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21. 发明申请

US20110163061A1 Method Of Producing Microsprings Having Nanowire Tip Structures 审中-公开
标题翻译：具有纳米线尖端结构的微管生产方法
公开(公告)号：US20110163061A1
公开(公告)日：2011-07-07
申请号：US13044933
申请日：2011-03-10
申请人： Eugene Chow , Pengfei Qi
发明人： Eugene Chow , Pengfei Qi
IPC分类号： C03C25/68 , B05D1/32 , B82Y40/00
CPC分类号： B81C1/0015 , B81B2203/019 , B81B2207/07 , B82Y10/00
摘要： A stress-engineered microspring is formed generally in the plane of a substrate. A nanowire (or equivalently, a nanotube) is formed at the tip thereof, also in the plane of the substrate. Once formed, the length of the nanowire may be defined, for example photolithographically. A sacrificial layer underlying the microspring may then be removed, allowing the engineered stresses in the microspring to cause the structure to bend out of plane, elevating the nanowire off the substrate and out of plane. Use of the nanowire as a contact is thereby provided. The nanowire may be clamped at the tip of the microspring for added robustness. The nanowire may be coated during the formation process to provide additional functionality of the final device.
摘要翻译：应力工程微球通常在基底的平面上形成。纳米线（或等效地，纳米管）也在其顶端形成在基板的平面中。一旦形成，可以例如光刻地限定纳米线的长度。然后可以去除位于微弹簧下面的牺牲层，允许微弹簧中的工程应力使结构弯曲出平面，从而使纳米线离开基底并离开平面。由此提供了使用纳米线作为接触。可以将纳米线夹在微弹簧的末端以增加坚固性。在形成过程中可以涂覆纳米线以提供最终装置的附加功能。

22. 发明申请

US20070221611A1 Method of manufacturing fine features for thin film transistors 有权
标题翻译：制造薄膜晶体管精细特征的方法
公开(公告)号：US20070221611A1
公开(公告)日：2007-09-27
申请号：US11388731
申请日：2006-03-24
申请人： Eugene Chow , William Wong , Michael Chabinyc , Ana Arias
发明人： Eugene Chow , William Wong , Michael Chabinyc , Ana Arias
IPC分类号： H01B13/00 , C23F1/00
CPC分类号： H01L29/4908 , H01L27/124 , H01L27/1292
摘要： A process for fabricating fine features such as small gate electrodes on a transistor. The process involves the jet-printing of a mask and the plating of a metal to fabricate sub-pixel and standard pixel size features in one layer. Printing creates a small sub-pixel size gap mask for plating a fine feature. A second printed mask may be used to protect the newly formed gate and etch standard pixel size lines connecting the small gates.
摘要翻译：一种在晶体管上制造诸如小栅电极的精细特征的工艺。该方法涉及一种掩模的喷墨印刷和金属镀层，以在一层中制造亚像素和标准像素尺寸特征。打印创建一个小的子像素大小的间隙掩模，用于电镀精细特征。可以使用第二印刷掩模来保护新形成的栅极并蚀刻连接小栅极的标准像素尺寸线。

23. 发明申请

US20060065909A1 Selective delamination of thin-films by interface adhesion energy contrasts and thin film transistor devices formed thereby 失效
公开(公告)号：US20060065909A1
公开(公告)日：2006-03-30
申请号：US10950413
申请日：2004-09-28
申请人： William Wong , Chinwen Shih , Rene Lujan , Eugene Chow
发明人： William Wong , Chinwen Shih , Rene Lujan , Eugene Chow
IPC分类号： H01L21/00 , H01L21/84 , H01L31/0328 , H01L31/0336 , H01L31/072 , H01L31/109 , H01L21/20
CPC分类号： H01L29/66765
摘要： Various exemplary embodiments of the systems and methods according to this invention provide for a method of producing a self-aligned thin film transistor, the transistor including a metal layer covering at least a portion of a doped layer, the doped layer covering at least a portion of a dielectric layer, a strain being created in the metal layer, the method includes etching an exposed portion of the doped layer to create a defect at an interface between the doped layer and the dielectric layer so as to initiate a delamination of the doped layer from the dielectric layer. The delamination of the doped layer from the dielectric layer is stopped when the defect propagates into an interface between the doped layer and the dielectric layer that has an adhesive energy that is greater than the strain of the metal layer.

24. 发明授权

US08541741B2 Photonic measurement instrument using fiber optics 有权
标题翻译：使用光纤的光子测量仪器
公开(公告)号：US08541741B2
公开(公告)日：2013-09-24
申请号：US12949383
申请日：2010-11-18
申请人： Juan C. Ivaldi , Paul L. St. Cyr , Eugene Chow , Mark C. Werner
发明人： Juan C. Ivaldi , Paul L. St. Cyr , Eugene Chow , Mark C. Werner
IPC分类号： G01J5/00
CPC分类号： G01N21/3103 , G01N21/3151 , G01N21/68 , G01N21/72 , G01N21/74 , G01N2201/082 , G01N2201/0826 , G01N2201/0833
摘要： A photonic measurement system, such as an atomic absorption spectrometer, includes source, sample and detection modules that are interconnected by fiber optic cables. A first set of fiber optic cables guides light from one or more light sources in the source module to each of at least two analysis chambers in the sample module. A second set of fiber optic cables guides light from the analysis chambers to a detector in the detection module. The detector provides to a processing sub-system signals that correspond to intensities of the guided light. One analysis chamber is selected to perform a sample analysis at a given time, and the processing sub-system processes the signals associated with the selected analysis chamber as measurement signals. The processing sub-system may further process the signals associated with a given non-selected analysis chamber as reference signals.
摘要翻译：诸如原子吸收光谱仪的光子测量系统包括通过光纤电缆互连的源，样本和检测模块。第一组光纤电缆将源模块中的一个或多个光源的光引导到样品模块中的至少两个分析室中的每一个。第二组光纤电缆将来自分析室的光引导到检测模块中的检测器。检测器向处理子系统提供对应于导光的强度的信号。选择一个分析室以在给定时间执行样本分析，并且处理子系统处理与所选分析室相关联的信号作为测量信号。处理子系统可以进一步处理与给定的非选择分析室相关联的信号作为参考信号。

25. 发明授权

US07995081B2 Anisotropically conductive backside addressable imaging belt for use with contact electrography 有权
标题翻译：用于接触电摄影的各向异性导电背面可寻址成像带
公开(公告)号：US07995081B2
公开(公告)日：2011-08-09
申请号：US12145677
申请日：2008-06-25
申请人： Timothy D. Stowe , Chu-heng Liu , Jeng Ping Lu , Eugene Chow , Gregory B. Anderson , Armin Völkel , Eric Peeters
发明人： Timothy D. Stowe , Chu-heng Liu , Jeng Ping Lu , Eugene Chow , Gregory B. Anderson , Armin Völkel , Eric Peeters
IPC分类号： B41J2/41
CPC分类号： B41J2/41 , G03G15/32
摘要： An addressable imaging belt for use in printing applications having embedded anisotropically conductive addressable islands configured for electric contact on a first side of the belt by a write head consisting of an array of compliant cantilevered fingers with contact pads/points to which a voltage can be applied. The conductive addressable islands electrically isolated from one another and extending substantially through the thickness of the belt in order to allow charge to flow through the belt towards a second side of the belt, in order to form a latent electrostatic image on the second side and develop this latent image by attracting colorized toner or other electrically charged particles to the second side.
摘要翻译：一种用于印刷应用的可寻址成像带，其具有嵌入的各向异性导电可寻址岛，其配置用于通过由柔性悬臂指状物阵列组成的写头组成，用于在带的第一侧上进行电接触，所述写头具有可被施加电压的接触焊盘/点。导电寻址岛彼此电隔离并且基本上延伸穿过带的厚度，以便允许电荷通过带流向带的第二侧，以在第二面上形成静电潜像并显影该潜像通过将着色调色剂或其它带电粒子吸引到第二侧。

26. 发明申请

US20110185925A1 Digital Gravure Printing with a Pixilated Photoconductor 有权
标题翻译：数字凹版印刷与Pixilated光电导体
公开(公告)号：US20110185925A1
公开(公告)日：2011-08-04
申请号：US12697109
申请日：2010-01-29
申请人： Eugene Chow , Jeng Ping Lu
发明人： Eugene Chow , Jeng Ping Lu
IPC分类号： B41M1/10
CPC分类号： B41M1/10
摘要： A printing sub-system including same including a pixilated photoconductive member (such as a photobelt) is disclosed. Electrically isolated cells hold surface application material above the photoconductor. The surface application material is first charged. Charge on the surface application material in an individual cell may then be discharged by exposure of a region of the photoconductor proximate that cell to light from an optical addressing system. The surface application material is brought into proximity of an image receiving member such as paper, which is either charged or proximate a charge source. Charged surface application material in a cell may then be electrostatically transferred from the cell onto the image receiving member, while discharged surface application material remains in the cell. The subsystem may form a part of a complete printing system using many existing components. Among other advantages, viscous liquid surface application material may thereby be printed.
摘要翻译：公开了包括像素化感光体（例如光带）的包括其的印刷子系统。电隔离的电池在光电导体上方保持表面应用材料。首先对表面施用材料进行充电。然后可以通过将靠近该单元的光电导体的区域暴露于来自光寻址系统的光来对单个单元中的表面施加材料上的电荷进行放电。表面施加材料被带入诸如纸的图像接收构件，其被充电或靠近电荷源。然后可以将电池中的充电表面施用材料静电从细胞转移到图像接收部件上，同时放电的表面施用材料保留在电池中。子系统可以使用许多现有组件形成完整打印系统的一部分。除了其它优点之外，可以印刷粘性液体表面施加材料。

27. 发明申请

US20110122396A1 PHOTONIC MEASUREMENT INSTRUMENT USING FIBER OPTICS 有权
标题翻译：光纤测量仪器使用光纤光学
公开(公告)号：US20110122396A1
公开(公告)日：2011-05-26
申请号：US12949383
申请日：2010-11-18
申请人： Juan C. Ivaldi , Paul L. St. Cyr , Eugene Chow , Mark C. Werner
发明人： Juan C. Ivaldi , Paul L. St. Cyr , Eugene Chow , Mark C. Werner
IPC分类号： G01J3/28 , G01J3/00 , G01J3/30
CPC分类号： G01N21/3103 , G01N21/3151 , G01N21/68 , G01N21/72 , G01N21/74 , G01N2201/082 , G01N2201/0826 , G01N2201/0833
摘要： A photonic measurement system, such as an atomic absorption spectrometer, includes source, sample and detection modules that are interconnected by fiber optic cables. A first set of fiber optic cables guides light from one or more light sources in the source module to each of at least two analysis chambers in the sample module. A second set of fiber optic cables guides light from the analysis chambers to a detector in the detection module. The detector provides to a processing sub-system signals that correspond to intensities of the guided light. One analysis chamber is selected to perform a sample analysis at a given time, and the processing sub-system processes the signals associated with the selected analysis chamber as measurement signals. The processing sub-system may further process the signals associated with a given non-selected analysis chamber as reference signals.
摘要翻译：诸如原子吸收光谱仪的光子测量系统包括通过光纤电缆互连的源，样本和检测模块。第一组光纤电缆将源模块中的一个或多个光源的光引导到样品模块中的至少两个分析室中的每一个。第二组光纤电缆将来自分析室的光引导到检测模块中的检测器。检测器向处理子系统提供对应于导光的强度的信号。选择一个分析室以在给定时间执行样本分析，并且处理子系统处理与所选分析室相关联的信号作为测量信号。处理子系统可以进一步处理与给定的非选择分析室相关联的信号作为参考信号。

28. 发明授权

US07804090B2 Patterned-print thin-film transistors with top gate geometry 有权
标题翻译：具有顶栅几何形状的图案印刷薄膜晶体管
公开(公告)号：US07804090B2
公开(公告)日：2010-09-28
申请号：US12018794
申请日：2008-01-23
申请人： William Wong , Rene Lujan , Eugene Chow
发明人： William Wong , Rene Lujan , Eugene Chow
IPC分类号： H01L29/04
CPC分类号： H01L29/41733 , H01L27/124 , H01L27/1285 , H01L27/1288 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66757
摘要： A self-aligned, thin-film, top-gate transistor and method of manufacturing same are disclosed. A first print-patterned mask is formed over a metal layer by digital lithography, for example by printing with a phase change material using a droplet ejector. The metal layer is then etched using the first print-patterned mask to form source and drain electrodes. A semiconductive layer and an insulative layer are formed thereover. A layer of photosensitive material is then deposited and exposed through the substrate, with the source and drain electrodes acting as masks for the exposure. Following development of the photosensitive material, a gate metal layer is deposited. A second print-patterned mask is then formed over the device, again by digital lithography. Etching and removal of the photosensitive material leaves the self-aligned top-gate electrode.
摘要翻译：公开了一种自对准薄膜顶栅晶体管及其制造方法。通过数字光刻在金属层上形成第一印刷图案掩模，例如通过使用液滴喷射器用相变材料进行印刷。然后使用第一印刷图案化掩模蚀刻金属层以形成源极和漏极。在其上形成半导体层和绝缘层。然后将一层感光材料沉积并暴露通过基底，源极和漏极用作曝光的掩模。在感光材料的显影之后，沉积栅极金属层。然后再次通过数字光刻法在器件上形成第二印刷图案掩模。蚀刻和去除感光材料离开自对准顶栅电极。

29. 发明申请

US20090159996A1 Method Of Producing Microsprings Having Nanowire Tip Structures 有权
标题翻译：具有纳米线尖端结构的微管生产方法
公开(公告)号：US20090159996A1
公开(公告)日：2009-06-25
申请号：US11963507
申请日：2007-12-21
申请人： Eugene Chow , Pengfei Qi
发明人： Eugene Chow , Pengfei Qi
IPC分类号： H01L29/84 , H01L21/00
CPC分类号： B81C1/0015 , B81B2203/019 , B81B2207/07 , B82Y10/00
摘要： A stress-engineered microspring is formed generally in the plane of a substrate. A nanowire (or equivalently, a nanotube) is formed at the tip thereof, also in the plane of the substrate. Once formed, the length of the nanowire may be defined, for example photolithographically. A sacrificial layer underlying the microspring may then be removed, allowing the engineered stresses in the microspring to cause the structure to bend out of plane, elevating the nanowire off the substrate and out of plane. Use of the nanowire as a contact is thereby provided. The nanowire may be clamped at the tip of the microspring for added robustness. The nanowire may be coated during the formation process to provide additional functionality of the final device.
摘要翻译：应力工程微球通常在基底的平面上形成。纳米线（或等效地，纳米管）也形成在其顶端，也在基板的平面中。一旦形成，可以例如光刻地限定纳米线的长度。然后可以去除位于微弹簧下面的牺牲层，允许微弹簧中的工程应力使结构弯曲出平面，从而使纳米线离开基底并离开平面。由此提供了使用纳米线作为接触。可以将纳米线夹在微弹簧的尖端，以增加坚固性。在形成过程中可以涂覆纳米线以提供最终装置的附加功能。

30. 发明申请

US20070221610A1 Method using monolayer etch masks in combination with printed masks 失效
标题翻译：使用单层蚀刻掩模与印刷掩模组合的方法
公开(公告)号：US20070221610A1
公开(公告)日：2007-09-27
申请号：US11388718
申请日：2006-03-24
申请人： Eugene Chow , William Wong , Michael Chabinyc , Jeng Lu , Ana Arias
发明人： Eugene Chow , William Wong , Michael Chabinyc , Jeng Lu , Ana Arias
IPC分类号： H01B13/00 , B44C1/22
CPC分类号： H01L21/302 , H01L21/0271 , H01L21/0273 , H01L27/124 , H01L27/1288 , H01L27/1292 , H01L29/66765
摘要： A method to pattern films into dimensions smaller than the printed pixel mask size. A printed mask is deposited on a thin film on a substrate. The second mask layer is selectively deposited onto the film, but not to the printed mask. A third mask is then printed onto the substrate to pattern a portion of the second mask. Certain solvents are then used to remove the printed mask but not the mask layer on the thin film. The mask layer is then used to form a pattern on the thin film in combination with etching. The features formed in the thin film are smaller than the smallest dimension of the printed mask. The coated mask layer can be a self-assembled mono-layer or other material that selectively binds to the thin film.
摘要翻译：将薄膜图案尺寸小于印刷像素掩模尺寸的方法。印刷的掩模沉积在基底上的薄膜上。第二掩模层选择性地沉积在膜上，而不是印刷在掩模上。然后将第三掩模印刷到基底上以对第二掩模的一部分进行图案化。然后使用某些溶剂去除印刷的掩模，而不是薄膜上的掩模层。然后将掩模层与蚀刻结合在薄膜上形成图案。形成在薄膜中的特征小于印刷掩模的最小尺寸。涂覆的掩模层可以是选择性地结合薄膜的自组装单层或其它材料。

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