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    • 1. 发明申请
    • DEVICE AND PROCESS FOR WET TREATING A PERIPHERAL AREA OF A WAFER-SHAPED ARTICLE
    • 湿法处理波浪形文字的外围区域的设备和方法
    • WO2009065757A1
    • 2009-05-28
    • PCT/EP2008/065371
    • 2008-11-12
    • SEZ AGFRANK, DieterPARZEFALL, JürgenSCHWARZFURTNER, Alexander
    • FRANK, DieterPARZEFALL, JürgenSCHWARZFURTNER, Alexander
    • H01L21/00
    • H01L21/67051H01L21/6708
    • Disclosed is a device (1) for wet treating a peripheral area of a wafer-shaped article W. The device comprises holding means (20, 50) for holding and rotating the wafer-shaped article at its edge, a first liquid treatment unit (30) for supplying liquid towards the peripheral area, and a second liquid treatment unit (60) for supplying liquid towards the peripheral area. The holding means comprise rollers (23, 53) for driving the wafer-shaped article at its edge. The first liquid treatment unit comprises a first liquid carrier for providing a first liquid to wet a first section of the peripheral area, a first liquid supply nozzle for supplying liquid to the first liquid carrier, and a first liquid discharging channel for removing liquid from the first liquid carrier. The second liquid treatment unit comprises, a second liquid carrier for providing a second liquid to wet a second section of the peripheral area, a second liquid supply nozzle for supplying liquid to the second liquid carrier, a second liquid discharging channel for removing liquid from the second liquid carrier, and a second gas treatment section with a gas supply nozzle for supplying gas towards the peripheral area, which has been treated with the second liquid for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid. Furthermore an associated method is disclosed.
    • 公开了一种用于湿式处理晶片状物品W的周边区域的装置(1)。该装置包括用于在其边缘保持和旋转晶片状物品的保持装置(20,50),第一液体处理单元 30),用于向周边区域供应液体;以及第二液体处理单元(60),用于向周边区域供应液体。 保持装置包括用于在其边缘处驱动晶片状物品的辊(23,53)。 第一液体处理单元包括用于提供第一液体以润湿周边区域的第一部分的第一液体载体,用于向第一液体载体供应液体的第一液体供给喷嘴和用于从第一液体载体中除去液体的第一液体排出通道 第一液载体。 第二液体处理单元包括用于提供第二液体以润湿周边区域的第二部分的第二液体载体,用于向第二液体载体供应液体的第二液体供应喷嘴,用于从第二液体载体中除去液体的第二液体排出通道 第二液体载体和第二气体处理部,其具有用于向周边区域供应气体的气体供给喷嘴,所述气体供给喷嘴已经用用于从周边区域除去大部分第二液体的第二液体处理,并且具有气体排出通道 排出气体并除去液体。 此外,公开了一种相关联的方法。
    • 4. 发明申请
    • UNIFORM CAVITATION FOR PARTICLE REMOVAL
    • 用于颗粒去除的均匀孔
    • WO2004110657A3
    • 2005-05-12
    • PCT/EP2004051020
    • 2004-06-03
    • SEZ AGFERRELL GARY WSCHIPPER JOHN FRATRA JAGJIT S
    • FERRELL GARY WSCHIPPER JOHN FRATRA JAGJIT S
    • B08B3/12H01L21/00
    • H01L21/67057B08B3/12
    • Systems and methods for promoting a substantially uniform cavitation field. With system (100) including a diaphragm (109) dividing a container (103), a second energy pulse corresponding to a first energy pulse arising from collapse of a cavity C is produced and is used to determine whether to adjust a corresponding transducer 121-k. In system (16), a cavity creating unit (11), including an assembly of transducers 15-i, is moveable from a test liquid to a particle removal (PR) liquid after transducer testing. In another system, a sensor plate (170) having an array of sensors 171-j provides a virtual wafer. A substantially uniform field of cavitation may be maintained by a cavity enhancement liquid, or adjustment of transducer energy. Mechanisms of holding an object produce substantially uniform cavitation. Opposed transducers in a container having monotonically decreasing and/or increasing cavitation density produce substantially uniform cavitation density.
    • 用于促进基本均匀的空化场的系统和方法。 对于包括分隔容器(103)的隔膜(109)的系统(100),产生对应于由空腔C的塌陷引起的第一能量脉冲的第二能量脉冲,并用于确定是否调整相应的换能器121- ķ。 在系统(16)中,包括换能器15-i的组件的空腔产生单元(11)在换能器测试之后可从测试液体移动到颗粒去除(PR)液体。 在另一系统中,具有传感器171-j阵列的传感器板(170)提供虚拟晶片。 可以通过空腔增强液体或换能器能量的调节来维持基本均匀的空化场。 保持物体的机理产生基本均匀的气蚀。 具有单调减小和/或增加的空化密度的容器中的对置换能器产生基本均匀的空化密度。
    • 5. 发明申请
    • UNIFORM CAVITATION FOR PARTICLE REMOVAL
    • 用于颗粒去除的均匀孔
    • WO2004110657A2
    • 2004-12-23
    • PCT/EP2004/051020
    • 2004-06-03
    • SEZ AGFERRELL, Gary W.SCHIPPER, John F.RATRA, Jagjit S.
    • FERRELL, Gary W.SCHIPPER, John F.RATRA, Jagjit S.
    • B08B3/12
    • H01L21/67057B08B3/12
    • Systems and methods for promoting a substantially uniform cavitation field. With system (100) including a diaphragm (109) dividing a container (103), a second energy pulse corresponding to a first energy pulse arising from collapse of a cavity C is produced and is used to determine whether to adjust a corresponding transducer 121-k. In system (16), a cavity creating unit (11), including an assembly of transducers 15-i, is moveable from a test liquid to a particle removal (PR) liquid after transducer testing. In another system, a sensor plate (170) having an array of sensors 171-j provides a virtual wafer. A substantially uniform field of cavitation may be maintained by a cavity enhancement liquid, or adjustment of transducer energy. Mechanisms of holding an object produce substantially uniform cavitation. Opposed transducers in a container having monotonically decreasing and/or increasing cavitation density produce substantially uniform cavitation density.
    • 用于促进基本均匀的空化场的系统和方法。 对于包括分隔容器(103)的隔膜(109)的系统(100),产生对应于由空腔C的塌陷引起的第一能量脉冲的第二能量脉冲,并用于确定是否调整相应的换能器121- ķ。 在系统(16)中,包括换能器15-i的组件的空腔产生单元(11)在换能器测试之后可从测试液体移动到颗粒去除(PR)液体。 在另一系统中,具有传感器171-j阵列的传感器板(170)提供虚拟晶片。 可以通过空腔增强液体或换能器能量的调节来维持基本均匀的空化场。 保持物体的机理产生基本均匀的气蚀。 具有单调减小和/或增加的空化密度的容器中的对置换能器产生基本均匀的空化密度。
    • 9. 发明申请
    • DEVICE AND METHOD FOR WET TREATING PLATE-LIKE-ARTICLES
    • 用于湿处理板状物品的装置和方法
    • WO2008071517A1
    • 2008-06-19
    • PCT/EP2007/062489
    • 2007-11-19
    • SEZ AGBRUGGER, MichaelSCHWARZFURTNER, Alexander
    • BRUGGER, MichaelSCHWARZFURTNER, Alexander
    • H01L21/00H01L21/687H01L21/683G03F7/16
    • H01L21/68735G03F7/162H01L21/67023H01L21/6704H01L21/67051H01L21/67063H01L21/67075H01L21/6708H01L21/6715
    • Disclosed is a device for wet treatment of plate-like articles comprising, a chuck for holding a single plate-like article comprising an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip, wherein the chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck, the rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm. Further disclosed is an associated method.
    • 公开了一种用于湿式处理板状制品的装置,包括:用于保持单个板状制品的卡盘,所述卡盘用于当用液体处理时包括向上表面用于接收从板状物品流出的液体,其中卡盘向外 由周向环形凸缘界定,其中卡盘的外径大于待处理的板状制品的最大直径,以及具有朝上的环形表面的可旋转部分,用于接收从外周唇缘流出的液体 卡盘,可旋转部分可相对于卡盘旋转,环形表面相对于周向环形唇缘同轴布置,环形表面的内径小于卡盘的外径,并且 唇缘和向上的环形表面之间的距离d在0.1mm至5mm的范围内。 进一步公开的是相关联的方法。