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1. 发明申请

WO2009052120A1 LITHOGRAPHY OF NANOPARTICLE BASED INKS 审中-公开
标题翻译：基于纳米脂肪的墨水的研究
公开(公告)号：WO2009052120A1
公开(公告)日：2009-04-23
申请号：PCT/US2008/079893
申请日：2008-10-14
申请人： NANOINK, INC. , PARPIA, Mohammed , TEVAARWERK, Emma , AMRO, Nabil , SANEDRIN, Raymond
发明人： PARPIA, Mohammed , TEVAARWERK, Emma , AMRO, Nabil , SANEDRIN, Raymond
IPC分类号： C09D11/00 , G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/322 , C09D11/52
摘要： An ink composition comprising: a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water, and wherein the composition is formulated for slow dry rate and proper viscosity for DPN. Also, a method comprising: depositing a composition onto a cantilever, wherein the composition comprises a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water. The composition can be used in direct writing onto surfaces to form patterns and arrays using cantilevers, microcontact printing, ink jet printing, and other methods. The composition is particularly useful for preparing nanoscale features and forming high quality continuous conductive lines and dots, including silver based lines and dots. Applications include surface repair.
摘要翻译：一种油墨组合物，包括：悬浮在载体中的多个金属纳米颗粒，其中所述载体包含水和至少一种与水混溶的有机溶剂，并且其中所述组合物配制成用于DPN的缓慢干燥速率和适当的粘度。此外，一种方法包括：将组合物沉积在悬臂上，其中所述组合物包含悬浮在载体中的多个金属纳米颗粒，其中所述载体包含水和至少一种可与水混溶的有机溶剂。组合物可用于直接写入表面以形成使用悬臂，微接触印刷，喷墨印刷和其它方法的图案和阵列。该组合物特别可用于制备纳米级特征并形成高质量的连续导电线和点，包括银基线和点。应用包括表面修复。

2. 发明申请

WO2011002806A1 ADVANCED PHOTOMASK REPAIR 审中-公开
标题翻译： ADVANCED PHOTOMASK维修
公开(公告)号：WO2011002806A1
公开(公告)日：2011-01-06
申请号：PCT/US2010/040470
申请日：2010-06-29
申请人： NANOINK, INC. , AMRO, Nabil , SANEDRIN, Raymond , DISAWAL, Sandeep , FRAGALA, Joseph S.
发明人： AMRO, Nabil , SANEDRIN, Raymond , DISAWAL, Sandeep , FRAGALA, Joseph S.
IPC分类号： G03F1/00 , C23C18/12
CPC分类号： G03F1/72 , B82Y10/00 , B82Y40/00 , C23C18/06 , C23C18/1204 , C23C18/1254 , C23C18/14 , G03F7/0002
摘要： Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.
摘要翻译：通过直接写入平版印刷与尖锐的尖端和悬臂，对低温或光学固化的先进光掩模进行添加修复。可以调整由墨形成的材料的光学性质（例如n和k值）。溶胶凝胶油墨，包括倍半硅氧烷油墨，可用于形成MoSi组合物。修复的光掩模在正常的光掩模洗涤条件下耐洗涤。 AFM仪器可用于执行添加剂修复以提供高分辨率和注册。

3. 发明申请

WO2004038504A2 NANOMETER-SCALE ENGINEERED STRUCTURES, METHODS AND APPARATUS FOR FABRICATION THEREOF, AND APPLICATIONS TO MASK REPAIR, ENHANCEMENT, AND FABRICATION 审中-公开
标题翻译：纳米尺度工程结构，其制造方法和装置以及掩模修复，增强和制造的应用
公开(公告)号：WO2004038504A2
公开(公告)日：2004-05-06
申请号：PCT/US2003/033148
申请日：2003-10-21
申请人： NANOINK, INC. , VAN CROCKER, Percy , CRUCHON-DUPEYRAT, Sylvain , DEMERS, Linette , ELGHANIAN, Robert , DISAWAL, Sandeep , AMRO, Nabil , ZHANG, Hua
发明人： VAN CROCKER, Percy , CRUCHON-DUPEYRAT, Sylvain , DEMERS, Linette , ELGHANIAN, Robert , DISAWAL, Sandeep , AMRO, Nabil , ZHANG, Hua
IPC分类号： G03F7/00
CPC分类号： C23C18/14 , C09D11/52 , C23C18/06 , C23C18/1208 , C23C18/1254 , C23C18/1605 , C23C18/161 , C23C18/1612 , C23C18/1658 , G03F1/72 , G03F7/0002 , Y10S977/857 , Y10S977/863
摘要： Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including solgel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.
摘要翻译：使用直写纳米光刻技术进行光掩模修复和制造，包括使用扫描探针微尖以沉积油墨材料，包括溶胶凝胶和金属油墨。添加方法可以与减法方法相结合。孔可以填充纳米结构。可以控制填充孔的纳米结构的高度，而不会失去对纳米结构的横向尺寸的控制。可以使用和制造Chrome-on-Glass面罩，以及更先进的面罩，包括用于纳米压印纳米光刻的掩模。

4. 发明申请

WO2005084092A2 MICROMETRIC DIRECT-WRITE METHODS FOR PATTERNING CONDUCTIVE MATERIAL AND APPLICATIONS TO FLAT PANEL DISPLAY REPAIR 审中-公开
标题翻译：用于绘制导电材料的MICROMETRIC直接写入方法和应用于平板显示器维修
公开(公告)号：WO2005084092A2
公开(公告)日：2005-09-09
申请号：PCT/US2005/006009
申请日：2005-02-25
申请人： NANOINK, INC. , AMRO, Nabil , DEMERS, Linette , DISAWAL, Sandeep , ZHANG, Hua , ELGHANIAN, Robert , CRUCHON-DUPEYRAT, Sylvain , BUSSAN, John
发明人： AMRO, Nabil , DEMERS, Linette , DISAWAL, Sandeep , ZHANG, Hua , ELGHANIAN, Robert , CRUCHON-DUPEYRAT, Sylvain , BUSSAN, John
IPC分类号： H05K3/00
CPC分类号： H05K3/1241 , C09D11/02 , C09D11/30 , C23C18/08 , C23C18/161 , G02F1/1362 , H05K2203/0195
摘要： A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material. To obtain highly conductive and robust patterns with this deposition method, two general ink formulation strategies were designed. The key component of both ink systems is nanoparticles with diameters less than 100 nm. Because nanoparticles typically have significantly lower melting points than the bulk material, one can fuse, sinter, or coalesce collections of discrete particles into continuous (poly)crystalline films at very low temperatures (less than about 300 °C, and as low as about 120 °C). In the first strategy, one can disperse hydrocarbon-capped nanoparticles in a suitable solvent, deposit them on a surface in the form of a pattern, and then anneal the film by heating to form continuous metallic patterns. In the second strategy, one can deliver metal compounds to the surface in the presence of a reducing matrix and then form nanoparticles in situ by heating that subsequently coalesce to form continuous metallic patterns. In studies with platinum and gold inks, both nanoparticle-based methods yield micron sized traces on glass and oxidized silicon that have low resistivity (4 microohm.cm), and excellent adhesion properties.
摘要翻译：一种用于直接写入具有微米和亚微米尺寸特征的导电金属迹线的新的低温方法。在该方法中，使用平面光束，例如具有或不具有尖端的AFM悬臂，以将金属前体油墨的痕迹绘制到基底上。金属迹线的尺寸可以通过悬臂的几何形状直接控制，从而可以通过微加工的悬臂将可追溯的微量线从1微米到100微米宽的沉积物进行控制。具有尖锐尖端的悬臂可用于进一步将最小特征尺寸缩小至亚微米级。通过构建相似或不同材料的层可以增加特征的高度。为了通过该沉积方法获得高导电性和鲁棒性的图案，设计了两种一般的油墨配方策略。两种油墨系统的关键组分是直径小于100nm的纳米颗粒。因为纳米颗粒通常具有比散装材料显着更低的熔点，所以可以在非常低的温度（小于约300℃，低至约120℃）熔融，烧结或聚集离散颗粒的集合到连续（多）晶体膜中 C）。在第一种策略中，可以将烃封端的纳米颗粒分散在合适的溶剂中，将其沉积在图案形式的表面上，然后通过加热退火以形成连续的金属图案。在第二种策略中，可以在还原性基质的存在下将金属化合物递送到表面，然后通过加热原位形成纳米颗粒，随后聚结形成连续的金属图案。在使用铂金和金色墨水的研究中，基于纳米粒子的方法都会在玻璃上产生微米尺寸的痕迹和具有低电阻率（4微欧姆·厘米）的氧化硅，并具有优异的粘合性能。

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