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1. 发明专利

JP2003295768A Seal for cheering sport 审中-公开
标题翻译：密封运动
公开(公告)号：JP2003295768A
公开(公告)日：2003-10-15
申请号：JP2002136284
申请日：2002-04-04
申请人： Toshiyuki Ogata , 俊幸尾形
发明人： OGATA TOSHIYUKI
IPC分类号： G09F3/10
摘要： PROBLEM TO BE SOLVED: To provide a so-called face-printing method for painting a national flag or a flag showing belonging on the face, which is used for cheering sport, in an easily usable form. SOLUTION: A seal for cheering sport itself is constituted of an inclination (3) provided on one surface of a sheet (1) and a printed surface (2) on which optional printing form is applied, and it is used in such constitution that, on the optionally printed surface, the national flag and a design for expressing a team, a pattern expressing a mass-meeting character or the like are printed, and when cheering the sport, the seal can be peeled and stuck on an optional place of a body such as a face, clothes and a cap, and further, an advertisement printed surface (4) is also provided on the printed surface (2) on which the optional printing form is applied and a name and a logos of a sponsor, cheering letters or the like are printed on the advertisement printed surface (4). COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种所谓的面部印刷方法，用于以易于使用的形式绘制用于欢呼运动的表面上的归属的国旗或旗帜。解决方案：用于欢呼运动的密封件本身由设置在片材（1）的一个表面上的倾斜（3）和在其上施加任选印刷形式的印刷表面（2）构成，并且在其中使用在可选择地印刷的表面上，打印国旗和表达团队的设计的结构，打印表示大会的字符等的图案，并且当欢呼运动时，可以将密封件剥离并粘贴在可选的诸如面部，衣服和帽子的身体的位置，并且还在印刷表面（2）上设置广告印刷表面（4），在该表面上应用可选的打印形式，并且其名称和标志赞助商，欢呼字母等印刷在广告印刷表面上（4）。版权所有（C）2004，JPO

2. 发明授权

US07993706B2 Method of forming a nano-structure and the nano-structure 失效
标题翻译：形成纳米结构和纳米结构的方法
公开(公告)号：US07993706B2
公开(公告)日：2011-08-09
申请号：US11628793
申请日：2005-06-08
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
IPC分类号： B82B3/00 , C01B33/12 , H01L21/027
CPC分类号： G03F7/405 , H01L21/0272 , Y10T428/24802
摘要： A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
摘要翻译：形成纳米结构的方法可以容易地形成精细图案，并且提供通过该方法获得的纳米结构。使用形成纳米结构的方法，包括通过在形成在基板上的模板的表面上的液相吸附形成薄膜，以及去除薄膜的一部分，以及去除模板。

3. 发明授权

US07943284B2 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern 失效
标题翻译：化合物，溶解抑制剂，正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07943284B2
公开(公告)日：2011-05-17
申请号：US11911341
申请日：2006-04-17
申请人： Daiju Shiono , Taku Hirayama , Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
发明人： Daiju Shiono , Taku Hirayama , Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , C07J9/00 , G03F7/0045 , Y10S430/106
摘要： A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.
摘要翻译：提供了用于形成高分辨抗蚀剂图案的正型抗蚀剂组合物和形成抗蚀剂图案的方法，其使用低分子量材料作为基础组分，并且化合物和溶解抑制剂各自适用于阳性型抗蚀剂组合物。这里，该化合物是分子量为500〜3000的非聚合物，在酸的作用下分解，生成分子量为200以上的分解产物的2个以上分子; 该溶解抑制剂包含该化合物; 正型抗蚀剂组合物包含化合物和酸产生剂组分; 并且形成抗蚀剂图案的方法使用正型抗蚀剂组合物。

4. 发明授权

US07932013B2 Pattern coating material and pattern forming method 有权
标题翻译：图案涂层材料和图案形成方法
公开(公告)号：US07932013B2
公开(公告)日：2011-04-26
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

5. 发明申请

US20110065858A1 Adhesive composition and adhesive film 审中-公开
标题翻译：粘合剂组合物和粘合剂膜
公开(公告)号：US20110065858A1
公开(公告)日：2011-03-17
申请号：US12924583
申请日：2010-09-29
申请人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
发明人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
IPC分类号： C09J133/24
CPC分类号： C09J133/064
摘要： An adhesive composition of the present invention includes a polymer as a main component. The polymer is produced by copolymerization of a monomer composition which includes chain-structured alkyl (meth)acrylate and a monomer containing a maleimide group. This makes it possible to provide an adhesive composition used for forming an adhesive layer in which adhesive strength is kept in a high temperature environment. That is, it becomes possible to provide an adhesive composition that allows forming an adhesive layer which has high adhesive strength in a high temperature environment (particularly at 200° C. to 250° C.).
摘要翻译：本发明的粘合剂组合物包括聚合物作为主要成分。聚合物通过包含链状结构的（甲基）丙烯酸烷基酯和含有马来酰亚胺基团的单体的单体组合物的共聚来制备。这使得可以提供用于形成粘合剂层的粘合剂组合物，其中粘合强度保持在高温环境中。也就是说，可以提供一种粘合剂组合物，其可以在高温环境（特别是在200℃至250℃）下形成具有高粘合强度的粘合剂层。

6. 发明授权

US07888617B2 Controller for wire-cut electrical discharge machine 有权
标题翻译：线切割放电机控制器
公开(公告)号：US07888617B2
公开(公告)日：2011-02-15
申请号：US12044184
申请日：2008-03-07
申请人： Kaoru Hiraga , Toshiyuki Ogata
发明人： Kaoru Hiraga , Toshiyuki Ogata
IPC分类号： B23H7/02 , B23H7/20
CPC分类号： B23H7/065 , B23H7/20
摘要： In a reference (n-th) machining pass, the wire travels along a machining route RTn and passes through a reentrant angular corner with wire position WMn, producing a workpiece edge Hn. In the following (n+1)-th machining pass, the wire travels along a machining route RTn+1, but the straight sections preceding and following the corner are replaced with a circular arc route so that the wire passes smoothly through a straight route, then a circular arc route, and then a straight route. The radius of curvature of the circular arc route is determined in the controller on the basis of the difference between the offset specified for the reference (n-th) machining pass and the offset specified for the (n+1)-th pass in which the circular arc route is inserted. Accordingly, the machining margin does not increase in the reentrant angular corner and the machining accuracy is thereby improved.
摘要翻译：在参考（第n）个加工道次中，线沿着加工路径RTn行进，并通过具有线位置WMn的可重入角角，产生工件边缘Hn。在下面的第（n + 1）次加工中，线沿着加工路径RTn + 1行进，但是角部前后的直线部分被圆弧路线替代，使得线材顺利地通过直线路线，然后是圆弧路线，然后是直线路线。圆弧路径的曲率半径基于对第（n）个加工通过指定的偏移与第（n + 1）次通过指定的偏移量之间的差异，在控制器中确定，其中插入圆弧路线。因此，在凹入角角中的加工余量不增加，从而提高了加工精度。

7. 发明授权

US07851127B2 Polymer compound, positive resist composition and resist pattern forming method 有权
标题翻译：高分子化合物，正性抗蚀剂组合物和抗蚀剂图案形成方法
公开(公告)号：US07851127B2
公开(公告)日：2010-12-14
申请号：US11576518
申请日：2005-09-22
申请人： Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
发明人： Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0397 , C08F220/28 , Y10S430/106 , Y10S430/114 , Y10S430/146
摘要： The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.
摘要翻译：本发明涉及包含至少一种选自由以下通式（A0-1），（A0-2），（A0-3）和（A0-3）和（A0-3）表示的结构单元组成的组的组成单元（a0） A0-4）[其中R表示氢原子或低级烷基]，以及由具有酸解离溶解抑制基团的（α-低级烷基）丙烯酸酯衍生的构成单元（a1）。

8. 发明授权

US07723007B2 Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method 有权
标题翻译：高分子化合物，包含高分子化合物的光致抗蚀剂组合物和抗蚀图案形成方法
公开(公告)号：US07723007B2
公开(公告)日：2010-05-25
申请号：US10589681
申请日：2005-01-28
申请人： Toshiyuki Ogata , Syogo Matsumaru , Yohei Kinoshita , Hideo Hada , Daiju Shiono , Hiroaki Shimizu , Naotaka Kubota
发明人： Toshiyuki Ogata , Syogo Matsumaru , Yohei Kinoshita , Hideo Hada , Daiju Shiono , Hiroaki Shimizu , Naotaka Kubota
IPC分类号： G03F7/004 , C07C61/26 , C08F32/08
CPC分类号： G03F7/0397 , C07C69/54 , C07C2603/74 , C08F220/28 , C08F290/06 , C08F290/061 , C09D133/14 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition. The photoresist composition and the resist pattern formation method use the polymer compound including an alkali soluble group (i), wherein the alkali soluble group (i) is at least one substituent group selected from an alcoholic hydroxyl group, a carboxyl group, or a phenolic hydroxyl group, and the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): —CH2—OCH2nR1 (1) (wherein R1 represents a cycloaliphatic group which contains no more than 20 carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom, and n represents 0 or an integer of 1 to 5).
摘要翻译：本发明提供一种高分子化合物，其可以构成光刻胶组合物，其能够具有优异的分辨率，形成具有良好矩形性的精细图案，即使酸产生器产生的酸的酸强弱也能获得良好的抗蚀特性，并具有良好的灵敏度; 包含该高分子化合物的光致抗蚀剂组合以及使用光致抗蚀剂组合物的抗蚀剂图案形成方法。光致抗蚀剂组合物和抗蚀剂图案形成方法使用包含碱溶性基团（i）的高分子化合物，其中碱溶性基团（i）为选自醇羟基，羧基或酚类中的至少一个取代基羟基，取代基被通过通式（1）表示的酸解离的溶解抑制基团（ⅱ）保护：-CH 2 -OCH 2 n R 1（1）（其中R 1表示含有不多于20个碳的脂环族基团原子，可以含有氧原子，氮原子，硫原子或卤素原子，n表示0或1〜5的整数。

9. 发明申请

US20100119860A1 STEEL PIPE EXCELLENT IN DEFORMATION CHARACTERISTICS AND METHOD OF PRODUCING THE SAME 有权
标题翻译：钢管在变形特性方面表现出色，其生产方法也是如此
公开(公告)号：US20100119860A1
公开(公告)日：2010-05-13
申请号：US12452765
申请日：2008-07-22
申请人： Asahi Hitoshi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
发明人： Asahi Hitoshi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
IPC分类号： B32B1/08 , C22C38/58 , C22C38/42 , C22C38/54 , C21D9/08 , C22C38/04
CPC分类号： C22C38/04 , C21D8/105 , C21D9/08 , Y10T428/12292
摘要： The invention provides a steel pipe excellent in deformation characteristics, most notably a steel pipe for expandable-pipe oil well and a low-yield-ratio line pipe, and a method of producing the same without conducting water cooling requiring large-scale heat treatment equipment, namely a method of producing a steel pipe excellent in deformation characteristics whose microstructure is a two-phase structure including a martensite-austenite constituent at an area fraction of 2 to 10% and a soft phase, which method comprises: heating at Ac1+10° C. to Ac1+60° C. and thereafter cooling a precursor steel pipe which contains, in mass %, C: 0.04 to 0.10% and Mn: 1.00 to 2.50%, is limited to Si: 0.80% or less, P: 0.03% or less, S: 0.01% or less, Al: 0.10% or less and N: 0.01% or less, further contains one or more of Ni: 1.00% or less, Mo: 0.60% or less, Cr: 1.00% or less and Cu: 1.00% or less, where content of Mn and content of one or more of Cr, Ni, Mo and Cu satisfy Mn+Cr+Ni+2Mo+Cu≧2.00, and a balance of iron and unavoidable impurities.
摘要翻译：本发明提供一种变形特性优异的钢管，特别是可膨胀管油管用钢管和低屈服比管线管，以及不进行需要大型热处理设备的水冷却的制造方法即具有优异的变形特性的钢管的制造方法，其特征在于微结构为包含2〜10％面积分数的马氏体 - 奥氏体组分和软相的两相组织，该方法包括：在Ac1 + 10 ℃至Ac1 + 60℃，然后将质量％C：0.04〜0.10％，Mn：1.00〜2.50％的前体钢管冷却至Si：0.80％以下，P： 0.03％以下，S：0.01％以下，Al：0.10％以下，N：0.01％以下，还含有Ni：1.00％以下，Mo：0.60％以下，Cr：1.00％以下，Cu：1.00％以下，其中，Cr，Ni，Mo，Cu中的一种以上的Mn含量满足Mn + Cr + Ni + 2Mo +Cu≥2.00，和铁和不可避免的杂质的平衡。

10. 发明授权

US07700259B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern 有权
标题翻译：高分子化合物，含有该高分子化合物的光致抗蚀剂组合物，以及形成抗蚀剂图案的方法
公开(公告)号：US07700259B2
公开(公告)日：2010-04-20
申请号：US11578189
申请日：2005-04-05
申请人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
发明人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
IPC分类号： G03C1/00 , C07C69/74
CPC分类号： C08F220/28 , C07C69/54 , C07C2601/14 , C08F222/1006 , C08F232/08 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
摘要翻译：化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法图案，能够以高分辨率形成精细图案。高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基，（1）表示的化合物（式中，A表示1〜20个碳原子的至少n + 1的有机基团，n表示1〜4的整数）。

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