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1. 发明授权

US08813329B2 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US08813329B2
公开(公告)日：2014-08-26
申请号：US13152369
申请日：2011-06-03
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

2. 发明申请

US20080115342A1 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US20080115342A1
公开(公告)日：2008-05-22
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B21D39/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

3. 发明授权

US07984539B2 Chamber replacing method 有权
标题翻译：室更换方法
公开(公告)号：US07984539B2
公开(公告)日：2011-07-26
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

4. 发明授权

US5291509A Gas laser apparatus 失效
标题翻译：气体激光设备
公开(公告)号：US5291509A
公开(公告)日：1994-03-01
申请号：US911137
申请日：1992-07-09
申请人： Hakaru Mizoguchi , Junichi Fujimoto , Yoshiho Amada
发明人： Hakaru Mizoguchi , Junichi Fujimoto , Yoshiho Amada
IPC分类号： H01S3/03 , F16C33/76 , F16J15/43 , H01S3/036
CPC分类号： H01S3/036 , F16C33/765 , F16J15/43
摘要： A gas laser apparatus in which a gas medium in a case and a lubricant for bearings supporting a blower for circulating the gas medium are isolated from each other, so that the lubricant can be prevented from mixing into the gas medium while no substantially large resistance is applied to the blower drive. To isolate the gas medium and the lubricant, magnetic fluid shaft seals (10, 11) are used for sealing between the lubricant for the bearings (6) for supporting rotation shafts (3a, 3b) of the blower (3) and the gas medium in the case (1).
摘要翻译：一种气体激光装置，其中壳体中的气体介质和支撑用于使气体介质循环的鼓风机的轴承的润滑剂彼此隔离，使得可以防止润滑剂混入气体介质中，而基本上没有大的阻力是应用于鼓风机驱动。为了隔离气体介质和润滑剂，磁流体轴密封件（10,11）用于密封用于支撑鼓风机（3）的旋转轴（3a，3b）的轴承（6）的润滑剂和气体介质在（1）的情况下。

5. 发明授权

US6130904A Gas supplementation method of excimer laser apparatus 失效
标题翻译：准分子激光装置的气体补充方法
公开(公告)号：US6130904A
公开(公告)日：2000-10-10
申请号：US669332
申请日：1996-06-20
申请人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
发明人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
IPC分类号： H01S3/036 , H01S3/104 , H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/225 , H01S3/104 , H01S3/134
摘要： In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.
摘要翻译： PCT No.PCT / JP94 / 02187 Sec。 371日期：1996年6月20日 102（e）日期1996年6月20日PCT 1994年12月22日PCT PCT。公开号WO95 / 18477 日期：1995年6月7日在激光振荡前将卤素气体，稀有气体和缓冲气体供给到激光室的准分子激光装置中，计算振荡停止时间，如果计算出的振荡停止时间超过规定时间使用计算出的振荡停止时间来计算包含稀有气体或缓冲气体的混合气体的进料量，并且在激光振荡之前将所述混合气体以计算的进料量进料; 从激光振荡的初始阶段得到稳定的激光输出。

6. 发明授权

US5663977A Gas laser apparatus 失效
标题翻译：气体激光设备
公开(公告)号：US5663977A
公开(公告)日：1997-09-02
申请号：US619530
申请日：1996-03-19
申请人： Junichi Fujimoto , Hakaru Mizoguchi
发明人： Junichi Fujimoto , Hakaru Mizoguchi
IPC分类号： H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036
摘要： A gas laser apparatus is operated in such a manner that gas supplied to a laser chamber is excited for laser oscillation. A cabinet (11) which houses gas containers (12 and 13) is located adjacent to the laser oscillator (1) or integrated with it, The piping for the laser gas is incorporated in the cabinet, Such a structure realizes an economical laser of stabilized performance and easy maintenance.
摘要翻译： PCT No.PCT / JP94 / 01600 Sec。 371日期：1996年3月19日 102（e）1996年3月19日PCT PCT 1994年9月28日PCT公布。公开号WO95 / 09460 日期1995年04月6日气体激光装置的操作是这样一种方式使得供应给激光室的气体被激发用于激光振荡。容纳气体容器（12和13）的机柜（11）位于激光振荡器（1）附近或与其一体化的地方，激光气体的管道被并入机柜中，这种结构实现了经济的激光器性能好，维护方便。

7. 发明授权

US5373523A Excimer laser apparatus 失效
标题翻译：准分子激光装置
公开(公告)号：US5373523A
公开(公告)日：1994-12-13
申请号：US136448
申请日：1993-10-14
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
IPC分类号： H01S3/034 , H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/0346 , H01S3/036 , H01S3/225
摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).
摘要翻译：准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性从管道连接泄漏。准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

8. 发明授权

US06810061B2 Discharge electrode and discharge electrode manufacturing method 有权
标题翻译：放电电极和放电电极的制造方法
公开(公告)号：US06810061B2
公开(公告)日：2004-10-26
申请号：US10225286
申请日：2002-08-22
申请人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
发明人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0388 , H01S3/225
摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.
摘要翻译：在主放电电极的放电部分上形成膜。为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质主放电电极用于该膜。结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

9. 发明授权

US5450436A Laser gas replenishing apparatus and method in excimer laser system 失效
标题翻译：激光气体补充装置和准分子激光系统中的方法
公开(公告)号：US5450436A
公开(公告)日：1995-09-12
申请号：US154531
申请日：1993-11-19
申请人： Hakaru Mizoguchi , Junichi Fujimoto , Masahiko Kowaka , Tomokazu Takahashi
发明人： Hakaru Mizoguchi , Junichi Fujimoto , Masahiko Kowaka , Tomokazu Takahashi
IPC分类号： H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/225
摘要： A laser system which realizes its stable operation. In the system, a spectrum width of laser light dischargingly excited in a laser chamber is detected by a spectrum width monitor. A controller controls, on the basis of the detected spectrum width, a replenishment amount of gas to be replenished from an F2 gas cylinder into the laser chamber through a sub-tank and on-off valves to cause the spectrum width to become constant.Further, when replenishment of a halogen gas diluted with a buffer gas is carried out, a gas exhaustion step of keeping the internal total gas pressure of the laser chamber constant is omitted.In addition, a laser oscillation pulse number is counted for a predetermined period of time and a replenishment amount of the halogen gas is carried out according to the count value.
摘要翻译：实现其稳定运行的激光系统。在该系统中，通过光谱宽度监视器检测在激光室中放电激发的激光的光谱宽度。控制器基于检测到的频谱宽度，通过子箱和开关阀将从F2气瓶补充的气体的补充量控制到激光室，使得光谱宽度变得恒定。此外，当进行用缓冲气体稀释的卤素气体的补充时，省略了保持激光室内部总气体压力恒定的气体排出步骤。此外，激光振荡脉冲数被计数预定时间段，并且根据计数值执行卤素气体的补充量。

10. 发明申请

US20120119118A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

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