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21. 发明申请

US20090196587A1 Fragrance Emitting Apparatus For Use With USB Port 有权
标题翻译：香水发射装置用于USB端口
公开(公告)号：US20090196587A1
公开(公告)日：2009-08-06
申请号：US12358216
申请日：2009-01-22
申请人： David Cheung
发明人： David Cheung
IPC分类号： A61L9/03
CPC分类号： A61L9/03 , A61L9/037 , A61L9/14
摘要： A fragrance emitting apparatus for connection to a USB port. In one embodiment, the fragrance emitting apparatus comprises a casing having an interior and at least one vent in communication with the interior, a cover removably attached to the casing to provide access to the interior, and a fragrance bottle removably disposed within the interior of the casing and having therein a liquid that provides a desired fragrance. The fragrance bottle further comprises a fragrance member having a first portion within fragrance bottle and a second portion extending from the fragrance bottle. The fragrance member is configured to absorb liquid in the fragrance bottle. The apparatus further comprises a micro-pump device positioned within the interior of the casing and adjacent to the second portion of the fragrance member. The micro-pump device has an oscillating member that contacts the second portion of the fragrance member. The apparatus further includes a control circuit to control the micro-pump device the control circuit generating an electrical wave signal having a predetermined frequency that causes the oscillating member to vibrate so as to diffuse fragrance liquid that contacts the oscillating member. A USB connector is connected to the casing and electrically connected to the control circuit. The diffusion of the fragrance liquid produces a fragrance that exits the casing through the vent. Other embodiments of the apparatus of the present invention are disclosed herein.
摘要翻译：一种用于连接到USB端口的香味发射装置。在一个实施例中，香味发射装置包括具有内部和与内部连通的至少一个通气口的外壳，可移除地附接到壳体以提供对内部通路的盖子，以及可拆卸地设置在内部的内部的香味瓶并且在其中具有提供期望香味的液体。香味瓶还包括香料构件，其具有在香料瓶内的第一部分和从香料瓶延伸的第二部分。香味构件被配置成吸收香料瓶中的液体。该装置还包括定位在壳体内部并且邻近香料构件的第二部分的微型泵装置。微型泵装置具有与香料构件的第二部分接触的摆动构件。该装置还包括控制电路，用于控制微泵装置，该控制电路产生具有预定频率的电波信号，该预定频率使振荡部件振动，从而扩散与振荡部件接触的香味液体。 USB连接器连接到壳体并电连接到控制电路。香味液体的扩散产生通过排气口离开套管的香料。本文公开了本发明的装置的其它实施例。

22. 发明申请

US20080215088A1 Systems, Methods, and compositions for achieving closure of suture sites 失效
标题翻译：用于实现缝合部位闭合的系统，方法和组合物
公开(公告)号：US20080215088A1
公开(公告)日：2008-09-04
申请号：US12079049
申请日：2008-03-24
申请人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
发明人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
IPC分类号： A61B17/08
CPC分类号： A61B17/0057 , A61B17/00491 , A61B2017/00004 , A61B2017/00495 , A61B2017/00637 , A61B2017/0065 , A61B2017/00654 , A61B2017/00663
摘要： Systems and methods employ functional instruments to close incisions and wounds using a suture knot in combination with a biocompatible material composition. The systems and methods are well suited for use, for example, at a vascular puncture site following a vascular access procedure.
摘要翻译：系统和方法使用功能性仪器来使用缝线结与生物相容性材料组合物闭合切口和伤口。该系统和方法非常适用于例如血管通路手术后的血管穿刺部位。

23. 发明授权

US07351249B2 Systems, methods, and compositions for achieving closure of suture sites 有权
标题翻译：用于实现缝合部位闭合的系统，方法和组合物
公开(公告)号：US07351249B2
公开(公告)日：2008-04-01
申请号：US10212472
申请日：2002-08-05
申请人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
发明人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
IPC分类号： A61B17/08
CPC分类号： A61B17/0057 , A61B17/00491 , A61B2017/00004 , A61B2017/00495 , A61B2017/00637 , A61B2017/0065 , A61B2017/00654 , A61B2017/00663
摘要： Systems and methods employ functional instruments to close incisions and wounds using a suture knot in combination with a biocompatible material composition. The systems and methods are well suited for use, for example, at a vascular puncture site following a vascular access procedure.
摘要翻译：系统和方法使用功能性仪器来使用缝线结与生物相容性材料组合物闭合切口和伤口。该系统和方法非常适用于例如血管通路手术后的血管穿刺部位。

24. 发明申请

US20080032625A1 DEVIATING FROM A TRANSMISSION MAP TO COMMUNICATE IN A WIRELESS NETWORK 失效
标题翻译：从无线网络传输映射转发到通信
公开(公告)号：US20080032625A1
公开(公告)日：2008-02-07
申请号：US11458476
申请日：2006-07-19
申请人： David Cheung , Sathish K. Kumar
发明人： David Cheung , Sathish K. Kumar
IPC分类号： H04B7/24
CPC分类号： H04W72/1257 , H04W88/04
摘要： Direct communication between devices in a wireless network without going through a base station is described herein. Such communication may be possible by deviating from a transmission map to be broadcasted by the base station of the wireless network.
摘要翻译：这里描述了无需通过基站的无线网络中的设备之间的直接通信。可以通过偏离由无线网络的基站广播的传输图来实现这种通信。

25. 发明申请

US20060251629A1 Muscle-based grafts/implants 审中-公开
公开(公告)号：US20060251629A1
公开(公告)日：2006-11-09
申请号：US11480711
申请日：2006-07-03
申请人： C. Mills , John Bianchi , Michael Roberts , David Cheung , Chandrasekaran Nataraj , John Howell
发明人： C. Mills , John Bianchi , Michael Roberts , David Cheung , Chandrasekaran Nataraj , John Howell
IPC分类号： A61K38/17 , A61K35/12 , A61F2/06
CPC分类号： A61L27/3608 , A61F2/08 , A61F2/105 , A61F2002/0894 , A61L27/3604 , A61L27/3687 , A61L27/3691 , A61L27/38 , A61L27/3826 , A61L27/46 , A61L27/54 , A61L27/56 , A61L2300/414 , A61L2400/06 , A61L2430/02 , A61L2430/10 , A61L2430/30 , B33Y80/00
摘要： The present invention is directed to a composition comprising a matrix suitable for implantation in humans, comprising defatted, shredded, allogeneic human muscle tissue that has been combined with an aqueous carrier and dried in a predetermined shape. Also disclosed is a tissue graft or implant comprising a matrix suitable for implantation in humans, comprising defatted, shredded, allogeneic human muscle tissue that has been combined with an aqueous carrier and dried in a predetermined shape. The composition and/or tissue graft or implant of the invention is usable in combination with seeded cells, a tissue growth factor, and/or a chemotactic agent to attract a desired cell.

26. 发明申请

US20060127876A1 Method to treat collagenous connective tissue for implant remodeled by host cells into living tissue 有权
标题翻译：治疗由宿主细胞重建为生物体组织的植入物的胶原结缔组织的方法
公开(公告)号：US20060127876A1
公开(公告)日：2006-06-15
申请号：US11345768
申请日：2006-01-19
申请人： David Cheung
发明人： David Cheung
IPC分类号： C12N5/06 , A01N1/02
CPC分类号： A01N1/02 , A01N1/0226 , A61K38/39 , A61L27/3604 , A61L27/3687
摘要： The invention relates to a method of treatment of collagenous connective tissue removed from a donor for implant into a recipient which is re-habited or re-colonized by host cells without an immune rejection and inflammatory reaction. After removal from the donor the tissue is trimmed and thereafter soaked in a cold stabilizing solution having a temperature range of 4 to 10 degrees centigrade. The tissue is then soaked at a predetermined temperature in a polyglycol, salt, hydrogen peroxide, and phosphate buffer first solution of predetermined quantities and concentrations and of sufficient ionic strength to permit ground substances to dissociate such that the collagen fibers remain stable. The tissue is then soaked in an alcohol and water solution at a predetermined temperature for a sufficient period of time to remove the residue of the first solution. Following the removal of the residue, the tissue is soaked at a predetermined temperature in a third solution of an anti-inflammatory agent, an anti-thrombic agent, alcohol, and water or sequentially in an anti-inflammatory agent, alcohol, and water solution, and then in an anti-thrombic agent, alcohol and water solution and thereafter stored.
摘要翻译：本发明涉及一种治疗从供体移出的胶原结缔组织的方法，用于植入到受体中，其被宿主细胞重新吸收或重新定植而没有免疫排斥和炎症反应。从供体移除后，将组织修整，然后在温度范围为4至10摄氏度的冷稳定溶液中浸泡。然后将组织在预定温度下浸入预定量和浓度的聚二醇，盐，过氧化氢和磷酸盐缓冲液第一溶液中并具有足够的离子强度，以使研磨物质解离，使得胶原纤维保持稳定。然后将组织在预定温度下在醇和水溶液中浸泡足够的时间以除去第一溶液的残余物。除去残留物后，将组织在预定温度下在抗炎剂，抗血栓剂，酒精和水的第三溶液中浸泡，或依次在抗炎剂，酒精和水溶液中浸泡，然后在抗血栓剂，酒精和水溶液中储存。

27. 发明申请

US20050191846A1 Plasma processes for depositing low dielectric constant films 有权
公开(公告)号：US20050191846A1
公开(公告)日：2005-09-01
申请号：US11087393
申请日：2005-03-22
申请人： David Cheung , Wai-Fan Yau , Robert Mandal , Shin-Puu Jeng , Kuo-Wei Liu , Yung-Cheng Lu , Michael Barnes , Ralf Willecke , Farhad Moghadam , Tetsuya Ishikawa , Tze Poon
发明人： David Cheung , Wai-Fan Yau , Robert Mandal , Shin-Puu Jeng , Kuo-Wei Liu , Yung-Cheng Lu , Michael Barnes , Ralf Willecke , Farhad Moghadam , Tetsuya Ishikawa , Tze Poon
IPC分类号： C23C16/40 , H01L21/316 , H01L21/768 , H01L21/4763 , H01L21/31 , H01L21/469
CPC分类号： H01L21/76835 , C23C16/401 , H01L21/02126 , H01L21/02203 , H01L21/02208 , H01L21/02274 , H01L21/0228 , H01L21/02304 , H01L21/02362 , H01L21/31612 , H01L21/76801 , H01L21/76808 , H01L21/7681 , H01L21/76829 , H01L21/76832 , H01L21/76834 , H01L2221/1031 , Y10T428/24926 , Y10T428/31663
摘要： A method and apparatus for depositing a low dielectric constant film by reaction of an organosilicon compound and an oxidizing gas comprising carbon at a constant RF power level. Dissociation of the oxidizing gas can be increased prior to mixing with the organosilicon compound, preferably within a separate microwave chamber, to assist in controlling the carbon content of the deposited film. The oxidized organosilane or organosiloxane film has good barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organosilane or organosiloxane film may also be used as an etch stop and an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organosilane or organosiloxane films also provide excellent adhesion between different dielectric layers.

28. 发明授权

US06632735B2 Method of depositing low dielectric constant carbon doped silicon oxide 失效
标题翻译：沉积低介电常数碳掺杂氧化硅的方法
公开(公告)号：US06632735B2
公开(公告)日：2003-10-14
申请号：US09924240
申请日：2001-08-07
申请人： Wai-Fan Yau , Ju-Hyung Lee , Nasreen Gazala Chopra , Tzu-Fang Huang , David Cheung , Farhad Moghadam , Kuo-Wei Liu , Yung-Cheng Lu , Ralf B. Willecke , Paul Matthews , Dian Sugiarto
发明人： Wai-Fan Yau , Ju-Hyung Lee , Nasreen Gazala Chopra , Tzu-Fang Huang , David Cheung , Farhad Moghadam , Kuo-Wei Liu , Yung-Cheng Lu , Ralf B. Willecke , Paul Matthews , Dian Sugiarto
IPC分类号： H01L2131
CPC分类号： H01L21/02126 , C23C16/401 , H01L21/02274 , H01L21/02337 , H01L21/31633
摘要： A method of forming a carbon-doped silicon oxide layer is disclosed. The carbon-doped silicon oxide layer is formed by applying an electric field to a gas mixture comprising an organosilane compound and an oxidizing gas. The carbon-doped silicon oxide layer is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the carbon-doped silicon oxide layer is used as an intermetal dielectric layer. In another integrated circuit fabrication process, the carbon-doped silicon oxide layer is incorporated into a damascene structure.
摘要翻译：公开了形成碳掺杂氧化硅层的方法。碳掺杂氧化硅层通过向包含有机硅烷化合物和氧化气体的气体混合物施加电场而形成。碳掺杂氧化硅层与集成电路制造工艺兼容。在一个集成电路制造工艺中，碳掺杂氧化硅层用作金属间介电层。在另一个集成电路制造工艺中，掺杂碳的氧化硅层被结合到镶嵌结构中

29. 发明授权

US06537929B1 CVD plasma assisted low dielectric constant films 失效
公开(公告)号：US06537929B1
公开(公告)日：2003-03-25
申请号：US09580505
申请日：2000-05-25
申请人： David Cheung , Wai-Fan Yau , Robert R. Mandal
发明人： David Cheung , Wai-Fan Yau , Robert R. Mandal
IPC分类号： H01L2131
CPC分类号： H01L21/76832 , C23C16/401 , H01L21/02126 , H01L21/02208 , H01L21/02274 , H01L21/0228 , H01L21/02304 , H01L21/02362 , H01L21/31612 , H01L21/76801 , H01L21/76808 , H01L21/7681 , H01L21/76829 , H01L21/76834 , H01L21/76835 , H01L2221/1031
摘要： A method and apparatus for depositing a low dielectric constant film by reaction of an organosilane or organosiloxane compound and an oxidizing gas at a low RF power level from 10-250 W. The oxidized organosilane or organosiloxane film has good barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organosilane or organosiloxane film may also be used as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organosilane or organosiloxane films also provide excellent adhesion between different dielectric layers. A preferred oxidized organosilane film is produced by reaction of methylsilane, CH3SiH3, or dimethylsilane, (CH3)2SiH2, and nitrous oxide, N2O, at an RF power level from about 10 to 200 W or a pulsed RF power level from about 20 to 250 W during 10-30% of the duty cycle.

30. 发明授权

US06187072B1 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions 失效
标题翻译：从底物处理设备排放物减少全氟化合物气体的方法和装置
公开(公告)号：US06187072B1
公开(公告)日：2001-02-13
申请号：US08741272
申请日：1996-10-30
申请人： David Cheung , Sebastien Raoux , Judy H. Huang , William N. Taylor, Jr. , Mark Fodor , Kevin Fairbairn
发明人： David Cheung , Sebastien Raoux , Judy H. Huang , William N. Taylor, Jr. , Mark Fodor , Kevin Fairbairn
IPC分类号： B01D4624
CPC分类号： H01J37/32844 , B01D45/06 , B01D53/32 , B01D53/46 , B01D2257/206 , B01D2259/818 , B01J19/08 , B01J19/088 , B01J19/126 , B01J19/249 , B01J2219/2453 , B01J2219/2458 , B01J2219/2461 , B01J2219/2467 , B01J2219/247 , B01J2219/2474 , B01J2219/2475 , B01J2219/2487 , B01J2219/2493 , B01J2219/2496 , C23C16/4405 , C23C16/4412 , H01J37/3244 , H01J2237/022 , H05H1/46 , H05H2001/4622 , H05H2001/4667 , H05H2245/1215 , Y02C20/30 , Y02P70/605
摘要： An apparatus for converting PFC gases exhausted from semiconductor processing equipment to less harmful, non-PFC gases. One embodiment of the apparatus includes a silicon filter and a plasma generation system. The plasma generation system forms a plasma from the effluent PFC gases. Constituents from the plasma react with silicon and/or oxygen in the filter and convert the effluent PFC gases to less harmful, non-PFC gaseous products and byproducts. Another embodiment includes a plasma generation system and a particle trapping and collection system. The particle trapping and collection system traps silicon containing residue from deposition processes that produces such residue, and the plasma generation system forms a plasma from the effluent PFC gases. Constituents from the plasma react with the collected residue to convert the effluent PFC gases to less harmful, non-PFC gaseous products and byproducts.
摘要翻译：用于将从半导体处理设备排出的PFC气体转化为较少有害的非PFC气体的设备。该装置的一个实施例包括硅滤波器和等离子体产生系统。等离子体发生系统从流出的PFC气体形成等离子体。来自等离子体的成分与过滤器中的硅和/或氧反应，并将流出的PFC气体转化为不太有害的非PFC气体产物和副产物。另一实施例包括等离子体产生系统和颗粒捕集和收集系统。颗粒捕集和收集系统从产生这种残余物的沉积过程中捕集含硅残渣，等离子体产生系统从流出的PFC气体形成等离子体。来自等离子体的成分与收集的残余物反应，将流出的PFC气体转化为不太有害的非PFC气体产物和副产物。

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