专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

22. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

23. 发明授权

US07631548B2 Scanning probe microscope 失效
标题翻译：扫描探针显微镜
公开(公告)号：US07631548B2
公开(公告)日：2009-12-15
申请号：US11737779
申请日：2007-04-20
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01B5/28
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

24. 发明申请

US20070266780A1 Scanning Probe Microscope 失效
标题翻译：扫描探头显微镜
公开(公告)号：US20070266780A1
公开(公告)日：2007-11-22
申请号：US11737779
申请日：2007-04-20
申请人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01N13/10
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

25. 发明授权

US5062715A Method and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor device 失效
标题翻译：用于检测光声信号的方法和装置以及用于检测半导体器件的内部缺陷的方法
公开(公告)号：US5062715A
公开(公告)日：1991-11-05
申请号：US479712
申请日：1990-02-14
申请人： Toshihiko Nakata , Yukio Kembo
发明人： Toshihiko Nakata , Yukio Kembo
IPC分类号： G01N29/00 , G01N29/04 , G01N29/24 , G02B21/00
CPC分类号： G02B21/0072 , G01N29/2418 , G01N2291/0423 , G01N2291/2697
摘要： A photoacoustic signal detecting method and apparatus for intensity-modulating light having a wavelength penetrating a sample such as a semiconductor device at a desired frequency, the light being emitted from a first light source, focusing the intensity-modulated light on the sample as a light spot, by changing the position of the sample and the optical constant of the means for focusing, scanning the light spot inside the sample in a depth direction thereof to detect the photoacoustic effect generated in the sample, and extracting information relative to the surface and inside of the sample and defect information therein. The photoacoustic effect is detected using an interferometer. Light incident on the sample surface for a second light source in order to obtain interference light and the interference light reflected from the sample surface are adjusted in response to a signal indicative of the depth of the light spot to detect optimum interference light. Light reflected from the sample surface when light emitted from a third light source is incident on the surface is detected through the focusing optical system to generate the signal indicative of the depth of the light spot.
摘要翻译：一种光声信号检测方法和装置，用于强度调制具有以期望频率穿透诸如半导体器件的样品的波长的光，所述光从第一光源发射，将强度调制光聚焦在样品上作为光通过改变样品的位置和聚焦装置的光学常数，扫描样品内的光斑在其深度方向上，以检测样品中产生的光声效应，并提取相对于表面和内部的信息的样品和缺陷信息。使用干涉仪检测光声效应。为了获得干涉光和从样品表面反射的干涉光，入射到用于第二光源的样品表面上的光被响应于指示光斑的深度的信号来调节以检测最佳干涉光。通过聚焦光学系统检测从第三光源发射的光入射在表面上的从样品表面反射的光，以产生指示光斑深度的信号。

26. 发明授权

US4803712A X-ray exposure system 失效
标题翻译： X射线曝光系统
公开(公告)号：US4803712A
公开(公告)日：1989-02-07
申请号：US4880
申请日：1987-01-20
申请人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
发明人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F7/709
摘要： An X-ray exposure system includes a frame set on the floor; an X-ray source fixedly provided in the central portion of the upper part of the frame; a mask-wafer alignment means comprising a wafer at a fixed distance from a mask, an X-Y table mounted with the wafer holder, a mask holder for holding the mask, and an alignment detecting means for detecting the alignment of the alignment pattern of the mask and that of the wafer; vibration isolators for supporting the mask-wafer alignment means so that vibrations do not propagate to the mask-wafer alignment means; detecting means for detecting the position of the mask-wafer alignment means with respect to three-dimensional directions relative to the X-ray source; an arithmetic means for calculating an exposure error of a dislocation of a mask pattern exposure on the wafer, on the basis of position data obtained by the detecting means; and correcting means for correcting the exposure error calculated by the arithmetic means.
摘要翻译： X射线曝光系统包括设置在地板上的框架; 固定地设置在所述框架的上部的中心部分的X射线源; 掩模晶片对准装置，其包括距离掩模固定距离的晶片，安装有晶片保持器的XY工作台，用于保持掩模的掩模支架，以及用于检测掩模的对准图案的对准的对准检测装置和晶片的; 用于支撑掩模 - 晶片对准装置的振动隔离器，使得振动不传播到掩模 - 晶片对准装置; 检测装置，用于相对于X射线源相对于三维方向检测掩模晶片对准装置的位置; 用于根据由检测装置获得的位置数据计算晶片上的掩模图案曝光的位错的曝光误差的算术装置; 以及校正装置，用于校正由算术装置计算出的曝光误差。

27. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

28. 发明申请

US20080223122A1 SCANNING PROBE MICROSCOPE 有权
标题翻译：扫描探针显微镜
公开(公告)号：US20080223122A1
公开(公告)日：2008-09-18
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
CPC分类号： G01Q70/04 , G01Q10/06
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译：扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。

29. 发明授权

US07173693B2 Method for inspecting defects and an apparatus of the same 有权
标题翻译：检查缺陷的方法及其装置
公开(公告)号：US07173693B2
公开(公告)日：2007-02-06
申请号：US11042173
申请日：2005-01-26
申请人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
发明人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： A method for inspecting a specimen includes obtaining an image of a specimen through a first optical system, displaying the obtained image of the specimen on a display screen; dividing the displayed image of the specimen into plural regions and setting defect detection sensitivity for each of the plural divided regions, transferring the specimen from the first optical system to a second optical system, obtaining an image of the specimen through the second optical system, detecting defects on the specimen by processing the image obtained through the second optical system using the defect detection sensitivity set for a respective region, and displaying information of the detected defects on the display screen.
摘要翻译：用于检查样本的方法包括通过第一光学系统获得样本的图像，将获得的样本图像显示在显示屏上; 将样本的显示图像分割成多个区域，并且对多个分割区域中的每一个分割区域设置缺陷检测灵敏度，将样本从第一光学系统传送到第二光学系统，通过第二光学系统获得样本的图像，检测通过使用针对各个区域设置的缺陷检测灵敏度处理通过第二光学系统获得的图像，并在显示屏幕上显示检测到的缺陷的信息，来检查样本上的缺陷。

30. 发明申请

US20060097162A1 Apparatus and method for determining surface profiles using a scanning probe microscope 有权
标题翻译：使用扫描探针显微镜确定表面轮廓的装置和方法
公开(公告)号：US20060097162A1
公开(公告)日：2006-05-11
申请号：US11251795
申请日：2005-10-18
申请人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
发明人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
IPC分类号： G21K7/00
CPC分类号： G01Q10/04
摘要： A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface includes: a sample stage movable in at least one axis direction; the probe which is brought into close proximity to or contact with the surface of the sample mounted on the sample stage and scans the sample surface; a probe-driving unit for moving the probe three-dimensionally; a probe deflection detector for detecting a deflection of the probe; and an observation optical system which has an objective lens and observes the probe disposed on substantially the optical axis of the objective lens, and the sample. The probe-driving unit is disposed with three sets of paired drive sources arranged essentially with symmetry with respect to the optical axis of the objective lens.
摘要翻译：一种扫描探针显微镜，用于通过使探针靠近或接触样品的表面并扫描样品表面来测量样品的表面轮廓，包括：可在至少一个轴向移动的样品台; 该探头与安装在样品台上的样品的表面紧密接触或接触并扫描样品表面; 用于三维移动探头的探针驱动单元; 用于检测探针偏转的探针偏转检测器; 以及观察光学系统，其具有物镜并观察设置在物镜的基本光轴上的探针和样品。探针驱动单元设置有三组成对的驱动源，其基本上相对于物镜的光轴对称布置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式