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1. 发明申请

WO2005078522A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置照明系统
公开(公告)号：WO2005078522A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005001501
申请日：2005-02-15
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
发明人： FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source (14), a first optical raster element (62; 62'; 62''; 62''') and a second optical raster element (64; 90; 90''; 100). The first optical raster element extends in a first pupil plane (28) of the illumination system (10) and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane (28) of the illumination system, which is not necessarily different from the first pupil plane (28), and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This allows to improve the irradiance uniformity in a reticle plane (46).
摘要翻译：一种用于微光刻投影曝光步进扫描装置的照明系统具有光源（14），第一光栅元件（62; 62'; 62“，62”'）和第二光栅元件（64 ; 90; 90“; 100）。第一光栅元件在照明系统（10）的第一光瞳平面（28）中延伸，并被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面（28）中延伸，其不一定与第一光瞳平面（28）不同，并且被设计成使得在扫描中系统的几何光通量增加方向并与其垂直。这允许改进掩模版平面（46）中的辐照度均匀性。

2. 发明申请

WO2005017620A3 ILLUMINATION DEVICE AND POLARISER FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：照明装置和偏振器一种用于微光刻投影曝光装置
公开(公告)号：WO2005017620A3
公开(公告)日：2005-07-28
申请号：PCT/EP2004008892
申请日：2004-08-09
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , SCHOLZ AXEL , MAUL MANFRED
发明人： FIOLKA DAMIAN , SCHOLZ AXEL , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70566
摘要： The invention relates to an illumination device for a microlithographic projection exposure installation, said device comprising a light source (1) for generating projection light, a masking device (5) for masking a reticle (R), and a masking objective (6) for imaging the masking device (5) onto the reticle (R). A polariser (10) for generating linearly polarised light is also arranged in the masking objective (6). Said polariser (10) can, for example, be provided with polarisation-selective beam splitter layers (54, 56; 154, 156; 292, 294) that are arranged at an angle to each other, are light-permeable in a first polarisation state (68), and are light-reflective in a second polarisation state (70) different to the first polarisation state (68). In this way, the polariser (10) generally has a very flat structural form.
摘要翻译：用于微光刻投影曝光设备的照明装置包括：光源（1），用于生成投影光，掩蔽装置（5），用于掩蔽掩模版（R）和掩蔽透镜（6），用于在光罩（R）成像掩蔽装置（5）。另外，在透镜罩（6），用于产生线性偏振光的偏振片（10）布置。它们是透明的光在第一偏振态（68）和用于光在（第一偏振状态68的偏振器（10），例如一角度布置成彼此偏振选择性分束层（292，294 54，56; 154，156））不同的第二偏振状态（70）是反射的。这导致偏振器（10）的整体非常平坦的设计。

3. 发明申请

WO2008095695A3 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译： METHOD AND APPARATUS FOR IN的微光刻投射曝光设备的照明系统的监控多个MIRROR ARRANGEMENTS
公开(公告)号：WO2008095695A3
公开(公告)日：2008-10-30
申请号：PCT/EP2008000920
申请日：2008-02-06
申请人： ZEISS CARL SMT AG , XALTER STEFAN , KWAN YIM-BUN-PATRICK , MAJOR ANDRAS G , MAUL MANFRED , EISENMENGER JOHANNES , FIOLKA DAMIAN , HORN JAN , DEGUENTHER MARKUS , BACH FLORIAN , PATRA MICHAEL , WANGLER JOHANNES , LAYH MICHAEL
发明人： XALTER STEFAN , KWAN YIM-BUN-PATRICK , MAJOR ANDRAS G , MAUL MANFRED , EISENMENGER JOHANNES , FIOLKA DAMIAN , HORN JAN , DEGUENTHER MARKUS , BACH FLORIAN , PATRA MICHAEL , WANGLER JOHANNES , LAYH MICHAEL
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Disclosed is an illumination system (12) of a microlithographic projection exposure apparatus (10), comprising a pupil surface and a substantially planar arrangement of beam deflecting elements (28) which can preferably be triggered in an individual manner and are used for variably illuminating the pupil surface. Each beam deflecting element (28) allows a projection light beam (32) that is incident thereon to be deflected in accordance with a control signal which is applied to the beam deflecting element (28). A measuring illumination device (54, 56, 58, 60; 88; 90; 98) directs a measuring light beam (36) that is independent from the projection light beams (32) onto a beam deflecting element (28). A detector device detects the measuring light beam (38) after the latter has been deflected on the beam deflecting element (28). An evaluation unit determines the deflection of the projection light beam (32) from the test signals supplied by the detector device.
摘要翻译：微光刻投射曝光设备（10）的照明系统（12）具有用于光瞳表面的可变照明光瞳表面及实质呈平面排列优选单独可控光束偏转元件（28）。通过每个光束偏转元件（28），作为施加到光束偏转元件（28）的控制信号的函数，可实现照射在其上的投影光束（32）的偏转。的测量照明装置（54，56，58，60; 88; 90; 98）从投射光束建立（32）独立的测量光束（36）的光束偏转元件（28）。检测器装置在光束偏转元件（28）处偏转之后检测测量光束（38）。评估单元根据检测器装置提供的测量信号来确定投影光束（32）的偏转。

4. 发明申请

WO2006066638A8 A FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION 审中-公开
标题翻译：用于补偿不对称管路照明的过滤装置
公开(公告)号：WO2006066638A8
公开(公告)日：2006-08-24
申请号：PCT/EP2005009165
申请日：2005-08-25
申请人： ZEISS CARL SMT AG , MAUL MANFRED , FIOLKA DAMIAN
发明人： MAUL MANFRED , FIOLKA DAMIAN
IPC分类号： G03F7/20
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device (100) for an illumination system, especially for the correction of the illumination of the illuminating pupil, comprising a light source, with the illumination system being passed through by a boudle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device (100), comprising at least one filter element (105) which can be introduced into the beam path of the bundle of illuminating rays, with the filter element comprising an actuating device (113), so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的滤光器装置（100），特别是用于校正照明光瞳的照明，包括光源，照明系统通过来自光源的照明光线的一束通过，物体平面，其中照射光束束照射在过滤器装置（100）上，包括至少一个过滤元件（105），该过滤元件可以被引入照射光束束的光束路径中，而过滤元件包括致动器装置（113），使得过滤元件可以在致动装置的帮助下被带入照射光束。

5. 发明申请

WO2005026843A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：用于微观投影曝光安装的照明系统
公开(公告)号：WO2005026843A3
公开(公告)日：2005-05-26
申请号：PCT/EP2004010188
申请日：2004-09-13
申请人： ZEISS CARL SMT AG , KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
发明人： KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

6. 发明申请

WO2006058754A2 PROJECTION EXPOSURE SYSTEM, BEAM DELIVERY SYSTEM AND METHOD OF GENERATING A BEAM OF LIGHT 审中-公开
标题翻译：投影曝光系统，光束输送系统及生成光束的方法
公开(公告)号：WO2006058754A2
公开(公告)日：2006-06-08
申请号：PCT/EP2005012857
申请日：2005-12-01
申请人： ZEISS CARL SMT AG , KUSS MATTHIAS , FIOLKA DAMIAN , REISINGER GERD , MAUL MANFRED , DAVYDENKO VLADIMIR
发明人： KUSS MATTHIAS , FIOLKA DAMIAN , REISINGER GERD , MAUL MANFRED , DAVYDENKO VLADIMIR
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width ? lat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width ? lat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width ? b corresponding to plural lateral laser modes, and wherein ?m lat b, and wherein an optical delay apparatus disposed in the beam provides an optical path difference ,?1 wherein (I); wherein ? 0 is an average wavelength of the light of the first beam of laser light, and ?? lat
摘要翻译：投影曝光系统的光束传送系统包括激光器，其产生来自空腔中的多个纵向激光模式的激光光束，其中由单个纵向激光模式产生的光具有平均线宽度ΔL，其中，所述光束的激光在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度ΔLAT，并且其中所述光束的激光具有当在其整个横截面上平均时，对应于多个横向激光模式的线宽度ΔB2S，并且其中θm<θ 并且其中设置在所述光束中的光学延迟装置提供光程差，θ1其中（I）; 其中λ<0>是第一激光束的光的平均波长，Δλ>

7. 发明申请

WO2005083511A3 SYSTEM FOR REDUCING THE COHERENCE OF LASER RADIATION 审中-公开
标题翻译：系统来降低激光辐射的一致性
公开(公告)号：WO2005083511A3
公开(公告)日：2005-12-01
申请号：PCT/EP2005001797
申请日：2005-02-22
申请人： ZEISS CARL SMT AG , DIECKMANN NILS , MAUL MANFRED , FIOLKA DAMIAN
发明人： DIECKMANN NILS , MAUL MANFRED , FIOLKA DAMIAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation (10), especially for a projection lens for use in semiconductor lithography, wherein a first partial beam (10a) of a laser beam (10) incident on a surface (11) of a resonator body (9) is partially reflected. A second partial beam (10b) penetrates the resonator body (9) and emerges from the resonator body (9) at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams (10a and 10b) are then passed on jointly to an illumination plane. The resonator body (9) is adapted, in addition to splitting the laser beam into partial beams (10a, 10b), to modulate the wave fronts of at least one partial beam (10b) during a laser pulse. The partial beams (10a, 10b) reflected on the resonator body (9) and penetrating the resonator body are superimposed downstream of the resonator body (9). The resonator body (9, 9') is provided with a phase plate (12) having different local phase distribution.
摘要翻译：在用于减少的波阵面发射激光辐射（10）的一致性，特别是用于在半导体光刻的投射物镜的系统中，从谐振器的表面（11）（9）入射激光束（10）部分地反射第一部分光束（10A）。第二部分光束（10b）的至少约进入谐振器（9）和出口由多个全反射在进入点的区域背面从谐振器（9）。随后，将两个子光束（10a和10b）被传递到一个公共照明平面。的谐振器（9）被设计为使得除了分成子光束（10A，10B）的波阵面被激光脉冲期间调制的至少一个偏光束（10b）的，反射的，在所述谐振器（9）和进入所述谐振器分光束（10A，10B）是由所述谐振器重叠（9），并且其中所述Resonatorkkörper（9,9“）设置有相位差板（12）具有变化的本地相位分布。

8. 发明申请

WO2005015310A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微型投影曝光装置的照明系统
公开(公告)号：WO2005015310A3
公开(公告)日：2005-07-28
申请号：PCT/EP2004007926
申请日：2004-07-15
申请人： ZEISS CARL SMT AG , DEGUENTHER MARKUS , MAUL MANFRED , FIOLKA DAMIAN
发明人： DEGUENTHER MARKUS , MAUL MANFRED , FIOLKA DAMIAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70066 , G03F7/70158 , G03F7/70191
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (12) for generating a projection light beam, a first objective (20) and a masking system (38, 52) for masking a reticle (30). The masking system (38, 52) includes adjustable first blades (40) for masking in a first spatial direction (X) and adjustable second blades (54, 56) for masking in a second spatial direction (Y). The first blades (40) are arranged in the region of a first field plane (36) and the second blades (54, 56) are arranged in the region of the second field plane (44) which are different to the first field plane (36). The masking system can therefore be made spatially less concentrated, whereby constructional difficulties in the region of the field plane before the masking objective resulting from space requirement problems are reduced. A further contribution is made to solving the space requirement problem if an attenuation system for achieving the most uniform possible light intensity in the wafer plane (122) includes a transmission filter (162) which has locally varying transmissivity and can be moved synchronously with traversing movements of the reticle (30).
摘要翻译：一种用于微光刻投影曝光装置的照明系统包括用于产生投影光束的光源（12），第一物镜（20）和用于掩蔽标线片（30）的掩蔽系统（38,52）。掩蔽系统（38,52）包括用于在第一空间方向（X）上掩蔽的可调整第一刀片（40）和用于在第二空间方向（Y）上掩蔽的可调整第二刀片（54,56）。第一叶片（40）布置在第一场平面（36）的区域中，并且第二叶片（54,56）布置在第二场平面（44）的与第一场平面（44）不同的区域中 36）。因此掩蔽系统可以在空间上较少集中，由此减少了空间需求问题导致掩蔽目标之前的场平面区域中的结构困难。如果用于在晶片平面（122）中获得最均匀的可能光强度的衰减系统包括透射滤波器（162），该透射滤波器（162）具有局部变化的透射率并且可以与横向运动同步地移动，则对解决空间需求问题做出进一步的贡献（30）。

9. 发明申请

WO02093257A8 MICROLITHOGRAPHIC PROJECTION ILLUMINATION SYSTEM 审中-公开
标题翻译：微光刻投射曝光系统，
公开(公告)号：WO02093257A8
公开(公告)日：2003-12-31
申请号：PCT/EP0204900
申请日：2002-05-04
申请人： ZEISS CARL SMT AG , BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
发明人： BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).
摘要翻译：在投射曝光设备特别是157或193nm和像侧NA 0.8至0.95，用氟晶透镜（43,43），其角度依赖性的双折射是通过绕光轴（O）和/或相对旋转（通过校正元件 44）的光瞳平面（P）附近的在它们的破坏性效果降低。

10. 发明申请

WO2008092653A3 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微型投影曝光设备的照明系统
公开(公告)号：WO2008092653A3
公开(公告)日：2008-10-09
申请号：PCT/EP2008000706
申请日：2008-01-30
申请人： ZEISS CARL SMT AG , DIECKMANN NILS , MAUL MANFRED , HETTICH CHRISTIAN , NATT OLIVER
发明人： DIECKMANN NILS , MAUL MANFRED , HETTICH CHRISTIAN , NATT OLIVER
IPC分类号： G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus comprises at least one transmission filter (66; 166; 266; 366; 466; 566; 666; 666'; 766, 766'; 866, 866') which has a different transmittance at least at two positions and which is arranged between a pupil plane (42, 60) and a field plane (52, 58). The transmittance distribution is determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：一种微光刻投影曝光设备的照明系统包括至少一个透射滤光器（66; 166; 266; 366; 466; 566; 666; 666'; 766,766'; 866,866'），其至少具有不同的透射率在两个位置处并且布置在光瞳平面（42,60）和场平面（52,58）之间。透射率分布被确定为使得其具有对椭圆率的与场相关的校正效果。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

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