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1. 发明授权

US06245605B1 Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing 有权
标题翻译：在半导体器件制造中多金属栅极形成期间保护金属免于氧化的方法
公开(公告)号：US06245605B1
公开(公告)日：2001-06-12
申请号：US09369132
申请日：1999-08-05
申请人： Ming Hwang , Wei-Yung Hsu , Chih-Chen Cho , Dirk N. Anderson
发明人： Ming Hwang , Wei-Yung Hsu , Chih-Chen Cho , Dirk N. Anderson
IPC分类号： H01L218238
CPC分类号： H01L21/02164 , H01L21/02211 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/28061 , H01L21/28247 , H01L21/31662 , H01L21/32105 , H01L29/4983
摘要： A method for protecting metal (112) from oxidation during various oxidation steps such as CVD SiO2 oxidation for forming an overlying oxide layer (114), smile oxidation, and sidewall (116) deposition. The gas CO2 is added to the oxidation chemistry. The CO2/H2 ratio is controlled for selective oxidation. The metal (112) is effectively protected from oxidation due to the existence of both H2 and CO2 as strong reduction reagents.
摘要翻译：一种用于在各种氧化步骤（例如CVD SiO 2氧化）中保护金属（112）不被氧化的方法，用于形成上覆氧化物层（114），微笑氧化和侧壁（116）沉积。气体二氧化碳被添加到氧化化学物质中。 CO 2 / H 2比被控制用于选择性氧化。由于H2和CO2作为强还原试剂的存在，金属（112）被有效地保护免于氧化。

2. 发明申请

US20090021986A1 OPERATING METHOD OF NON-VOLATILE MEMORY DEVICE 审中-公开
标题翻译：非易失性存储器件的操作方法
公开(公告)号：US20090021986A1
公开(公告)日：2009-01-22
申请号：US12236999
申请日：2008-09-24
申请人： Wei-Zhe Wong , Ching-Sung Yang , Chih-Chen Cho
发明人： Wei-Zhe Wong , Ching-Sung Yang , Chih-Chen Cho
IPC分类号： G11C11/34
CPC分类号： H01L27/115 , H01L27/11568 , H01L29/40117 , H01L29/66833 , H01L29/792 , H01L29/7926 , Y10S438/954
摘要： An operating method for a non-volatile memory device is applicable on a non-volatile memory device in which a substrate is disposed. The substrate includes a trench, a first conductive type first well region disposed in the substrate, and a second conductive type second well region disposed above the first conductive type first well region. The operating method includes applying a first voltage to a control gate, a second voltage to a drain region, and a third voltage to a source region. Besides, a channel F-N tunneling effect is employed to program a memory cell.
摘要翻译：用于非易失性存储器件的操作方法适用于其中设置衬底的非易失性存储器件。衬底包括沟槽，设置在衬底中的第一导电类型的第一阱区域和设置在第一导电类型的第一阱区域上方的第二导电类型的第二阱区域。操作方法包括将第一电压施加到控制栅极，将第二电压施加到漏极区域，并将第三电压施加到源极区域。此外，采用信道F-N隧道效应来对存储器单元进行编程。

3. 发明申请

US20070263448A1 OPERATING METHOD OF A NON-VOLATILE MEMORY 审中-公开
标题翻译：非易失性存储器的操作方法
公开(公告)号：US20070263448A1
公开(公告)日：2007-11-15
申请号：US11778657
申请日：2007-07-17
申请人： Wei-Zhe Wong , Ching-Sung Yang , Chih-Chen Cho
发明人： Wei-Zhe Wong , Ching-Sung Yang , Chih-Chen Cho
IPC分类号： G11C11/34 , G11C16/04
CPC分类号： G11C16/0416 , H01L27/115 , H01L27/11521 , H01L29/40114 , H01L29/42328 , H01L29/66825 , H01L29/7887
摘要： A non-volatile memory is provided. A substrate has at least two isolation structures therein to define an active area. A well is located in the substrate. A shallow doped region is located in the well. At least two stacked gate structures are located on the substrate. Pocket doped regions are located in the substrate at the peripheries of the stacked gate structures; each of the pocket doped regions extends under the stacked gate structure. Drain regions are located in the pocket doped regions at the peripheries of the stacked gate structures. An auxiliary gate layer is located on the substrate between the stacked gate structures. A gate dielectric layer is located between the auxiliary gate layer and the substrate and between the auxiliary gate layer and the stacked gate structure. Plugs are located on the substrate and extended to connect with the pocket doped region and the drain regions therein.
摘要翻译：提供非易失性存储器。衬底在其中具有至少两个隔离结构以限定有效区域。一个井位于基板中。浅掺杂区域位于井中。至少两个堆叠的栅极结构位于衬底上。袋状掺杂区域位于堆叠栅极结构的周边的衬底中; 每个口袋掺杂区域在堆叠的栅极结构之下延伸。漏极区位于堆叠栅极结构的周边的口袋掺杂区域中。辅助栅极层位于堆叠栅极结构之间的衬底上。栅极电介质层位于辅助栅极层和衬底之间，并且位于辅助栅极层和堆叠栅极结构之间。插头位于衬底上并延伸以与其中的口袋掺杂区域和漏极区域连接。

4. 发明申请

US20070108504A1 NON-VOLATILE MEMORY AND MANUFACTURING METHOD AND OPERATING METHOD THEREOF 审中-公开
标题翻译：非易失性存储器及其制造方法及其工作方法
公开(公告)号：US20070108504A1
公开(公告)日：2007-05-17
申请号：US11308507
申请日：2006-03-31
申请人： Yung-Chung Lee , Hann-Ping Hwang , Chin-Chung Wang , Chih-Ming Chao , Saysamone Pittikoun , Chih-Chen Cho
发明人： Yung-Chung Lee , Hann-Ping Hwang , Chin-Chung Wang , Chih-Ming Chao , Saysamone Pittikoun , Chih-Chen Cho
IPC分类号： H01L29/788 , H01L29/76 , H01L21/336
CPC分类号： H01L29/792 , G11C16/0483 , H01L27/115 , H01L27/11568 , H01L29/42344
摘要： A non-volatile memory having a plurality of gate structures, a plurality of charge storage layers and two doped regions is provided. The gate structures are disposed on the substrate and connected in series. The charge storage layers are disposed between every two neighboring gate structures respectively. The gate structures and the charge storage layers form a memory cell column. The two doped regions are disposed in the substrate at both sides of the memory cell column.
摘要翻译：提供具有多个栅极结构，多个电荷存储层和两个掺杂区域的非易失性存储器。栅极结构设置在基板上并串联连接。电荷存储层分别设置在每两个相邻栅极结构之间。栅极结构和电荷存储层形成存储单元列。两个掺杂区域在存储单元列的两侧设置在基板中。

5. 发明申请

US20060039200A1 NON-VOLATILE MEMORY CELL, FABRICATION METHOD AND OPERATING METHOD THEREOF 审中-公开
标题翻译：非挥发性记忆体，制造方法及其操作方法
公开(公告)号：US20060039200A1
公开(公告)日：2006-02-23
申请号：US10907031
申请日：2005-03-17
申请人： Ching-Sung Yang , Wei-Zhe Wong , Chih-Chen Cho
发明人： Ching-Sung Yang , Wei-Zhe Wong , Chih-Chen Cho
IPC分类号： G11C7/10
CPC分类号： G11C16/0483 , G11C16/0466 , H01L27/115 , H01L27/11519 , H01L27/11568
摘要： A non-volatile memory including a plurality of memory units is provided. Each of the memory units includes a first memory cell and a second memory cell. The first memory cell is disposed over the substrate. The second memory cell is disposed next to the sidewall of the first memory cell and over the substrate. The first memory cell includes a first gate disposed over the substrate, a first composite dielectric layer disposed between the first gate and the substrate. The second memory cell includes a second gate disposed over the substrate and a second composite dielectric layer disposed between the second gate and the substrate and between the second gate and the first memory cell. Each of the first and second composite dielectric layers includes a bottom dielectric layer, a charge-trapping layer and a top dielectric layer.
摘要翻译：提供包括多个存储单元的非易失性存储器。每个存储单元包括第一存储单元和第二存储单元。第一存储单元设置在衬底上。第二存储单元设置在第一存储单元的侧壁旁边且在衬底上。第一存储单元包括设置在衬底上的第一栅极，设置在第一栅极和衬底之间的第一复合介电层。第二存储单元包括设置在衬底上的第二栅极和设置在第二栅极和衬底之间以及第二栅极和第一存储单元之间的第二复合电介质层。第一和第二复合电介质层中的每一个包括底部电介质层，电荷俘获层和顶部电介质层。

6. 发明申请

US20050151198A1 Apparatus for increasing SRAM cell capacitance with metal fill 审中-公开
标题翻译：用于通过金属填充增加SRAM单元电容的装置
公开(公告)号：US20050151198A1
公开(公告)日：2005-07-14
申请号：US11057302
申请日：2005-02-11
申请人： Zhongze Wang , Chih-Chen Cho
发明人： Zhongze Wang , Chih-Chen Cho
IPC分类号： G11C11/412 , H01L21/768 , H01L21/8244 , H01L27/11 , H01L29/76
CPC分类号： G11C11/4125 , G11C11/412 , H01L21/76885 , H01L27/11 , H01L27/1104
摘要： A static random access memory cell with metal fill to form capacitors for increasing the capacitance of the memory cell. More specifically, a semiconductor device including a structure having an upper surface and a contact surface formed at the upper surface of the structure. A dielectric material is formed over the contact surface with a first conductive node and a second conductive node extending beyond the dielectric material. Dielectric spacers are formed around the first and second conductive nodes and conductive elements are formed between the dielectric spacers. The conductive elements and spacers form capacitors without implementing additional masking steps.
摘要翻译：具有金属填充的静态随机存取存储器单元以形成用于增加存储单元的电容的电容器。更具体地说，一种半导体器件，包括具有形成在该结构的上表面上的上表面和接触表面的结构。介电材料在接触表面上与第一导电节点和延伸超出电介质材料的第二导电节点形成。电介质隔板围绕第一和第二导电节点形成，并且导电元件形成在电介质间隔件之间。导电元件和间隔件形成电容器而不实施附加的掩蔽步骤。

7. 发明授权

US06858937B2 Backend metallization method and device obtained therefrom 失效
标题翻译：后端金属化方法和由其获得的器件
公开(公告)号：US06858937B2
公开(公告)日：2005-02-22
申请号：US09517314
申请日：2000-03-02
申请人： Chih-Chen Cho
发明人： Chih-Chen Cho
IPC分类号： H01L21/768 , H01L23/48 , H01L23/58
CPC分类号： H01L21/31116 , H01L21/76802 , H01L21/76816 , H01L21/76829 , H01L23/5226 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device and a method of making it are described. During the formation of the semiconductor device, a hard mask is formed of an etch-resistant material. The mask prevents etchant from etching an area within a dielectric material near a conductive plug. The mask may be formed of a nitride. Conductive material is then deposited withinan etched via and is contacted with the conductive plug.
摘要翻译：对半导体器件及其制造方法进行说明。在形成半导体器件期间，由耐蚀刻材料形成硬掩模。掩模防止蚀刻剂蚀刻导电塞附近的电介质材料内的区域。掩模可以由氮化物形成。然后将导电材料沉积在蚀刻通孔内并与导电塞接触。

8. 发明授权

US06599789B1 Method of forming a field effect transistor 失效
标题翻译：形成场效应晶体管的方法
公开(公告)号：US06599789B1
公开(公告)日：2003-07-29
申请号：US09713844
申请日：2000-11-15
申请人： Todd R. Abbott , Zhongze Wang , Jigish D. Trivedi , Chih-Chen Cho
发明人： Todd R. Abbott , Zhongze Wang , Jigish D. Trivedi , Chih-Chen Cho
IPC分类号： H01L2184
CPC分类号： H01L29/66651 , H01L21/26533 , H01L29/0653 , H01L29/41766 , H01L29/66636
摘要： A method of forming a field effect transistor includes forming a channel region within bulk semiconductive material of a semiconductor substrate. Source/drain regions are formed on opposing sides of the channel region. An insulative dielectric region is formed within the bulk semiconductive material proximately beneath at least one of the source/drain regions. A method of forming a field effect transistor includes providing a semiconductor-on-insulator substrate, said substrate comprising a layer of semiconductive material formed over a layer of insulative material. All of a portion of the semiconductive material layer and all of the insulative material layer directly beneath the portion are removed thereby creating a void in the semiconductive material layer and the insulative material layer. Semiconductive channel material is formed within the void. Opposing source/drain regions are provided laterally proximate the channel material. A gate is formed over the channel material. Integrated circuitry includes a bulk semiconductor substrate. A field effect transistor thereon includes a gate, a channel region in the bulk semiconductor substrate, and source/drain regions within the substrate on opposing sides of the channel region. A field isolation region is formed in the bulk semiconductor substrate and laterally adjoins with one of the source/drain regions. The field isolation region includes a portion which extends beneath at least some of the one source/drain region. Other aspects are contemplated.
摘要翻译：形成场效应晶体管的方法包括在半导体衬底的本体半导体材料内形成沟道区。源极/漏极区域形成在沟道区域的相对侧上。绝缘电介质区域在本体半导体材料内形成在源极/漏极区域中的至少一个附近。形成场效应晶体管的方法包括提供绝缘体上半导体衬底，所述衬底包括在绝缘材料层上形成的半导体材料层。半导体材料层的一部分和直接在该部分正下方的所有绝缘材料层被除去，从而在半导体材料层和绝缘材料层中产生空隙。半导体通道材料形成在空隙内。相邻的源极/漏极区域横向靠近通道材料提供。在通道材料上形成一个栅极。集成电路包括体半导体衬底。其中的场效应晶体管包括栅极，体半导体衬底中的沟道区，以及在沟道区的相对侧上的衬底内的源极/漏极区。在体半导体衬底中形成场隔离区域，并且与源极/漏极区域之一横向邻接。场隔离区域包括在一个源极/漏极区域中的至少一些的下方延伸的部分。考虑其他方面。

9. 发明授权

US06583518B2 Cross-diffusion resistant dual-polycide semiconductor structure and method 有权
公开(公告)号：US06583518B2
公开(公告)日：2003-06-24
申请号：US09945380
申请日：2001-08-31
申请人： Jigish D. Trivedi , Zhongze Wang , Todd R. Abbott , Chih-Chen Cho
发明人： Jigish D. Trivedi , Zhongze Wang , Todd R. Abbott , Chih-Chen Cho
IPC分类号： H01L2711
CPC分类号： H01L27/11 , H01L27/1104 , Y10S257/903 , Y10S257/904
摘要： A dual-polycide semiconductor structure and method for forming the same having reduced dopant cross-diffusion. A conductive layer is formed over a polysilicon layer having a first region doped with a first dopant and a second region adjoining the first region at an interface doped with a second dopant. A region of discontinuity is then formed in the conductive layer located away from the interface. The conductive layer formed over the polysilicon gate overlaps the interface to provide electrical continuity between the first and second regions of the polysilicon gate, but also includes a region of discontinuity to reduce dopant cross-diffusion.

10. 发明授权

US06420250B1 Methods of forming portions of transistor structures, methods of forming array peripheral circuitry, and structures comprising transistor gates 有权
标题翻译：形成晶体管结构部分的方法，形成阵列外围电路的方法以及包括晶体管栅极的结构
公开(公告)号：US06420250B1
公开(公告)日：2002-07-16
申请号：US09518508
申请日：2000-03-03
申请人： Chih-Chen Cho , Richard H. Lane , Charles H. Dennison
发明人： Chih-Chen Cho , Richard H. Lane , Charles H. Dennison
IPC分类号： H01L213205
CPC分类号： H01L21/76897 , H01L21/28247 , H01L21/76829 , H01L21/823425 , H01L21/823468 , H01L27/10894
摘要： The invention encompasses a method of forming a portion of a transistor structure. A substrate is provided, and a transistor gate is formed over the substrate. The transistor gate has a sidewall. A silicon oxide is deposited over a portion of the substrate proximate the transistor gate by high density plasma deposition. A spacer is formed over the silicon oxide and along the sidewall of the transistor gate. The invention also encompasses a method of oxidizing a portion of a conductive structure. Additionally, the invention encompasses transistor gate structures, as well as structures comprising memory array and peripheral circuitry.
摘要翻译：本发明包括形成晶体管结构的一部分的方法。提供衬底，并且在衬底上形成晶体管栅极。晶体管栅极具有侧壁。通过高密度等离子体沉积，氧化硅沉积在靠近晶体管栅极的衬底的一部分上。在氧化硅上并沿着晶体管栅极的侧壁形成间隔物。本发明还包括氧化导电结构的一部分的方法。另外，本发明包括晶体管栅极结构以及包括存储器阵列和外围电路的结构。

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