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1. 发明申请

WO2006029796A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006029796A3
公开(公告)日：2006-08-03
申请号：PCT/EP2005009804
申请日：2005-09-13
申请人： ZEISS CARL SMT AG , BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
发明人： BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system (12) for a microlithographic projection exposure apparatus (10) comprises a masking device (36) and a masking objective (38; 138; 238) which projects the masking device (36) onto an image plane (18). The illumination system further includes an optical correction element (46; 34'; 146a, 146b; 242; 242a, 242b, 242c) having a surface (48; 44; 44'; 148a, 148b) that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane (40; 140) which precedes the image plane (18) of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system (12; 112; 212) in the image plane matches a principal ray distribution required by a projection objective (16).
摘要翻译：用于微光刻投影曝光装置（10）的照明系统（12）包括将掩模装置（36）投影到图像平面（18）上的掩蔽装置（36）和掩蔽物镜（38; 138; 238）。所述照明系统还包括具有表面（48; 44; 44'; 148a，148b）的光学校正元件（46; 34'; 146a，146b; 242; 242a，242b，242c），所述表面是非球面形或支撑衍射具有至少基本上非球面表面效果的结构。该表面至少大致布置在掩模对象的图像平面（18）之前的场平面（40; 140）中。非球面作用表面被设计成使得由照明系统（12; 112; 在图像平面中匹配投影物镜（16）所需的主光线分布。

2. 发明申请

WO2004102224A3 AXICON SYSTEM AND EXPOSURE SYSTEM EQUIPPED WITH THE SAME 审中-公开
标题翻译： AXICONSYSTEM和照明系统
公开(公告)号：WO2004102224A3
公开(公告)日：2005-04-14
申请号：PCT/EP2004004874
申请日：2004-05-07
申请人： ZEISS CARL SMT AG , DEGUENTHER MARKUS , BROTSACK MARKUS
发明人： DEGUENTHER MARKUS , BROTSACK MARKUS
IPC分类号： G02B20060101 , G02B5/00 , G02B5/04 , G02B13/14 , G02B27/09 , G02B27/28 , G03F7/20
CPC分类号： G03F7/70125 , G02B5/001 , G03F7/70108 , G03F7/70566
摘要： The invention relates to an axicon system that can be used, for example, in an exposure system for a microlithographic projection-exposure installation. Said system re-shapes an incident light distribution, which strikes its incident surface, into an exit light distribution that emerges from its exit surface by radially re-distributing the light intensity. In one embodiment, the axicon system comprises an optical axis and an axicon element with a first axicon surface and an additional surface lying opposite said axicon surface. At least one of the surfaces is coated with an optical compensation layer, which uses an elliptical transmission function to induce a location-dependent compensation of transmission irregularities on the axicon surface, said irregularities being caused by polarisation-selective reflection and transmission.
摘要翻译：甲Axiconsystem，它可以在一种用于微光刻投射曝光设备的照明系统被用于例如用于形成在其入射表面入射的光分布的入射到受光强度的径向再分配从其出射面出射的光的分布的发行。在一个实施方案中，Axiconsystem光轴，并与第一和AxiconflächeAxiconfläche相对的另一表面具有一个旋转三棱镜元件。至少一个表面涂覆有引起的在Axiconsystems的AxiconflächeTransmissionsinhomogenitäten引起偏振选择反射和传输的依赖于位置的补偿椭圆传输功能的光学补偿层。

3. 发明申请

WO2004099873A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION ILLUMINATION INSTALLATION 审中-公开
标题翻译：照明系统，微光刻投射曝光系统
公开(公告)号：WO2004099873A3
公开(公告)日：2005-06-09
申请号：PCT/EP2004004875
申请日：2004-05-07
申请人： ZEISS CARL SMT AG , DEGUENTHER MARKUS , WANGLER JOHANNES , BROTSACK MARKUS , MIZKEWITSCH ELLA
发明人： DEGUENTHER MARKUS , WANGLER JOHANNES , BROTSACK MARKUS , MIZKEWITSCH ELLA
IPC分类号： G02B27/09 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70075 , G03F7/70091
摘要： The invention relates to an illumination system (1) for a microlithographic projection illumination installation. Said illumination system is configured to illuminate an illumination field with an illumination radiation having a defined degree of coherency sigma , said degree of coherency being adjustable within a coherency degree range that reaches the range of very low coherency degrees substantially below sigma =0.2. The illumination system comprises a first optical system (30) for producing a defined light distribution in an entry plane of a light mixing device and a light mixing device (12) for homogenizing the incident radiation. The first optical system and the light mixing device can be adjusted between a plurality of configurations that correspond to different coherency degree ranges. The coherency degree ranges overlap and are calculated in such a manner that the resulting total coherency degree range is larger than the individual coherency degree ranges.
摘要翻译：一种用于微光刻投影曝光设备的照明系统（1）被设计为与具有相干西格玛的预定程度的照明光束，其特征在于，相干度可以一定程度的相干性区域的，其延伸到非常小的程度的一致性的范围显著低于标准差= 0.2范围内调节照明的照明场，照明系统具有用于产生在光混合装置的入射平面上的规定的配光均匀化的入射辐射的第一光学系统（30），和一光混合装置（12）。第一光学系统和所述光混合装置是多个对应于不同程度的相干性区域的配置之间的每个切换。重叠区域连贯性的程度，并且其尺寸使得相干区域的得到的总程度比相干区域的各个程度越大。

4. 发明申请

WO2005026843A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：用于微观投影曝光安装的照明系统
公开(公告)号：WO2005026843A3
公开(公告)日：2005-05-26
申请号：PCT/EP2004010188
申请日：2004-09-13
申请人： ZEISS CARL SMT AG , KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
发明人： KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

5. 发明申请

WO2006079486A2 ILLUMINATION SYSTEM, IN PARTICULAR FOR A PROJECTION EXPOSURE MACHINE IN SEMICONDUCTOR LITHOGRAPHY 审中-公开
标题翻译：照明系统，特别是半导体光刻中的投影曝光机
公开(公告)号：WO2006079486A2
公开(公告)日：2006-08-03
申请号：PCT/EP2006000535
申请日：2006-01-21
申请人： ZEISS CARL SMT AG , BROTSACK MARKUS
发明人： BROTSACK MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70108 , G03F7/70141
摘要： An illumination system is provided with a light produced by a light source (1) , with an optical axis and with optical elements (3, 7), in particular for a projection exposure machine in semiconductor lithography, having at least one optical element (3, 7) for producing a pupil distribution of the light beam, and having a homogenizing element (10, 24) for .homogenizing the intensity of the light. For an asymmetric pupil distribution at least the optical elements (3, 7) that produce non-rotationally symmetrical light distributions, and/or the homogenizing element (10, 24) ) are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x' -/y' -coordinate system newly formed by the rotational angle a by means of rotating the x-/y- coordinate system by the angle a.
摘要翻译：照明系统具有由光源（1）产生的光，具有光轴和光学元件（3,7），特别是用于半导体光刻中的投影曝光机，其具有至少一个光学元件（3 ，7）用于产生光束的瞳孔分布，并且具有均匀化元件（10,24），用于均匀化光的强度。对于不对称的光瞳分布，至少产生非旋转对称的光分布的光学元件（3,7）和/或均化元件（10,24）被围绕光轴可旋转地支撑，该光轴形成z轴在x / y坐标系中，可以设置至少一个旋转角α，使得瞳孔分布位于轴上或者相对于x' - / y'坐标的轴对称系统通过旋转x / y坐标系以角度α旋转角度α新形成的系统。

6. 发明申请

WO2005031467A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE 审中-公开
标题翻译：微观投影曝光
公开(公告)号：WO2005031467A3
公开(公告)日：2005-05-19
申请号：PCT/EP0311977
申请日：2003-10-29
申请人： ZEISS CARL SMT AG , GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
发明人： GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane (7) of a projection objective (6), as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device (40, 50, 60, 70, 80) the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在布置在投影物镜（6）的图像平面（7）的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，输出朝向基板的辐射，并具有产生输出偏振状态。通过借助于至少一个偏振操纵装置（40,50,60,70,80）的输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

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