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1. 发明申请

WO2011117872A1 SYSTEM AND METHOD FOR CONTROLLING A LITHOGRAPHY PROCESS 审中-公开
标题翻译：用于控制光刻过程的系统和方法
公开(公告)号：WO2011117872A1
公开(公告)日：2011-09-29
申请号：PCT/IL2011/000274
申请日：2011-03-24
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz
发明人： BRILL, Boaz
IPC分类号： G03F7/20 , G01B11/00 , G01N21/956
CPC分类号： G03F7/70625 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2021/8822
摘要： A measurement system and method is presented for measuring properties of a structure having a pattern of spaced-apart features arranged along a pattern axis. The measurement system comprises: a structure support unit defining a support plane for supporting the structure, an optical system comprising an illumination system defining an illumination path, and at least one detection system defining one or more detection paths, and a control system. The optical system has a predetermined numerical aperture, and is configured to define an incidence plane and the detection corresponding to dark-field detection mode for collecting light propagating from an illuminated region on the structure with a solid angle outside that of specular reflection, said incidence plane being oriented with respect to said support plane such as to form a selected angle other than 90 degrees with said pattern axis. The control system is configured and operable for receiving from the detection system data indicative of light detected with said dark-field mode and processing the received data by applying thereto predetermined modeled data based on a predetermined unit cell having a dimension along the patterned axis selected in accordance with the numerical aperture of the optical system.
摘要翻译：提出了一种用于测量具有沿图案轴线布置的间隔特征图案的结构的性质的测量系统和方法。测量系统包括：结构支撑单元，其限定用于支撑结构的支撑平面;光学系统，包括限定照明路径的照明系统;以及限定一个或多个检测路径的至少一个检测系统以及控制系统。光学系统具有预定的数值孔径，并且被配置为限定入射平面和与暗场检测模式相对应的检测，用于收集从结构上的照射区域传播的光，其以镜面反射以外的立体角度，所述入射平面相对于所述支撑平面定向，以便形成与所述图案轴线不同于90度的选定角度。控制系统被配置和操作用于从检测系统接收指示用所述暗场模式检测到的光的数据，并且基于具有沿着所选择的图案化轴的尺寸的预定单位单元向其施加预定的建模数据来处理所接收的数据符合光学系统的数值孔径。

2. 发明申请

WO2009078014A3 MEASUREMENT SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2009078014A3
公开(公告)日：2009-06-25
申请号：PCT/IL2008/001627
申请日：2008-12-16
申请人： NOVA MEASURING INSTRUMENTS LTD , BRILL, Boaz , SANDIK, Shimon
发明人： BRILL, Boaz , SANDIK, Shimon
IPC分类号： G01R31/26
摘要： A multi-station measurement system concept is presented, particularly based on an X-Y stage and plurality of horizontal load/unload units. The system allows loading/unloading of wafers from several load/unload units by the direct action of the X-Y stage, thus creating a buffer for wafers without actually requiring an additional buffer mechanism.

3. 发明申请

WO2009007981A1 METHOD AND SYSTEM FOR USE IN MONITORING PROPERTIES OF PATTERNED STRUCTURES 审中-公开
标题翻译：用于监测图形结构特性的方法和系统
公开(公告)号：WO2009007981A1
公开(公告)日：2009-01-15
申请号：PCT/IL2008/000966
申请日：2008-07-13
申请人： NOVA MEASURING INSTRUMENTS LTD. , COHEN, Yoel , BRILL, Boaz
发明人： COHEN, Yoel , BRILL, Boaz
IPC分类号： G01N21/21 , G01B11/06
CPC分类号： G01N21/9501 , G01B11/0625 , G01B11/24 , G06F15/00
摘要： A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
摘要翻译：本发明提供了一种方法和系统，用于表征具有包括多个不同周期图案位置的结构的制品的性质。该方法包括：提供指示由对应位点的几何和材料参数限定的不同堆叠的光学性质的预测理论模型，所述位置在几何参数和材料参数中的至少一个中是共同的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

4. 发明申请

WO2002025723A3 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUE 审中-公开
公开(公告)号：WO2002025723A3
公开(公告)日：2002-03-28
申请号：PCT/IL2001/000884
申请日：2001-09-20
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
发明人： BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
IPC分类号： H01L21/66
摘要： The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.

5. 发明申请

WO2011104713A1 METHOD AND SYSTEM FOR MEASURNG IN PATTERNED STRUCTURES 审中-公开
标题翻译：图形结构测量方法与系统
公开(公告)号：WO2011104713A1
公开(公告)日：2011-09-01
申请号：PCT/IL2011/000188
申请日：2011-02-24
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , SHERMAN, Boris
发明人： BRILL, Boaz , SHERMAN, Boris
IPC分类号： G01B11/06 , G01B11/24 , G03F7/20
CPC分类号： G06F17/00 , G01B11/0625 , G01B11/24 , G03F7/70508 , G03F7/70616
摘要： A method and system are provided for use in measurement of at least one parameter of a patterned structure. The method comprises: providing input data comprising: measured data including multiple measured signals corresponding to measurements on different sites of the structure; and data indicative of theoretical signals, a relation between the theoretical and measured signals being indicative of at least one parameter of the structure; providing a penalty function based on at least one selected global parameter characterizing at least one property of the structure; and performing a fitting procedure between the theoretical and measured signals, said performing of the fitting procedure comprising using said penalty function for determining an optimized relation between the theoretical and measured signals, and using the optimized relation to determine said at least one parameter of the structure.
摘要翻译：提供了一种用于测量图案化结构的至少一个参数的方法和系统。该方法包括：提供输入数据，包括：测量数据，包括对应于结构不同位置上的测量的多个测量信号; 以及指示理论信号的数据，所述理论信号和测量信号之间的关系指示所述结构的至少一个参数; 提供基于表征所述结构的至少一个属性的至少一个所选择的全局参数的惩罚函数; 以及执行理论和测量信号之间的拟合过程，所述执行拟合过程包括使用所述惩罚函数来确定理论信号和测量信号之间的优化关系，并且使用优化的关系来确定所述结构的所述至少一个参数。

6. 发明申请

WO2009107143A2 LINE EDGE ROUGHNESS MEASURING TECHNIQUE AND TEST STRUCTURE 审中-公开
标题翻译：线边缘粗糙度测量技术和测试结构
公开(公告)号：WO2009107143A2
公开(公告)日：2009-09-03
申请号：PCT/IL2009/000233
申请日：2009-03-01
申请人： NOVA MEASURING INSTRUMENTS LTD , BRILL, Boaz
发明人： BRILL, Boaz
IPC分类号： G01N33/574 , C07H21/04 , C07K14/435 , C12N5/06 , C12P21/02
CPC分类号： G03F7/70625 , G03F7/70616
摘要： A test structure is presented test structure on a substrate for monitoring a LER and/or LWR effect, said test structure comprising an array of features manufactured with amplified LER and/or LWR effect.
摘要翻译：测试结构呈现在用于监测LER和/或LWR效应的衬底上的测试结构，所述测试结构包括用扩增的LER和/或LWR效应制造的特征阵列。

7. 发明申请

WO2003095993A1 AN OPTICAL SYSTEM OPERATING WITH VARIABLE ANGLE OF INCIDENCE 审中-公开
标题翻译：具有可变角度变化的光学系统
公开(公告)号：WO2003095993A1
公开(公告)日：2003-11-20
申请号：PCT/IL2003/000373
申请日：2003-05-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
发明人： BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
IPC分类号： G01N21/55
CPC分类号： G01N21/55
摘要： An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.
摘要翻译：一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的某个位置，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述限定所选择的入射角中的一个的至少一个可移动偏转元件。

8. 发明申请

WO2013011508A2 OPTICAL SYSTEM AND METHOD FOR MEASURING IN PATTERNED STUCTURES 审中-公开
标题翻译：用于测量图案化结构的光学系统和方法
公开(公告)号：WO2013011508A2
公开(公告)日：2013-01-24
申请号：PCT/IL2012/050253
申请日：2012-07-18
申请人： NOVA MEASURING INSTRUMENTS LTD. , BARAK, Gilad , BRILL, Boaz
发明人： BARAK, Gilad , BRILL, Boaz
IPC分类号： G03F7/20 , G01B11/22
CPC分类号： G01B11/22 , G01B11/24 , G01N21/27 , G01N21/9501 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An optical system is presented for use in measuring in patterned structures having vias. The optical system comprises an illumination channel for propagating illuminated light onto the structure being measured; a detection channel for collecting light returned from the illuminated structure to a detection unit; and an attenuation assembly accommodated in the illumination and detection channels and being configured and operable for selectively attenuating light propagating along the detection channel, the attenuation creating a predetermined condition for the selectively attenuated light, said predetermined condition being defined by a predetermined ratio between a first light portion corresponding to a dark field condition and a second light portion corresponding to a bright field condition in said selectively attenuated light, detected selectively attenuated light being therefore indicative of at least one parameter of the via being illuminated.
摘要翻译：提出了一种用于在具有通孔的图案化结构中进行测量的光学系统。该光学系统包括用于将照明光传播到被测量的结构上的照明通道; 检测通道，用于收集从照明结构返回到检测单元的光; 以及衰减组件，其容纳在所述照明和检测通道中，并且被配置并可操作用于选择性地衰减沿着所述检测通道传播的光，所述衰减为所述选择性衰减的光创建预定条件，所述预定条件由第一因此检测到的选择性衰减的光因此指示通孔的至少一个参数被照亮。

9. 发明申请

WO2012095808A1 PROCESS CONTROL USING NON-ZERO ORDER DIFFRACTION 审中-公开
标题翻译：使用非零订单分解的过程控制
公开(公告)号：WO2012095808A1
公开(公告)日：2012-07-19
申请号：PCT/IB2012/050157
申请日：2012-01-12
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz
发明人： BRILL, Boaz
IPC分类号： G01B11/14
CPC分类号： G03F7/70516 , G01B11/14 , G01B2210/56 , G01N21/4788 , G01N2021/8416 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G03G15/50 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.
摘要翻译：一种控制制造过程的方法，所述方法包括以下步骤：a）提供具有周期性结构的测试区域，其中周期性结构包括一系列图案化特征，b）用光照射周期性结构，从而产生非零级衍射信号，c）收集衍射信号以产生测试签名，d）使测试签名与参考签名相匹配，其中先前通过执行步骤a），b）和c）产生参考签名; 相对于至少类似于周期性结构的参考结构，以及e）使用与匹配参考签名相关联的控制设置集来控制制造过程。

10. 发明申请

WO2012093400A9 METHOD AND SYSTEM FOR USE IN MEASURING IN COMPLEX PATTERNED STRUCTURES 审中-公开
公开(公告)号：WO2012093400A9
公开(公告)日：2012-07-12
申请号：PCT/IL2012/050003
申请日：2012-01-03
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , SHERMAN, Boris
发明人： BRILL, Boaz , SHERMAN, Boris
IPC分类号： G01B11/24 , G01N21/47
摘要： A method and system are presented for use in measuring in complex patterned structures. A full model and at least one approximate model are provided for the same measurement site in a structure, said at least one approximate model satisfying a condition that a relation between the full model and the approximate model is defined by a predetermined function. A library is created for simulated data calculated by the approximate model for the entire parametric space of the approximate model. Also provided is data corresponding to simulated data calculated by the full model in selected points of said parametric space. The library for the approximate model data and said data of the full model are utilized for creating a library of values of a correction term for said parametric space, the correction term being determined as said predetermined function of the relation between the full model and the approximate model. This enable to process measured data by fitting said measured data to the simulated data calculated by the approximate model corrected by a corresponding value of the correction term.

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