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1. 发明申请

WO2015013606A1 MULTI-PART MASK FOR IMPLANTING WORKPIECES 审中-公开
标题翻译：用于植入工作的多部分面罩
公开(公告)号：WO2015013606A1
公开(公告)日：2015-01-29
申请号：PCT/US2014/048181
申请日：2014-07-25
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEBB, Aaron P. , CARLSON, Charles T.
IPC分类号： H01L21/265
CPC分类号： B32B37/18 , H01J2237/31711 , H01L21/266 , Y10T29/49895
摘要： A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.
摘要翻译：多部分掩模具有图案板，其包括具有在工件加工期间使用的期望孔径图案的平面部分。多部分面罩还具有用于固定图案板的安装框架。在组装之前，图案板具有对准部分，其具有一个或多个孔，可重复使用的对准销插入该孔中。这些对准销进入设置在安装框架上的运动接头，用于将图案板精确地对准安装框架。在图案板已经固定到安装框架之后，对准部分可以从图案板分离。对准引脚可以在以后再次使用。在一些实施例中，可以稍后从安装框架移除图案板，使得安装框架可以重复使用。

2. 发明申请

WO2014093501A1 MASK ALIGNMENT SYSTEM FOR SEMICONDUCTOR PROCESSING 审中-公开
标题翻译：用于半导体处理的掩模对准系统
公开(公告)号：WO2014093501A1
公开(公告)日：2014-06-19
申请号：PCT/US2013/074423
申请日：2013-12-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEBB, Aaron P. , CARLSON, Charles T. , WEAVER, William T. , GRANT, Christopher N.
IPC分类号： H01L21/68
CPC分类号： H01L21/266 , H01L21/682
摘要： A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
摘要翻译：掩模对准系统，用于在离子注入掩模和工件之间提供精确和可重复的对准。该系统包括具有松散地连接到其上的多个离子注入掩模的掩模框架。掩模框架设置有多个框架对准空腔，并且每个掩模设置有多个掩模对准空腔。该系统还包括用于保持工件的压板。压板可以设置有多个掩模对准销和框架对准销，其被配置为分别接合掩模对准空腔和框架对准空腔。面罩框架可以下降到台板上，框架对准空腔与框架定位销对齐，以在面罩和工件之间提供粗略对准。然后将掩模对准空腔移动到与掩模对准销对准，从而将每个单独的掩模移动到与相应的工件精确对准。

3. 发明申请

WO2015013607A1 MECHANICAL ALIGNMENT OF SUBSTRATES TO A MASK 审中-公开
标题翻译：基板的机械对准面板
公开(公告)号：WO2015013607A1
公开(公告)日：2015-01-29
申请号：PCT/US2014/048183
申请日：2014-07-25
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEBB, Aaron P. , CARLSON, Charles T. , HONAN, Michael , AMATO, Luigi G. , GRANT, Christopher Neil , STRASSNER, James D.
IPC分类号： H01L21/68
CPC分类号： H01L21/682 , C23C14/04 , Y10T29/49895
摘要： A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.
摘要翻译：多个掩模附着到荫罩框架的下侧。该附件被制成使得每个掩模可以在三个方向上相对于掩模框架独立地移动。该相对移动允许每个掩模调整其位置以与设置在工作表面上的相应对准销对准。在一个实施例中，每个掩模使用紧固件附接到掩模框架，其中紧固件具有直径小于设置在掩模上的安装孔的直径的轴。可以使用偏置元件来允许掩模和掩模框架在垂直方向上的相对移动。每个掩模还可以具有与工作表面上的相应对准销匹配的运动特征。

4. 发明申请

WO2014093529A1 TEMPERATURE MONITOR FOR DEVICES IN AN ION IMPLANT APPARATUS 审中-公开
标题翻译：离子植入装置中的器件温度监测器
公开(公告)号：WO2014093529A1
公开(公告)日：2014-06-19
申请号：PCT/US2013/074465
申请日：2013-12-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEBB, Aaron P. , RIORDON, Benjamin B. , CARLSON, Charles T. , GRANT, Christopher N. , BONECUTTER, Luke , WEAVER, William T.
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： G01N25/00 , C23C14/042 , C23C14/48 , G01B11/00 , G01N21/84 , H01J37/3045 , H01J37/3171 , H01J2237/31711
摘要： An ion implant apparatus configured to measure the temperature or monitor the degradation of components in the apparatus is provided. The ion implant apparatus may include a platen configured to move in a first direction, a mask frame to hold one or more masks disposed on the platen, a first optical sensor configured to project an optical beam to a second optical sensor, and a measurement bar disposed on the mask frame, the measurement bar raised above the surface of the mask frame to interrupt the optical beam when the platen moves in the first direction.
摘要翻译：提供了配置成测量温度或监测装置中部件的劣化的离子注入装置。离子注入装置可以包括被配置为沿第一方向移动的压板，掩模框架以保持设置在压板上的一个或多个掩模，配置成将光束投影到第二光学传感器的第一光学传感器，以及测量条设置在掩模框架上的情况下，当压板沿第一方向移动时，测量棒在掩模框架的表面上方升高以中断光束。

5. 发明申请

WO2014093527A1 TRANSFER CHAMBER AND METHOD OF USING TRANSFER CHAMBER 审中-公开
标题翻译：传送室和使用传送室的方法
公开(公告)号：WO2014093527A1
公开(公告)日：2014-06-19
申请号：PCT/US2013/074462
申请日：2013-12-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEBB, Aaron P. , CARLSON, Charles T. , FORDERHASE, Paul , WEAVER, William T. , VOPAT, Robert B.
IPC分类号： H01L21/67 , H01J37/317
CPC分类号： H01L31/18 , H01J37/3171 , H01J37/3178 , H01J37/32412 , H01L21/67155 , H01L21/67173 , H01L21/67184 , H01L31/1804 , Y02E10/547 , Y02P70/521 , Y10T29/49718
摘要： An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate configured to controllably seal the transfer chamber from the process chamber, and a second isolation gate configured to controllably seal the transfer chamber from an atmospheric environment, wherein a component of the ion implanter can be transferred between the process chamber and the transfer chamber for performing maintenance on the component outside of the process chamber. Performing maintenance on a component of the ion implanter includes the steps of transferring the component from the process chamber to the transfer chamber, sealing the transfer chamber, venting the transfer chamber to atmospheric pressure, an opening the transfer chamber to an atmospheric environment.
摘要翻译：一种离子注入机和方法，用于以减少停机时间同时提高离子注入机的产量的方式促进对离子注入机部件的维护的快速性能。离子注入机包括处理室，连接到处理室的传送室，构造成可以将传送室从处理室可控地密封的第一隔离栅和被配置为可控制地将传送室与大气环境密封的第二隔离栅，其中所述离子注入机的部件可以在所述处理室和所述传送室之间传送，以对所述处理室外的部件执行维护。对离子注入机的部件执行维护包括将部件从处理室传送到传送室，密封传送室，将传送室排出到大气压力，将传送室打开到大气环境的步骤。

6. 发明申请

WO2014046774A1 SYSTEM AND METHOD FOR 2D WORKPIECE ALIGNMENT 审中-公开
标题翻译：二维工作对齐的系统与方法
公开(公告)号：WO2014046774A1
公开(公告)日：2014-03-27
申请号：PCT/US2013/050886
申请日：2013-07-17
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： WEAVER, William T. , CARLSON, Charles T. , SMITH, Scott A. , BECK, Michael A. , WEBB, Aaron P. , STRASSNER, James D. , GRAVELL, Lawrence R. , SIMMONS, Michael C.
IPC分类号： H01L21/673 , H01L21/687 , C23C14/04
CPC分类号： H01L21/67333 , C23C14/042 , C23C14/48 , C23C14/50 , H01L21/68728 , H01L21/68735 , H01L21/68778 , Y10T29/49899
摘要： A carrier capable of holding one or more workpieces is disclosed. The carrier includes movable projections located along the sides of each cell in the carrier. This carrier, in conjunction with a separate alignment apparatus, aligns each workpiece within its respective cell against several alignment pins, using a multiple step alignment process to guarantee proper positioning of the workpiece in the cell. First, the workpieces are moved toward one side of the cell. Once the workpieces have been aligned against this side, the workpieces are then moved toward an adjacent orthogonal side such that the workpieces are aligned to two sides of the cell. Once aligned, the workpiece is held in place by the projections located along each side of each cell. In addition, the alignment pins are also used to align the associated mask, thereby guaranteeing that the mask is properly aligned to the workpiece.
摘要翻译：公开了能够容纳一个或多个工件的承载件。载体包括沿着载体中的每个单元的侧面定位的可移动凸起。该载体与单独的对准装置一起使用多步对准工艺将其各自的电池内的每个工件对准几个对准销，以保证工件在电池中的正确定位。首先，将工件朝向电池的一侧移动。一旦工件已经对准该侧面，工件就移动到相邻的正交侧，使得工件与单元的两侧对齐。一旦对准，工件通过位于每个单元的每一侧的凸起保持就位。此外，对准销还用于对准相关联的掩模，从而保证掩模适当地对准工件。

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