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1. 发明申请

WO2003095993A1 AN OPTICAL SYSTEM OPERATING WITH VARIABLE ANGLE OF INCIDENCE 审中-公开
标题翻译：具有可变角度变化的光学系统
公开(公告)号：WO2003095993A1
公开(公告)日：2003-11-20
申请号：PCT/IL2003/000373
申请日：2003-05-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
发明人： BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
IPC分类号： G01N21/55
CPC分类号： G01N21/55
摘要： An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.
摘要翻译：一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的某个位置，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述限定所选择的入射角中的一个的至少一个可移动偏转元件。

2. 发明申请

WO2002025723A3 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUE 审中-公开
公开(公告)号：WO2002025723A3
公开(公告)日：2002-03-28
申请号：PCT/IL2001/000884
申请日：2001-09-20
申请人： NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
发明人： BRILL, Boaz , FINAROV, Moshe , SCHEINER, David
IPC分类号： H01L21/66
摘要： The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.

3. 发明申请

WO2003075099A3 METHOD AND SYSTEM FOR OVERLAY MEASUREMENT 审中-公开
公开(公告)号：WO2003075099A3
公开(公告)日：2003-09-12
申请号：PCT/IL2003/000176
申请日：2003-03-06
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe , SCHEINER, David
发明人： FINAROV, Moshe , SCHEINER, David
IPC分类号： G03F7/20
摘要： An optical measurement method and system are presented for imaging two target structures (T1, T2) in two parallel layers (L1, L2), respectively, of a sample (W), to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer (L1). The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement (14), and the collected radiation response is split into two spatially separated radiation components (B(1)res, B(2)res). The split radiation components are directed towards at least one imaging plane (24 or 26) along different optical channels characterized by optical paths of different lengths (S1, S2), respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.

4. 发明申请

WO2003014658A3 METHOD AND APPARATUS FOR PROCESS CONTROL IN THE SEMICONDUCTOR MANUFACTURING 审中-公开
公开(公告)号：WO2003014658A3
公开(公告)日：2003-02-20
申请号：PCT/IL2002/000656
申请日：2002-08-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01B11/24
摘要： An optical system is presented for use in a measurement system (OS) for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises (OS) an illuminator unit (10) producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector (26) and a spectrophotometer detector (30), and a light directing assembly (31). The light directing assembly (31) defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path.

5. 发明申请

WO2003017322A3 A METHOD AND SYSTEM FOR MEASUREMENTS IN PATTERNED STRUCTURES 审中-公开
公开(公告)号：WO2003017322A3
公开(公告)日：2003-02-27
申请号：PCT/IL2002/000655
申请日：2002-08-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： H01L21/00 , G01R31/02
摘要： A method and system are presented for measuring in a patterned structure to thereby enabling to control a process. An image of at least a region of patterned structure formed by light returned from the illuminated region is acquired and analysed to determine sites of the structure to which electrical measurements are to be applied. Electrical measurements to the predetermined sites of the structure are applied and measured data indicative of at least one parameter of the structure is generated for adjusting operating conditions of the process.

6. 发明申请

WO2005119225A1 DEVICE AND METHOD FOR OPTICAL REFLECTOMETRY UNDER OBLIQUE ANGLE 审中-公开
标题翻译：用于反射角度下的光学反射测量的装置和方法
公开(公告)号：WO2005119225A1
公开(公告)日：2005-12-15
申请号：PCT/IL2005/000563
申请日：2005-05-31
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N21/211 , G01N21/8806
摘要： A system (1) and method are presented for measurement on an article (w). The system comprises an illuminator (2) for producing light of at least one predetermined wavelength range; an optical system (4); a displacement arrangement (5); and a control system (6). The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage (10) supporting the article about a rotational axis (OA) substantially normal to the stage.
摘要翻译：提供了一种用于物品（w）上的测量的系统（1）和方法。该系统包括用于产生至少一个预定波长范围的光的照明器（2）光学系统（4）; 位移布置（5）; 和控制系统（6）。光学系统被配置为至少限定测量通道，并且包括光导组件，用于将输入光束沿着从照明器的输入光路传播到物品上并引导从照明区域的光束返回的光束该物品至少有一个光检测器。所述位移布置与至少所述光学系统的所述光导组件相关联，并且被所述控制系统配置和操作以使所述光学系统的所述至少光导向组件相对于支撑所述制品的台架（10）旋转基本上垂直于平台的旋转轴线（OA）。

7. 发明申请

WO2003040771A3 METHOD AND SYSTEM FOR MEASURING THIN FILMS 审中-公开
公开(公告)号：WO2003040771A3
公开(公告)日：2003-05-15
申请号：PCT/IL2002/000898
申请日：2002-11-10
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G02B06/00
摘要： An optical system is presented for use in a measurement system (100) for use in measurements of thin films of a workpiece (W), the system comprising an optical assembly (14), comprising illuminator assembly, a detector assembly, and a light directing assembly (FA-OF) for directing illuminating light to a plurality of measurement sites in the workpiece (W) arranged in an array of substantially concentric ring-like regions, such that an area defined by the measurement sites within one of the substantially concentric ring-like regions is substantially equal to that of the other substantially concentric ring-like region.

8. 发明申请

WO2003014658A2 METHOD AND APPARATUS FOR PROCESS CONTROL IN THE SEMICONDUCTOR MANUFACTURING 审中-公开
标题翻译：用于半导体制造中的过程控制的方法和设备
公开(公告)号：WO2003014658A2
公开(公告)日：2003-02-20
申请号：PCT/IL2002/000656
申请日：2002-08-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01B11/00
CPC分类号： G01B11/00 , G01B11/0616
摘要： An optical system is presented for use in a measurement system (OS) for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises (OS) an illuminator unit (10) producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector (26) and a spectrophotometer detector (30), and a light directing assembly (31). The light directing assembly (31) defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path.
摘要翻译：提出了一种用于在图案化结构中测量的测量系统（OS）中使用的光学系统，这对控制在生产线上进行的结构的处理特别有用。该系统包括：产生照明光的照明器单元（10），所述照明器单元产生照射光以被引导到所述结构以产生返回的光;检测器单元，其包括成像检测器（26）和分光光度计检测器（30）;以及导光组件 31）。导光组件（31）限定用于光传播的第一和第二光路径。容纳在第一光路中的光学元件影响光，以提供结构平面的相对较小的测量区域。与第一光路相比，第二光路位于第一光路外部，通过第二光路的光传播提供相对较大的测量区域。

9. 发明申请

WO2006054292A2 METHOD AND SYSTEM FOR SPECTRAL MEASUREMENTS 审中-公开
标题翻译：光谱测量方法与系统
公开(公告)号：WO2006054292A2
公开(公告)日：2006-05-26
申请号：PCT/IL2005/001211
申请日：2005-11-16
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01J3/02 , G01J3/10 , G01J3/28 , G01J3/42 , G02B20060101
CPC分类号： G01J3/10 , G01J3/02 , G01J3/0218 , G01J3/28 , G01J3/2803 , G01J3/42 , G01J2003/2866
摘要： A system and method for use in spectrometric measurements of an article using selecting an optimal integration time range of the light detection system during which the measurement is to be applied, the optimal integration time being that at which a required value of signal to noise ratio (SNR) of the measurements is obtainable.
摘要翻译：一种用于在使用测量的光检测系统的最佳积分时间范围内使用物品的光谱测量的系统和方法，最佳积分时间是所需的信噪比值（ SNR）。

10. 发明申请

WO2004113932A3 METHOD AND SYSTEM FOR AUTOMATIC TARGET FINDING 审中-公开
公开(公告)号：WO2004113932A3
公开(公告)日：2004-12-29
申请号：PCT/IL2004/000525
申请日：2004-06-17
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe , HOLCMAN, Ido
发明人： FINAROV, Moshe , HOLCMAN, Ido
IPC分类号： G03B27/00
摘要： A method and system are presented for automatic target finding by using two imaging channels with relatively low and high magnifications, using the low magnification channel (relatively large field of view) for finding a region of interest (i.e., that of the targets location within the field), scanning this zone by grabbing images via the high magnification channel (relatively small field of view) and marking the overlay targets using image processing algorithms.

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