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    • 3. 发明申请
    • MICROFABRICATED FILTER AND SHELL CONSTRUCTED WITH A PERMEABLE MEMBRANE
    • 微孔过滤器和壳体用可渗透膜构成
    • WO1997049475A1
    • 1997-12-31
    • PCT/US1997010221
    • 1997-05-29
    • THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    • THE REGENTS OF THE UNIVERSITY OF CALIFORNIALEBOUITZ, Kyle, S.HOWE, Roger, T.PISANO, Albert, P.
    • B01D24/02
    • B81C1/00333B01D67/0072B01D67/0093B01D71/02B01D2323/225B01D2325/04B01L3/502707B01L3/502753B01L2200/12B01L2300/0681B81C1/00158G01N33/491G03F7/00
    • Microfabricated filters (100) constructed with permeable polysilicon membranes (104) and methods for fabricating such filters. The filters include a frame structure (102) having a plurality of openings (103) therethrough and a permeable polysilicon membrane disposed over the openings in the frame structure. The frame structure provides support for the permeable polysilicon membrane. The pores of the filter may be smaller than the resolution limit of photolithography. The width of the pores may be as small as about 0.05 microns. The filters feature a relatively high throughput due to the extremely short pore length. The filters may be fabricated utilizing standard microfabrication processes. Also, microfabricated shells constructed with permeable membranes for encapsulating microfabricated devices such as microelectromechanical structures (MEMS) and methods for fabricating such shells. The shells include a frame structure having a plurality of openings therethrough, a permeable membrane disposed on the openings through the frame structure, an optional sealing cavity bounded by the frame structure. The permeable membrane may be a thin film layer of polysilicon having a thickness of less than 0.3 microns.
    • 用可渗透多晶硅膜(104)构成的微型过滤器(100)和用于制造这种过滤器的方法。 过滤器包括具有穿过其中的多个开口(103)的框架结构(102)和设置在框架结构中的开口上方的可渗透多晶硅膜。 框架结构为可渗透多晶硅膜提供支撑。 滤光器的孔可以小于光刻的分辨率极限。 孔的宽度可以小至约0.05微米。 由于孔长度非常短,过滤器的生产量相对较高。 可以使用标准微加工工艺来制造过滤器。 而且,用可封装微结构器件(例如微机电结构(MEMS))和用于制造这种壳的方法的可渗透膜构成的微制造壳体。 壳体包括具有穿过其中的多个开口的框架结构,通过框架结构设置在开口上的可渗透膜,由框架结构限定的可选密封腔。 可渗透膜可以是厚度小于0.3微米的多晶硅薄膜层。