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21. 发明授权

US4568771A Method for stabilizing aliphatic higher aldehyde compounds 失效
标题翻译：稳定脂肪族高级醛化合物的方法
公开(公告)号：US4568771A
公开(公告)日：1986-02-04
申请号：US570351
申请日：1984-01-13
申请人： Toshinobu Ishihara , Akira Yamamoto , Mitsuyoshi Ohshima , Nobolu Aiba
发明人： Toshinobu Ishihara , Akira Yamamoto , Mitsuyoshi Ohshima , Nobolu Aiba
IPC分类号： C07C45/86
CPC分类号： C07C45/86
摘要： Aliphatic higher aldehyde compounds, e.g. Z-11-hexadecenal and Z-9-tetradecenal, can be stabilized against oxidation to form a carboxylic acid and trimer formation by the addition of a stabilizer compound including a tertiary amine compound, benzophenone compound, salicylate compound, benzotriazole compound and cyanoacrylate compound together with or without further admixture of an antioxidant.
摘要翻译：脂肪族高级醛化合物，例如 Z-11-十六碳烯酸酯和Z-9-十四碳烯酸酯可以通过加入包括叔胺化合物，二苯甲酮化合物，水杨酸酯化合物，苯并三唑化合物和氰基丙烯酸酯化合物在内的稳定剂化合物来稳定，防止氧化形成羧酸和三聚体形成有或没有进一步混合抗氧化剂。

22. 发明授权

US4529825A Method for the preparation of a trans-isomer of ethylenically unsaturated organic compounds 失效
标题翻译：烯属不饱和有机化合物的反式异构体的制备方法
公开(公告)号：US4529825A
公开(公告)日：1985-07-16
申请号：US583881
申请日：1984-02-27
申请人： Akira Yamamoto , Toshinobu Ishihara
发明人： Akira Yamamoto , Toshinobu Ishihara
IPC分类号： B01J23/00 , C07B31/00 , C07B35/02 , C07C1/00 , C07C5/09 , C07C11/02 , C07C27/00 , C07C29/17 , C07C33/02 , C07C33/025 , C07C67/00
CPC分类号： C07C5/09 , C07C29/17 , C07C33/02 , C07B2200/09 , Y02P30/42
摘要： The trans-isomer of an ethylenically unsaturated organic compound of the formula R.sup.1 CH.dbd.CHR.sup.2, in which R.sup.1 and R.sup.2 are each a substituted or unsubstituted monovalent hydrocarbon group, is selectively prepared in a high yield by the reduction of the corresponding acetylenically unsaturated organic compound of the formula R.sup.1 C.tbd.CR.sup.2. The method comprises reducing the starting compound in a hydrocarbon solvent containing an alkali metal dispersed therein in the presence of a proton donor compound such as an alcohol or a carboxylic acid at a temerature of 50.degree. to 150.degree. C.
摘要翻译：式R1CH = CHR2的烯键式不饱和有机化合物的反式异构体，其中R 1和R 2各自为取代或未取代的一价烃基，通过还原相应的炔属不饱和有机化合物式R1C 3BOND CR2。该方法包括在50至150℃的温度下，在质子给体化合物如醇或羧酸存在下，将分散在其中的碱金属的烃溶剂中的起始化合物还原。

23. 发明授权

US4246178A Tetrahydropyran-5-one compounds 失效
标题翻译：四氢吡喃-5-酮化合物
公开(公告)号：US4246178A
公开(公告)日：1981-01-20
申请号：US952457
申请日：1978-10-18
申请人： Akira Yamamoto , Kenichi Taguchi , Akira Hayashida , Toshinobu Ishihara
发明人： Akira Yamamoto , Kenichi Taguchi , Akira Hayashida , Toshinobu Ishihara
IPC分类号： C07D309/28 , B23K31/02 , C07D309/30 , C07D309/06
CPC分类号： C07D309/30
摘要： A novel class of tetrahydropyran-5-one compounds are provided which are 2-alkoxy- or 2-acyloxy-3,4-dihalogeno-6-alkyl tetrahydropyran-5-ones expressed by the general formula ##STR1## where R.sup.1 is an alkyl group, R.sup.2 is an alkyl or an acyloxy group and X is a halogen atom. The compounds are synthesized by the reaction of a 2-furyl carbinol compound with a halogen in the presence of an alcohol or a carboxylic acid. The compounds are useful as an intermediate for the synthetic preparation of various useful compounds including maltol as a flavor.
摘要翻译：提供了一类新的四氢吡喃-5-酮化合物，它们是由通式“IMAGE”表示的2-烷氧基 - 或2-酰氧基-3,4-二卤代-6-烷基四氢吡喃-5-酮，其中R 1是烷基基团，R2是烷基或酰氧基，X是卤素原子。该化合物通过2-甲酰基甲醇化合物与卤素在醇或羧酸存在下的反应而合成。该化合物可用作合成制备各种有用化合物的中间体，包括麦芽酚作为风味剂。

24. 发明授权

US09034661B2 Method for producing molecule immobilizing substrate, and molecule immobilizing substrate 有权
标题翻译：制备分子固定底物的方法和分子固定底物
公开(公告)号：US09034661B2
公开(公告)日：2015-05-19
申请号：US12709020
申请日：2010-02-19
申请人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G01N33/544 , G01N33/543 , G01N33/53 , C08L83/04 , C08L83/06
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译：公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面电影。可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

25. 发明授权

US08129100B2 Double patterning process 有权
标题翻译：双重图案化工艺
公开(公告)号：US08129100B2
公开(公告)日：2012-03-06
申请号：US12418090
申请日：2009-04-03
申请人： Katsuya Takemura , Jun Hatakeyama , Kazumi Noda , Mutsuo Nakashima , Masaki Ohashi , Toshinobu Ishihara
发明人： Katsuya Takemura , Jun Hatakeyama , Kazumi Noda , Mutsuo Nakashima , Masaki Ohashi , Toshinobu Ishihara
IPC分类号： G03F7/11 , G03F7/20 , G03F7/40 , G03F7/039
CPC分类号： G03F7/0035 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/40
摘要： Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a positive resist pattern, treating the positive resist pattern to be alkali soluble and solvent resistant, coating a negative resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a negative resist pattern. The last development step includes the reversal transfer step of dissolving away the positive resist pattern which has been converted to be soluble in developer.
摘要翻译：通过涂覆化学放大的正性抗蚀剂组合物形成双重图案，所述正性抗蚀剂组合物包含含酸不稳定基团的树脂和光致酸发生剂和预烘烤以在可加工的基材上形成抗蚀剂膜，将抗蚀剂膜暴露于高能量辐射，PEB和显影用碱性显影剂形成正的抗蚀剂图案，将正性抗蚀剂图案处理为碱溶性和耐溶剂性，涂覆负性抗蚀剂组合物和预烘烤以形成反转膜，并将反转膜暴露于高能辐射PEB，并用碱性显影剂显影以形成负的抗蚀剂图案。最后的显影步骤包括将已被转化为可溶于显影剂的正性抗蚀图案溶解的反转移步骤。

26. 发明申请

US20110123935A1 METHOD FOR PRODUCING HOLLOW STRUCTURE 有权
标题翻译：生产中空结构的方法
公开(公告)号：US20110123935A1
公开(公告)日：2011-05-26
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/20 , B32B38/10
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。也就是说，制造中空结构体的方法，在基材的中空结构体的制造方法中堆叠结构材料的制造方法，该方法包括在基板上形成结构材料层的工序，在结构材料层上形成图案，通过用水溶性或碱溶性聚合物之间掩埋图案形成牺牲材料层作为待掩埋在图案之间的牺牲材料的步骤，进一步层压结构材料层并在层压的结构材料层上形成图案，并且完成所有层压之后最后去除牺牲材料的步骤。

27. 发明授权

US07622228B2 Halftone phase shift mask blank, and method of manufacture 有权
标题翻译：半色调相移掩模空白及其制造方法
公开(公告)号：US07622228B2
公开(公告)日：2009-11-24
申请号：US11613780
申请日：2006-12-20
申请人： Satoshi Okazaki , Toshinobu Ishihara
发明人： Satoshi Okazaki , Toshinobu Ishihara
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译：半色调相移掩模板在透明基板上具有移相膜。移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性耐化学品，特别是碱性化学品。

28. 发明授权

US07598004B2 Film-depositing target and preparation of phase shift mask blank 有权
标题翻译：成膜沉积目标和相移掩模空白的准备
公开(公告)号：US07598004B2
公开(公告)日：2009-10-06
申请号：US11093297
申请日：2005-03-30
申请人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
IPC分类号： G03F1/00 , C25B11/00
CPC分类号： G03F1/32 , C23C14/06 , C23C14/3414 , C23C14/3464
摘要： For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
摘要翻译：为了制造包括透明基板和具有受控相位和透射率的一层或多层的半透明膜的半色调相移掩模坯料，同时至少一层包括Si，Mo和Zr的半透明膜，包含Zr和Mo的摩尔比在0.05和5之间的至少Zr和Mo是有用的。

29. 外观设计

USD550731S1 Preheater for melting solder 有权
标题翻译：熔化焊料预热器
公开(公告)号：USD550731S1
公开(公告)日：2007-09-11
申请号：US29272075
申请日：2007-01-31
申请人： Toshinobu Ishihara , Tomomi Sugiyama
设计人： Toshinobu Ishihara , Tomomi Sugiyama

30. 发明授权

US06919161B2 Silicon-containing polymer, resist composition and patterning process 失效
标题翻译：含硅聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06919161B2
公开(公告)日：2005-07-19
申请号：US10611261
申请日：2003-07-02
申请人： Jun Hatakeyama , Takanobu Takeda , Toshinobu Ishihara
发明人： Jun Hatakeyama , Takanobu Takeda , Toshinobu Ishihara
IPC分类号： C08F230/08 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C08F230/08 , G03F7/0045 , G03F7/0392 , G03F7/0758
摘要： Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R1 is a single bond or alkylene, R2 is hydrogen or alkyl, R3, R4 and R5 are alkyl, haloalkyl, aryl or silicon-containing group, R6 is hydrogen, methyl, cyano or —C(═O)OR8 wherein R8 is hydrogen, alkyl or acid labile group, R7 is alkyl, —NR9R10 or —OR11 wherein R9, R10 and R11 are hydrogen or alkyl, a and b are positive numbers satisfying 0
摘要翻译：包含式（1）的重复单元的含硅聚合物是新的，其中R 1是单键或亚烷基，R 2是氢或烷基，R 3 R 4，R 4和R 5是烷基，卤代烷基，芳基或含硅基团，R 6是氢，甲基，氰基或-C（-O）OR 8，其中R 8为氢，烷基或酸不稳定基团，R 7为烷基，-NR 其中R 9，R 10和R 10和R 11和R 11独立地选自氢， α是氢或烷基，a和b是满足0

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