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1. 发明授权

US09034661B2 Method for producing molecule immobilizing substrate, and molecule immobilizing substrate 有权
标题翻译：制备分子固定底物的方法和分子固定底物
公开(公告)号：US09034661B2
公开(公告)日：2015-05-19
申请号：US12709020
申请日：2010-02-19
申请人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G01N33/544 , G01N33/543 , G01N33/53 , C08L83/04 , C08L83/06
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译：公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面电影。可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

2. 发明申请

US20110123935A1 METHOD FOR PRODUCING HOLLOW STRUCTURE 有权
标题翻译：生产中空结构的方法
公开(公告)号：US20110123935A1
公开(公告)日：2011-05-26
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/20 , B32B38/10
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。也就是说，制造中空结构体的方法，在基材的中空结构体的制造方法中堆叠结构材料的制造方法，该方法包括在基板上形成结构材料层的工序，在结构材料层上形成图案，通过用水溶性或碱溶性聚合物之间掩埋图案形成牺牲材料层作为待掩埋在图案之间的牺牲材料的步骤，进一步层压结构材料层并在层压的结构材料层上形成图案，并且完成所有层压之后最后去除牺牲材料的步骤。

3. 发明授权

US08367311B2 Method for producing hollow structure 有权
标题翻译：中空结构的制造方法
公开(公告)号：US08367311B2
公开(公告)日：2013-02-05
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。即，一种中空结构的制造方法，在基板的中空结构的制造方法中堆叠结构材料的制造方法，其特征在于，包括：在基材上形成结构材料层的步骤，在结构材料层上形成图案的步骤，通过用水溶性或碱溶性聚合物将图案之间埋入形成牺牲材料层的步骤牺牲材料被埋在图案之间，进一步层压结构材料层并在层压的结构材料层上形成图案的步骤，以及完成所有层压之后最终去除牺牲材料的步骤。

4. 发明授权

US09410951B2 Method for producing substrate for making microarray 有权
标题翻译：制备微阵列的基质的制备方法
公开(公告)号：US09410951B2
公开(公告)日：2016-08-09
申请号：US12458637
申请日：2009-07-17
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G01N33/543 , C40B40/04 , C40B50/18
CPC分类号： G01N33/54353 , B01J2219/00527 , B01J2219/00596 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , C40B40/04 , C40B50/18
摘要： There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
摘要翻译：公开了一种制造微阵列的基板的制造方法，该方法至少包括：向基板的最外表面形成具有取向的氧联苯乙烯基的单分子膜的工序; 以及通过将含有二胺化合物的溶液施加到氧联苯乙酰基上而形成具有取向氨基的单分子膜朝向基板上的最外表面的步骤。可以提供一种制造用于制造微阵列的基板的方法，其中朝向最外表面取向的氨基的密度和取向是可控的，此外，在基板上形成的单分子膜不会发生分层。

5. 发明授权

US08148053B2 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US08148053B2
公开(公告)日：2012-04-03
申请号：US12073953
申请日：2008-03-12
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： G01N33/54353 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00659 , B01J2219/00722
摘要： To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X (1), wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
摘要翻译：提供一种用于制造微阵列的基板的方法，该方法将以低成本确保以选址方式安全地固定材料。该方法包括以下步骤：使用由以下通式（1）表示的硅烷化合物Y3Si-（CH2）m-X（1）在基材表面上形成单分子膜，其中m表示3的整数到20 X表示当暴露于酸时将转化为羟基的羟基前体官能团; Y独立地表示具有1-4个碳原子的卤原子或烷氧基; 并将由X表示的羟基前体官能团转化为羟基; 其中将由X表示的羟基前体官能团转化为羟基的步骤包括在单分子膜上形成含有由以下通式（2）或（3）表示的化合物的聚合物层，

6. 发明授权

US08053179B2 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US08053179B2
公开(公告)日：2011-11-08
申请号：US12071889
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： G03F7/0397
摘要： A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided.A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
摘要翻译：提供了制造用于制造微阵列的基板的方法，其中用于固定靶分子的单分子膜可以简单地在用于制备微阵列的基板的制造中位置选择性地形成。一种制造微阵列的基板的制造方法，其特征在于，使用使用了具有羟基的单体单元的含量为5摩尔％以下的共聚物的化学放大型正性抗蚀剂组合物在基板上形成抗蚀剂膜的工序相对于作为粘合剂的总单体单元; 图案化抗蚀剂膜的步骤; 在具有图案化抗蚀剂膜的基板上形成具有氧化硅链的单分子膜的步骤; 随后除去抗蚀剂膜的步骤。

7. 发明申请

US20100055337A1 Method for producing substrate for making microarray 有权
标题翻译：制备微阵列的基质的制备方法
公开(公告)号：US20100055337A1
公开(公告)日：2010-03-04
申请号：US12458637
申请日：2009-07-17
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： B05D1/36
CPC分类号： G01N33/54353 , B01J2219/00527 , B01J2219/00596 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , C40B40/04 , C40B50/18
摘要： There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
摘要翻译：公开了一种制造微阵列的基板的制造方法，该方法至少包括：向基板的最外表面形成具有取向的氧联苯乙烯基的单分子膜的工序; 以及通过将含有二胺化合物的溶液施加到氧联苯乙酰基上而形成具有取向氨基的单分子膜朝向基板上的最外表面的步骤。可以提供一种制造用于制造微阵列的基板的方法，其中朝向最外表面取向的氨基的密度和取向是可控的，此外，在基板上形成的单分子膜不会发生分层。

8. 发明申请

US20080233521A1 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233521A1
公开(公告)日：2008-09-25
申请号：US12071889
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/38
CPC分类号： G03F7/0397
摘要： A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided.A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
摘要翻译：提供了制造用于制造微阵列的基板的方法，其中用于固定靶分子的单分子膜可以简单地在用于制备微阵列的基板的制造中位置选择性地形成。一种制造微阵列的基板的制造方法，其特征在于，使用使用了具有羟基的单体单元的含量为5摩尔％以下的共聚物的化学放大型正性抗蚀剂组合物在基板上形成抗蚀剂膜的工序相对于作为粘合剂的总单体单元; 图案化抗蚀剂膜的步骤; 在具有图案化抗蚀剂膜的基板上形成具有氧化硅链的单分子膜的步骤; 随后除去抗蚀剂膜的步骤。

9. 发明申请

US20080233409A1 Method for manufacturing substrate for making microarray 审中-公开
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233409A1
公开(公告)日：2008-09-25
申请号：US12071885
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： B32B9/04
CPC分类号： B01J19/0046 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00722 , Y10T428/31663
摘要： A method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain is provided.A method for manufacturing a substrate for making a microarray comprising; at least a step of forming a monomolecular film on the substrate using a silane compound, wherein the monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step.
摘要翻译：提供一种制造微阵列的基板的方法，其中当使用具有氧化硅链的单分子膜将靶分子固定在基板上时，单分子膜不分离。一种制造微阵列用基板的方法，包括：至少使用硅烷化合物在基板上形成单分子膜的步骤，其中在该步骤中使用包含硅烷化合物和含氮有机碱的溶液形成单分子膜。

10. 发明申请

US20080233309A1 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233309A1
公开(公告)日：2008-09-25
申请号：US12073953
申请日：2008-03-12
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： C23C14/28
CPC分类号： G01N33/54353 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00659 , B01J2219/00722
摘要： To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X (1) ,wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
摘要翻译：提供一种用于制造微阵列的基板的方法，该方法将以低成本确保以选址方式安全地固定材料。该方法包括以下步骤：使用由以下通式（1）表示的硅烷化合物在基材表面上形成单分子膜：<？在线式描述=“在线式”末端=“铅 “→> Y 3 -S-（CH 2）m -X（1）<βin-line-formula description =”In- 线式“end =”tail“？>，其中m表示3至20的整数; X表示当暴露于酸时将转化为羟基的羟基前体官能团; Y独立地表示具有1-4个碳原子的卤原子或烷氧基; 并将由X表示的羟基前体官能团转化为羟基; 其中将由X表示的羟基前体官能团转化为羟基的步骤包括在单分子膜上形成含有由以下通式（2）或（3）表示的化合物的聚合物层，

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