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11. 发明申请

US20100035177A1 METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM 有权
标题翻译：形成图案的方法和形成涂膜的材料
公开(公告)号：US20100035177A1
公开(公告)日：2010-02-11
申请号：US12443118
申请日：2007-09-13
申请人： Kiyoshi Ishikawa , Jun Koshiyama , Kazumasa Wakiya
发明人： Kiyoshi Ishikawa , Jun Koshiyama , Kazumasa Wakiya
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： H01L21/0273 , G03F7/0035 , G03F7/40 , H01L21/0337 , H01L21/0338 , Y10S430/128
摘要： A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a pattern are provided. First resist film (2) is formed by applying a first chemically amplified resist composition on support (1), and thus formed film is selectively exposed, and developed to form multiple first resist patterns (3). Next, on the surface of the first resist patterns (3) are formed multiple coating patterns (5) by forming coating films (4) constituted with a water soluble resin film, respectively. Furthermore, a second chemically amplified resist composition is applied on the support (1) having the coating pattern (5) formed thereon to form second resist film (6), which is selectively exposed and developed to form multiple second resist patterns (7). Accordingly, a pattern including the coating patterns (5) and the second resist patterns (7) is formed on the support (1).
摘要翻译：提供一种用于形成能够减少双重图案化工艺中的台阶数的图案的新颖方法和用于形成图案的方法中适当使用的涂膜形成材料。通过在支撑体（1）上涂覆第一化学放大抗蚀剂组合物形成第一抗蚀剂膜（2），从而形成膜被选择性地曝光并显影以形成多个第一抗蚀剂图案（3）。接下来，通过分别形成由水溶性树脂膜构成的涂膜（4），在第一抗蚀剂图案（3）的表面上形成多个涂布图案（5）。此外，在其上形成有涂层图案（5）的支撑体（1）上施加第二化学放大抗蚀剂组合物以形成第二抗蚀剂膜（6），其被选择性地暴露和显影以形成多个第二抗蚀剂图案（7）。因此，在支撑体（1）上形成包括涂布图案（5）和第二抗蚀图案（7）的图案。

12. 发明申请

US20090029284A1 PATTERN COATING MATERIAL AND PATTERN FORMING METHOD 有权
标题翻译：图案涂料和图案形成方法
公开(公告)号：US20090029284A1
公开(公告)日：2009-01-29
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/075 , G03F7/20
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

13. 发明授权

US5908738A Undercoating composition for photolithography 失效
标题翻译：用于光刻的底漆组合物
公开(公告)号：US5908738A
公开(公告)日：1999-06-01
申请号：US18910
申请日：1998-02-05
申请人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Toshimasa Nakayama
发明人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , G03C1/825
CPC分类号： G03F7/091 , Y10S430/117 , Y10S430/124
摘要： Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.
摘要翻译：提出了通过介于基板表面和光致抗蚀剂层之间用于光致抗蚀剂层的光刻图案中的新颖的底涂层组合物，以减少来自基板表面的反射光的不利影响。本发明的底漆组合物包含（a）被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物和（b）多羟基二苯甲酮化合物，二苯基砜化合物或二苯基亚砜化合物，任选地与（c）（甲基）丙烯酸酯的不溶性树脂。

14. 发明授权

US4826147A Paper feed cassette 失效
标题翻译：供纸盒
公开(公告)号：US4826147A
公开(公告)日：1989-05-02
申请号：US647306
申请日：1984-09-04
申请人： Satoshi Shino , Akira Sasahara , Kiyoshi Ishikawa , Shigeru Shibasaki , Shinji Takashina
发明人： Satoshi Shino , Akira Sasahara , Kiyoshi Ishikawa , Shigeru Shibasaki , Shinji Takashina
IPC分类号： B65H1/04 , G03G15/00 , B65H1/00
CPC分类号： B65H1/266 , B65H1/04 , G03G15/6502
摘要： A dual purpose cassette is disclosed that allows the feeding of sheets in either a short edge or long edge direction. The cassette has openings on the short edge and long edge of its base and side portions so that depending on which direction the cassette is inserted into the machine sheets can be fed in the longitudinal or lateral directions.
摘要翻译：公开了一种双用途盒，其允许片材在短边缘或长边缘方向上进给。盒子在其基部和侧部的短边缘和长边缘上具有开口，使得根据盒子插入到机器片材中的哪个方向可以沿纵向或横向进给。

15. 发明授权

US08378863B2 Analog-to-digital converter and correction method thereof 有权
标题翻译：模数转换器及其校正方法
公开(公告)号：US08378863B2
公开(公告)日：2013-02-19
申请号：US13040062
申请日：2011-03-03
申请人： Kiyoshi Ishikawa
发明人： Kiyoshi Ishikawa
IPC分类号： H03M1/06
CPC分类号： H03M1/00 , H03M1/0607 , H03M1/468 , H03M1/68 , H03M1/804
摘要： An analog-to-digital (AD) converter device, includes: a capacitive digital-to-analog converter (DAC) including a reference capacitor group having capacitors which are weighted with a ratio, one terminal of each of the capacitors being coupled to a common signal line, the other terminal of each of the capacitors being coupled to one of reference power supplies via one of switches; a comparator to compare a voltage of the common signal line with a reference voltage; a successive approximation routine circuit to control the switches based on a comparison result of the comparator; an offset correction circuit to correct an offset of the comparator; and a DAC correction circuit to correct an error in a voltage change of the common signal line, the offset correction circuit and the DAC correction circuit performing a correction so that a residual offset of the comparator and a residual error of the capacitive DAC cancel.
摘要翻译：一种模拟数字（AD）转换器装置，包括：电容性数模转换器（DAC），包括具有以比例加权的电容器的参考电容器组，每个电容器的一个端子耦合到公共信号线，每个电容器的另一个端子经由开关中的一个耦合到参考电源之一; 将公共信号线的电压与参考电压进行比较的比较器; 基于比较器的比较结果控制开关的逐次逼近程序电路; 偏移校正电路，用于校正比较器的偏移; 以及DAC校正电路，用于校正公共信号线，偏移校正电路和DAC校正电路的电压变化中的误差，执行校正，使得比较器的残余偏移和电容性DAC的残留误差被抵消。

16. 发明申请

US20060127799A1 Method for forming resist pattern and resist pattern 审中-公开
标题翻译：形成抗蚀剂图案和抗蚀剂图案的方法
公开(公告)号：US20060127799A1
公开(公告)日：2006-06-15
申请号：US10537162
申请日：2003-12-02
申请人： Naotaka Kubota , Kiyoshi Ishikawa , Mitsuru Sato , Tasuku Matsumiya , Kazuhiro Fujii , Kenichi Sato
发明人： Naotaka Kubota , Kiyoshi Ishikawa , Mitsuru Sato , Tasuku Matsumiya , Kazuhiro Fujii , Kenichi Sato
IPC分类号： G03C1/76
CPC分类号： G03F7/32 , G03F7/0397 , G03F7/40
摘要： A resist pattern forming method which can prevent a fine resist pattern from collapsing in a drying step after a development treatment in case of forming a resist pattern is provided. This method comprises applying a positive resist composition comprising a resin component (A), which has an alkali-soluble unit content of less than 20 mol % and also has an acid dissociable dissolution inhibiting group, alkali solubility thereof being enhanced by action of acid, an acid generator component (B) which generates an acid under exposure, and an organic solvent (C) which dissolves the components (A) and (B) on a substrate; subjecting the resulting film to prebaking, selective exposure, post exposure baking and alkali development; performing a displacing step of displacing a liquid existing on the substrate with a displacing liquid at least one time; displacing the displacing liquid with a liquid for critical drying; and performing a drying step of drying the liquid for critical drying via a critical state.
摘要翻译：提供了抗蚀剂图案形成方法，其可以在形成抗蚀剂图案的情况下，在显影处理之后，在干燥步骤中防止细小的抗蚀剂图案塌陷。该方法包括涂布含有碱溶性单元含量小于20摩尔％的树脂成分（A）的正型抗蚀剂组合物，并且还具有酸解离溶解抑制基团，其碱溶性通过酸的作用而增强，产生暴露酸的酸产生剂组分（B）和在基材上溶解组分（A）和（B）的有机溶剂（C）; 对所得膜进行预烘烤，选择性曝光，曝光后烘烤和碱显影; 执行置换步骤，用置换液体至少一次移动存在于基板上的液体; 用液体移动置换液体进行临界干燥; 并执行干燥步骤，用于通过临界状态干燥用于临界干燥的液体。

17. 发明授权

US6083665A Photoresist laminate and method for patterning using the same 有权
标题翻译：光刻胶层压板和使用其的图案化方法
公开(公告)号：US6083665A
公开(公告)日：2000-07-04
申请号：US273262
申请日：1999-03-22
申请人： Mitsuru Sato , Katsumi Oomori , Etsuko Iguchi , Kiyoshi Ishikawa , Fumitake Kaneko , Toshimasa Nakayama
发明人： Mitsuru Sato , Katsumi Oomori , Etsuko Iguchi , Kiyoshi Ishikawa , Fumitake Kaneko , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/038 , G03F7/09 , G03F7/11 , H01L21/027 , H01L21/302 , H01L21/3065 , G03F7/40
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus, patterning is conducted on a photo-resist laminate comprising (a) a substrate; (b) a specific anti-reflection coating layer formed on one surface of the substrate; and (c) a photoresist layer formed on the anti-reflection coating layer from a specific negative-working chemical-sensitization photoresist composition. The patterning procedure comprises the steps of: (A) exposing, pattern-wise to actinic rays, the photoresist layer of the photoresist laminate; (B) subjecting the photoresist layer to a heat treatment; (C) subjecting the photoresist layer to a development treatment to dissolve away the photoresist layer in the areas unexposed to actinic rays in step (A) so as to expose bare the anti-reflection coating layer in the areas unexposed to the actinic rays leaving a patterned resist layer in the areas exposed to the actinic rays; and (D) removing the pattern-wise exposed anti-reflection coating layer by dry etching with the patterned photoresist layer as a mask.
摘要翻译：提出了在基板上的图案化抗蚀剂层的光刻形成，而不会由于基板表面上的曝光光的反射而引起的问题。因此，在包含（a）基材的光致抗蚀剂层压体上进行图案化; （b）形成在所述基板的一个表面上的特定抗反射涂层; 和（c）由特定的负性化学增感光致抗蚀剂组合物形成在抗反射涂层上的光致抗蚀剂层。图案化步骤包括以下步骤：（A）以光致抗蚀剂层压板的光致抗蚀剂层将光致抗蚀剂层以图形方式曝光于光化射线; （B）对光致抗蚀剂层进行热处理; （C）在步骤（A）中对光致抗蚀剂层进行显影处理以将光致抗蚀剂层溶解在未暴露于光化射线的区域中，以便露出未暴露于光化离子的区域中的防反射涂层在暴露于光化射线的区域中的图案化抗蚀剂层; 和（D）通过用图案化的光致抗蚀剂层作为掩模的干蚀刻去除图案化的曝光的抗反射涂层。

18. 发明授权

US5941839A Rotary apparatus 失效
标题翻译：旋转装置
公开(公告)号：US5941839A
公开(公告)日：1999-08-24
申请号：US941329
申请日：1997-09-30
申请人： Kiyoshi Ishikawa
发明人： Kiyoshi Ishikawa
IPC分类号： A61H1/00 , A61M16/00 , A61M1/00
CPC分类号： A61H1/001 , A61H2201/107
摘要： A rotary apparatus gives a patient a rotational motion at a discretionary controlled speed suitable to medical treatment and at the same time can continuously supply the patient in rotation with oxygen for inhalation by means of oxygen supply equipment. The apparatus is characterized in that a chair 1 on which a patient is sitting is driven, via a rotary shaft 6, by a driving system 3 installed in a control base 2 to rotate, and oxygen for inhalation to be supplied to the patient in rotation is guided to pass through the interior of the rotary shaft 6 and supplied by a mouthpiece 23 provided at the top end of an oxygen supply tube 21 to a position suitable for the patient to breathe.
摘要翻译：旋转装置以适合于医疗处理的任意控制速度向患者提供旋转运动，并且同时可以通过氧气供应设备连续向患者提供用于吸入的氧气。该装置的特征在于，通过旋转轴6通过安装在控制基座2中的驱动系统3驱动患者坐在其上的椅子1以旋转，并且吸入氧气被提供给患者旋转被引导通过旋转轴6的内部并由设置在供氧管21的顶端的接口管23供给到适合于患者呼吸的位置。

19. 发明授权

US5928837A Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds 失效
标题翻译：包含肟磺酸盐化合物的负性化学增感光致抗蚀剂组合物
公开(公告)号：US5928837A
公开(公告)日：1999-07-27
申请号：US987023
申请日：1997-12-09
申请人： Mitsuru Sato , Kiyoshi Ishikawa , Yoshiki Sugeta , Hiroyuki Yamazaki , Toshikazu Tachikawa , Hiroshi Komano
发明人： Mitsuru Sato , Kiyoshi Ishikawa , Yoshiki Sugeta , Hiroyuki Yamazaki , Toshikazu Tachikawa , Hiroshi Komano
IPC分类号： G03F7/004 , G03F7/038 , H01L21/027 , G03C1/492
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Proposed is a novel negative-working chemical-sensitization photoresist composition used in the photolithographic patterning work for the manufacture of semiconductor devices and the like and capable of giving a patterned resist layer with high sensitivity and pattern resolution as well as excellent heat resistance and excellently orthogonal cross sectional profile of the patterned resist layer. The composition comprises, as a uniform solution:(A) 100 parts by weight of an alkali-soluble resin which is a polyhydroxystyrene-based resin having a weight-average molecular weight of at least 2000;(B) from 3 to 70 parts by weight of an acid-crosslinkable compound which is an amino resin having hydroxyalkyl and/or alkoxyalkyl groups;(C) from 0.5 to 30 parts by weight of a radiation-sensitive acid-generating compound selected from several types of specific oximesulfonate compounds; and(D) from 0.5 to 10 parts by weight of a phenolic compound, such as benzophenone compounds, having at least four hydroxyl groups in a molecule and a molecular weight smaller than 2000.
摘要翻译：提出了用于制造半导体器件等的光刻图案化工作中的新颖的负极化学增感光致抗蚀剂组合物，并且能够提供具有高灵敏度和图案分辨率的图案化抗蚀剂层以及优异的耐热性和良好的正交图案化抗蚀剂层的横截面轮廓。该组合物包含作为均匀溶液：（A）100重量份作为重均分子量为至少2000的聚羟基苯乙烯类树脂的碱溶性树脂; （B）3〜70重量份作为具有羟烷基和/或烷氧基烷基的氨基树脂的酸交联性化合物; （C）0.5〜30重量份选自几种特定肟磺酸酯化合物的辐射敏感产酸化合物; 和（D）0.5〜10重量份在分子中具有至少四个羟基并且分子量小于2000的酚类化合物，例如二苯甲酮化合物。

20. 发明授权

US5789136A Negative-working photoresist composition 失效
标题翻译：负性光刻胶组合物
公开(公告)号：US5789136A
公开(公告)日：1998-08-04
申请号：US626147
申请日：1996-04-05
申请人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Fumitake Kaneko
发明人： Mitsuru Sato , Katsumi Oomori , Kiyoshi Ishikawa , Etsuko Iguchi , Fumitake Kaneko
IPC分类号： G03F7/004 , G03F7/038 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/128
摘要： Proposed is an alkali-developable negative-working photoresist composition in the form of a solution capable of exhibiting high sensitivity and greatly improved stability of the resist layer of the composition on a substrate surface after pattern-wise exposure to actinic rays and kept for a substantial length of time before further processing. The photoresist composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a copolymer of hydroxystyrene and styrene; (b) a compound capable of releasing an acid when irradiated with actinic rays such as tris(2,3-dibromopropyl) isocyanurate; (c) a crosslinking agent selected from the group consisting of melamine resins and urea resins substituted at the N-positions by methylol groups, alkoxy methyl groups or a combination thereof; and (d) a sensitivity improver which is hexa(methoxymethyl) melamine or di(methoxymethyl) urea, each in a specified proportion.
摘要翻译：提出了一种可显影的负性光致抗蚀剂组合物，其形式为能够显示出高灵敏度并且大大提高组合物的抗蚀剂层在图案形式暴露于光化射线之后在基材表面上的稳定性，并保持基本上进一步处理之前的时间长短。光致抗蚀剂组合物包含作为必要成分的（a）碱溶性树脂，例如羟基苯乙烯和苯乙烯的共聚物; （b）当用诸如三（2,3-二溴丙基）异氰脲酸酯的光化射线照射时能够释放酸的化合物; （c）选自三聚氰胺树脂和在N-位被羟甲基取代的尿素树脂的交联剂，烷氧基甲基或其组合; 和（d）灵敏度改进剂，其为六（甲氧基甲基）三聚氰胺或二（甲氧基甲基）脲，各自为特定比例。

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