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21. 发明授权

US06872508B2 Exposure method and method of manufacturing semiconductor device 失效
标题翻译：半导体器件的制造方法及制造方法
公开(公告)号：US06872508B2
公开(公告)日：2005-03-29
申请号：US10180004
申请日：2002-06-26
申请人： Nobuhiro Komine , Keita Asanuma , Tatsuhiko Higashiki
发明人： Nobuhiro Komine , Keita Asanuma , Tatsuhiko Higashiki
IPC分类号： G02B5/18 , G03F1/36 , G03F1/70 , G03F7/20 , H01L21/027 , H01L21/301 , G03F9/00
CPC分类号： G03F7/70433
摘要： Disclosed is an exposure method comprising preparing an exposure apparatus including an illumination system and a projection lens, setting, in the exposure apparatus, a photomask having a mask pattern including a plurality of unit circuit patterns arranged like a checkered flag pattern and a plurality of unit auxiliary patterns arranged between the unit circuit patterns, and projecting the mask pattern onto a substrate through the projection lens by irradiating the photomask with light from the illumination system, wherein the unit circuit patterns and the unit auxiliary patterns generate a plurality of diffraction light spots on a pupil plane of the projection lens, and the four diffraction light spots having higher light intensities than the remaining diffraction light spots are distributed on the pupil plane in a cycle of 90°.
摘要翻译：公开了一种曝光方法，包括准备包括照明系统和投影透镜的曝光装置，在曝光装置中设置具有掩模图案的光掩模，所述掩模图案包括布置成格子状图案的多个单位电路图案和多个单元辅助图案，布置在单元电路图案之间，并且通过用来自照明系统的光照射光掩模，通过投影透镜将掩模图案投影到基板上，其中单元电路图案和单元辅助图案在投影透镜的光瞳面，并且具有比剩余的衍射光斑更高的光强度的四个衍射光点以90°的周期分布在光瞳面上。

22. 发明申请

US20110229826A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：用于形成电阻图案的半导体器件制造方法和基板处理装置
公开(公告)号：US20110229826A1
公开(公告)日：2011-09-22
申请号：US13118779
申请日：2011-05-31
申请人： Daisuke KAWAMURA , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
发明人： Daisuke KAWAMURA , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341
摘要： This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
摘要翻译：本发明公开了一种通过浸渍曝光在待处理衬底上形成抗蚀剂图案的方法。在被处理基板的上表面的中央部，在上表面的斜面部分上形成抗蚀剂膜，该斜面部分是通过倒角被处理基板的周边部分而得到的，待处理衬底的端部。在抗蚀剂膜和曝光装置的投影光学系统的构成元素之间存在折射率高于空气的液体的情况下，在抗蚀剂膜上形成期望图案的潜像的图案曝光，其为最接近被处理衬底。在执行图案曝光之后，通过向被处理基板的端部供给冲洗液，除去形成在被处理基板的端部的抗蚀剂膜。

23. 发明申请

US20070288113A1 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device 有权
标题翻译：对准器评估系统，对准器评估方法，计算机程序产品和半导体器件的制造方法
公开(公告)号：US20070288113A1
公开(公告)日：2007-12-13
申请号：US11882620
申请日：2007-08-03
申请人： Takuya Kouno , Shigeki Nojima , Tatsuhiko Higashiki
发明人： Takuya Kouno , Shigeki Nojima , Tatsuhiko Higashiki
IPC分类号： G06F19/00 , G06F17/50
CPC分类号： G03F7/705 , G03F7/70525 , G03F7/70541 , G03F7/70591 , G03F7/70991
摘要： An aligner evaluation system includes (a) an error calculation module configured to calculate error information on mutual optical system errors among a plurality of aligners; (b) a simulation module configured to simulate device patterns to be delineated by each of the aligners based on the error information; and (c) a evaluation module configured to evaluate whether each of the aligners has appropriate performances for implementing an organization of a product development machine group based on the simulated device pattern.
摘要翻译：对准器评估系统包括：（a）误差计算模块，被配置为计算多个对准器之间的相互光学系统误差的误差信息; （b）模拟模块，被配置为基于所述误差信息来模拟由每个对准器描绘的装置模式; 以及（c）评估模块，其被配置为基于所述模拟设备模式来评估每个对准器是否具有用于实现产品开发机器组的组织的适当性能。

24. 发明授权

US07269470B2 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device 有权
公开(公告)号：US07269470B2
公开(公告)日：2007-09-11
申请号：US10636625
申请日：2003-08-08
申请人： Takuya Kouno , Shigeki Nojima , Tatsuhiko Higashiki
发明人： Takuya Kouno , Shigeki Nojima , Tatsuhiko Higashiki
IPC分类号： G06F19/00
CPC分类号： G03F7/705 , G03F7/70525 , G03F7/70541 , G03F7/70591 , G03F7/70991
摘要： An aligner evaluation system includes (a) an error calculation module configured to calculate error information on mutual optical system errors among a plurality of aligners; (b) a simulation module configured to simulate device patterns to be delineated by each of the aligners based on the error information; and (c) a evaluation module configured to evaluate whether each of the aligners has appropriate performances for implementing an organization of a product development machine group based on the simulated device pattern.

25. 发明申请

US20060050351A1 Liquid immersion optical tool, method for cleaning liquid immersion optical tool, and method for manufacturing semiconductor device 审中-公开
标题翻译：液浸式光学工具，液浸式光学工具的清洗方法以及半导体装置的制造方法
公开(公告)号：US20060050351A1
公开(公告)日：2006-03-09
申请号：US11217464
申请日：2005-09-02
申请人： Tatsuhiko Higashiki
发明人： Tatsuhiko Higashiki
IPC分类号： G02B26/02
CPC分类号： G02B27/0006 , G03F7/70341 , G03F7/70925
摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.
摘要翻译：公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置液体介质流体通过清洗溶液。

26. 发明授权

US06437858B1 Aberration measuring method, aberration measuring system and aberration measuring mask 失效
标题翻译：畸变测量方法，像差测量系统和像差测量掩模
公开(公告)号：US06437858B1
公开(公告)日：2002-08-20
申请号：US09667818
申请日：2000-09-22
申请人： Takuya Kouno , Hiroshi Nomura , Tatsuhiko Higashiki
发明人： Takuya Kouno , Hiroshi Nomura , Tatsuhiko Higashiki
IPC分类号： G01B900
CPC分类号： G01M11/0264 , G01M11/0242 , G03F7/706
摘要： A plurality of bars-in-bars marks are formed. Each mark has four small patterns and four large patterns arranged in a direction of a straight line and a direction perpendicular thereto. The straight lines of the respective bars-in-bars marks are disposed at angles of 0°, 30° and 60°.
摘要翻译：形成多个条形棒标记。每个标记具有沿直线方向和与其垂直的方向布置的四个小图案和四个大图案。各个棒状标记的直线以0°，30°和60°的角度设置。

27. 发明授权

US06262792B1 Optical exposure apparatus of scanning exposure system and its exposing method 失效
公开(公告)号：US06262792B1
公开(公告)日：2001-07-17
申请号：US08772120
申请日：1996-12-20
申请人： Tatsuhiko Higashiki
发明人： Tatsuhiko Higashiki
IPC分类号： G03B2742
CPC分类号： G03F9/7026 , G03F7/70358 , G03F9/7003 , G03F9/7011 , G03F9/7034
摘要： In an optical exposure apparatus of a scan-exposure system, scan-exposure is preliminarily executed before an actual scan-exposure, and a reticle position measuring device measures a positional change of a reticle in the upper and lower direction with the movement of a reticle stage to a scanning direction. Then, a calculation circuit obtains correction data for an offset based on the measuring value to be stored in a memory. Thereafter, correction data stored in the memory is sequentially supplied to a feedback controlling circuit at an actual scan-exposure time. Also, a measuring value of the position of a wafer in a Z-axial direction with the movement of the wafer stage to the scanning direction, relatively moving with the reticle stage, is supplied to the feedback controlling circuit from a wafer position measuring device. The feedback controlling circuit controls a wafer Z-axial driving mechanism such that the position of the wafer in the Z-axial direction is offset by a positional change of the reticle in upper and lower directions. Thereby, correcting a shift of a projection image from a focal position at an exposure surface on the wafer due to deformation (curve and tilt) of the reticle and the upper and lower movement.

28. 发明授权

US06008880A Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate 失效
标题翻译：能够根据场间坐标校正高（N-TH）次曝光误差的曝光工具和方法
公开(公告)号：US06008880A
公开(公告)日：1999-12-28
申请号：US821447
申请日：1997-03-21
申请人： Tatsuhiko Higashiki , Keita Asanuma
发明人： Tatsuhiko Higashiki , Keita Asanuma
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B11/26 , G03B27/42
CPC分类号： G03F7/70591 , G03F7/70691 , G03F9/70
摘要： A light exposure tool of the present invention is so structured as to enable the correction of a linear intrafield error of a shot and of a higher-order intrafield error of the shot depending upon an interfield of a wafer. The light exposure tool comprises a reticle having a written circuit pattern, a reticle stage having the reticle placed on it, a reticle XY stage drive controller, a reticle stage position measuring mechanism, a wafer stage having a semiconductor wafer placed on it, the semiconductor wafer having a plurality of alignment marks formed on it for position identification, a wafer XY stage drive controller, a wafer stage position measuring mechanism, a projection optical mechanism for projecting the circuit pattern of the reticle onto the wafer to create a shot, an alignment mechanism for detecting positions of the alignment marks 9 and setting the reticle and wafer in a desired position, a calculation device, a shot rotation adjusting controller, and an isotropic magnification controller. At a time of light exposures by the projection optical mechanism on the wafer, a per-exposure systematic error of at least one of a rotation error, magnification error and skew error is approximated with an n-th order function Ls (x, y) in an interfield coordinate (x, y) of the wafer to control the alignment mechanism in accordance with the function Ls (x, y) and to correct the per-exposure systematic error depending upon the interfield coordinate of the wafer.
摘要翻译：本发明的曝光工具被构造成使得能够根据晶片的间隔来校正镜头的镜头的线性场内误差和镜头的高阶场内误差。曝光工具包括具有写入电路图案的标线片，其上放置有掩模版的标线片台，标线片XY台驱动控制器，标线片台位置测量机构，具有放置在其上的半导体晶片的晶片台，半导体具有形成在其上用于位置识别的多个对准标记的晶片，晶片XY台驱动控制器，晶片台位置测量机构，用于将掩模版的电路图案投影到晶片上以产生镜头的投影光学机构，对准用于检测对准标记9的位置并将掩模版和晶片设置在期望位置的机构，计算装置，镜头旋转调节控制器和各向同性放大控制器。在由晶片上的投影光学机构进行光照射的时刻，旋转误差，放大误差和偏斜误差中的至少一个的每个曝光系统误差用n阶函数Ls（x，y）近似，在晶片的场间坐标（x，y）中，根据函数Ls（x，y）来控制对准机构，并且根据晶片的场间坐标校正每曝光系统误差。

29. 发明申请

US20120009799A1 TEMPLATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TEMPLATE 有权
标题翻译：模式制造方法，半导体器件制造方法和模板
公开(公告)号：US20120009799A1
公开(公告)日：2012-01-12
申请号：US13150961
申请日：2011-06-01
申请人： Tsukasa AZUMA , Tatsuhiko Higashiki , Kyoichi Suguro
发明人： Tsukasa AZUMA , Tatsuhiko Higashiki , Kyoichi Suguro
IPC分类号： H01L21/302 , B29C59/02 , B01J19/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.
摘要翻译：根据一个实施例，模板制造方法是用于制造在压印处理中使用的模板的方法，其中在主表面上形成具有凹凸的图案，并且图案与形成在基板上的抗蚀剂部件接触要被处理以将图案转印到抗蚀剂构件上，该方法包括将带电粒子至少注入到模板的凹部的底部中。

30. 发明授权

US07985958B2 Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program 有权
标题翻译：电子束描绘装置，偏转放大器，偏转控制装置，电子束描绘法，半导体装置的制造方法以及电子束绘制程序
公开(公告)号：US07985958B2
公开(公告)日：2011-07-26
申请号：US11268603
申请日：2005-11-08
申请人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
发明人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
IPC分类号： H01J37/153
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/15 , H01J2237/30433
摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.
摘要翻译：根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分，指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部部分。

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