专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO9001459A3 PHOTOSENSITIVE, RADIATION SENSITIVE, THERMALLY SENSITIVE AND PRESSURE SENSITIVE SILVER SODALITE MATERIALS 审中-公开
标题翻译：光敏性，辐射敏感性，热敏性和压敏性银SODALITE材料
公开(公告)号：WO9001459A3
公开(公告)日：1990-03-22
申请号：PCT/GB8900890
申请日：1989-08-03
申请人： OZIN GEOFFREY A , GODBER JOHN , STEIN ANDREAS
发明人： OZIN GEOFFREY A , GODBER JOHN , STEIN ANDREAS
IPC分类号： B41M5/124 , B41M5/26 , B41M5/28 , B41M5/32 , C01B39/02 , G03C1/00 , G03C1/494 , C01B33/34
CPC分类号： B41M5/283 , B41M5/124 , C01B33/2892 , C01B39/026 , G03C1/494 , Y10S423/32 , Y10S430/163
摘要： Silver sodalites with cages containing anions such as oxalate, formate, halide, carbonate, sulphide etc. have silver compositions entrapped or encapsulated in the cages of a microporous sodalite lattice. The cages of the sodalite lattice have very small but very even sizes e.g. 6.6 Å diameters, so that the silver compositions trapped therein are also of very small but very even sizes. The silver compositions may be sensitive to the application of light, and may be sensitive to thermal or pressure stimuli. Thus, images produced by, for example, irradiation of the materials can be of very high resolution. The silver sodalite materials are prepared by a silver ion exchange process, from synthetic sodium sodalites.
摘要翻译：具有含阴离子如草酸盐，甲酸盐，卤化物，碳酸盐，硫化物等的笼的银方钠石具有包埋或包封在微孔方钠石晶格的笼中的银组合物。方钠石晶格的笼具有非常小但非常均匀的尺寸，例如 6.6＆Aring; 直径，使得其中包含的银组合物也具有非常小但非常均匀的尺寸。银组合物可能对光的应用敏感，并且可能对热或压力刺激敏感。因此，例如通过照射材料产生的图像可以具有非常高的分辨率。银方钠石材料通过银离子交换过程由合成钠方钠石制备。

2. 发明申请

WO2006004798A3 MULTILAYER OPTICAL DISPLAY DEVICE 审中-公开
标题翻译：多层光学显示设备
公开(公告)号：WO2006004798A3
公开(公告)日：2006-09-08
申请号：PCT/US2005023020
申请日：2005-06-29
申请人： LUMINOZ INC , COOPER TERENCE ALFRED , YOSHIDA KENJI
发明人： COOPER TERENCE ALFRED , YOSHIDA KENJI
IPC分类号： C09K19/00 , G02B1/10 , G03C1/492 , G03C1/494 , G03C1/76 , G03C5/00
CPC分类号： G02B5/0242
摘要： A multilayer optical device which comprises one or more radiation scattering layers, radiation absorption layers, tint layers, interfacial layers, adhesive layers, protective layers, matte, non-reflective, anti-glare, antistatic or embossed surface layers, focusing layers and supporting layers is described. Interfacial layers, adhesive layers, protective layers, tint layers, matte, non-reflective, anti-glare, antistatic or embossed surface layers, focusing layers and supporting layers may be optional in some embodiments of the invention. The device is used to display an image which is projected either in the transmission or reflection mode.
摘要翻译：多层光学器件，其包括一个或多个辐射散射层，辐射吸收层，着色层，界面层，粘合剂层，保护层，无光泽，非反射性，防眩光，抗静电或压花表面层，聚焦层和支撑层被描述。在本发明的一些实施例中，界面层，粘合剂层，保护层，着色层，无光泽，非反射性，防眩光，抗静电或压花表面层，聚焦层和支撑层可以是任选的。该设备用于显示以传输或反射模式投影的图像。

3. 发明申请

WO2006014708A9 THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS 审中-公开
公开(公告)号：WO2006014708A9
公开(公告)日：2006-04-06
申请号：PCT/US2005025698
申请日：2005-07-20
申请人： CITIPLATE INC
发明人： SETH PRAKASH , CUSUMANO CHARLES S
IPC分类号： G03C1/494
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/262
摘要： A photothermally sensitive composition which is primarily energy sensitive in the near infrared and ultraviolet region of the electromagnetic spectrum is composed of a novolak polymer, a melamine derivative crosslinking compound, an acid-generating compound, a polymeric dissolution inhibitor selected from cellulose acetate butyrate, cellulose acetate propionate and mixtures thereof and an infrared absorbing dye. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.

4. 发明申请

WO2005029654A2 INCREASING THERMAL CONDUCTIVITY OF HOST POLYMER USED WITH LASER ENGRAVING METHODS AND COMPOSITIONS 审中-公开
标题翻译：使用激光雕刻方法和组合物增加主体聚合物的热导率
公开(公告)号：WO2005029654A2
公开(公告)日：2005-03-31
申请号：PCT/US2004030702
申请日：2004-09-17
申请人： DIGIMARC CORP , LABREC BRIAN , JONES ROBERT L
发明人： LABREC BRIAN , JONES ROBERT L
IPC分类号： B23K26/42 , B41M5/24 , C08F2/46 , C08J3/28 , G03C1/00 , G03C1/492 , G03C1/494 , G03C1/76 , G06K5/00 , H01S20060101 , H01S
CPC分类号： B41M5/24 , B23K26/60 , B29C65/1616 , B41M3/16 , Y10S430/146 , Y10T156/10 , Y10T428/31504 , Y10T428/31507
摘要： The invention provides a composition having laser engraving properties, comprising a host material and a laser enhancing additive. The host material comprises a material, such as a polymer, modified by a first process, whereby the host material as modified by the first process has increased thermal conductivity as compared to the host material before the first process. The laser enhancing additive comprises a first quantity of at least one of copper potassium iodide (CuKI3), Copper Iodide (CuI), potassium iodide (KI), sodium iodide (NaI), and aluminum iodide (AlI), and a second quantity of at least one substance selected from the group consisting of zinc sulfide (ZnS), barium sulfide (BaS), alkyl sulfonate, and thioester.
摘要翻译：本发明提供具有激光雕刻性质的组合物，其包含主体材料和激光增强添加剂。主体材料包括通过第一工艺改性的材料，例如聚合物，其中由第一工艺改性的主体材料与第一工艺之前的主体材料相比具有增加的热导率。激光增强添加剂包括第一量的碘化钾（CuKI3），碘化铜（CuI），碘化钾（KI），碘化钠（NaI）和碘化铝（AlI）中的至少一种，第二量的选自硫化锌（ZnS），硫化钡（BaS），烷基磺酸盐和硫酯中的至少一种物质。

5. 发明申请

WO2006014708A2 THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS 审中-公开
标题翻译：用于光刻元件的热敏涂层组合物
公开(公告)号：WO2006014708A2
公开(公告)日：2006-02-09
申请号：PCT/US2005/025698
申请日：2005-07-20
申请人： CITIPLATE, INC.
发明人： SETH, Prakash , CUSUMANO, Charles, S.
IPC分类号： G03C1/494
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/262
摘要： A photothermally sensitive composition which is primarily energy sensitive in the near infrared and ultraviolet region of the electromagnetic spectrum is composed of a novolak polymer, a melamine derivative crosslinking compound, an acid-generating compound, a polymeric dissolution inhibitor selected from cellulose acetate butyrate, cellulose acetate propionate and mixtures thereof and an infrared absorbing dye. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.
摘要翻译：在电磁光谱的近红外和紫外线区域中主要对能量敏感的光敏组合物由酚醛清漆聚合物，三聚氰胺衍生物交联化合物，产酸化合物，聚合物溶解抑制剂组成，其选自乙酸丁酸纤维素，纤维素乙酸丙酸酯及其混合物和红外吸收染料。当应用于适当的支撑和加工时，组合物可用作胶印平版印刷版，防色膜或图像抗蚀剂。

6. 发明申请

WO2005026465A3 CONSTRUCTION MATERIAL BASED ON GYPSUM 审中-公开
标题翻译：材料，以石膏
公开(公告)号：WO2005026465A3
公开(公告)日：2005-06-16
申请号：PCT/EP2004010208
申请日：2004-09-13
申请人： KNAUF GIPS KG , HUMMEL HANS-ULRICH , KRAEMER GEORG , STOESSEL HANS-RUDOLF
发明人： HUMMEL HANS-ULRICH , KRAEMER GEORG , STOESSEL HANS-RUDOLF
IPC分类号： C04B14/04 , C04B28/02 , C04B28/14 , E04C2/04 , G03C1/494
CPC分类号： E04C2/043 , C04B14/047 , C04B28/02 , C04B28/14 , C04B28/145 , C04B2111/0062 , Y10T428/24273 , C04B14/20
摘要： Disclosed is a construction material which is based on gypsum containing 1 to 25 percent by weight of zeolites.
摘要翻译：基于含有1〜25米重量％的沸石石膏建筑材料。

7. 发明申请

WO01063358A1 ORGANIC POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译：化学蒸气沉积沉积的有机聚合物抗反射涂层
公开(公告)号：WO01063358A1
公开(公告)日：2001-08-30
申请号：PCT/US2001/003568
申请日：2001-02-02
IPC分类号： G03F7/11 , C23C16/46 , G03F7/09 , H01L21/027 , G03C1/76 , G03C1/492 , G03C1/494 , G03F7/00 , G11B7/24
CPC分类号： G03F7/091 , Y10S430/136 , Y10S430/151
摘要： An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mu m or smaller) features.
摘要翻译：提供了一种用于将有机抗反射涂层施加到基底表面和所得前体结构的改进方法。广泛地，这些方法包括在基片表面上化学气相沉积（CVD）抗反射化合物。在一个实施方案中，化合物是高度应变的（例如具有至少约10kcal / mol的应变能），并且包含通过连接基彼此连接的两个环状部分。最优选的单体是[2.2]（1,4） - 萘环戊烷和[2.2]（9,10） - 蒽环庚烷。 CVD工艺包括加热抗反射化合物以使其蒸发，然后热解汽化的化合物以形成稳定的双基质，随后在沉积室中的基底表面上聚合。本发明的方法可用于在具有超亚微米（0.25μm或更小）特征的大的基片表面上提供高保形抗反射涂层。

8. 发明申请

WO2006019450A3 IMPROVED METHOD FOR BUMP EXPOSING RELIEF IMAGE PRINTING PLATES 审中-公开
标题翻译：用于缓冲曝光图像打印板的改进方法
公开(公告)号：WO2006019450A3
公开(公告)日：2006-11-30
申请号：PCT/US2005017023
申请日：2005-05-16
申请人： MACDERMID PRINTING SOLUTIONS
发明人： ROBERTS DAVID H , MUELLER GREGORY E
IPC分类号： G03C1/76 , G03C1/492 , G03C1/494 , G03C1/725 , G03C1/73 , G03C1/735 , G03F7/00 , G03F7/26
CPC分类号： G03F7/2022 , G03F7/029 , G03F7/031 , G03F7/168 , Y10S430/145 , Y10S430/146
摘要： A process of producing a relief image printing plate, the process comprising the steps of providing a photosensitive printing element, quenching dissolved oxygen in the photosensitive resin layer by pre-exposing the photosensitive layer to one or more sources of actinic radiation, wherein the range of wavelengths spanned by the one or more sources of actinic radiation differs by no more than about 20 nm, and imagewise exposing the photosensitive resin layer to actinic radiation to crosslink and cure the photosensitive resin layer. The photosensitive composition typically comprises at least one photoinitiator that is present in the photosensitive composition in an amount sufficient to provide an optical density in the photosensitive composition of between about 0.05 and 0.43 at a wavelength used to pre-expose the photosensitive composition.
摘要翻译：一种制造浮雕图像印版的方法，该方法包括以下步骤：提供感光印刷元件，通过将感光层预曝光到一种或多种光化辐射源来淬灭感光性树脂层中的溶解氧，其中，由一种或多种光化辐射源所跨越的波长不超过约20nm，并将感光性树脂层成像曝光于光化辐射以使感光性树脂层交联和固化。感光组合物通常包含光敏组合物中存在的至少一种光引发剂，其量足以在光敏组合物预曝光的波长下在光敏组合物中提供约0.05至0.43的光密度。

9. 发明申请

WO2005111719A3 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS 审中-公开
标题翻译：使用乙烯基交联剂的抗反射涂层
公开(公告)号：WO2005111719A3
公开(公告)日：2006-11-09
申请号：PCT/US2005012851
申请日：2005-04-15
申请人： BREWER SCIENCE INC , GUERRERO DOUGLAS J , COX ROBERT C , WEIMER MARC W
发明人： GUERRERO DOUGLAS J , COX ROBERT C , WEIMER MARC W
IPC分类号： G03F7/095 , C07C43/166 , C08J3/24 , C08J3/28 , C08J5/18 , G03C1/492 , G03C1/494 , G03F7/039 , G03F7/09 , G03F7/11
CPC分类号： G03F7/091 , C07C43/166 , G03F7/039 , G03F7/0392 , G03F7/094 , G03F7/11 , G03F7/168 , G03F7/40 , Y10S438/952 , Y10T428/31667 , Y10T428/31699 , Y10T428/31935
摘要： Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新型的湿显影抗反射涂层组合物和使用这些组合物的方法。组合物包含具有酸官能团并且与交联剂和光酸产生剂一起溶解在溶剂体系中的聚合物和/或低聚物。优选的酸官能团是羧酸，而优选的交联剂是乙烯基醚交联剂。在使用中，将组合物施加到基底上并进行热交联。曝光时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

10. 发明申请

WO2005001901A3 WET DEVELOPABLE HARD MASK IN CONJUNCTION WITH THIN PHOTORESIST FOR MICRO PHOTOLITHOGRAPHY 审中-公开
标题翻译：与薄膜光刻胶相结合的可湿性硬面膜
公开(公告)号：WO2005001901A3
公开(公告)日：2005-12-01
申请号：PCT/US2004018851
申请日：2004-06-10
申请人： BREWER SCIENCE INC , SUN SAM X , LI CHENGHONG
发明人： SUN SAM X , LI CHENGHONG
IPC分类号： G03C1/492 , G03C1/494 , G03C1/76 , G03C5/00 , G03F7/00 , G03F7/09 , G03F7/095 , G03F7/11 , G03F7/30 , H01L20060101 , H01L21/308 , H01L21/31 , H01L21/3213
CPC分类号： G03F7/091 , G03F7/094 , G03F7/095 , G03F7/11 , H01L21/3081 , H01L21/32139
摘要： A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selectively modified by reactive ion etch (RIE). The protective layer is photosensitive and anti-reflective. An extremely thin photoresist layer is coated on top of the protective layer. The stack of the films is selectively exposed to actinic radiation at a wavelength determined by the sensitivities of the protective layer and photoresist layer. The latent images on the photoresist and protective layers resulting from the exposure are developed with a common alkaline developer. The three dimensional patterns of photoresist and underlying protective layer are formed simultaneously by the single exposure and single development. When the underlying substrate is etched by RIE, the protective layer is the masking layer, not the photoresist.
摘要翻译：提供了与非常薄的光致抗蚀剂结合使用硬掩模或保护层的新颖方法。在该过程中，保护层的薄膜被涂覆在待通过反应离子蚀刻（RIE）选择性修饰的基底的表面上。保护层是光敏的和抗反射的。在保护层的顶部涂覆极薄的光致抗蚀剂层。以由保护层和光致抗蚀剂层的敏感度确定的波长选择性地暴露于光化辐射。用普通的碱性显影剂显影在光致抗蚀剂和由曝光产生的保护层上的潜像。光刻胶和下层保护层的三维图案通过单次曝光和单次显影同时形成。当通过RIE蚀刻底层衬底时，保护层是掩模层，而不是光致抗蚀剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式