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1. 发明授权

US08409249B2 Systems, methods, and compositions for achieving closure of suture sites 失效
公开(公告)号：US08409249B2
公开(公告)日：2013-04-02
申请号：US12079049
申请日：2008-03-24
申请人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
发明人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
IPC分类号： A61B17/08
CPC分类号： A61B17/0057 , A61B17/00491 , A61B2017/00004 , A61B2017/00495 , A61B2017/00637 , A61B2017/0065 , A61B2017/00654 , A61B2017/00663
摘要： Systems and methods employ functional instruments to close incisions and wounds using a suture knot in combination with a biocompatible material composition. The systems and methods are well suited for use, for example, at a vascular puncture site following a vascular access procedure.

2. 发明申请

US20080215088A1 Systems, Methods, and compositions for achieving closure of suture sites 失效
标题翻译：用于实现缝合部位闭合的系统，方法和组合物
公开(公告)号：US20080215088A1
公开(公告)日：2008-09-04
申请号：US12079049
申请日：2008-03-24
申请人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
发明人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
IPC分类号： A61B17/08
CPC分类号： A61B17/0057 , A61B17/00491 , A61B2017/00004 , A61B2017/00495 , A61B2017/00637 , A61B2017/0065 , A61B2017/00654 , A61B2017/00663
摘要： Systems and methods employ functional instruments to close incisions and wounds using a suture knot in combination with a biocompatible material composition. The systems and methods are well suited for use, for example, at a vascular puncture site following a vascular access procedure.
摘要翻译：系统和方法使用功能性仪器来使用缝线结与生物相容性材料组合物闭合切口和伤口。该系统和方法非常适用于例如血管通路手术后的血管穿刺部位。

3. 发明授权

US07351249B2 Systems, methods, and compositions for achieving closure of suture sites 有权
标题翻译：用于实现缝合部位闭合的系统，方法和组合物
公开(公告)号：US07351249B2
公开(公告)日：2008-04-01
申请号：US10212472
申请日：2002-08-05
申请人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
发明人： Olexander Hnojewyj , Bruce Addis , Daniel Browne , David Cheung
IPC分类号： A61B17/08
CPC分类号： A61B17/0057 , A61B17/00491 , A61B2017/00004 , A61B2017/00495 , A61B2017/00637 , A61B2017/0065 , A61B2017/00654 , A61B2017/00663
摘要： Systems and methods employ functional instruments to close incisions and wounds using a suture knot in combination with a biocompatible material composition. The systems and methods are well suited for use, for example, at a vascular puncture site following a vascular access procedure.
摘要翻译：系统和方法使用功能性仪器来使用缝线结与生物相容性材料组合物闭合切口和伤口。该系统和方法非常适用于例如血管通路手术后的血管穿刺部位。

4. 发明申请

US20110223232A1 DRUG-RELEASE COMPOSITION HAVING A THERAPEUTIC CARRIER 审中-公开
标题翻译：具有治疗载体的药物释放组合物
公开(公告)号：US20110223232A1
公开(公告)日：2011-09-15
申请号：US12446498
申请日：2007-10-23
申请人： Olexander Hnojewyj , Patrick Rivelli, JR. , Tony B. Shaffer , David Cheung
发明人： Olexander Hnojewyj , Patrick Rivelli, JR. , Tony B. Shaffer , David Cheung
IPC分类号： A61F2/82 , A61K31/60 , A61K31/603 , A61K31/192 , A61K31/196 , A61K31/405 , A61K31/407 , A61K31/436 , A61P29/00 , A61P9/00
CPC分类号： A61K45/06 , A61K47/55 , A61L31/16 , A61L2300/41 , A61L2300/416 , A61L2300/45 , A61L2300/80
摘要： The invention is generally directed to a drug-release composition that contains drug-linker-drug compound that is combined with another therapeutic agent that can be an antirestenotic agent. The therapeutic agent can be partially bound to the drug-linker-drug compound, miscible with the drug-linker-drug compound, combined with the drug-linker-drug compound at various ratios, and tuned to control the release of drugs to a tissue in need thereof.
摘要翻译：本发明一般涉及一种药物释放组合物，其含有药物 - 接头 - 药物化合物，其与可以是抗再狭窄剂的另一种治疗剂组合。治疗剂可以部分地结合药物 - 接头 - 药物化合物，与药物 - 接头 - 药物化合物混合，并且以各种比例与药物 - 接头 - 药物化合物组合，并且被调整以控制药物释放到组织需要它。

5. 外观设计

USD968500S1 Golf green camera assembly 有权
公开(公告)号：USD968500S1
公开(公告)日：2022-11-01
申请号：US29787878
申请日：2021-06-09
申请人： David Cheung
设计人： David Cheung

6. 发明授权

US09591738B2 Plasma generator systems and methods of forming plasma 有权
标题翻译：等离子体发生器系统和形成等离子体的方法
公开(公告)号：US09591738B2
公开(公告)日：2017-03-07
申请号：US12062052
申请日：2008-04-03
申请人： Huatan Qiu , David Cheung , Prashanth Kothnur
发明人： Huatan Qiu , David Cheung , Prashanth Kothnur
IPC分类号： H01L21/306 , C23C16/00 , H05H1/46 , H01J37/32
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32119 , H01J37/32174 , H01J37/3244
摘要： Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.
摘要翻译：提供了形成等离子体的系统和方法。在一个实施例中，提供了一种等离子体发生器系统，其包括容器，围绕容器设置的单个线圈，该单个线圈是单个构件并且具有第一端，第二端，第一绕组和第二绕组，其中，第一绕组从第一端延伸，并且第二绕组一体地形成为第一绕组的一部分并且延伸到第二端，直接电耦合到单个构件的第一端的能量源，以及直接耦合到单一成员的第二端。

7. 发明授权

US08716143B1 Plasma based photoresist removal system for cleaning post ash residue 有权
标题翻译：基于等离子体的光致抗蚀剂去除系统，用于清洁后灰渣
公开(公告)号：US08716143B1
公开(公告)日：2014-05-06
申请号：US13370689
申请日：2012-02-10
申请人： David Cheung , Kirk J. Ostrowski
发明人： David Cheung , Kirk J. Ostrowski
IPC分类号： H01L21/302 , H01L21/461 , B08B6/00 , H01L21/311 , H01L21/4763
CPC分类号： H01L21/311 , H01L21/02063 , H01L21/302 , H01L21/31138 , H01L21/4763
摘要： A method of cleaning a low dielectric constant film in a lithographic process includes providing a dielectric film having thereover a resist composition, the dielectric film having a dielectric constant no greater than about 4.0, and stripping the resist composition to leave a substantially silicon-containing ash residue on the dielectric film. The method then includes contacting the ash residue with plasma comprising an ionized, essentially pure noble gas such as helium to remove the resist residue without substantially affecting the underlying dielectric film.
摘要翻译：在光刻工艺中清洁低介电常数膜的方法包括提供具有抗蚀剂组合物的电介质膜，电介质膜的介电常数不大于约4.0，并剥离抗蚀剂组合物以留下基本上含硅的灰分电介质膜上的残留物。该方法然后包括使灰渣与等离子体接触，所述等离子体包含电离的，基本上纯的惰性气体，例如氦，以除去抗蚀剂残留物，而基本上不影响下面的介电膜。

8. 发明授权

US08248928B1 Monitoring server load balancing 有权
标题翻译：监控服务器负载均衡
公开(公告)号：US08248928B1
公开(公告)日：2012-08-21
申请号：US11937285
申请日：2007-11-08
申请人： Bing Wang , David Cheung
发明人： Bing Wang , David Cheung
IPC分类号： G01R31/08
CPC分类号： H04L43/0894 , H04L43/026 , H04L43/12 , H04L47/125 , H04L63/1408 , H04L67/1014
摘要： Embodiments described herein discuss an approach to implementing load-balancing across multiple monitoring servers. One such embodiment describes a network monitoring device. The network monitoring device includes an ingress port, for receiving mirrored network packets, and a number of egress ports. The egress ports are associated with a number of monitoring servers, and used to forward the mirrored network packets to the monitoring servers. A packet classifier, coupled to the ingress port, examines the mirrored network packets, and determines which of the monitoring servers should receive the packets.
摘要翻译：本文描述的实施例讨论了跨多个监控服务器实现负载平衡的方法。一个这样的实施例描述了网络监视设备。网络监控设备包括入口端口，用于接收镜像网络报文，以及多个出口端口。出口端口与多个监控服务器相关联，用于将镜像网络数据包转发到监控服务器。耦合到入口端口的数据包分类器检查镜像网络数据包，并确定哪些监视服务器应该接收数据包。

9. 发明申请

US20120097331A1 GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES 审中-公开
标题翻译：气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
公开(公告)号：US20120097331A1
公开(公告)日：2012-04-26
申请号：US13342757
申请日：2012-01-03
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01L21/3065
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

10. 发明申请

US20110143548A1 ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP 审中-公开
标题翻译：超低硅低损耗植皮带
公开(公告)号：US20110143548A1
公开(公告)日：2011-06-16
申请号：US12636582
申请日：2009-12-11
申请人： David Cheung , Haoquan Fang , Jack Kuo , Ilia Kalinovski , Ted Li , Andrew Yao , Anirban Guha , Kirk Ostrowski
发明人： David Cheung , Haoquan Fang , Jack Kuo , Ilia Kalinovski , Ted Li , Andrew Yao , Anirban Guha , Kirk Ostrowski
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01L21/31138 , G03F7/427 , H01L21/31116 , H01L21/31144 , H01L21/32136 , H01L21/32137 , H01L21/32139
摘要： Improved methods for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, plasma is generated using elemental hydrogen, a fluorine-containing gas and a protectant gas. The plasma-activated gases reacts with the high-dose implant resist, removing both the crust and bulk resist layers, while simultaneously protecting exposed portions of the work piece surface. The work piece surface is substantially residue free with low silicon loss.
摘要翻译：提供了用于剥离光致抗蚀剂和从工件表面去除离子注入相关残留物的改进方法。根据各种实施例，使用元素氢，含氟气体和保护气体产生等离子体。等离子体活化气体与高剂量植入物抗蚀剂反应，去除了外壳和体抗蚀剂层，同时保护了工件表面的暴露部分。工件表面基本上无残留物，硅损耗低。

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