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1. 发明申请

WO2004038504A3 NANOMETER-SCALE ENGINEERED STRUCTURES, METHODS AND APPARATUS FOR FABRICATION THEREOF, AND APPLICATIONS TO MASK REPAIR, ENHANCEMENT, AND FABRICATION 审中-公开
标题翻译：纳米尺度工程结构，其制造方法和装置以及掩模修复，增强和制造的应用
公开(公告)号：WO2004038504A3
公开(公告)日：2004-11-04
申请号：PCT/US0333148
申请日：2003-10-21
申请人： NANOINK INC , VAN CROCKER PERCY , CRUCHON-DUPEYRAT SYLVAIN , DEMERS LINETTE , ELGHANIAN ROBERT , DISAWAL SANDEEP , AMRO NABIL , ZHANG HUA
发明人： VAN CROCKER PERCY , CRUCHON-DUPEYRAT SYLVAIN , DEMERS LINETTE , ELGHANIAN ROBERT , DISAWAL SANDEEP , AMRO NABIL , ZHANG HUA
IPC分类号： B82B3/00 , C23C18/14 , C23C18/16 , C23C18/28 , G01Q30/16 , G01Q60/00 , G03F1/00 , G03F7/00 , G03F9/00 , G21K5/00
CPC分类号： C23C18/14 , C09D11/52 , C23C18/06 , C23C18/1208 , C23C18/1254 , C23C18/1605 , C23C18/161 , C23C18/1612 , C23C18/1658 , G03F1/72 , G03F7/0002 , Y10S977/857 , Y10S977/863
摘要： Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including solgel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.

2. 发明申请

WO2005084092A3 MICROMETRIC DIRECT-WRITE METHODS FOR PATTERNING CONDUCTIVE MATERIAL AND APPLICATIONS TO FLAT PANEL DISPLAY REPAIR 审中-公开
标题翻译：用于图案化导电材料的微米直写方法和用于平板显示修复的应用
公开(公告)号：WO2005084092A3
公开(公告)日：2005-11-24
申请号：PCT/US2005006009
申请日：2005-02-25
申请人： NANOINK INC , AMRO NABIL , DEMERS LINETTE , DISAWAL SANDEEP , ZHANG HUA , ELGHANIAN ROBERT , CRUCHON-DUPEYRAT SYLVAIN , BUSSAN JOHN
发明人： AMRO NABIL , DEMERS LINETTE , DISAWAL SANDEEP , ZHANG HUA , ELGHANIAN ROBERT , CRUCHON-DUPEYRAT SYLVAIN , BUSSAN JOHN
IPC分类号： C09D11/00 , C09D11/02 , G02F1/1362 , G03F7/00 , G12B21/02 , H05K3/00 , H05K3/12
CPC分类号： H05K3/1241 , C09D11/02 , C09D11/30 , C23C18/08 , C23C18/161 , G02F1/1362 , H05K2203/0195
摘要： A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material. To obtain highly conductive and robust patterns with this deposition method, two general ink formulation strategies were designed. The key component of both ink systems is nanoparticles with diameters less than 100 nm. Because nanoparticles typically have significantly lower melting points than the bulk material, one can fuse, sinter, or coalesce collections of discrete particles into continuous (poly)crystalline films at very low temperatures (less than about 300 °C, and as low as about 120 °C). In the first strategy, one can disperse hydrocarbon-capped nanoparticles in a suitable solvent, deposit them on a surface in the form of a pattern, and then anneal the film by heating to form continuous metallic patterns. In the second strategy, one can deliver metal compounds to the surface in the presence of a reducing matrix and then form nanoparticles in situ by heating that subsequently coalesce to form continuous metallic patterns. In studies with platinum and gold inks, both nanoparticle-based methods yield micron sized traces on glass and oxidized silicon that have low resistivity (4 microohm.cm), and excellent adhesion properties.
摘要翻译：用于直接书写具有微米和亚微米尺寸特征的导电金属迹线的新型低温方法。在这种方法中，使用扁平光束，例如带或不带尖端的AFM悬臂，将痕量的金属前体墨水绘制到基底上。金属迹线的尺寸可以通过悬臂的几何形状直接控制，从而可以使用微制造的悬臂可控地沉积1微米至100微米宽的迹线。具有尖锐尖端的悬臂可用于进一步缩小最小特征尺寸至亚微米尺度。通过构建相似或不同材料的层可以增加特征的高度。为了用这种沉积方法获得高导电性和耐用的图案，设计了两种通用的油墨配方策略。两种墨水系统的关键组件是直径小于100 nm的纳米粒子。因为纳米颗粒通常具有比本体材料低得多的熔点，所以可以在非常低的温度下（低于约300℃并且低至约120℃）将离散颗粒的集合物熔合，烧结或聚结成连续（多晶）薄膜 C）。在第一种策略中，可以将碳氢化合物封端的纳米粒子分散在合适的溶剂中，以图案的形式将它们沉积在表面上，然后通过加热使膜退火以形成连续的金属图案。在第二种策略中，可以在还原基质存在下将金属化合物递送到表面，然后通过加热原位形成纳米颗粒，随后聚结形成连续的金属图案。在使用铂和金油墨的研究中，基于纳米粒子的方法都能在玻璃和氧化硅上产生微米尺寸的痕迹，这些痕迹具有低电阻率（4微欧姆·厘米）和优异的粘附性能。

3. 发明申请

WO2004044552A3 METHODS AND APPARATUS FOR INK DELIVERY TO NANOLITHOGRAPHIC PROBE SYSTEMS 审中-公开
标题翻译：用于墨水输送到纳米扫描探针系统的方法和装置
公开(公告)号：WO2004044552A3
公开(公告)日：2004-09-02
申请号：PCT/US0335860
申请日：2003-11-12
申请人： NANOINK INC , CRUCHON-DUPEYRAT SYLVAIN , NELSON MICHAEL , ELGHANIAN ROBERT , FRAGALA JOSEPH , TOUZOV IGOR , DEBJYOTI BANERJEE
发明人： CRUCHON-DUPEYRAT SYLVAIN , NELSON MICHAEL , ELGHANIAN ROBERT , FRAGALA JOSEPH , TOUZOV IGOR , DEBJYOTI BANERJEE
IPC分类号： B05C1/00 , B05D5/00 , B43L25/00 , G01D15/16 , G01N20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

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