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1. 发明申请

WO2008064859A3 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 审中-公开
标题翻译：具有可更换，可调节的校正装置的光学系统，用于减少图像错误
公开(公告)号：WO2008064859A3
公开(公告)日：2008-08-21
申请号：PCT/EP2007010286
申请日：2007-11-27
申请人： ZEISS CARL SMT AG , XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
发明人： XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
IPC分类号： G03F7/20 , G02B7/14
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator (14) for reducing image aberrations, wherein the manipulator (14) contains at least one optical element (8) which can be manipulated by means of at least one actuator (13), and wherein the manipulator (14) is formed in changeable fashion together with an actuator (13).
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光设备，包括至少一个用于减少像差的操纵器（14），其中操纵器（14）包含至少一个光学元件（8），该光学元件可以通过至少一个致动器（13），并且其中所述操纵器（14）与致动器（13）一起以可变方式形成。

2. 发明申请

WO2005054953A3 HOLDING DEVICE FOR AN OPTICAL ELEMENT IN AN OBJECTIVE 审中-公开
标题翻译：用于目标的光学元件的保持装置
公开(公告)号：WO2005054953A3
公开(公告)日：2006-01-05
申请号：PCT/EP2004013228
申请日：2004-11-22
申请人： ZEISS CARL SMT AG , ASML NETHERLANDS BV , GELLRICH BERNHARD , WURMBRAND ANDREAS , KUGLER JENS , SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN , BRUYNOOGHE STEPHANE
发明人： GELLRICH BERNHARD , WURMBRAND ANDREAS , KUGLER JENS , SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN , BRUYNOOGHE STEPHANE
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： A holding device (6) for an optical element (5) in an objective (1) has a mount (4) that is connected to the objective (1) , on the one hand, and at least indirectly to the optical element (5), on the other hand. Arranged between the mount (4) and the optical element (5) is a reinforcing element (8) whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element (5).
摘要翻译：一种用于物镜（1）中的光学元件（5）的保持装置（6）具有安装件（4），一方面连接到物镜（1），并且至少间接地连接到光学元件（5）），另一方面。安装件（4）和光学元件（5）之间的布置是其热膨胀系数基本上对应于光学元件（5）的热膨胀系数的增强元件（8）。

3. 发明申请

WO2008122626A3 OPTICAL ELEMENT MODULE WITH IMAGING ERROR AND POSITION CORRECTION 审中-公开
标题翻译：具有成像误差和位置校正的光学元件模块
公开(公告)号：WO2008122626A3
公开(公告)日：2009-01-15
申请号：PCT/EP2008054154
申请日：2008-04-07
申请人： ZEISS CARL SMT AG , GELLRICH BERNHARD , KUGLER JENS , LIMBACH GUIDO
发明人： GELLRICH BERNHARD , KUGLER JENS , LIMBACH GUIDO
IPC分类号： G03F7/20 , G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B27/0068 , G03F7/70258
摘要： There is provided an optical element module (106) comprising an optical element (107) and a support structure (108) supporting the optical element, the support structure comprising a first holding structure (109), an intermediate structure (110) and a second holding structure (111). The first holding structure (109) contacts the optical element (107) and is adapted to adjustably introduce defined deformations into the optical element. The intermediate structure (110) supports the first holding structure (109) while the second holding structure (111) supports the intermediate structure (110) and is adapted to adjust the -position of the intermediate structure. The optical element module is used 'in microlithography systems for compensating aberrations. The holding structures are arranged Kinematically in series. Also provided is an optical element module wherein the first holding structure is adapted to adjust the position and the second is adapted to adjustably introduce deformations. Further provided is an optical element module wherein one of the deformation or position adjustment is omitted.
摘要翻译：提供了一种包括光学元件（107）和支撑光学元件的支撑结构（108）的光学元件模块（106），该支撑结构包括第一保持结构（109），中间结构（110）和第二保持结构（111）。第一保持结构（109）接触光学元件（107）并且适于将限定的变形引入到光学元件中。中间结构（110）支撑第一保持结构（109），而第二保持结构（111）支撑中间结构（110）并且适于调节中间结构的位置。光学元件模块用于微光学系统中用于补偿像差。保持结构以运动学方式排列。还提供了一种光学元件模块，其中第一保持结构适于调节位置，第二保持结构适于可调节地引入变形。还提供了一种光学元件模块，其中省略了变形或位置调整之一。

4. 发明申请

WO2007031413A3 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
标题翻译：光学元件曝光过程
公开(公告)号：WO2007031413A3
公开(公告)日：2007-06-21
申请号：PCT/EP2006065892
申请日：2006-08-31
申请人： ZEISS CARL SMT AG , KUGLER JENS , SCHWERTNER TILMANN , BINGEL ULRICH , LIMBACH GUIDO , KALLER JULIAN , SCHAFFER DIRK , SCHERLE HANS-JUERGEN , GELLRICH BERNHARD
发明人： KUGLER JENS , SCHWERTNER TILMANN , BINGEL ULRICH , LIMBACH GUIDO , KALLER JULIAN , SCHAFFER DIRK , SCHERLE HANS-JUERGEN , GELLRICH BERNHARD
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： There is provided an optical element unit comprising at least a first optical element module and a sealing arrangement: The first optical element module occupies a first module space and comprises a first module component of a first component type and an associated second module component of a second component type, the first component type being optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：提供了包括至少第一光学元件模块和密封装置的光学元件单元：第一光学元件模块占据第一模块空间，并且包括第一部件类型的第一模块部件和第二模块部件的第二模块部件组件类型，第一组件类型是光学元件，第二组件类型与第一组件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和第二个空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

5. 发明申请

WO2005101121A3 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
标题翻译：光学元件曝光过程
公开(公告)号：WO2005101121A3
公开(公告)日：2006-07-06
申请号：PCT/EP2005003875
申请日：2005-04-13
申请人： ZEISS CARL SMT AG , GELLRICH BERNHARD , KUGLER JENS , LIMBACH GUIDO , KALLER JULIAN , SCHERLE HANS JUERGEN , SCHMEREK DIETER , MUELLER DETLEV , SCHLETTERER THOMAS
发明人： GELLRICH BERNHARD , KUGLER JENS , LIMBACH GUIDO , KALLER JULIAN , SCHERLE HANS JUERGEN , SCHMEREK DIETER , MUELLER DETLEV , SCHLETTERER THOMAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G02B7/023 , G02B27/0006 , G03B27/52 , G03F7/70341 , G03F7/70808 , G03F7/70833
摘要： An optical element unit (3) is provided comprising an optical element group (7) ; a housing (3.1)receiving said optical element group and having an inner housing part (3.4) and an exit end (3.2) ; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element (9). The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap (12). The purge unit (15) provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
摘要翻译：提供一种光学元件单元（3），包括光学元件组（7）; 接收所述光学元件组并具有内部壳体部分（3.4）和出口端（3.2）的壳体（3.1）; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。光学元件组包括最终光学元件（9）。最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。最终光学元件和壳体限定密封间隙（12）。净化单元（15）为清洁介质提供密封间隙，以防止污染物侵入内壳体部分。

6. 发明申请

WO2005015315A2 MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM, AND METHOD FOR INTRODUCING AN IMMERSION LIQUID INTO AN IMMERSION CHAMBER 审中-公开
标题翻译：微光刻投射曝光装置和方法，用于引入浸渍于液浸ROOM
公开(公告)号：WO2005015315A2
公开(公告)日：2005-02-17
申请号：PCT/EP2004007456
申请日：2004-07-08
申请人： ZEISS CARL SMT AG , GELLRICH BERNHARD , REISINGER GERD , SCHMEREK DIETER , KUGLER JENS
发明人： GELLRICH BERNHARD , REISINGER GERD , SCHMEREK DIETER , KUGLER JENS
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a plurality of optical elements such as lenses (L5) and enabling a reticle that can be arranged in an object plane of the projection objective to be imaged onto a light-sensitive surface (26) that can be arranged in an image plane of the projection objective and is applied to a carrier (30). The inventive system is also provided with an immersion device between an image-side last optical element (L5) of the projection objective and the light-sensitive surface (26), for introducing an immersion liquid (34) into an immersion chamber (50). Said immersion device comprises means (44; 66) which can prevent the appearance of gas bubbles (48) in the immersion liquid (34), affecting the imaging quality, and/or can remove existing gas bubbles (48). Said means can be, for example, an ultrasound source (66) or a degasifier (44).
摘要翻译：用于微光刻的投射曝光系统包括一个照明装置，用于产生投射光，并且具有多个光学元件，例如一个投影透镜例如透镜（L5），其可以在投射物镜的物面被布置成与可以在掩模版被设置在所述投影透镜的像面和在载体（30）施加的光敏感表面（26）可以被成像。此外，提供了用于引入的浸没液体（34）到所述投射物镜的像侧最后光学元件（L5）和感光表面（26）之间的浸没空间（50）的浸入设备。浸渍装置包括装置（44; 66），通过该能够防止在浸没液体（34）的成像质量损害气泡（48）的发生和/或可能已经被移除时发生气泡（48）。这些装置可以是，例如超声波源（66）或一个脱气装置（44）的行为。

7. 发明申请

WO02093257A8 MICROLITHOGRAPHIC PROJECTION ILLUMINATION SYSTEM 审中-公开
标题翻译：微光刻投射曝光系统，
公开(公告)号：WO02093257A8
公开(公告)日：2003-12-31
申请号：PCT/EP0204900
申请日：2002-05-04
申请人： ZEISS CARL SMT AG , BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
发明人： BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).
摘要翻译：在投射曝光设备特别是157或193nm和像侧NA 0.8至0.95，用氟晶透镜（43,43），其角度依赖性的双折射是通过绕光轴（O）和/或相对旋转（通过校正元件 44）的光瞳平面（P）附近的在它们的破坏性效果降低。

8. 发明申请

WO2012041459A3 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统的微观算法
公开(公告)号：WO2012041459A3
公开(公告)日：2012-08-30
申请号：PCT/EP2011004744
申请日：2011-09-22
申请人： ZEISS CARL SMT GMBH , ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
发明人： ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength ? in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least ?. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (?1, O2) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O1, O2) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10-5 of the wavelength ?.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜包括光学元件（M1-M6），其被配置为引导具有波长λ的电磁辐射（19）在用于将物场（13）成像到图像平面（14）的成像光束路径中，以及具有坐标（p，q）的光瞳（24），其与图像场（16）一起具有坐标（x，（x，y，p，q）的波前W（x，y，p，q）的函数，跨越具有坐标（x，y，p，q）的扩展的4维瞳孔空间，定义通过光学系统的辐射（19）。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有相应表面偏差的非旋转对称表面（26），该二维表面具有最大的海拔及其最深的山谷至少？非旋转对称表面的子孔径比从物体场（13）的每个点（θ1，O 2）偏离光学元件的每个其他表面的子孔径比至少0.01，这是位于成像光束路径中，位于物场（13）的相应点（O1，O2）处。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其它光学元件移位第一光学元件，可以使光学系统（10）的波前的改变具有具有至少2倍对称性的部分，扩展的四维光瞳空间中的波前变化的最大值为波长λ的至少1×10 -5。

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