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1. 发明申请

WO2015034690A1 UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TEMPLATES FOR DIRECTED SELF-ASSEMBLY 审中-公开
标题翻译：紫外线辅助剥离硬化的光催化剂以创建用于指导的自组装的化学模板
公开(公告)号：WO2015034690A1
公开(公告)日：2015-03-12
申请号：PCT/US2014/052292
申请日：2014-08-22
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： SOMERVELL, Mark , BROWN, Ian , SIMMS, Ihsan , NEGREIRA, Ainhoa , NAFUS, Kathleen
IPC分类号： H01L21/20
CPC分类号： H01L21/0271 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/091 , G03F7/40 , G03F7/423 , G03F7/425 , H01L21/31133 , H01L21/31138
摘要： A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200nm and the second wavelength of UV light may be greater than 200mn.
摘要翻译：公开了一种处理方法，其通过允许在DSA模板中形成改进的引导条来实现改进的定向自组装（DSA）处理方案，其可以使得能够在衬底上形成亚-30nm特征。可以通过改善不同有机层或膜之间的湿化学处理的选择性来形成改进的引导条。在一个实施方案中，用一个或多个紫外光波长处理有机层可提高选择性。 UV光的第一波长可以小于200nm，第二波长的UV光可以大于200mn。

2. 发明申请

WO2021076320A1 SYSTEMS AND METHODS FOR MONITORING ONE OR MORE CHARACTERISTICS OF A SUBSTRATE 审中-公开
公开(公告)号：WO2021076320A1
公开(公告)日：2021-04-22
申请号：PCT/US2020/053302
申请日：2020-09-29
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , SOMERVELL, Mark , HOOGE, Joshua , TADOKORO, Masahide
IPC分类号： H01L21/66 , H01L21/67 , G01B11/06 , H01L21/677
摘要： A substrate inspection system is provided to monitor characteristics of a substrate, while the substrate is disposed within (or being transferred into/out of) a processing unit of a liquid dispense substrate processing system. The inspection system is integrated within a liquid dispense substrate processing system and includes one or more optical sensors of a reflectometer (such as a spectrometer or laser-based transceiver) configured to obtain spectral data from a substrate. A controller is coupled to receive the spectral data from the optical sensors(s). The one or more optical sensors (or one or more optical fibers coupled to the rest of the optical sensor hardware) are coupled at locations within the substrate processing system. The controller analyzes the spectral data received from the optical sensors(s) to detect characteristic(s) of the substrate including, but not limited to, film thickness (FT), refractive index changes, and associated critical dimension (CD) changes.

3. 发明申请

WO2021034567A1 METHOD AND PROCESS FOR STOCHASTIC DRIVEN DEFECTIVITY HEALING 审中-公开
公开(公告)号：WO2021034567A1
公开(公告)日：2021-02-25
申请号：PCT/US2020/045931
申请日：2020-08-12
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , NAGAHARA, Seiji , DINH, Congque , SOMERVELL, Mark
IPC分类号： G03F7/20 , G03F7/004 , G03F7/26
摘要： Substrate processing techniques to alleviate missing contact holes, scummed contact holes and scummed caused bridging are disclosed. In one embodiment, electromagnetic radiation (EMR) absorbing molecules are utilized in a process that uses an initial patterned exposure followed by a flood exposure. In one embodiment, a Photo-Sensitized Chemically-Amplified Resist (PSCAR) resist process is utilized to form contact holes in which an initial exposure and develop process is performed followed by a flood exposure and a second develop process. In another embodiment, a process is utilized in which precursors of EMR absorbing molecules are incorporated into a layer underlying the resist layer. Thus, enhanced formation of EMR absorbing molecules will result at the interface of the resist layer and the underlying layer.

4. 发明申请

WO2021091636A1 SYSTEMS AND METHODS FOR SPIN PROCESS VIDEO ANALYSIS DURING SUBSTRATE PROCESSING 审中-公开
公开(公告)号：WO2021091636A1
公开(公告)日：2021-05-14
申请号：PCT/US2020/053373
申请日：2020-09-30
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , HOOGE, Joshua , SOMERVELL, Mark , IWAKI, Hiroyuki , TADOKORO, Masahide , ENOMOTO, Masashi , ESTRELLA, Joel , KUNUGIMOTO, Yuichiro
IPC分类号： H01L21/67 , H04N7/18 , G06T7/13 , H01L21/687
摘要： Camera images may be utilized to detect substrate edges and provide information regarding the centering of the substrate within the fluid dispense system. Camera images may also be utilized to monitoring the location of a cup within the fluid dispense system. The signal processing techniques utilized may include data smoothing, analyzing only certain wavelengths of reflected energy, transforming the data (in one embodiment utilizing a Fourier transform), and / or analyzing a sub-set of the collected pixels of data. The camera image data collected herein may be combined with a wide variety of other data so as to better monitor, characterize and/or control a substrate processing process flow.

5. 发明申请

WO2021091635A1 METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE SYSTEMS 审中-公开
公开(公告)号：WO2021091635A1
公开(公告)日：2021-05-14
申请号：PCT/US2020/053306
申请日：2020-09-29
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： HOOGE, Joshua , CARCASI, Michael , SOMERVELL, Mark
IPC分类号： H01L21/67 , H01L21/687 , H01L21/66
摘要： Embodiments are described herein to monitor and synchronize dispense systems for processing systems. For one embodiment, pressure and flow rate sensors are used to determine a delay between a flow change event and an increase in flow rate, and this delay is used to detect defects or conditions within the dispense system. For one embodiment, dispense system operation is synchronized using flow rate sensors. For one embodiment, simulation models or complex dispense profiles based upon combined pressure/flow/spin/concentration sensor data are used to enable complex process recipes. For one embodiment, dispense-to-dispense pressure and/or flow rate measurements are used to detect dispense parameters and defects. For one embodiment, cameras and image processing are used to detect flow rates from the dispense nozzle, and dispense-to-dispense measurements are used to detect dispense parameters and defects. One or more of the disclosed embodiments can be used in processing systems for microelectronic workpieces.

6. 发明申请

WO2020251927A1 PLANARIZATION OF SEMICONDUCTOR DEVICES 审中-公开
公开(公告)号：WO2020251927A1
公开(公告)日：2020-12-17
申请号：PCT/US2020/036778
申请日：2020-06-09
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： BURNS, Ryan , SOMERVELL, Mark , LEMLEY, Corey
IPC分类号： H01L21/768
摘要： In certain embodiments, a method for processing a substrate includes applying a surface treatment to selected surfaces of the substrate. The substrate has a non-planar topography including structures defining recesses. The method further includes depositing a fill material on the substrate by spin-on deposition. The surface treatment directs the fill material to the recesses and away from the selected surfaces to fill the recesses with the fill material without adhering to the selected surfaces. The method further includes removing the surface treatment from the selected surfaces of the substrate and depositing a planarizing film on the substrate by spin-on deposition. The planarizing film is deposited on the selected surfaces and top surfaces of the fill material.

7. 发明申请

WO2010033720A1 DUAL TONE DEVELOPMENT PROCESSES 审中-公开
标题翻译：双音发展过程
公开(公告)号：WO2010033720A1
公开(公告)日：2010-03-25
申请号：PCT/US2009/057342
申请日：2009-09-17
申请人： TOKYO ELECTRON LIMITED , FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven
发明人： FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven
IPC分类号： G03F7/00
CPC分类号： G03F7/095 , G03F7/322 , G03F7/325
摘要： A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process. The method can advantageously comprise monitoring various metrics of the subject resists in comparison with simulated limits, enabling corrective changes in process parameters that reduce unwanted variations in product metrics. The system can advantageously comprise an interface layer under or a protecting layer over the resist layer, wherein the interface or protecting layer can be activated to modify the threshold reactivity profile of the resist layer.
摘要翻译：描述了使用双色调显影处理图案化衬底的方法和系统。该方法和系统包括使用具有聚合物主链的抗蚀剂材料，其具有连接到其上的多个保护基，以改善双音发展过程的工艺范围和临界尺寸的一致性。该方法可以有利地包括与模拟限制相比监测受试者抗蚀剂的各种度量，使得能够减少过程参数的校正改变，从而减少产品度量的不期望的变化。该系统可以有利地包括在抗蚀剂层上的保护层下面的界面层，其中该界面或保护层可被激活以修饰抗蚀剂层的阈值反应性分布。

8. 发明申请

WO2010114716A1 USING ELECTRIC-FIELD DIRECTED POST-EXPOSURE BAKE FOR DOUBLE PATTERNING (D-P) 审中-公开
标题翻译：使用电场指向的曝光后双面打印纸（D-P）
公开(公告)号：WO2010114716A1
公开(公告)日：2010-10-07
申请号：PCT/US2010/027874
申请日：2010-03-18
申请人： TOKYO ELECTRON LIMITED , SCHEER, Steven , SOMERVELL, Mark
发明人： SCHEER, Steven , SOMERVELL, Mark
IPC分类号： H01L21/461
CPC分类号： H01L21/0332 , H01L21/0337
摘要： The invention provides a method of processing a substrate using Double-Patterning (D-P) processing sequences and Electric-Field Enhanced Layers (E-FELs). The D-P processing sequences and E-FELs can be used to create lines, trenches, vias, spacers, contacts, and gate structures using a minimum number of etch processes.
摘要翻译：本发明提供使用双图案（D-P）处理序列和电场增强层（E-FEL）处理衬底的方法。 D-P处理序列和E-FEL可以用于使用最少数量的蚀刻工艺来产生线，沟槽，通孔，间隔物，接触和栅极结构。

9. 发明申请

WO2010126735A1 FLOOD EXPOSURE PROCESS FOR DUAL TONE DEVELOPMENT IN LITHOGRAPHIC APPLICATIONS 审中-公开
标题翻译：用于岩石应用中双色发展的FLOOD曝光过程
公开(公告)号：WO2010126735A1
公开(公告)日：2010-11-04
申请号：PCT/US2010/031607
申请日：2010-04-19
申请人： TOKYO ELECTRON LIMITED , FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven , PRINTZ, Wallace, P.
发明人： FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven , PRINTZ, Wallace, P.
IPC分类号： A61N5/06
CPC分类号： G03F7/30 , G03F7/095 , G03F7/70466
摘要： A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process.
摘要翻译：描述了使用双色调显影处理来图案化衬底的方法和系统。该方法和系统包括基底的暴露以提高双音发展过程的过程纬度。

10. 发明申请

WO2010025198A1 METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT 审中-公开
标题翻译：使用双音发展绘制基板的方法
公开(公告)号：WO2010025198A1
公开(公告)日：2010-03-04
申请号：PCT/US2009/055084
申请日：2009-08-26
申请人： TOKYO ELECTRON LIMITED , GRONHEID, Roel , BERNARD, Sophie , FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven , INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC) VZW , KATHOLIEKE UNVERSITEIT LEUVEN, K.U. LEUVEN R&D
发明人： GRONHEID, Roel , BERNARD, Sophie , FONSECA, Carlos, A. , SOMERVELL, Mark , SCHEER, Steven
IPC分类号： G03C5/00 , G03F9/00
CPC分类号： G03F7/325 , G03F7/2002 , G03F7/322 , G03F7/38
摘要： A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process.
摘要翻译：描述了用于图案化衬底的方法。特别地，本发明涉及一种使用双音发展对基片进行双重图案化的方法。此外，本发明涉及优化双音发展过程。

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