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11. 发明申请

US20110232058A1 CHAMBER REPLACING METHOD 有权
标题翻译：室更换方法
公开(公告)号：US20110232058A1
公开(公告)日：2011-09-29
申请号：US13152369
申请日：2011-06-03
申请人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B23P6/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

12. 发明授权

US07067832B2 Extreme ultraviolet light source 有权
标题翻译：极紫外光源
公开(公告)号：US07067832B2
公开(公告)日：2006-06-27
申请号：US10489431
申请日：2003-04-04
申请人： Hakaru Mizoguchi , Akira Endo , Hirokazu Tanaka
发明人： Hakaru Mizoguchi , Akira Endo , Hirokazu Tanaka
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit (23) that applies a charge to the target (22), and an acceleration unit (24) which accelerates the charged target (22) using an electromagnetic field. The target supply device supplies the target (22) comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO2) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.
摘要翻译：一种极紫外光源装置，其可以增加工作距离并获得高输出的极紫外光。极紫外光源装置通过用来自驱动激光装置（25）的激光照射靶（22）来产生等离子体，并产生波长为几纳米至几十纳米的极紫外（EUV）光。所述极紫外光源装置具备目标供给装置，所述目标供给装置具有向所述目标物（22）施加电荷的电荷施加部（23）;以及使用电磁场来加速所述充电对象（22）的加速部（24）。目标供给装置供给由氙（Xe）等稀有气体元素或锂（Li），锡（Sn），氧化锡（SnO 2）等金属构成的靶（22） / SUB>）等，作为电离分子，包含多个原子的原子或质量，或作为电离团簇。

13. 发明申请

US20050205803A1 Light source device and exposure equipment using the same 有权
标题翻译：光源设备和曝光设备使用相同
公开(公告)号：US20050205803A1
公开(公告)日：2005-09-22
申请号：US10806812
申请日：2004-03-22
申请人： Hakaru Mizoguchi
发明人： Hakaru Mizoguchi
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/008
摘要： A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying a material which becomes the target; a laser unit including an oscillation stage laser having a lower-order transverse mode and at least one amplification stage laser for amplifying a lower-order transverse mode laser beam generated by the oscillation stage laser, for irradiating the target with the amplified laser beam to generate plasma; and a collection optical system for collecting the extreme ultra violet light emitted from the plasma to output the collected extreme ultra violet light.
摘要翻译：光源装置具有较小的光通量，从而可以抽出大功率并且受到较少的碎片损伤。用于通过用激光束照射目标来产生极紫外光的光源装置包括用于供应成为靶的材料的目标供给单元; 激光单元，其包括具有低级横模的振荡级激光器和至少一个放大级激光器，用于放大由振荡级激光器产生的低阶横模激光束，用放大的激光束照射目标，以产生等离子体; 以及用于收集从等离子体发射的极紫外光以输出所收集的极紫外光的收集光学系统。

14. 发明授权

US06839373B1 Ultra-narrow band flourine laser apparatus 有权
标题翻译：超窄带激光设备
公开(公告)号：US06839373B1
公开(公告)日：2005-01-04
申请号：US09608964
申请日：2000-06-30
申请人： Kiwamu Takehisa , Hakaru Mizoguchi , Shinji Nagai , Tatsumi Gotou
发明人： Kiwamu Takehisa , Hakaru Mizoguchi , Shinji Nagai , Tatsumi Gotou
IPC分类号： H01S3/223 , B23K26/06 , H01S3/00 , H01S3/08 , H01S3/097 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/10092 , B23K26/064 , B23K26/0643 , B23K26/0648 , H01S3/005 , H01S3/08059 , H01S3/097 , H01S3/225 , H01S3/2325 , H01S3/2366
摘要： An ultra-narrow band fluorine laser apparatus is provided in which a line width of a fluorine laser can be narrowed to about 0.2 to 0.3 pm without using any band-narrowing element such as an etalon. In an oscillator 11, a laser chamber 15 is provided in a stable type resonator constituted by an output mirror 13 and a totally reflecting mirror 14. The laser chamber 15 is filled with a laser gas at about 0.8 atm. As a result, when discharge is caused in the laser chamber 15 to cause laser oscillation, laser light L10 in a bandwidth of about 0.3 pm is provided. The power of the laser light L10 is increased by an amplifier 12. The amplifier 12 emits laser light L20 in a bandwidth of about 0.3 pm having laser energy of 10 mJ or more.

15. 发明授权

US6130904A Gas supplementation method of excimer laser apparatus 失效
标题翻译：准分子激光装置的气体补充方法
公开(公告)号：US6130904A
公开(公告)日：2000-10-10
申请号：US669332
申请日：1996-06-20
申请人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
发明人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
IPC分类号： H01S3/036 , H01S3/104 , H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/225 , H01S3/104 , H01S3/134
摘要： In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.
摘要翻译： PCT No.PCT / JP94 / 02187 Sec。 371日期：1996年6月20日 102（e）日期1996年6月20日PCT 1994年12月22日PCT PCT。公开号WO95 / 18477 日期：1995年6月7日在激光振荡前将卤素气体，稀有气体和缓冲气体供给到激光室的准分子激光装置中，计算振荡停止时间，如果计算出的振荡停止时间超过规定时间使用计算出的振荡停止时间来计算包含稀有气体或缓冲气体的混合气体的进料量，并且在激光振荡之前将所述混合气体以计算的进料量进料; 从激光振荡的初始阶段得到稳定的激光输出。

16. 发明授权

US5663977A Gas laser apparatus 失效
标题翻译：气体激光设备
公开(公告)号：US5663977A
公开(公告)日：1997-09-02
申请号：US619530
申请日：1996-03-19
申请人： Junichi Fujimoto , Hakaru Mizoguchi
发明人： Junichi Fujimoto , Hakaru Mizoguchi
IPC分类号： H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036
摘要： A gas laser apparatus is operated in such a manner that gas supplied to a laser chamber is excited for laser oscillation. A cabinet (11) which houses gas containers (12 and 13) is located adjacent to the laser oscillator (1) or integrated with it, The piping for the laser gas is incorporated in the cabinet, Such a structure realizes an economical laser of stabilized performance and easy maintenance.
摘要翻译： PCT No.PCT / JP94 / 01600 Sec。 371日期：1996年3月19日 102（e）1996年3月19日PCT PCT 1994年9月28日PCT公布。公开号WO95 / 09460 日期1995年04月6日气体激光装置的操作是这样一种方式使得供应给激光室的气体被激发用于激光振荡。容纳气体容器（12和13）的机柜（11）位于激光振荡器（1）附近或与其一体化的地方，激光气体的管道被并入机柜中，这种结构实现了经济的激光器性能好，维护方便。

17. 发明授权

US5373523A Excimer laser apparatus 失效
标题翻译：准分子激光装置
公开(公告)号：US5373523A
公开(公告)日：1994-12-13
申请号：US136448
申请日：1993-10-14
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
IPC分类号： H01S3/034 , H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/0346 , H01S3/036 , H01S3/225
摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).
摘要翻译：准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性从管道连接泄漏。准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

18. 发明申请

US20120228527A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 审中-公开
标题翻译：极光紫外线光源设备
公开(公告)号：US20120228527A1
公开(公告)日：2012-09-13
申请号：US13477940
申请日：2012-05-22
申请人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G21K5/02
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

19. 发明授权

US08212228B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08212228B2
公开(公告)日：2012-07-03
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

20. 发明授权

US07984539B2 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US07984539B2
公开(公告)日：2011-07-26
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

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