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    • 1. 发明申请
    • REAGENT IMPREGNATED SWIPE FOR CHEMICAL DETECTION
    • 用于化学检测的试剂浸入剂
    • WO2014058507A3
    • 2014-06-26
    • PCT/US2013051671
    • 2013-07-23
    • MASSACHUSETTS INST TECHNOLOGY
    • GREGORY KERIN EKUNZ RODERICK R
    • G01N21/77
    • G01N27/622G01N1/02G01N2001/028
    • The invention is directed to a swipe with at least one ionization reagent associated with the swipe for detecting target analytes and methods of detecting the target analyte molecules that can indicate the presence of, for example, explosives, narcotics, chemical warfare agents, biological warfare agents, or toxins. The swipe can be used to transfer molecules from a surface to the swipe for further analysis. In particular, the swipes can include an ionization reagent that is preferably a low volatility compound and capable of forming ionization reagent-analyte complexes with target analytes. The swipe can also include multiple ionization reagents with different volatilities such that they are released sequentially during a thermal ramp-up. Alternatively, the swipe can have multiple ionization reagents associated with spatially separated portions of the swipe such that they can be releasable sequentially to detect multiple target analytes.
    • 本发明涉及具有与用于检测目标分析物的滑动剂相关联的至少一种离子化试剂的滑动和检测可以指示例如爆炸物,麻醉剂,化学战剂,生物战剂的靶分析物分子的方法 ,或毒素。 滑动可用于将分子从表面转移到滑动进行进一步分析。 特别地,刷擦可以包括优选低挥发性化合物并能够与靶分析物形成离子化试剂 - 分析物复合物的离子化试剂。 滑动还可以包括具有不同挥发性的多种电离试剂,使得它们在热升温过程中依次释放。 或者,滑动可以具有与滑动件的空间分离部分相关联的多个电离试剂,使得它们可以顺序释放以检测多个目标分析物。
    • 2. 发明申请
    • LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY
    • 157纳米光刻胶的低吸收电阻
    • WO02069043A2
    • 2002-09-06
    • PCT/US0205472
    • 2002-02-22
    • MASSACHUSETTS INST TECHNOLOGY
    • FEDYNYSHYN THEODORE HKUNZ RODERICK RSWORIN MICHAELSINTA ROGER
    • G03F7/004G03F7/039
    • G03F7/0392G03F7/0046Y10S430/108Y10S430/115
    • The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at least one monomeric unit having an aromatic moiety. The monomeric unit further includes at least a group, such as an electron withdrawing group, attached to the aromatic moiety. The attached group includes at least one CF bond. The polymer further includes an acidic hydroxyl group. A photoresist composition of the invention can have an absorbance in a range of 1-5 mu m at 157 nm, rendering it particularly suitable for use as a single layer resist in 157 nm lithography.
    • 本发明提供了在波长小于约248nm的光刻中使用的光刻胶材料。 更具体地说,本发明的光致抗蚀剂特别适用于157nm光刻。 本发明的光致抗蚀剂组合物包括具有至少一个具有芳族部分的单体单元的聚合物。 单体单元还包括至少一个与芳族部分连接的基团,例如吸电子基团。 所附组包括至少一个CF键。 聚合物还包括酸性羟基。 本发明的光致抗蚀剂组合物可以在157nm处具有在1-5μm-1范围内的吸光度,使其特别适合用作157nm光刻中的单层抗蚀剂。
    • 5. 发明申请
    • LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY
    • 157纳米光刻胶的低吸收电阻
    • WO02069043A8
    • 2004-05-27
    • PCT/US0205472
    • 2002-02-22
    • MASSACHUSETTS INST TECHNOLOGY
    • FEDYNYSHYN THEODORE HKUNZ RODERICK RSWORIN MICHAELSINTA ROGER
    • G03F7/004G03F7/039
    • G03F7/0392G03F7/0046Y10S430/108Y10S430/115
    • The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at least one monomeric unit having an aromatic moiety. The monomeric unit further includes at least a group, such as an electron withdrawing group, attached to the aromatic moiety. The attached group includes at least one CF bond. The polymer further includes an acidic hydroxyl group. A photoresist composition of the invention can have an absorbance in a range of 1-5 mu m at 157 nm, rendering it particularly suitable for use as a single layer resist in 157 nm lithography.
    • 本发明提供了在波长小于约248nm的光刻中使用的光刻胶材料。 更具体地说,本发明的光致抗蚀剂特别适用于157nm光刻。 本发明的光致抗蚀剂组合物包括具有至少一个具有芳族部分的单体单元的聚合物。 单体单元还包括至少一个与芳族部分连接的基团,例如吸电子基团。 所附组包括至少一个CF键。 聚合物还包括酸性羟基。 本发明的光致抗蚀剂组合物可以在157nm处具有在1-5μm-1范围内的吸光度,使其特别适合用作157nm光刻中的单层抗蚀剂。
    • 6. 发明申请
    • REAGENTS FOR OXIDIZER-BASED CHEMICAL DETECTION
    • 基于氧化剂的化学检测试剂
    • WO2014058508A3
    • 2014-07-31
    • PCT/US2013051676
    • 2013-07-23
    • MASSACHUSETTS INST TECHNOLOGY
    • GREGORY KERIN EKUNZ RODERICK RSWORIN MICHAEL
    • H01J49/26
    • G01N33/50G01N2560/00
    • Reagents and methods are disclosed for detection of oxidizers and inorganic salts and other analytes of interest. The reagents can interact with their target analytes, especially oxidizer compositions or oxidizer-based explosives, to selectively enhance their ionization yield, interacting by chemical reaction or by forming an associative adduct which facilitates their detection. For example, the reagents can adduct with the counter-ion of the intended analyte for improved direct detection and/or react chemically via acid-base reactions to produce a new product for detection. In another aspect of the invention, reactive reagents and methods are also disclosed that facilitate indirect detection of the analyte at lower temperatures based on reduction-oxidation (redox) chemistry. These reagents are particularly useful in detecting oxidizer analytes.
    • 公开了用于检测氧化剂和无机盐以及其他感兴趣分析物的试剂和方法。 试剂可以与它们的目标分析物相互作用,特别是氧化剂组合物或基于氧化剂的爆炸物,以选择性地增强它们的电离产率,通过化学反应相互作用或通过形成促进其检测的缔合加合物来相互作用。 例如,试剂可与预期分析物的抗衡离子加合以改善直接检测和/或通过酸碱反应化学反应以产生用于检测的新产品。 在本发明的另一方面,还公开了反应性试剂和方法,其有助于基于还原 - 氧化(氧化还原)化学在较低温度下间接检测分析物。 这些试剂特别适用于检测氧化剂分析物。
    • 7. 发明申请
    • ION MOBILITY SPECTROMETERS AND METHODS
    • 离子移动光谱仪和方法
    • WO0052432A9
    • 2002-03-14
    • PCT/US0005634
    • 2000-03-03
    • MASSACHUSETTS INST TECHNOLOGY
    • KUNZ RODERICK R
    • G01N27/64H01J49/40
    • G01N27/622
    • Ion mobility spectrometer systems and methods of using such systems are disclosed. The systems and methods can combine two different ionization techniques (e.g., proton affinity ionization and electron transfer ionization) to provide enhanced detection sensitivity and/or detection selectivity of certain target compounds. A first ion mobility spectrometer (200) effects ionization by one mechanism and a second ion mobility spectrometer (300) effects ionization by the other mechanism. A comparison apparatus (400) analyzes the data from the two spectrometers (200, 300) to determine whether a target compound, e.g., a contraband compoumd, is present in the sample.
    • 公开了离子迁移谱仪系统和使用这种系统的方法。 系统和方法可以组合两种不同的电离技术(例如,质子亲和电离和电子转移电离)以提供某些目标化合物的增强的检测灵敏度和/或检测选择性。 第一离子迁移谱仪(200)通过一种机理实现电离,而第二离子迁移谱仪(300)通过另一种机制实现电离。 比较装置(400)分析来自两个光谱仪(200,300)的数据,以确定样品中是否存在目标化合物(例如,违禁品)。
    • 9. 发明申请
    • ION MOBILITY SPECTROMETERS AND METHODS
    • 离子移动光谱仪和方法
    • WO0052432A3
    • 2001-01-18
    • PCT/US0005634
    • 2000-03-03
    • MASSACHUSETTS INST TECHNOLOGY
    • KUNZ RODERICK R
    • G01N27/64H01J49/40
    • G01N27/622
    • Ion mobility spectrometer systems and methods of using such systems are disclosed. The systems and methods can combine two different ionization techniques (e.g., proton affinity ionization and electron transfer ionization) to provide enhanced detection sensitivity and/or detection selectivity of certain target compounds. A first ion mobility spectrometer (200) effects ionization by one mechanism and a second ion mobility spectrometer (300) effects ionization by the other mechanism. A comparison apparatus (400) analyzes the data from the two spectrometers (200, 300) to determine whether a target compound, e.g., a contraband compoumd, is present in the sample.
    • 公开了离子迁移谱仪系统和使用这种系统的方法。 系统和方法可以组合两种不同的电离技术(例如,质子亲和电离和电子转移电离)以提供某些目标化合物的增强的检测灵敏度和/或检测选择性。 第一离子迁移谱仪(200)通过一种机理实现电离,而第二离子迁移谱仪(300)通过另一种机制实现电离。 比较装置(400)分析来自两个光谱仪(200,300)的数据,以确定样品中是否存在目标化合物(例如,违禁品)。