专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2015084258A1 LIGHT-EMITTING DEVICE AND METHOD OF FORMING THE SAME 审中-公开
标题翻译：发光装置及其形成方法
公开(公告)号：WO2015084258A1
公开(公告)日：2015-06-11
申请号：PCT/SG2014/000541
申请日：2014-11-18
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： ZHANG, Xueliang , ZHANG, Zi-Hui , JI, Yun , JU, Zhen Gang , LIU, Wei , TAN, Swee Tiam , SUN, Xiaowei , DEMIR, Hilmi Volkan
IPC分类号： H01L33/36 , H01L33/62
CPC分类号： H01L27/156 , H01L33/22 , H01L33/32 , H01L33/38 , H01L33/382 , H01L33/44 , H01L2933/0016
摘要： A light-emitting device may include an active layer. The light-emitting device may include a first semiconductor layer of a first conductivity type. The first semiconductor layer may be in physical contact with the active layer. The light-emitting device may also include a second semiconductor layer of a second conductivity type. The second semiconductor layer may be in physical contact with the active layer and opposite the first conductive layer. The light-emitting device may further include a first electrode in physical contact with a first side of the first semiconductor layer. The light-emitting device may additionally include a second electrode in physical contact with a second side of the first semiconductor layer. The second side of the first semiconductor layer may be different from the first side of the first semiconductor layer. The light-emitting device may also include a third electrode in physical contact with the second semiconductor layer.
摘要翻译：发光器件可以包括有源层。发光器件可以包括第一导电类型的第一半导体层。第一半导体层可以与有源层物理接触。发光器件还可以包括第二导电类型的第二半导体层。第二半导体层可以与有源层物理接触并与第一导电层相对。发光器件还可以包括与第一半导体层的第一侧物理接触的第一电极。发光装置还可以包括与第一半导体层的第二侧物理接触的第二电极。第一半导体层的第二面可以与第一半导体层的第一侧不同。发光器件还可以包括与第二半导体层物理接触的第三电极。

2. 发明申请

WO2014120086A1 METHOD OF FABRICATING SEMICONDUCTOR DEVICES 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：WO2014120086A1
公开(公告)日：2014-08-07
申请号：PCT/SG2013/000542
申请日：2013-12-19
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： LIU, Wei , ZHANG, Zi-Hui , JU, Zhengang , ZHANG, Xueliang , JI, Yun , TAN, Swee, Tiam , SUN, Xiao, Wei , DEMIR, Hilmi, Volkan
IPC分类号： H01L33/00 , H01L21/78
CPC分类号： H01L33/0095 , H01L33/0079 , H01L33/62 , H01L2933/0016 , H01L2933/0066
摘要： Vertical high power LEDs are the technological choice for the application of general lighting due to their advantages of high efficiency and capability of handling high power. However, the technologies of vertical LED fabrication reported so far involve the wafer-level metal substrate substitution which may cause large stress due to the mismatch between metal substrate and LED layer. Moreover, the metal substrate has to be diced to separate LED dies which may cause metal contamination and thus increase the leakage current. These factors will lower the yield of LED production and increase the cost as well. The present invention is to disclose a novel method for the fabrication of GaN vertical high power LEDs and/or a novel method for the fabrication of GaN vertical high power LEDs which is compatible to mass production conditions. The novelty of the invention is that the island metal plating is conducted with the help of pattern formation techniques. Due to the small area of the islands, the stress generated between LED layer and metal islands is much less significant. Furthermore, due to the island metal plating and through the application of temporary supporting carriers the LED dies will be separated at the end of the fabrication process automatically or simply by applying slight mechanical stress or stretching the adhesive tape. This advantage avoids the metal dicing step and reduces the possibility of metal contamination and leakage current generation. Therefore, high yield and low cost will be realized using this novel method in LED production.
摘要翻译：由于高效率和高功率处理的优点，垂直大功率LED是普通照明应用的技术选择。然而，到目前为止报道的垂直LED制造技术涉及晶片级金属基板的取代，这可能由于金属基板和LED层之间的失配而引起大的应力。此外，金属基板必须被切割成分开的LED管芯，这可能导致金属污染并因此增加漏电流。这些因素将降低LED生产的产量，并增加成本。本发明公开了一种用于制造GaN垂直高功率LED的新颖方法和/或用于制造与大规模生产条件兼容的GaN垂直高功率LED的新颖方法。本发明的新颖之处在于，借助于图案形成技术来进行岛金属电镀。由于岛的面积很小，LED层和金属岛之间产生的应力要小得多。此外，由于岛金属电镀和通过施加临时支撑载体，LED管芯将在制造过程结束时自动或简单地通过施加轻微的机械应力或拉伸粘合带而分离。这个优点避免了金属切割步骤，并降低了金属污染和漏电流产生的可能性。因此，在LED生产中使用这种新颖的方法可以实现高产量和低成本。

3. 发明申请

WO2019054942A1 LIGHT-EMITTING DEVICE AND METHOD OF FORMING THE SAME 审中-公开
公开(公告)号：WO2019054942A1
公开(公告)日：2019-03-21
申请号：PCT/SG2018/050463
申请日：2018-09-11
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： ZHANG, Xueliang , TAN, Swee Tiam , DEMIR, Hilmi Volkan
IPC分类号： H01L33/14 , H01L33/06 , H01L33/10
摘要： Various embodiments may provide a light-emitting device. The light-emitting device may include a first semiconductor layer of a first conductivity type. The light-emitting device may also include a second semiconductor layer of a second conductivity type different from the first conductivity type. The light-emitting device may further include an active layer between the first semiconductor layer and the second semiconductor layer. The light-emitting device may include a current guide layer having a first surface in contact with a first portion of the second semiconductor layer, the current guide layer including a dielectric material. The light-emitting device may further include an electrically conductive layer in contact with a second portion of the second semiconductor layer. The light-emitting device may also include a first electrode in contact with the electrically conductive layer. The light-emitting device may further include a second electrode in contact with the first semiconductor layer.

4. 发明申请

WO2015174924A1 METHOD OF FORMING A LIGHT-EMITTING DEVICE 审中-公开
标题翻译：形成发光装置的方法
公开(公告)号：WO2015174924A1
公开(公告)日：2015-11-19
申请号：PCT/SG2015/050100
申请日：2015-05-07
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： JU, Zhengang , LIU, Wei , ZHANG, Xueliang , TAN, Swee Tiam , JI, Yun , ZHANG, Zi-hui , DEMIR, Hilmi Volkan
IPC分类号： H01L33/62 , H01L33/36
CPC分类号： H01L33/647 , H01L33/0079 , H01L33/22 , H01L33/38 , H01L33/486 , H01L33/62 , H01L2224/16225 , H01L2933/0016 , H01L2933/0066 , H01L2933/0091
摘要： Various embodiments provide a method of forming a light-emitting device. The method may include providing a multi-layer structure, wherein the multi-layer structure includes a substrate, a first semiconductor layer of a first conductivity type, an active layer and a second semiconductor layer of a second conductivity type in sequence, and includes at least one metal contact formed on at least one of the first semiconductor layer and the second semiconductor layer. The method further includes forming at least one trench over the at least one metal contact, and forming at least one metal support in the at least one trenches.
摘要翻译：各种实施例提供了一种形成发光器件的方法。该方法可以包括提供多层结构，其中多层结构依次包括基底，第一导电类型的第一半导体层，有源层和第二导电类型的第二半导体层，并且包括在形成在第一半导体层和第二半导体层中的至少一个上的至少一个金属接触。所述方法还包括在所述至少一个金属接触件上方形成至少一个沟槽，以及在所述至少一个沟槽中形成至少一个金属支撑件。

5. 发明申请

WO2019054943A1 LIGHT-EMITTING DEVICE AND METHOD OF FORMING THE SAME 审中-公开
公开(公告)号：WO2019054943A1
公开(公告)日：2019-03-21
申请号：PCT/SG2018/050464
申请日：2018-09-11
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： ZHANG, Xueliang , TAN, Swee Tiam , DEMIR, Hilmi Volkan
IPC分类号： H01L33/10 , H01L33/06 , H01L33/14
摘要： Various embodiments may provide a light-emitting device. The light-emitting device may include an epitaxial stack arrangement. The epitaxial stack arrangement may also include a first semiconductor layer of a first conductivity type. The epitaxial stack arrangement may further include a second semiconductor layer of a second conductivity type different from the first conductivity type. The epitaxial stack arrangement may additionally include an active layer between the first semiconductor layer and the second semiconductor layer. The light-emitting device may also include a reflector stack arrangement over the epitaxial stack arrangement. The reflector stack arrangement may include a first dielectric structure. The reflector stack arrangement may also include a second dielectric structure on the first dielectric structure. The reflector stack arrangement may further include a reflector structure on the second dielectric structure. The reflector stack arrangement may additionally include a third dielectric structure on the reflector layer.

6. 发明申请

WO2015174925A1 LIGHT-EMITTING DEVICE AND METHOD OF FORMING THE SAME 审中-公开
标题翻译：发光装置及其形成方法
公开(公告)号：WO2015174925A1
公开(公告)日：2015-11-19
申请号：PCT/SG2015/050105
申请日：2015-05-11
申请人： NANYANG TECHNOLOGICAL UNIVERSITY
发明人： LIU, Wei , KYAW, Zabu , ZHANG, Zi-hui , ZHU, Binbin , JU, Zhengang , TAN, Swee Tiam , ZHANG, Xueliang , DEMIR, Hilmi Volkan
IPC分类号： H01L33/14
CPC分类号： H01L33/06 , H01L33/007 , H01L33/32
摘要： Various embodiments provide methods of forming a light emitting device and a light emitting device formed thereof. The light emitting device of various embodiments alters the polarity of the polarization induced interface charges, such that the polarity induced charges at an interface of an active layer and an electron blocking layer of the light-emitting devices are negative.
摘要翻译：各种实施例提供了形成发光器件和由其形成的发光器件的方法。各种实施例的发光器件改变极化诱导的界面电荷的极性，使得在发光器件的有源层和电子阻挡层的界面处的极性感应电荷是负的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式