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11. 发明申请

US20140069007A1 PLANT GROWTH FACILITATING APPARATUS PLANT GROWTH FACILITATING APPARATUS 审中-公开
标题翻译：植物生长促进装置植物生长促进装置
公开(公告)号：US20140069007A1
公开(公告)日：2014-03-13
申请号：US13613137
申请日：2012-09-13
申请人： SHIH-CHANG CHEN , CHUN-LUNG CHIU , YUAN-PENG LEE , PO-HUNG LAI , YI-ZHENG LU
发明人： SHIH-CHANG CHEN , CHUN-LUNG CHIU , YUAN-PENG LEE , PO-HUNG LAI , YI-ZHENG LU
IPC分类号： A01G9/02
CPC分类号： A01G7/045 , A01G9/16 , Y02A40/254 , Y02P60/149
摘要： A plant growth facilitating apparatus, for receiving and growing a plant, includes an accommodating body and a light emitting unit. The accommodating body defines an accommodating space for receiving the plant. The light emitting unit has a first LED set for emitting a red light in increasing the growth speed of the plant and a second LED set for emitting a blue light in promoting the photosynthesis of the plant. The wavelength range of the red light is 620-760 nanometer, and the wavelength range of the blue light is 360-480 nanometer. The light emitting unit is used for emitting light toward the accommodating space of the accommodating body, and the longest path of the light from the light emitting unit to the accommodating body is smaller than 1 meter.
摘要翻译：用于接收和种植植物的植物生长促进装置包括容纳体和发光单元。容纳体限定用于接收植物的容纳空间。发光单元具有用于在增加设备的生长速度时发出红光的第一LED组和用于发射蓝光以促进植物的光合作用的第二LED组。红光的波长范围为620-760纳米，蓝光的波长范围为360-480纳米。发光单元用于向容纳体的容纳空间发射光，并且从发光单元到容纳体的光的最长路径小于1米。

12. 发明授权

US08547660B2 Magnetic write head manufactured by an enhanced damascene process producing a tapered write pole with a non-magnetic spacer and non-magnetic bump 有权
标题翻译：通过增强的镶嵌工艺制造的磁性写头，其产生具有非磁性间隔物和非磁性凸块的锥形写柱
公开(公告)号：US08547660B2
公开(公告)日：2013-10-01
申请号：US12641251
申请日：2009-12-17
申请人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3143 , G11B5/3146 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
摘要翻译：一种具有锥形后缘并具有磁性层的磁性写头，该磁性层形成在从ABS的凹陷处的写入极的后缘上，该磁性层通过薄的非磁性的方式与写入极的后缘分离层。薄的非磁性层优选地足够薄，使得磁性层可以在从ABS去除的区域中用作写入极的一部分。尾磁屏蔽形成在写极上，并且通过非磁性拖尾间隙层与写极分离。可以在磁性层之上形成非磁性间隔层，以在磁性层和尾部磁屏蔽之间提供额外的间隔。

13. 发明申请

US20130104388A1 NOVEL HIGH BEVEL ANGLE MAGNETIC WRITER POLE FABRICATION PROCESS 有权
标题翻译：新型高水平角度磁性写入器制造工艺
公开(公告)号：US20130104388A1
公开(公告)日：2013-05-02
申请号：US13285688
申请日：2011-10-31
申请人： Guomin Mao , Yi Zheng
发明人： Guomin Mao , Yi Zheng
IPC分类号： G11B5/84
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49067
摘要： Methods of making write poles for perpendicular magnetic recording write heads. The bevel angle of the write pole for a perpendicular magnetic recording write head affects the performance of the write head. By forming reinforcement layer on the polymeric underlayer mask to enhance the mask durability during ion mill and tapering the polymeric underlayer above the non-magnetic mill mask layer using oxygen and nitrogen based reactive ion etch process, the bevel angle of the magnetic write pole can be increased greatly to meet the demands of the next and future generations of magnetic recording write heads.
摘要翻译：制作垂直磁记录写磁头写磁极的方法。用于垂直磁记录写头的写入极的斜角影响写入头的性能。通过在聚合物底层掩模上形成增强层，以增强离子研磨过程中的掩模耐久性，并使用基于氧和氮的反应离子蚀刻工艺使非磁性研磨掩模层上方的聚合物底层逐渐变细，磁性写入极的斜角可以为大大增加，以满足下一代和下一代磁记录头的要求。

14. 发明申请

US20130081263A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE OF A PERPENDICULAR MAGNETIC WRITE HEAD USING NOVEL MASK FABRICATION 失效
标题翻译：使用新型掩模制造制造全磁性写磁头的磁性写入方法
公开(公告)号：US20130081263A1
公开(公告)日：2013-04-04
申请号：US13251082
申请日：2011-09-30
申请人： Guomin Mao , Sue Siyang Zhang , Yi Zheng
发明人： Guomin Mao , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write pole of a magnetic write head for perpendicular magnetic recording. A magnetic write pole material is deposited, followed by union milling hard mask, a polymer mask under-layer followed by a dielectric hard mask material, followed by a photoresist. The photoresist is patterned to define a write pole shape and the shape of the patterned photoresist is transferred onto the underlying dielectric hard mask by a novel reactive ion etching that is performed in a chemistry that includes one or more fluorine containing gases and He. The presence of He in the reactive ion etching tool helps to improve the profile of the patterned dielectric hard mask. In addition, RIE parameters such a gas ratio (e.g. CF4 to CHF3 gas ratio) and power ratio (e.g. source power to bias power) are adjusted to optimize the profile of the patterned dielectric mask.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的磁写磁极的方法。沉积磁性写入极材料，随后是联合铣削硬掩模，聚合物掩模底层，随后是电介质硬掩模材料，随后是光致抗蚀剂。光致抗蚀剂被图案化以限定写磁极形状，并且通过在包括一种或多种含氟气体和He的化学中进行的新型反应离子蚀刻将图案化光致抗蚀剂的形状转印到下面的电介质硬掩模上。反应离子蚀刻工具中He的存在有助于改善图案化电介质硬掩模的轮廓。此外，调整诸如气体比（例如CF4至CHF3气体比）和功率比（例如源功率与偏置功率）的RIE参数以优化图案化电介质掩模的轮廓。

15. 发明申请

US20120125883A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE USING A MULTI-LAYERED HARD MASK STRUCTURE 有权
标题翻译：使用多层硬掩模结构制造磁性写入点的方法
公开(公告)号：US20120125883A1
公开(公告)日：2012-05-24
申请号：US12953269
申请日：2010-11-23
申请人： Guomin Mao , Yi Zheng
发明人： Guomin Mao , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： H05K3/027 , G11B5/3116 , G11B5/3163 , H05K3/0073 , H05K2203/092
摘要： A method for manufacturing a magnetic write pole using a mask that includes a multi-layer hard mask. The multi-layer hard mask hard mask includes a first hard mask layer that is constructed of a Si containing material that can be spun on and a second hard mask material that is deposited by a deposition process such as sputter deposition. The first hard mask layer has optical properties that allow it to function well as a bottom anti-reflective coating (BARC) and also has optical properties that match well with an underlying image transfer layer. The second hard mask material has good selectivity for reactive ion etching so that it functions well as a RIE hard mask.
摘要翻译：一种使用包括多层硬掩模的掩模制造磁性写入极的方法。多层硬掩模硬掩模包括由可以纺丝的含Si材料构成的第一硬掩模层和通过诸如溅射沉积的沉积工艺沉积的第二硬掩模材料。第一个硬掩模层具有允许其作为底部抗反射涂层（BARC）的良好功能的光学性质，并且还具有与底层图像转印层良好匹配的光学性质。第二种硬掩模材料对反应离子蚀刻具有良好的选择性，因此其作为RIE硬掩模的功能很好。

16. 发明申请

US20120107645A1 METHOD FOR MANUFACTURING A SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD 有权
标题翻译：通过添加剂进行短期定义的方法
公开(公告)号：US20120107645A1
公开(公告)日：2012-05-03
申请号：US13339310
申请日：2011-12-28
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

17. 发明授权

US08136228B2 Method for manufacturing a magnetic write head 有权
标题翻译：磁写头制造方法
公开(公告)号：US08136228B2
公开(公告)日：2012-03-20
申请号：US12343713
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.
摘要翻译：一种用于制造写磁头的磁头的方法，其避免了写磁极定义期间与栅栏结构的形成有关的挑战。沉积磁性写入极材料。掩模结构沉积在磁性写入极材料上。掩模结构包括第一硬掩模，标记层，物理上坚固的无机RIEable图像转印层，图像转印层上方的第二硬掩模结构和在第二硬掩模上的光致抗蚀剂层。可以使用反应离子蚀刻工艺将光致抗蚀剂掩模和第二硬掩模层的图像转印到图像转印层上。执行离子铣削以限定写入极。沉积一层非磁性材料如氧化铝。进行离子研磨直到达到标记层，并执行另一反应离子蚀刻以除去剩余的硬掩模。

18. 发明申请

US20110319756A1 Method for Ultrasound Vibrometry Using Orthogonal Basis Functions 有权
标题翻译：使用正交基函数的超声波振幅法
公开(公告)号：US20110319756A1
公开(公告)日：2011-12-29
申请号：US13254227
申请日：2010-03-09
申请人： Yi Zheng , Aiping Yao , James F. Greenleaf , Shigao Chen , Matthew W. Urban
发明人： Yi Zheng , Aiping Yao , James F. Greenleaf , Shigao Chen , Matthew W. Urban
IPC分类号： A61B8/00
CPC分类号： G01S7/52036 , A61B8/485 , G01S7/52022 , G01S15/8952
摘要： A method for measuring a mechanical property of a subject includes using an ultrasound transducer to apply ultrasonic vibration pulses to a location in a subject in order to induce shear waves at multiple prescribed orthogonal frequencies in the subject. The ultrasound transducer is directed by an excitation signal that is composed of multiple orthogonal basis functions, each having a given frequency component corresponding to the prescribed orthogonal frequencies. The power level of each orthogonal basis function is independently adjustable. The excitation signal can be sparsely sampled, or portions of the excitation signal can be removed in order to improve tissue vibration and to provide for the interleaving ultrasonic vibration and detection pulses. Ultrasonic detection pulses are applied to at least one motion detection point, from which echo signals are received. From the received echo signals, a motion signal is determined, from which mechanical properties of the subject are calculated.
摘要翻译：用于测量受试者的机械性质的方法包括使用超声波换能器将超声波振动脉冲施加到受试者中的位置，以便在受试者中以多个规定的正交频率诱发剪切波。超声换能器由多个正交基函数组成的激励信号引导，每个正交基函数具有对应于规定正交频率的给定频率分量。每个正交基函数的功率电平是独立可调的。励磁信号可以被稀疏地采样，或者可以去除激励信号的部分，以便改善组织振动并提供交织超声波振动和检测脉冲。超声波检测脉冲被施加到至少一个运动检测点，从该运动检测点接收回波信号。从所接收的回波信号中，确定运动信号，从而计算被摄体的机械性质。

19. 发明授权

US08054586B2 Write head design and method for reducing adjacent track interference at very narrow track widths 有权
标题翻译：用于在非常窄的轨道宽度上减少相邻轨道干扰的写头设计和方法
公开(公告)号：US08054586B2
公开(公告)日：2011-11-08
申请号：US11286077
申请日：2005-11-23
申请人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49021
摘要： A perpendicular write head having a wrap around trailing shield for reducing stray field writing and adjacent track interference. A method for constructing such a write head allows for excellent control of side shield gap thickness and trailing shield gap thickness, and allows the ratio of side gap to trailing gap thicknesses to be maintained at about two to one as desired. The method includes depositing forming a write pole by constructing a mask which may include a bi-layer hard mask, and then ion milling to form the write pole. Once the write pole has been formed, a layer of alumina or some other non-magnetic material can be conformally deposited. A reactive ion mill (RIM) can be performed to open up the top of the write pole (remove the horizontally disposed portions of the alumina layer). Then, a second layer of alumina or some other non-magnetic material can be deposited, and the write pole can be plated. The thickness of the side shield gaps is defined by the sum of the final thicknesses of the first and second alumina layers, while the thickness of the first magnetic layer defines the thickness of the trailing shield gap.
摘要翻译：垂直写头，其具有围绕后屏蔽的卷绕，用于减少杂散场写入和相邻轨道干涉。用于构造这样的写头的方法允许对侧屏蔽间隙厚度和后屏蔽间隙厚度的优良控制，并且允许侧间隙与后间隙厚度的比率根据需要保持在大约二对一。该方法包括通过构成可包括双层硬掩模的掩模沉积形成写入极，然后进行离子铣削以形成写入极。一旦形成了写极，就可以共形沉积一层氧化铝或其它非磁性材料。可以执行反应离子磨（RIM）以打开写柱的顶部（去除氧化铝层的水平放置的部分）。然后，可以沉积第二层氧化铝或一些其它非磁性材料，并且可以对写入极进行电镀。侧屏蔽间隙的厚度由第一和第二氧化铝层的最终厚度之和限定，而第一磁性层的厚度限定了后屏蔽间隙的厚度。

20. 发明申请

US20110261485A1 MAGNETIC WRITE HEAD HAVING A WRAP AROUND TRAILING SHIELD WITH AN ASYMETRICAL SIDE GAP 有权
标题翻译：带有边界边缘的带有纹理的磁带头磁头
公开(公告)号：US20110261485A1
公开(公告)日：2011-10-27
申请号：US12766764
申请日：2010-04-23
申请人： Aron Pentek , Yi Zheng
发明人： Aron Pentek , Yi Zheng
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/23 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A magnetic write head having a magnetic write pole with a wrap around magnetic trailing shield. The wrap around magnetic trailing shield is separated by a first non-magnetic side gap at a first side of the write pole and by a second non-magnetic side gap at a second side of the write pole. The first second non-magnetic side gap is larger than the first non-magnetic side gap and is preferably at least twice the thickness of the first non-magnetic side gap. This design provides additional protection adjacent track interference at one side of the write pole and additional protection against magnetic write field loss at the other side of the write pole.
摘要翻译：一种具有磁性写磁极的磁性写头，其具有围绕磁性后屏蔽的环绕。绕磁屏蔽的缠绕由写磁极的第一侧的第一非磁性侧隙和写极的第二侧的第二非磁性侧间隙分开。第一第二非磁性侧间隙大于第一非磁性侧间隙，优选为第一非磁性侧间隙的厚度的至少两倍。该设计提供了额外的保护，在写入极的一侧附近有跟踪干扰，并且在写入极的另一侧具有额外的防磁磁场损耗的保护。

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