C1-8酯基，C1- 8个烷氧基，C 1-8氨基甲酸酯基，C 1-8硫醚基或萘醌二叠氮磺酰氧基（-ODNQ）; R为选自化学式1A所示的基团和其它化学式中的至少一种化合物。

25. 发明公开

KR1020120098680A 퀴논디아지드계 감광제 용액 및 포지티브형 레지스트 조성물 无效
标题翻译：喹诺酮类光敏剂溶液和阳离子型抗蚀剂组合物
公开(公告)号：KR1020120098680A
公开(公告)日：2012-09-05
申请号：KR1020127011987
申请日：2010-07-07
申请人： 데쿠세리아루즈 가부시키가이샤
发明人： 카나야,히로키
IPC分类号： G03F7/004 , G03F7/022 , C07C303/42 , C07C309/76
CPC分类号： G03F7/0226 , G03F7/0048 , C07C303/42 , C07C309/76 , G03F7/0045 , G03F7/0223
摘要： 본 발명은 열변성 처리를 하지 않더라도 포지티브형 레지스트 조성물로부터 퀴논디아지드계 감광제의 석출을 억제 또는 방지할 수 있도록 함과 함께, 포지티브형 레지스트 조성물의 제조 시에 포지티브형 레지스트 조성물에의 퀴논디아지드계 감광제의 용해를 쉽게 하기 위해서, 퀴논디아지드계 감광제를 유기 용제에 용해시켜 이루어지는 퀴논디아지드계 감광제 용액은 퀴논디아지드계 감광제의 석출 방지제로서 티올 화합물을 함유한다. 또한, 포지티브형 레지스트 조성물은 알칼리 가용성 수지와, 가교제와, 퀴논디아지드계 감광제와, 퀴논디아지드계 감광제의 석출 방지제로서 티올 화합물을 함유한다.

26. 发明公开

KR1020120068462A 포지티브 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 无效
标题翻译：使用它的光电子体的正电子成像组合物和图案方法
公开(公告)号：KR1020120068462A
公开(公告)日：2012-06-27
申请号：KR1020100130096
申请日：2010-12-17
申请人： 동우 화인켐 주식회사
发明人： 이은상 , 임민주 , 신혜라 , 김성현
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0223 , G03F7/0226 , G03F7/0395 , G03F7/0397 , H01L21/0274
摘要： PURPOSE: A positive photo-resist composition and a method for forming photo-resist patterns using the same are provided to prevent the reduction of yield due to coating stains and pattern exfoliation. CONSTITUTION: A positive photo-resist composition includes 10 to 25 weight% of an alkali soluble resin, 1 to 10 weight% of a photo-sensitive compound, 1 to 10 weight% of a cyclic terpene compound, and remaining amount of solvents based on the total weight of the composition. The cyclic terpene compound is limonene or terpinene. The alkali soluble resin is a novolac resin. The photo-sensitive compound is a diazide-based compound. The solvents is one or more selected from a group including 3-methoxylbuthyl acetate, methyl methoxy propionate, butyl acetate, ethyl lactate, gamma butyrolactone, propylene glycol monomethyl ether acetate.
摘要翻译：目的：提供正型光致抗蚀剂组合物和使用其形成光刻胶图案的方法，以防止由于涂层污渍和图案剥离而导致的收率降低。构成：正型光致抗蚀剂组合物包含10-25重量％的碱溶性树脂，1至10重量％的光敏化合物，1至10重量％的环萜烯化合物，以及基于组合物的总重量。环萜烯化合物是柠檬烯或萜品烯。碱溶性树脂是酚醛清漆树脂。光敏化合物是二叠氮基化合物。溶剂是选自乙酸3-甲氧基丁酸乙酯，甲氧基丙酸甲酯，乙酸丁酯，乳酸乙酯，γ-丁内酯，丙二醇单甲醚乙酸酯的一种或多种。

27. 发明公开

KR1020120027685A 포토레지스트 조성물 및 이를 이용한 패턴 형성 방법 无效
标题翻译：光刻胶组合物及其制作方法
公开(公告)号：KR1020120027685A
公开(公告)日：2012-03-22
申请号：KR1020100089422
申请日：2010-09-13
申请人： 해성디에스 주식회사
发明人： 유동국 , 김기수 , 임현태
IPC分类号： G03F7/022 , G03F7/008 , H01L21/027
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0236 , G03F7/40 , G03F7/0223 , G03F7/0085 , G03F7/0125 , H01L21/0273
摘要： PURPOSE: A photoresist composition and a method for forming patterns using the same are provided to improve yield and to reduce failure rate by preventing organic materials from being remaining on a substrate. CONSTITUTION: A photoresist composition includes 60-90 weight% of novolac resin, diazide-based compound, an organic solvent, and a rust preventive agent(310). The novolac resin includes phenol-based compound. The novolac resin is obtained by reacting the phenol-based compound with aldehyde-based compound or ketone-based compound. The diazide-based compound includes one or more of photo-sensitive agents and phenol-based compound. The phenol-based compound is bonded with a photo-sensitive agent. The rust preventive agent includes one or more of heterocyclic compound with a carbonyl group, glycol-based compound with triple bond, alkyl sarcosine metal salt compound, aromatic carbonic acid anhydride compound, and thiazole and triazole-based compound.
摘要翻译：目的：提供光致抗蚀剂组合物和使用其形成图案的方法，以通过防止有机材料残留在基底上来提高产量并降低破坏率。构成：光致抗蚀剂组合物包含60-90重量％的酚醛清漆树脂，二叠氮基化合物，有机溶剂和防锈剂（310）。酚醛清漆树脂包括苯酚类化合物。酚醛清漆树脂通过使酚类化合物与醛类化合物或酮系化合物反应而得到。二叠氮基化合物包括一种或多种光敏剂和酚类化合物。苯酚类化合物与光敏剂结合。防锈剂包括一种或多种具有羰基的杂环化合物，具有三键的二醇类化合物，烷基肌氨酸金属盐化合物，芳族碳酸酐化合物，噻唑和三唑类化合物。

28. 发明公开

KR1020110027740A 포지티브형 감광성 수지 조성물, 패턴형 수지막의 제조 방법, 반도체 장치, 표시소자, 및 반도체 장치 및 표시소자의 제조 방법 有权
标题翻译：正性工作感光树脂组合物，用于生产图案形成的树脂膜的方法，半导体器件，显示器件及其制造方法和半导体器件及显示器件
公开(公告)号：KR1020110027740A
公开(公告)日：2011-03-16
申请号：KR1020110017060
申请日：2011-02-25
申请人： 스미토모 베이클라이트 가부시키가이샤
发明人： 반바도시오 , 이케다다쿠지 , 야노다쓰야 , 히라노다카시
IPC分类号： G03F7/022 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0757 , G03F7/0048 , G03F7/0226 , G03F7/0233 , G03F7/0223 , G03F7/0125 , G03F7/0392 , G03F7/0395 , G03F7/075 , H01L21/0274
摘要： PURPOSE: A positive type photosensitive resin composition, including a superior thickness uniformity, a method for manufacturing a pattern type resin film, a display device, a semiconductor device, and a method for manufacturing the semiconductor device and the display device are provided to implement a patterning process without residues. CONSTITUTION: A positive type photosensitive resin composition, represented by a chemical formula 1, includes an alkaline soluble resin, a diazoquinone compound, and two or more kinds of mixed solvents. The alkaline soluble resin includes one or more structures selected from a group including a polybenzoxazole structure, a polybenzoxazole precursor structure, a polyimide structure, a polyimide precursor structure, and a polyamide-acid-ester structure. The mixed solvents include γ-butyrolactone and propylene glycol monoalkyl ether. A solvent with 3.5 or more debyes of dipole moment is additionally included in the mixed solvents.
摘要翻译：目的：提供具有优异的厚度均匀性的正型感光性树脂组合物，图案型树脂膜的制造方法，显示装置，半导体装置以及半导体装置及显示装置的制造方法，以实现无残留的图案化工艺。构成：由化学式1表示的正型感光性树脂组合物包含碱溶性树脂，重氮醌化合物和两种以上混合溶剂。碱溶性树脂包括一种或多种选自包括聚苯并恶唑结构，聚苯并恶唑前体结构，聚酰亚胺结构，聚酰亚胺前体结构和聚酰胺酸酯结构的结构。混合溶剂包括γ-丁内酯和丙二醇单烷基醚。混合溶剂中还含有3.5倍以上偶极矩的溶剂。

29. 发明公开

KR1020150046932A 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자 有权
标题翻译：正性感光树脂组合物，使用其制备的感光树脂膜和显示装置
公开(公告)号：KR1020150046932A
公开(公告)日：2015-05-04
申请号：KR1020130126541
申请日：2013-10-23
申请人： 제일모직주식회사
发明人： 남궁란 , 권효영 , 전환승
IPC分类号： G03F7/039 , G03F7/022 , G03F7/11 , H01L21/027
CPC分类号： G03F7/023 , C08G69/26 , C08G73/22 , G03F7/0226 , G03F7/0233 , G03F7/039 , G03F7/0397 , G03F7/004 , G03F7/0223 , G03F7/11 , H01L21/0273 , H01L21/0274
摘要： (A) 말단에 400 nm 내지 550 nm 파장영역의빛에의해해리되는관능기를포함하는폴리벤조옥사졸전구체; (B) 감광성디아조퀴논화합물; 및 (C) 용매를포함하며, 상기폴리벤조옥사졸전구체는상기관능기가상기파장영역의빛에의해해리되어그 말단이산성화되는포지티브형감광성수지조성물, 이를이용한감광성수지막, 및표시소자가제공된다.
摘要翻译：提供正型感光性树脂组合物，使用其的感光性树脂膜和显示装置。正型感光性树脂组合物包含：在其末端具有400-550nm波长范围内的光分解的官能团的聚苯并恶唑前体（A）光敏重氮醌化合物（B）; 和溶剂（C）。在聚苯并恶唑前体中，官能团被波长区域的光解离，其末端被酸化。

30. 发明公开

KR1020150045811A 포지티브형 감광성 수지 조성물, 및 이를 이용한 감광성 수지막 및 표시 소자 无效
标题翻译：正性感光树脂组合物，以及使用其制备的感光树脂膜和显示装置
公开(公告)号：KR1020150045811A
公开(公告)日：2015-04-29
申请号：KR1020130125532
申请日：2013-10-21
申请人： 제일모직주식회사
发明人： 권지윤 , 강진희 , 김대윤 , 김상권 , 김상수 , 김용태 , 노건배 , 박은비 , 백재열 , 송재환 , 이범진 , 이종화 , 이진영 , 홍충범 , 황은하 , 황인철
IPC分类号： G03F7/039 , G03F7/022 , G03F7/11 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/004 , G03F7/0223 , G03F7/11 , H01L21/0273 , H01L21/0274
摘要： (A) 알칼리가용성수지; (B) 감광성디아조퀴논화합물; (C) 300 nm 내지 450 nm의파장영역에서자외선을흡수하여산을발생시키는광산발생제; 및 (D) 용매를포함하는포지티브형감광성수지조성물, 그리고이를이용한감광성수지막및 표시소자가제공된다.
摘要翻译：提供正型感光性树脂组合物，感光性树脂膜和使用其的显示装置。正型感光性树脂组合物包含（A）碱溶性树脂; （B）光敏重氮醌化合物; （C）在300-450nm的波长范围内吸收紫外线，然后产生酸的光酸发生剂; 和（D）溶剂。

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