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1. 发明申请

WO2005114091A2 METHOD AND DEVICE FOR MEASURING WHETHER A PROCESS KIT PART MEETS A PRESCRIBED TOLERANCE 审中-公开
标题翻译：用于测量过程套件的方法和设备是否符合规定的公差
公开(公告)号：WO2005114091A2
公开(公告)日：2005-12-01
申请号：PCT/US2005/003024
申请日：2005-01-27
申请人： TOKYO ELECTRON LIMITED , FINK, Steven, T.
发明人： FINK, Steven, T.
IPC分类号： G01B3/00
CPC分类号： G01B3/50
摘要： A go no-go gauge and method for verifying whether a process kit part used within a plasma chamber of a plasma processing tool has accumulated excessive wear or deposits. The gauge includes a component for verifying whether a dimension of a process kit part feature violates a prescribed size tolerance, the violation indicating that the process kit part has accumulated excessive wear or deposits.
摘要翻译：用于验证等离子体处理工具的等离子体室内使用的处理组件部件是否累积了过多的磨损或沉积物的脱模仪和方法。仪表包括用于验证过程套件零件特征的尺寸是否违反规定的尺寸公差的部件，表示处理套件部件累积过多磨损或沉积的违规。

2. 发明申请

WO2005104164A2 HONEYCOMB OPTICAL WINDOW DEPOSITION SHIELD AND METHOD FOR A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：蜂窝状光学窗口沉积屏蔽和等离子体处理系统的方法
公开(公告)号：WO2005104164A2
公开(公告)日：2005-11-03
申请号：PCT/US2005003032
申请日：2005-01-27
申请人： TOKYO ELECTRON LTD , FINK STEVEN T , MITROVIC ANDREJ S , CALABRESE PAULA A
发明人： FINK STEVEN T , MITROVIC ANDREJ S , CALABRESE PAULA A
IPC分类号： C23C14/00 , H01J7/24 , H01J17/26 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32972
摘要： An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.
摘要翻译：一种光学窗口沉积屏蔽，包括具有通孔的背板，以及具有多个相邻单元的蜂窝结构，所述多个相邻单元被配置为允许通过蜂窝结构进行光学观察。蜂窝结构体的每个单元具有足以阻碍加工等离子体行进通过电池整个长度的长度与直径的纵横比。耦合装置，其被配置为将蜂窝芯结构耦合到背板，使得蜂窝结构与背板中的通孔的至少一部分对准。光学窗口沉积屏蔽屏蔽了等离子体处理装置的光学观察窗口与等离子体接触。

3. 发明申请

WO2005103507A1 METHOD AND SYSTEM FOR FASTENING COMPONENTS USED IN PLASMA PROCESSING 审中-公开
标题翻译：用于压缩等离子体加工中使用的组分的方法和系统
公开(公告)号：WO2005103507A1
公开(公告)日：2005-11-03
申请号：PCT/US2005/003023
申请日：2005-01-27
申请人： TOKYO ELECTRON LIMITED , FINK, Steven, T.
发明人： FINK, Steven, T.
IPC分类号： F16B21/00
CPC分类号： F16B21/02 , F16B5/10
摘要： A fastening component for fastening together a first component and a second component used in a plasma processing tool. The fastening component includes a first surface configured to be exposed to plasma processing performed in the plasma processing tool, and a second surface configured to contact the first component. Also included is a stem extending from the second surface and configured to at least partially protrude through the first component and the second component. The fastening component further includes a locking pin extending from at least one side of the stem and configured to contact the second component. The first surface, the second surface, the stem, and/or locking pin are made of or coated with a material that is highly resistant to erosion resulting from plasma processing.
摘要翻译：用于将第一部件和用于等离子体处理工具中的第二部件紧固在一起的紧固部件。紧固部件包括构造成暴露于等离子体处理工具中执行的等离子体处理的第一表面和被配置为接触第一部件的第二表面。还包括从第二表面延伸并构造成至少部分地突出穿过第一部件和第二部件的杆。紧固部件还包括从杆的至少一侧延伸并构造成接触第二部件的锁定销。第一表面，第二表面，杆和/或锁定销由对等离子体处理产生的侵蚀高度抵抗的材料制成或涂覆。

4. 发明申请

WO2005067462A2 MULTI-POSITION STOP MECHANISM 审中-公开
标题翻译：多位停止机制
公开(公告)号：WO2005067462A2
公开(公告)日：2005-07-28
申请号：PCT/US2004/035511
申请日：2004-11-05
申请人： TOKYO ELECTRON LIMITED , FINK, Steven, T.
发明人： FINK, Steven, T.
IPC分类号： F16D71/04 , F16H21/12 , H01L21/00 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67069 , H01L21/68 , H01L21/68792 , Y10T74/1836
摘要： A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or the second object, a rotatble shaft rotatably mounted to the housing, and plurality of stops located on the rotatable shaft. When the shaft is rotated within the housing, the stops are rotated to different positions relative to the housing. As such, the rotatable shaft positions one of the stops to contact the first or second object that the multi-stop mechanism is not attached to.
摘要翻译：用于在可移入和移出彼此接触的第一和第二物体之间提供多个停止位置的多停机构。本发明的多停机构包括将多停机构固定到第一物体和/或第二物体的壳体，可转动地安装在壳体上的可转动的轴以及位于可转轴上的多个止动件。当轴在壳体内旋转时，止挡件相对于壳体旋转到不同的位置。这样，可旋转的轴将止动件中的一个定位成接触多停止机构未附接到的第一或第二物体。

5. 发明申请

WO2005048289A2 METHOD AND APPARATUS FOR IMPROVED FOCUS RING 审中-公开
标题翻译：改进聚焦环的方法和装置
公开(公告)号：WO2005048289A2
公开(公告)日：2005-05-26
申请号：PCT/US2004/034338
申请日：2004-10-19
申请人： TOKYO ELECTRON LIMITED , LANDIS, Michael , FINK, Steven, T.
发明人： LANDIS, Michael , FINK, Steven, T.
IPC分类号： H01J37/00
CPC分类号： H01J37/32642
摘要： A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.
摘要翻译：配置成耦合到等离子体处理系统中的衬底保持器的聚焦环组件包括具有用于确定聚焦环的寿命的一个或多个磨损指示器的聚焦环，其中聚焦环与衬底保持器的联接有利于聚焦环在等离子体处理系统中自动对中。例如，安装在基板保持器上的定心环可以包括配置成与聚焦环上的配合特征耦合的定心特征。

6. 发明申请

WO2004095502A2 PLASMA PROCESSING SYSTEM AND METHOD 审中-公开
标题翻译：等离子体处理系统和方法
公开(公告)号：WO2004095502A2
公开(公告)日：2004-11-04
申请号：PCT/US2004/001406
申请日：2004-01-21
申请人： TOKYO ELECTRON LIMITED , FINK, Steven, T. , MOROZ, Paul , STRANG, Eric, J. , MITROVIC, Andrej, S.
发明人： FINK, Steven, T. , MOROZ, Paul , STRANG, Eric, J. , MITROVIC, Andrej, S.
IPC分类号： H01J37/00
CPC分类号： H01J37/3244 , H01J2237/022
摘要： A plasma processing system includes a chamber containing a plasma processing region and a chuck constructed and arranged to support a substrate within the chamber in the processing region. The plasma processing system further includes at least one gas injection passage in communication with the chamber and configured to facilitate removal of particles from the chamber by passing purge gas therethrough. In one embodiment, the plasma processing system can include an electrode configured to attract or repel particles in the chamber by electrostatic force when the electrode is biased with DC or RF power. A method of processing a substrate in a plasma processing system includes removing particles in a chamber of the plasma processing system by supplying purge gas through at least one gas injection passage in communication with the chamber.
摘要翻译：等离子体处理系统包括包含等离子体处理区域的腔室和构造和布置成在处理区域内的腔室内支撑衬底的卡盘。等离子体处理系统还包括至少一个与室连通的气体注入通道，并且构造成便于通过吹扫气体从腔室中除去颗粒。在一个实施例中，等离子体处理系统可以包括电极，其被配置为当电极用DC或RF功率偏置时通过静电力吸引或排斥腔室中的颗粒。一种在等离子体处理系统中处理衬底的方法，包括通过与室连通的至少一个气体注入通道供应净化气体来去除等离子体处理系统的腔室中的颗粒。

7. 发明申请

WO2004026096A3 VIEWING WINDOW CLEANING APPARATUS 审中-公开
标题翻译：查看窗户清洁装置
公开(公告)号：WO2004026096A3
公开(公告)日：2004-07-08
申请号：PCT/US0326302
申请日：2003-09-22
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： A47L20060101 , C03C15/00 , C23C16/44 , C23F1/00 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67028 , B08B7/0035 , C23C16/4405 , H01J37/32862 , H01J37/32972 , H01L21/67242 , H01L21/67253
摘要： A viewing port for a processing chamber is provided that includes a viewing window cleaning apparatus, a viewing window, and a mounting, where the viewing window cleaning apparatus is coupled to the mounting and disposed between the viewing window and the process chamber, and is configured to form a cleaning plasma in a cleaning plasma region of the mounting. In addition, the mounting can be configured to reduce a number of by-products from a process chamber on the viewing window by preventing them from propagating to the window.
摘要翻译：提供了用于处理室的观察口，该观察口包括观察窗清洁装置，观察窗和安装件，其中观察窗清洁装置联接到安装件并设置在观察窗和处理室之间，并且被构造成以在安装件的清洁等离子体区域中形成清洁等离子体。另外，安装件可以被配置成通过防止它们传播到窗户而减少来自观察窗上的处理室的大量副产品。

8. 发明申请

WO2004019368A3 REDUCED VOLUME PLASMA REACTOR 审中-公开
公开(公告)号：WO2004019368A3
公开(公告)日：2004-03-04
申请号：PCT/US2003/025478
申请日：2003-08-14
申请人： TOKYO ELECTRON LIMITED , FINK, Steven, T.
发明人： FINK, Steven, T.
IPC分类号： H01J37/18
摘要： A plasma processing system and a method for processing a substrate with a plasma processing system. An aspect of the invention provides a plasma processing system (100) that comprises a chamber (101), including a processing region (119) and an opening (107), a plasma generating system (114), constructed and arranged to produce a plasma during a plasma process in the processing region, a chuck (111), constructed and arranged to support a substrate (102) within the chamber in the processing region, a ring member (112) arranged in the chamber and a moving assembly (113), constructed and arranged to move the ring member, wherein the ring member is mounted on a periphery of the chuck such that when the substrate is being processed the ring member seals the opening.

9. 发明申请

WO02093605A3 CYLINDER-BASED PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：基于气缸的等离子体处理系统
公开(公告)号：WO02093605A3
公开(公告)日：2003-01-09
申请号：PCT/US0211875
申请日：2002-05-07
申请人： TOKYO ELECTRON LTD , FINK STEVEN T
发明人： FINK STEVEN T
IPC分类号： H01J37/32 , H01L21/00 , C23C16/00
CPC分类号： H01L21/6719 , H01J37/32458 , H01L21/67069 , H01L21/67236 , Y10T29/49948 , Y10T29/53 , Y10T29/53987
摘要： A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then hermetically sealed to the top and bottom of the cylinder. Fasteners (and the vacuum inside the chamber) clamp the plates to the cylinder.
摘要翻译：一种减少真空处理系统的成本的方法和系统，该方法和系统通过利用用于壁的壁和顶部和底部的单独制造的部件。壁由气缸（例如铝管或轧制环锻件）形成，然后将板气密地密封到气缸的顶部和底部。紧固件（和室内的真空）将板夹紧到气缸。

10. 发明申请

WO2002059933A2 VERTICALLY TRANSLATABLE CHUCK ASSEMBLY AND METHOD FOR A PLASMA REACTOR SYSTEM 审中-公开
标题翻译：垂直翻转卡盘组件及等离子体反应器系统的方法
公开(公告)号：WO2002059933A2
公开(公告)日：2002-08-01
申请号：PCT/US2001/048851
申请日：2001-12-20
申请人： TOKYO ELECTRON LIMITED , JOHNSON, Wayne, L. , FINK, Steven, T. , BROWNING, Jeff , JEVTIC, Jovan
发明人： JOHNSON, Wayne, L. , FINK, Steven, T. , BROWNING, Jeff , JEVTIC, Jovan
IPC分类号： H01J37/00
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32174
摘要： A chuck assembly (110) for supporting a workpiece (116) within a plasma reactor chamber (60) having sidewalls (64) surrounding an interior region (65) capable of supporting a plasma. The assembly includes a chuck base (130) and a plurality of support arms (150A-150C) extending outwardly from the chuck base perimeter to the chamber sidewalls. The support arms are adapted to support the chuck base within the interior region, while also being adapted to provide a path for mechanically, electrically, pneumatically and/or fluidly communicating with the chuck assembly from outside the chamber. The chuck assembly includes a workpiece support member (160) arranged above the chuck base, capable of supporting the workpiece and serving as a chuck electrode. The workpiece support member is supported by one or more vertical translation member (168) arranged between and operatively connected to the chuck base and the workpiece support member. The chuck assembly includes a match network (180MN), wherein at least a portion of the match network is mounted directly to the workpiece support member. The use of the support arms allows for the positioning of a vacuum pump system (250) directly beneath the chuck assembly.
摘要翻译：一种用于在等离子体反应室（60）内支撑工件（116）的卡盘组件（110），其具有围绕能够支撑等离子体的内部区域（65）的侧壁（64）。该组件包括卡盘基部（130）和从卡盘基部周边向腔室侧壁向外延伸的多个支撑臂（150A-150C）。支撑臂适于在内部区域内支撑卡盘基座，同时还适于提供从腔室外部与卡盘组件机械地，电气地，气动地和/或流体地连通的路径。卡盘组件包括布置在卡盘基座上方的工件支撑构件（160），其能够支撑工件并用作卡盘电极。工件支撑构件由一个或多个垂直移动构件（168）支撑，垂直移动构件（168）布置在卡盘基部和工件支撑构件之间并且可操作地连接至卡盘基部和工件支撑构件卡盘组件包括匹配网络（180MN），其中匹配网络的至少一部分直接安装到工件支撑构件。支撑臂的使用允许将真空泵系统（250）定位在卡盘组件的正下方。

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