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    • 2. 发明申请
    • TWO TRANSISTOR SONOS FLASH MEMORY
    • 两个晶体管SONOS闪存
    • WO2016164318A1
    • 2016-10-13
    • PCT/US2016/025916
    • 2016-04-04
    • NEO SEMICONDUCTOR, INC.
    • HSU, Fu-Chang
    • H01L29/788H01L29/792
    • G11C16/0433G11C16/0466G11C16/06G11C16/10H01L27/1157
    • A two transistor SONOS flash memory is disclosed. In one aspect, an apparatus, includes a control gate transistor having source and drain diffusions deposited in an N-well, a charge-trapping region formed on the N-well that overlaps the source and drain diffusions, and a control gate formed on the charge-trapping region. A channel region of the N-well between the source and drain diffusions is less than 90nm in length. The apparatus also includes a select gate transistor having a select source diffusion deposited in the N-well. A drain side of the select gate transistor shares the source diffusion. A channel region of the N-well between the select source diffusion and the source diffusion also is less than 90nm in length.
    • 公开了一种双晶体管SONOS闪速存储器。 一方面,一种装置包括:控制栅极晶体管,其具有沉积在N阱中的源极和漏极扩散层;形成在与所述源极和漏极扩散器重叠的所述N阱上的电荷俘获区域;以及控制栅极, 电荷捕获区域。 源极和漏极扩散之间的N阱的沟道区域的长度小于90nm。 该装置还包括具有沉积在N阱中的选择源扩散的选择栅极晶体管。 选择栅极晶体管的漏极侧共享源极扩散。 选择源扩散和源极扩散之间的N阱的沟道区域的长度小于90nm。
    • 3. 发明申请
    • METHOD AND APPARATUS FOR WRITING NONVOLATILE MEMORY USING MULTIPLE-PAGE PROGRAMMING
    • 使用多页编程编写非易失性存储器的方法和装置
    • WO2016037146A1
    • 2016-03-10
    • PCT/US2015/048718
    • 2015-09-04
    • NEO SEMICONDUCTOR, INC.
    • HSU, Fu-Chang
    • G06F12/06
    • G11C16/10G11C7/1039G11C16/08G11C16/16G11C16/32
    • A method of storing information or data in a nonvolatile memory device with multiple-page programming is disclosed. The method, in one aspect, is able to activate a first drain select gate ("DSG") signal. After loading the first data from a bit line ("BL") to a nonvolatile memory page of a first memory block in response to activation of the first DSG signal during a first clock cycle, the first DSG signal is deactivated. Upon activating a second DSG signal, the second data is loaded from the BL to a nonvolatile memory page of a second memory block. The first data and the second data are simultaneously written to the first memory block and the second memory block, respectively.
    • 公开了一种在具有多页编程的非易失性存储装置中存储信息或数据的方法。 该方法在一个方面能够激活第一漏极选择栅极(“DSG”)信号。 响应于在第一时钟周期期间第一DSG信号的激活将第一数据从位线(“BL”)加载到第一存储器块的非易失性存储器页面之后,第一DSG信号被去激活。 在激活第二DSG信号时,将第二数据从BL加载到第二存储器块的非易失性存储器页。 第一数据和第二数据分别同时写入第一存储器块和第二存储器块。
    • 6. 发明申请
    • THREE-DIMENSIONAL DOUBLE DENSITY NAND FLASH MEMORY
    • 三维双密度NAND闪存
    • WO2016154597A1
    • 2016-09-29
    • PCT/US2016/024358
    • 2016-03-25
    • NEO SEMICONDUCTOR, INC.
    • HSU, Fu-Chang
    • H01L29/792H01L23/525H01L27/115H01L29/51G11C11/56G11C16/00
    • H01L27/11582G11C11/5621G11C16/0475G11C16/0483H01L23/525H01L27/11565H01L27/1157
    • A three-dimensional double-density NAND flash memory device is disclosed. In one aspect, an apparatus includes a three dimensional stacked configuration of word line layers separated by insulating layers. The stacked configuration includes a selected number of the word line layers. The apparatus also includes an array of NAND strings deposited within the stacked configuration and perpendicular to a top surface of the stacked configuration. Each NAND string includes a charge-trapping layer that extends through the selected number of word line layers. The apparatus also includes one or more slits through the stacked configuration that divide each word line layer into a plurality of word line regions. The charge-trapping layer of each NAND string is coupled to two word line regions in each word line layer to form two charge-trapping regions to store two data bits in each word line layer.
    • 公开了一种三维双密度NAND闪速存储器件。 一方面,一种装置包括由绝缘层隔开的字线层的三维堆叠结构。 堆叠配置包括所选数量的字线层。 该装置还包括沉积在堆叠构造中并垂直于堆叠构造的顶表面的NAND串的阵列。 每个NAND串包括延伸穿过选定数量的字线层的电荷捕获层。 该装置还包括通过将每个字线层划分成多个字线区域的堆叠构造的一个或多个狭缝。 每个NAND串的电荷捕获层耦合到每个字线层中的两个字线区域,以形成两个电荷捕获区域,以在每个字线层中存储两个数据位。
    • 9. 发明申请
    • Dual Function Hybrid Memory Cell
    • 双功能混合存储单元
    • WO2016172636A1
    • 2016-10-27
    • PCT/US2016/029059
    • 2016-04-22
    • NEO SEMICONDUCTOR, INC.
    • HSU, Fu-Chang
    • H01L29/792H01L21/28G11C11/56G11C16/02
    • G11C16/0475G11C7/1015G11C11/401G11C16/0466G11C16/10G11C2211/4016H01L21/28282H01L27/1211H01L29/4234H01L29/66833H01L29/785H01L29/792
    • A dual function hybrid memory cell is disclosed. In one aspect, the memory cell includes a substrate, a bottom charge-trapping region formed on the substrate, a top charge-trapping region formed on the bottom charge-trapping region, and a gate layer formed on the top charge trapping region. In another aspect, a method for programming a memory cell having a substrate, a bottom charge-trapping layer, a top charge-trapping layer, and a gate layer is disclosed. The method includes biasing a channel region of the substrate, applying a first voltage differential between the gate layer and the channel region, injecting charge into the bottom charge-trapping layer from the channel region based on the first voltage differential. The method also includes applying a second voltage differential between the gate layer and the channel region and injecting charge from the bottom charge-trapping layer into the top charge-trapping layer based on the second voltage differential.
    • 公开了一种双功能混合存储器单元。 一方面,存储单元包括基板,形成在基板上的底部电荷俘获区域,形成在底部电荷俘获区域上的顶部电荷俘获区域和形成在顶部电荷俘获区域上的栅极层。 另一方面,公开了一种用于编程具有衬底,底部电荷俘获层,顶部电荷俘获层和栅极层的存储器单元的方法。 该方法包括偏置衬底的沟道区域,在栅极层和沟道区域之间施加第一电压差,基于第一电压差将电荷从沟道区域注入底部电荷俘获层。 该方法还包括在栅极层和沟道区域之间施加第二电压差,并且基于第二电压差将电荷从底部电荷俘获层注入顶部电荷俘获层。