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    • 1. 发明申请
    • FLUID DISCHARGING DEVICE
    • 流体排放装置
    • WO2006008236A1
    • 2006-01-26
    • PCT/EP2005/053197
    • 2005-07-05
    • SEZ AGPICHLER, Stefan
    • PICHLER, Stefan
    • H01L21/00
    • H01L21/67075B05B7/0416B05B7/065B05B14/00H01L21/6704H01L21/67051H01L21/6708
    • The invention relates to a fluid discharging device for separately discharging at least two fluids comprising an inner nozzle for discharging a first fluid and a coaxially arranged outer nozzle for discharging a second fluid. Such a fluid can be liquid or gas or a mixture thereof. Mixtures of liquid or gas comprise fluids having gas as the continuous phase and liquid as the disperse phase (e.g.aerosols) and fluids having liquid as the continuous phase and gas as the disperse phase (e.g.carbonated water). The invention further relates to a device and a method for wet treating a flat disc-like substrate, such as semiconductor wafers, flat panel displays or compact discs utilizing such a fluid discharging device. If in the following the term wafer is used, such disk-like substrates are meant.
    • 本发明涉及一种用于分开排放至少两种流体的流体排放装置,包括用于排放第一流体的内部喷嘴和用于排出第二流体的同轴布置的外部喷嘴。 这种流体可以是液体或气体或其混合物。 液体或气体的混合物包括具有作为连续相的气体的流体和作为分散相(例如溶剂)的液体,以及作为连续相的液体和作为分散相的气体(例如碳酸化水)的流体。 本发明还涉及一种用于湿式处理诸如半导体晶片,平板显示器或使用这种流体排放装置的光盘的平板状基板的装置和方法。 如果在下文中使用晶片,则意味着这种盘状基板。