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1. 发明申请

WO02059933A3 VERTICALLY TRANSLATABLE CHUCK ASSEMBLY AND METHOD FOR A PLASMA REACTOR SYSTEM 审中-公开
标题翻译：用于等离子体反应器系统的垂直可翻转组件和方法
公开(公告)号：WO02059933A3
公开(公告)日：2002-10-10
申请号：PCT/US0148851
申请日：2001-12-20
申请人： TOKYO ELECTRON LTD , JOHNSON WAYNE L , FINK STEVEN T , BROWNING JEFF , JEVTIC JOVAN
发明人： JOHNSON WAYNE L , FINK STEVEN T , BROWNING JEFF , JEVTIC JOVAN
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32174
摘要： A chuck assembly (110) for supporting a workpiece (116) within a plasma reactor chamber (60) having sidewalls (64) surrounding an interior region (65) capable of supporting a plasma. The assembly includes a chuck base (130) and a plurality of support arms (150A-150C) extending outwardly from the chuck base perimeter to the chamber sidewalls. The support arms are adapted to support the chuck base within the interior region, while also being adapted to provide a path for mechanically, electrically, pneumatically and/or fluidly communicating with the chuck assembly from outside the chamber. The chuck assembly includes a workpiece support member (160) arranged above the chuck base, capable of supporting the workpiece and serving as a chuck electrode. The workpiece support member is supported by one or more vertical translation member (168) arranged between and operatively connected to the chuck base and the workpiece support member. The chuck assembly includes a match network (180MN), wherein at least a portion of the match network is mounted directly to the workpiece support member. The use of the support arms allows for the positioning of a vacuum pump system (250) directly beneath the chuck assembly.
摘要翻译：一种用于在具有围绕能够支撑等离子体的内部区域（65）的侧壁（64）的等离子体反应器室（60）内支撑工件（116）的卡盘组件（110）。组件包括卡盘基座（130）和从卡盘基部周边向外延伸到腔室侧壁的多个支撑臂（150A-150C）。所述支撑臂适于在所述内部区域内支撑所述卡盘基座，同时还适于提供用于从所述腔室外部与所述卡盘组件机械，电气，气动和/或流体连通的路径。卡盘组件包括布置在卡盘基座上方的能够支撑工件并用作卡盘电极的工件支撑构件（160）。工件支撑构件由一个或多个垂直平移构件（168）支撑，该垂直平移构件布置在卡盘基座和工件支撑构件之间并且可操作地连接到卡盘基座和工件支撑构件上。卡盘组件包括匹配网络（180MN），其中匹配网络的至少一部分直接安装到工件支撑构件。支撑臂的使用允许将真空泵系统（250）直接定位在卡盘组件的正下方。

2. 发明申请

WO2005048322A3 METHOD AND APPARATUS FOR IMPROVED BAFFLE PLATE 审中-公开
标题翻译：改进的纸板的方法和装置
公开(公告)号：WO2005048322A3
公开(公告)日：2005-11-24
申请号：PCT/US2004034339
申请日：2004-10-19
申请人： TOKYO ELECTRON LTD , FINK STEVEN T , STRANG ERIC J , LAFLAMME ARTHUR H JR , WALLACE JAY , HYLAND SANDRA
发明人： FINK STEVEN T , STRANG ERIC J , LAFLAMME ARTHUR H JR , WALLACE JAY , HYLAND SANDRA
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32633 , H01J37/32834 , H01L21/67069
摘要： A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate (64) having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. A centering ring (100) mounted in the substrate holder can comprise a centering feature configured to couple (68) with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.
摘要翻译：挡板组件，其构造成在等离子体处理系统中耦合到衬底保持器，包括具有一个或多个开口以允许气体通过其中的挡板（64），其中挡板与衬底的耦合便于在等离子体处理系统中挡板的自动对中。安装在基板保持器中的定心环（100）可以包括定中心特征，其配置成将（68）与挡板上的配合特征相耦合。在初始组装等离子体处理系统之后，挡板可以在等离子体处理系统内更换并居中，而不会拆卸和重新组装衬底支架。

3. 发明申请

WO2004079778A3 APPARATUS FOR ATTACHMENT OF SEMICONDUCTOR HARDWARE 审中-公开
标题翻译：用于连接半导体硬件的装置
公开(公告)号：WO2004079778A3
公开(公告)日：2005-05-12
申请号：PCT/US2004003361
申请日：2004-02-26
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： H01J37/32 , B23P19/00
CPC分类号： H01J37/3244 , H01J37/32633 , H01L21/67069 , H01L21/6719
摘要： A plasma processing method and system (10) including an apparatus (20) for securing semiconductor hardware without the use of exposed threaded hardware. Consistent mechanical and electrical contact between parts in the assembled condition can be achieved.
摘要翻译：一种等离子体处理方法和系统（10），包括用于在不使用暴露的螺纹硬件的情况下固定半导体硬件的装置（20）。可以实现组装状态下部件之间的机械接触和电接触。

4. 发明申请

WO2005104164A2 HONEYCOMB OPTICAL WINDOW DEPOSITION SHIELD AND METHOD FOR A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：蜂窝状光学窗口沉积屏蔽和等离子体处理系统的方法
公开(公告)号：WO2005104164A2
公开(公告)日：2005-11-03
申请号：PCT/US2005003032
申请日：2005-01-27
申请人： TOKYO ELECTRON LTD , FINK STEVEN T , MITROVIC ANDREJ S , CALABRESE PAULA A
发明人： FINK STEVEN T , MITROVIC ANDREJ S , CALABRESE PAULA A
IPC分类号： C23C14/00 , H01J7/24 , H01J17/26 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32972
摘要： An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.
摘要翻译：一种光学窗口沉积屏蔽，包括具有通孔的背板，以及具有多个相邻单元的蜂窝结构，所述多个相邻单元被配置为允许通过蜂窝结构进行光学观察。蜂窝结构体的每个单元具有足以阻碍加工等离子体行进通过电池整个长度的长度与直径的纵横比。耦合装置，其被配置为将蜂窝芯结构耦合到背板，使得蜂窝结构与背板中的通孔的至少一部分对准。光学窗口沉积屏蔽屏蔽了等离子体处理装置的光学观察窗口与等离子体接触。

5. 发明申请

WO2004026096A3 VIEWING WINDOW CLEANING APPARATUS 审中-公开
标题翻译：查看窗户清洁装置
公开(公告)号：WO2004026096A3
公开(公告)日：2004-07-08
申请号：PCT/US0326302
申请日：2003-09-22
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： A47L20060101 , C03C15/00 , C23C16/44 , C23F1/00 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67028 , B08B7/0035 , C23C16/4405 , H01J37/32862 , H01J37/32972 , H01L21/67242 , H01L21/67253
摘要： A viewing port for a processing chamber is provided that includes a viewing window cleaning apparatus, a viewing window, and a mounting, where the viewing window cleaning apparatus is coupled to the mounting and disposed between the viewing window and the process chamber, and is configured to form a cleaning plasma in a cleaning plasma region of the mounting. In addition, the mounting can be configured to reduce a number of by-products from a process chamber on the viewing window by preventing them from propagating to the window.
摘要翻译：提供了用于处理室的观察口，该观察口包括观察窗清洁装置，观察窗和安装件，其中观察窗清洁装置联接到安装件并设置在观察窗和处理室之间，并且被构造成以在安装件的清洁等离子体区域中形成清洁等离子体。另外，安装件可以被配置成通过防止它们传播到窗户而减少来自观察窗上的处理室的大量副产品。

6. 发明申请

WO02093605A3 CYLINDER-BASED PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：基于气缸的等离子体处理系统
公开(公告)号：WO02093605A3
公开(公告)日：2003-01-09
申请号：PCT/US0211875
申请日：2002-05-07
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： H01J37/32 , H01L21/00 , C23C16/00
CPC分类号： H01L21/6719 , H01J37/32458 , H01L21/67069 , H01L21/67236 , Y10T29/49948 , Y10T29/53 , Y10T29/53987
摘要： A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then hermetically sealed to the top and bottom of the cylinder. Fasteners (and the vacuum inside the chamber) clamp the plates to the cylinder.
摘要翻译：一种减少真空处理系统的成本的方法和系统，该方法和系统通过利用用于壁的壁和顶部和底部的单独制造的部件。壁由气缸（例如铝管或轧制环锻件）形成，然后将板气密地密封到气缸的顶部和底部。紧固件（和室内的真空）将板夹紧到气缸。

7. 发明申请

WO0233729A3 PLASMA REACTOR WITH REDUCED REACTION CHAMBER 审中-公开
标题翻译：具有降低反应室的等离子体反应器
公开(公告)号：WO0233729A3
公开(公告)日：2002-08-01
申请号：PCT/US0132094
申请日：2001-10-15
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： H01J37/20 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67069 , H01J37/20 , H01J37/321 , H01J37/32743
摘要： A plasma reactor apparatus (100) includes plasma generating assembly (150) that is moveable between a first and second position. The plasma generating assembly (150) includes an inductive coil assembly (216) that is coupled to a source of RF energy. In the first position, acces is provided for mounting a wafer (101) onto a chuck assembly (250). In the second position, the plasma generating assembly (150) and the substrate chuck assembly (250) form an enclosed area (300) about the wafer (101). Process gas is used to fill the enclosed space (300) while a vacuum is created in the enclosed space (300). RF energy is applied to the inductive coil (218) and plasma is formed in the enclosed space (300) in order to process the wafer (101).
摘要翻译：等离子体反应器装置（100）包括可在第一和第二位置之间移动的等离子体发生组件（150）。等离子体生成组件（150）包括耦合到RF能量源的感应线圈组件（216）。在第一位置，提供了用于将晶片（101）安装到卡盘组件（250）上的接口。在第二位置，等离子体发生组件（150）和衬底卡盘组件（250）形成围绕晶片（101）的封闭区域（300）。当封闭空间（300）中产生真空时，使用工艺气体填充封闭空间（300）。将RF能量施加到感应线圈（218），并且在封闭空间（300）中形成等离子体以便处理晶片（101）。

8. 发明申请

WO2006071341A3 METHOD AND APPARATUS TO DETERMINE CONSUMABLE PART CONDITION 审中-公开
标题翻译：确定消耗部分条件的方法和装置
公开(公告)号：WO2006071341A3
公开(公告)日：2007-06-07
申请号：PCT/US2005038176
申请日：2005-10-25
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01L21/67288 , H01J37/32935
摘要： A system for monitoring a condition of a consumable component (8) in a substrate processing system (1) that includes a tapered plug (2) having a first axis (23), a second axis (24) that intersects the first axis, a top portion (25) with first width (B), a bottom portion (26) with a second width (D), and sidewalls (27) joining said top and bottom portions respectively. The tapered plug has a cross sectional profile that is substantially parallel to the top and bottom portions and a cross sectional width that varies according to a location where the cross sectional profile intersects the second axis. At least one of the tapered plugs is inserted into at least one consumable component of the substrate processing system such that the top portion of the tapered plug is exposed to a processing environment of a plasma processing system.
摘要翻译：一种用于监测衬底处理系统（1）中的消耗部件（8）的状态的系统，其包括具有第一轴线（23）的锥形塞（2），与第一轴线相交的第二轴线（24）具有第一宽度（B）的顶部（25），具有第二宽度（D）的底部部分（26）和分别连接所述顶部和底部的侧壁（27）。锥形塞具有基本上平行于顶部和底部的横截面轮廓，并且横截面宽度根据截面轮廓与第二轴线相交的位置而变化。将至少一个锥形插塞插入到基板处理系统的至少一个可消耗部件中，使得锥形插塞的顶部暴露于等离子体处理系统的处理环境。

9. 发明申请

WO2006093578A2 CHUCK PEDESTAL SHIELD 审中-公开
标题翻译： K K。。
公开(公告)号：WO2006093578A2
公开(公告)日：2006-09-08
申请号：PCT/US2006001683
申请日：2006-01-19
申请人： TOKYO ELECTRON LTD , MITROVIC ANDREJ S , FINK STEVEN T
发明人： MITROVIC ANDREJ S , FINK STEVEN T
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32477
摘要： An apparatus for processing semiconductors includes a processing chamber including a plurality of chamber walls, a substrate holder, positioned within the processing chamber and configured to support the substrate, and a linear displacement device, coupled between a base wall of the plurality of walls and the substrate holder and configured to move the substrate holder relative to the base wall. A shielding part extending from the substrate holder to be in close parallel relation with at least one of the plurality of walls such that a first area of the processing chamber is substantially shielded from a processing environment to which the substrate is exposed.
摘要翻译：一种用于处理半导体的设备包括处理室，其包括多个室壁，位于处理室内并被配置为支撑衬底的衬底保持器，以及线性位移装置，其连接在多个壁的底壁和衬底保持器并且构造成相对于底壁移动衬底保持器。从衬底保持器延伸成与多个壁中的至少一个紧密平行的屏蔽部分，使得处理室的第一区域基本上与衬底暴露于的处理环境屏蔽。

10. 发明申请

WO2005048289A3 METHOD AND APPARATUS COMPRISING AN IMPROVED FOCUS RING 审中-公开
标题翻译：包括改进聚焦环的方法和装置
公开(公告)号：WO2005048289A3
公开(公告)日：2006-01-26
申请号：PCT/US2004034338
申请日：2004-10-19
申请人： TOKYO ELECTRON LTD , LANDIS MICHAEL , FINK STEVEN T
发明人： LANDIS MICHAEL , FINK STEVEN T
IPC分类号： H01J37/32
CPC分类号： H01J37/32642
摘要： A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.
摘要翻译：配置成耦合到等离子体处理系统中的衬底保持器的聚焦环组件包括具有用于确定聚焦环的寿命的一个或多个磨损指示器的聚焦环，其中聚焦环与衬底保持器的联接有利于聚焦环在等离子体处理系统中自动对中。例如，安装在基板保持器上的定心环可以包括配置成与聚焦环上的配合特征耦合的定心特征。

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