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1. 发明申请

WO2006137011A3 METHODS AND DEVICES FOR CHARACTERIZING POLARIZATION OF ILLUMINATION SYSTEM 审中-公开
标题翻译：用于表征照明系统极化的方法和装置
公开(公告)号：WO2006137011A3
公开(公告)日：2007-07-05
申请号：PCT/IB2006051979
申请日：2006-06-20
申请人： KONINKL PHILIPS ELECTRONICS NV , AKSENOV YURI , DIRKSEN PETER , ZANDBERGEN PETER , BENNDORF MICHAEL , VAN STEENWINCKEL DAVID
发明人： AKSENOV YURI , DIRKSEN PETER , ZANDBERGEN PETER , BENNDORF MICHAEL , VAN STEENWINCKEL DAVID
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/7085 , G03F1/44 , G03F7/70058 , G03F7/70566
摘要： In a method for evaluating the polarization state of an illumination system (52) in an optical system (50), a mask (56) is provided in the optical system (50) such that an illumination beam incident on the mask (56) is adapted such as to substantially differently diffract incident components of a light beam having different polarization states. An image of the mask (56) is then obtained, using an illumination beam of the illumination system (52) of the optical system (50). The obtained image, being either an intensity plot or a structure created in a resist layer by exposing the resist layer with the image of the mask (56), is then used to extract polarization related information about the illumination system (52). The image used for evaluating may be a diffraction image of the mask.
摘要翻译：在用于评估光学系统（50）中的照明系统（52）的偏振状态的方法中，在光学系统（50）中设置掩模（56），使得入射到掩模（56）上的照明光束是适于使得具有不同极化状态的光束的入射分量基本不同的衍射。然后使用光学系统（50）的照明系统（52）的照明光束获得掩模（56）的图像。所获得的图像是强度图或通过用掩模（56）的图像曝光抗蚀剂层在抗蚀剂层中产生的结构，然后用于提取关于照明系统（52）的偏振相关信息。用于评估的图像可以是掩模的衍射图像。

2. 发明申请

WO2005064409A2 REMOVABLE PELLICLE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：可移除胶片用于浸没式光刻
公开(公告)号：WO2005064409A2
公开(公告)日：2005-07-14
申请号：PCT/IB2004052886
申请日：2004-12-22
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
发明人： DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70983
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.
摘要翻译：一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。因此，照射可以更完整，并且缺陷减少。对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。辐射可以用于任何目的，包括检查，加工，图案化等。可以将透明层的去除与显影抗蚀剂层的步骤组合。

3. 发明申请

WO2007069221A3 DEVICE FOR ANALYZING SAMPLES 审中-公开
标题翻译：用于分析样品的装置
公开(公告)号：WO2007069221A3
公开(公告)日：2007-10-11
申请号：PCT/IB2006054879
申请日：2006-12-15
申请人： KONINKL PHILIPS ELECTRONICS NV , KOLESNYCHENKO ALEKSEY , DIRKSEN PETER , AKSENOV YURI
发明人： KOLESNYCHENKO ALEKSEY , DIRKSEN PETER , AKSENOV YURI
IPC分类号： G01N21/25 , G01N21/64
CPC分类号： G01N21/6428 , G01N21/0303 , G01N21/0332 , G01N21/6456 , G01N33/54373 , G01N2021/0378
摘要： The invention relates to a device for analyzing one or more samples for the presence, amount or identity of one or more analytes in the samples, whereby the device comprises a focal microstructure for improving the signal/background ratio of an optical detection of the analytes.
摘要翻译：本发明涉及一种用于分析一种或多种样品中样品中一种或多种分析物的存在，量或同一性的装置，其中该装置包括用于改善分析物的光学检测的信号/背景比的聚焦微结构。

4. 发明申请

WO2007069222A3 ANALYSIS DEVICE WITH AN ARRAY OF FOCUSING MICROSTRUCTURES 审中-公开
标题翻译：具有聚焦微结构阵列的分析装置
公开(公告)号：WO2007069222A3
公开(公告)日：2008-05-29
申请号：PCT/IB2006054882
申请日：2006-12-15
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , AKSENOV YURI , VAN DEN HEUVEL FREDERICUS C , KWINTEN JOHANNES A J M
发明人： DIRKSEN PETER , AKSENOV YURI , VAN DEN HEUVEL FREDERICUS C , KWINTEN JOHANNES A J M
IPC分类号： G03F7/20 , B01L3/00 , G01N21/01 , G03F9/00
CPC分类号： G03F7/70616 , B01L3/502707 , B01L2200/12 , B01L2300/0654 , B01L2300/0819 , G03F7/70608 , G03F9/7011 , G03F9/7019 , G03F9/7076 , G06F3/016 , G11C16/16
摘要： The invention relates to a device comprising a first material (10) and a second material. (20) whereby the first and the second material are so provided towards each other as to form at least one focusing microstructure with a focal point (30) located outside of the first material.
摘要翻译：本发明涉及包括第一材料（10）和第二材料的装置。（20），由此第一和第二材料朝向彼此设置成形成至少一个具有位于第一材料外部的焦点（30）的聚焦微结构。

5. 发明申请

WO2005064399A2 LITHOGRAPHY SYSTEM USING A PROGRAMMABLE ELECTRO-WETTING MASK 审中-公开
标题翻译：使用可编程电湿面膜的光刻系统
公开(公告)号：WO2005064399A2
公开(公告)日：2005-07-14
申请号：PCT/IB2004052620
申请日：2004-12-01
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , HAYES ROBERT A , JUFFERMANS CASPARUS A H , STEFFEN THOMAS
发明人： DIRKSEN PETER , HAYES ROBERT A , JUFFERMANS CASPARUS A H , STEFFEN THOMAS
IPC分类号： G03F1/00 , G03F7/20 , G03F1/14 , G02B26/02
CPC分类号： G03F7/70291
摘要： A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on the electro-wetting principle. According to this principle, every pixel has a transparent reservoir containing a first, non-polar, non-transparent fluid and a second, polar, transparent fluid which are immiscible. Applying a field to the reservoir allows to displace the fluids with respect to each other. This allows to make the pixel either transparent or non-transparent. This lithographic programmable mask allows high resolution and fast setting and refreshing. A corresponding method for performing maskless optical lithography also is described.
摘要翻译：描述了具有可编程掩模的无掩模光刻系统，以允许使用相同的掩模执行几个光刻步骤。在每个光刻步骤中，通过向可编程掩模提供数字图案来获得相应的图案。可编程掩模包括基于电润湿原理的像素阵列。根据这个原理，每个像素都有一个透明的容器，它含有第一个，非极性的，不透明的流体和一个不混溶的第二个极性透明的流体。将场施加到储存器允许流体相对于彼此移位。这允许使像素透明或不透明。该光刻可编程掩模允许高分辨率和快速设置和刷新。还描述了用于执行无掩模光学光刻的相应方法。

6. 发明申请

WO2012014111A3 THIN FILM ULTRASOUND TRANSDUCER 审中-公开
标题翻译：薄膜超声波传感器
公开(公告)号：WO2012014111A3
公开(公告)日：2013-03-07
申请号：PCT/IB2011053096
申请日：2011-07-12
申请人： KONINKL PHILIPS ELECTRONICS NV , KLEE MAREIKE , MAUCZOK RUEDIGER , BOOTS HENRI MARIE JOSEPH , DE WILD NICO MARIS ADRIAAN , SREEDHARAN NAIR BIJU KUMAR , WUNNICKE OLAF , PASVEER WILLEM FRANKE , VAN DE LAGEMAAT DIRK , DIRKSEN PETER
发明人： KLEE MAREIKE , MAUCZOK RUEDIGER , BOOTS HENRI MARIE JOSEPH , DE WILD NICO MARIS ADRIAAN , SREEDHARAN NAIR BIJU KUMAR , WUNNICKE OLAF , PASVEER WILLEM FRANKE , VAN DE LAGEMAAT DIRK , DIRKSEN PETER
IPC分类号： B06B1/06
CPC分类号： H03H3/02 , B06B1/06 , B06B1/0622 , B06B1/0688 , H03H9/172
摘要： The present invention relates to a transducer (11) comprising - a membrane (31) configured to change shape in response to a force, the membrane (31) having a first major surface (16) and a second major surface (17), - a piezoelectric layer (18) formed over the first major surface (16) of the membrane (31), the piezoelectric layer (18) having an active portion, - first and second electrodes (19) in contact with the piezoelectric layer (18), wherein an electric field between the first and second electrodes (19) determines the mechanical movement of the piezoelectric layer (18), -support structures (40) at the second major surface (17) of the membrane (15) on adjacent sides of the active portion of the piezoelectric layer (18), at least part of the support structures (40) forming walls perpendicular, or at least not parallel, to the second major surface (17) of the membrane (31), so as to form a trench (41) of any shape underlying the active portion, so that an ultrasound transducer is obtained with a high output pressure at the support side than at the opposite side. The invention also relates to a method of forming such a transducer, and an array comprising at least one transducer of the like.
摘要翻译：本发明涉及一种换能器（11），其包括 - 被配置为响应于力而改变形状的膜（31），所述膜（31）具有第一主表面（16）和第二主表面（17）， - 形成在膜（31）的第一主表面（16）上方的压电层（18），压电层（18）具有有源部分， - 与压电层（18）接触的第一和第二电极（19），其中所述第一和第二电极（19）之间的电场确定所述压电层（18）的机械运动， - 在所述膜（15）的相邻侧上的所述膜（15）的第二主表面（17）处支撑结构（40）压电层（18）的有效部分，至少部分支撑结构（40）形成与膜（31）的第二主表面（17）垂直或至少不平行的壁，以形成在活动部分下方具有任何形状的沟槽（41），使得超声波换能器为ob 在支撑侧具有高于在相对侧的高输出压力。本发明还涉及一种形成这种换能器的方法，以及包括至少一个这样的换能器的阵列。

7. 发明申请

WO2010109363A3 GAS SENSING USING ULTRASOUND 审中-公开
标题翻译：使用超声波进行气体感应
公开(公告)号：WO2010109363A3
公开(公告)日：2010-11-18
申请号：PCT/IB2010051043
申请日：2010-03-10
申请人： KONINKL PHILIPS ELECTRONICS NV , PHILIPS CORP , SCHELLEKENS MARTIJN , KAHLMAN JOSEPHUS ARNOLDUS HENRICUS MARIA , VAN DER MARK MARTINUS BERNARDUS , DIRKSEN PETER , VAN KESTEREN HANS WILLEM
发明人： SCHELLEKENS MARTIJN , KAHLMAN JOSEPHUS ARNOLDUS HENRICUS MARIA , VAN DER MARK MARTINUS BERNARDUS , DIRKSEN PETER , VAN KESTEREN HANS WILLEM
IPC分类号： G01N33/00 , B06B1/02 , G01N29/02 , G01N29/024 , G01N33/497
CPC分类号： G01N33/497 , G01N29/2406 , G01N29/348 , G01N33/004 , G01N2291/0215 , G01N2291/02809
摘要： A sensor chip (1030) for gas has cells (200) for emitting and receiving ultrasound and is configured for a sufficiently large frequency range and for measuring concentration of at least one of the gas components based on at least two responses within the range. The frequency range can be achieved by varying the size of cell membranes (230), varying bias voltages, and/or varying air pressure for an array (205) of cMUTs or MEMS microphones. The sensor chip can be applied in, for example, capnography. A measurement air chamber (515) is implemented in the respiratory pathway (400), and it and/or the pathway may be designed to reduce turbulence in the exhaled breath (120) subject to ultrasound interrogation. The chip (1030) can be implemented as self-contained in the monitoring of parameters, obviating the need for off-chip sensors.
摘要翻译：用于气体的传感器芯片（1030）具有用于发射和接收超声波的电池（200），并且被配置为足够大的频率范围，并且用于基于在该范围内的至少两个响应来测量至少一个气体成分的浓度。频率范围可以通过改变cMUT或MEMS麦克风的阵列（205）的细胞膜（230）的尺寸，改变的偏置电压和/或变化的空气压力来实现。传感器芯片可以应用于例如二氧化碳图谱中。在呼吸路径（400）中实施测量空气室（515），并且其和/或路径可以被设计成减少经受超声询问的呼出呼吸（120）中的湍流。芯片（1030）可以被实现为独立于监视参数，从而避免了片外传感器的需要。

8. 发明申请

WO2005083525A3 DETERMINING IMAGE BLUR IN AN IMAGING SYSTEM 审中-公开
标题翻译：在成像系统中确定图像图像
公开(公告)号：WO2005083525A3
公开(公告)日：2006-05-18
申请号：PCT/IB2005050496
申请日：2005-02-08
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , JANSSEN AUGUSTUS J E M , BRAAT JOSEPHUS J M , LEEUWESTEIN ADRIAAN
发明人： DIRKSEN PETER , JANSSEN AUGUSTUS J E M , BRAAT JOSEPHUS J M , LEEUWESTEIN ADRIAAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70608 , G03F7/706
摘要： The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern,. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and/or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and/or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account. The computer program according to the invention is able to execute the step of determining the parameter relating to the image blur from a parameter relating to a shape of the blurred image.
摘要翻译：本发明涉及一种确定与成像系统（IS）中的图像模糊相关的参数的方法，包括通过成像系统（IS）照亮具有测试图案（MTP）的对象的步骤，从而形成图像测试模式。测试图案（MTP）的尺寸小于成像系统（IS）的分辨率，这使得测试图案的图像与照明器像差无关。测试图案（MTP）是一种孤立的图案，使图像无光学邻近效应。图像由于成像系统中的随机波动和/或检测模糊图像的检测器而模糊。根据与模糊图像的形状相关的参数确定与图像模糊有关的参数。根据本发明，可以表征抗蚀剂扩散和/或聚焦噪声。在设计掩模的方法中，考虑与抗蚀剂中的扩散引起的图像模糊有关的参数。根据本发明的计算机程序能够执行从与模糊图像的形状相关的参数确定与图像模糊有关的参数的步骤。

9. 发明申请

WO02095498A3 LITHOGRAPHIC METHOD OF MANUFACTURING A DEVICE 审中-公开
标题翻译：制造设备的平面方法
公开(公告)号：WO02095498A3
公开(公告)日：2003-10-16
申请号：PCT/IB0201733
申请日：2002-05-16
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , JUFFERMANS CASPARUS A H , VAN WINGERDEN JOHANNES
发明人： DIRKSEN PETER , JUFFERMANS CASPARUS A H , VAN WINGERDEN JOHANNES
IPC分类号： G03F7/11 , G03F1/00 , G03F7/00 , G03F7/14 , G03F7/20 , G03F7/40 , H01L21/027 , H01L21/3213 , G03F1/14
CPC分类号： H01L21/32139 , G03F1/26 , G03F1/36 , G03F7/0035
摘要： For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise "forbidden" structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.
摘要翻译：为了光刻制造具有非常高密度的器件，通过新的方法将设计掩模图案（120）分布在多个子图案（120a，120b，120c）上。子图案不包括“禁止”结构（135）并且可以通过常规设备传送到待图案化的基底层。为了传送，使用新的层叠层，其包括用于每个子图案的一对处理层（22; 26）和无机抗反射层（24; 28）。在第一处理层（26）已经被图案化为第一子图案之后，其被涂覆有用第二子图案曝光的新抗蚀剂层（30）和在第一子图案下方的第二处理层（22）用第二子图案处理处理层。

10. 发明申请

WO2008059440A3 DOUBLE PATTERNING FOR LITHOGRAPHY TO INCREASE FEATURE SPATIAL DENSITY 审中-公开
标题翻译：用于光刻的双重图案增加特征空间密度
公开(公告)号：WO2008059440A3
公开(公告)日：2008-08-21
申请号：PCT/IB2007054604
申请日：2007-11-13
申请人： NXP BV , VANLEENHOVE ANJA MONIQUE , DIRKSEN PETER , VAN STEENWINCKEL DAVID , VAN DAL MARK , DOORNBOS GERBEN , JUFFERMANS CASPER
发明人： VANLEENHOVE ANJA MONIQUE , DIRKSEN PETER , VAN STEENWINCKEL DAVID , VAN DAL MARK , DOORNBOS GERBEN , JUFFERMANS CASPER
IPC分类号： G03F7/00 , G03F7/11
CPC分类号： G03F7/0035 , G03F7/11 , H01L21/0271 , H01L21/0273 , H01L21/823821 , H01L29/66795 , H01L29/6681 , H01L29/785
摘要： A method of forming a pattern in at least one device layer in or on a substrate comprises: coating the device layer with a first photoresist layer; exposing the first photoresist using a first mask; developing the first photoresist layer to form a first pattern on the substrate; coating the substrate with a protection layer; treating the protection layer to cause a change therein where it is in contact with the first photoresist, to render the changed protection layer substantially immune to a subsequent exposure and / or developing step; coating the substrate with a second photoresist layer; exposing the second photoresist layer using a second mask; and developing the second photoresist layer to form a second pattern on the substrate without significantly affecting the first pattern in the first photoresist layer, wherein the first and second patterns together define interspersed features having a spatial frequency greater than that of the features defined in each of the first and second patterns separately. The process has particular utility in defining source, drain and fin features of finFET devices with a smaller feature size than otherwise achievable with the prevailing lithography tools.
摘要翻译：一种在衬底中或衬底上的至少一个器件层中形成图案的方法包括：用第一光刻胶层涂覆器件层; 使用第一掩模来暴露第一光致抗蚀剂; 显影第一光致抗蚀剂层以在衬底上形成第一图案; 用保护层涂覆衬底; 处理所述保护层以在其中与所述第一光刻胶接触的地方引起其中的变化，以使所述变化的保护层基本上不受后续曝光和/或显影步骤的影响; 用第二光致抗蚀剂层涂覆衬底; 使用第二掩模曝光第二光致抗蚀剂层; 以及显影所述第二光致抗蚀剂层以在所述衬底上形成第二图案而不显着影响所述第一光致抗蚀剂层中的所述第一图案，其中所述第一图案和所述第二图案一起限定具有大于每个图案中限定的特征的空间频率的散布特征第一和第二图案分开。该工艺在定义finFET器件的源极，漏极和鳍片特征方面具有特别的实用性，其特征尺寸小于通用光刻工具所能实现的特征尺寸。

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