专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012134867A2 DESIGN-BASED INSPECTION USING REPEATING STRUCTURES 审中-公开
标题翻译：基于设计的检测使用重复结构
公开(公告)号：WO2012134867A2
公开(公告)日：2012-10-04
申请号：PCT/US2012/029676
申请日：2012-03-19
申请人： KLA-TENCOR CORPORATION , KULKARNI, Ashok , CHEN, Chien-Huei Adam
发明人： KULKARNI, Ashok , CHEN, Chien-Huei Adam
IPC分类号： H01L21/66
CPC分类号： G01N21/95607 , G01N21/9501
摘要： Systems and methods for design-based inspection using repeating structures are provided.
摘要翻译：提供了使用重复结构进行基于设计的检查的系统和方法。

2. 发明申请

WO2012005863A3 DATA PERTURBATION FOR WAFER INSPECTION OR METROLOGY SETUP 审中-公开
公开(公告)号：WO2012005863A3
公开(公告)日：2012-01-12
申请号：PCT/US2011/039876
申请日：2011-06-09
申请人： KLA-TENCOR CORPORATION , THATTAISUNDARAM, Govind , MAHADEVAN, Mohan , GUPTA, Ajay , CHEN, Chien-Huei Adam , KULKARNI, Ashok , KIRKWOOD, Jason , WU, Kenong , RONG, Songnian
发明人： THATTAISUNDARAM, Govind , MAHADEVAN, Mohan , GUPTA, Ajay , CHEN, Chien-Huei Adam , KULKARNI, Ashok , KIRKWOOD, Jason , WU, Kenong , RONG, Songnian
IPC分类号： G06F19/00
摘要： Various embodiments for determining parameters for wafer inspection and/or metrology are provided.

3. 发明申请

WO2009018337A1 SEMICONDUCTOR DEVICE PROPERTY EXTRACTION, GENERATION, VISUALIZATION, AND MONITORING METHODS 审中-公开
标题翻译：半导体器件属性提取，生成，可视化和监控方法
公开(公告)号：WO2009018337A1
公开(公告)日：2009-02-05
申请号：PCT/US2008/071587
申请日：2008-07-30
申请人： KLA-TENCOR CORPORATION , KULKARNI, Ashok , CHEN, Chien-Huei (adam) , CAMPOCHIARO, Cecelia , WALLINGFORD, Richard , ZHANG, Yong , DUFFY, Brian
发明人： KULKARNI, Ashok , CHEN, Chien-Huei (adam) , CAMPOCHIARO, Cecelia , WALLINGFORD, Richard , ZHANG, Yong , DUFFY, Brian
IPC分类号： G01N21/95
CPC分类号： G01N21/9501
摘要： Various methods, carrier media, and systems for monitoring a characteristic of a specimen are provided. One computer-implemented method for monitoring a characteristic of a specimen includes determining a property of individual pixels on the specimen using output generated by inspecting the specimen with an inspection system. The method also includes determining a characteristic of individual regions on the specimen using the properties of the individual pixels in the individual regions. The method further includes monitoring the characteristic of the specimen based on the characteristics of the individual regions.
摘要翻译：提供了各种方法，载体介质和用于监测试样特征的系统。一种用于监测样本特征的计算机实现方法包括使用通过用检查系统检查样本产生的输出来确定样本上的各个像素的特性。该方法还包括使用各个区域中的各个像素的特性来确定样本上的各个区域的特征。该方法还包括基于各个区域的特征来监测样本的特性。

4. 发明申请

WO2009039486A2 SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 审中-公开
标题翻译：用于创建WAFER的持续数据并使用用于检查相关功能的数据的系统和方法
公开(公告)号：WO2009039486A2
公开(公告)日：2009-03-26
申请号：PCT/US2008/077203
申请日：2008-09-22
申请人： KLA-TENCOR CORPORATION , BHASKAR, Kris , BHASKAR, Chetana , KULKARNI, Ashok , ROSENGAUS, Eliezer , CAMPOCHIARO, Cecelia , MAHER, Chris , DUFFY, Brian , KHULLAR, Aneesh , KOHLI, Alpa , BALASUBRAMANIAN, Lalita , BHATTACHARYYA, Santosh , MAHADEVAN, Mohan
发明人： BHASKAR, Kris , BHASKAR, Chetana , KULKARNI, Ashok , ROSENGAUS, Eliezer , CAMPOCHIARO, Cecelia , MAHER, Chris , DUFFY, Brian , KHULLAR, Aneesh , KOHLI, Alpa , BALASUBRAMANIAN, Lalita , BHATTACHARYYA, Santosh , MAHADEVAN, Mohan
IPC分类号： H01L21/66
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.
摘要翻译：提供了用于创建晶片的持久数据并使用持久数据进行检查相关功能的各种系统和方法。一个系统包括耦合到检查系统的检测器的一组处理器节点。每个处理器节点被配置为在扫描晶片期间接收由检测器产生的图像数据的一部分。该系统还包括分开耦合到每个处理器节点的存储介质阵列。处理器节点被配置为将由处理器节点接收的图像数据的所有图像数据或选定部分发送到存储介质阵列，使得由检测器生成的图像数据或图像数据的所选部分在扫描晶片期间存储在存储介质的阵列中。

5. 发明申请

WO2008077100A2 SYSTEMS AND METHODS FOR CREATING INSPECTION RECIPES 审中-公开
标题翻译：用于创建检验录像的系统和方法
公开(公告)号：WO2008077100A2
公开(公告)日：2008-06-26
申请号：PCT/US2007/088129
申请日：2007-12-19
申请人： KLA-TENCOR CORPORATION , DUFFY, Brian , KULKARNI, Ashok
发明人： DUFFY, Brian , KULKARNI, Ashok
IPC分类号： G06F17/50 , G01R31/28
CPC分类号： G03F7/7065 , G03F7/70525
摘要： Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
摘要翻译：提供了用于创建检查配方的系统和方法。用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于打印第一设计的晶片的检查系统的输出的一个或多个特性。该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。第一和第二种设计是不同的。在使用制造工艺将第二设计印刷在晶片上之后，检查配方将用于检查晶片。

6. 发明申请

WO2009140403A2 SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER AND GENERATING INSPECTION RESULTS FOR THE WAFER 审中-公开
标题翻译：用于检测波形缺陷和产生检测结果的系统和方法
公开(公告)号：WO2009140403A2
公开(公告)日：2009-11-19
申请号：PCT/US2009/043814
申请日：2009-05-13
申请人： KLA-TENCOR CORPORATION , KULKARNI, Ashok , BHATTACHARYYA, Santosh
发明人： KULKARNI, Ashok , BHATTACHARYYA, Santosh
IPC分类号： H01L21/66
CPC分类号： G05B19/41875 , G05B2219/37224 , G05B2219/45031 , H01L22/12 , H01L22/20 , H01L2924/0002 , Y02P90/22 , H01L2924/00
摘要： Systems and methods for detecting defects on a wafer and generating inspection results for the wafer are provided. One method includes detecting defects on a wafer by comparing output generated by scanning of the wafer performed by an inspection system to one or more defect detection thresholds. The method also includes sampling outliers in the output by selecting the output having the highest values from bins defined based on one or more predetermined criteria. In addition, the method includes selecting a portion of the sampled outliers based on wafer-level analysis of the sampled outliers. The method further includes generating inspection results for the wafer by combining information about the selected portion of the sampled outliers with information about the defects detected using the one or more defect detection thresholds.
摘要翻译：提供了用于检测晶片上的缺陷并产生晶片的检查结果的系统和方法。一种方法包括通过将由检查系统执行的晶片的扫描产生的输出与一个或多个缺陷检测阈值进行比较来检测晶片上的缺陷。该方法还包括通过从基于一个或多个预定标准定义的箱中选择具有最高值的输出来对输出中的异常值进行采样。此外，该方法包括基于采样异常值的晶片级分析来选择一部分采样异常值。该方法还包括通过将关于所选择的采样异常值的部分的信息与关于使用一个或多个缺陷检测阈值检测到的缺陷的信息组合来产生晶片的检查结果。

7. 发明申请

WO2009038838A2 METHODS AND SYSTEMS FOR DETERMINING A POSITION OF INSPECTION DATA IN DESIGN DATA SPACE 审中-公开
标题翻译：用于确定设计数据空间中检验数据位置的方法和系统
公开(公告)号：WO2009038838A2
公开(公告)日：2009-03-26
申请号：PCT/US2008/066328
申请日：2008-06-09
申请人： KLA-TENCOR CORPORATION , KULKARNI, Ashok , DUFFY, Brian , MAAYAH, Kais , ROUSE, Gordon , SHIFRIN, Eugene
发明人： KULKARNI, Ashok , DUFFY, Brian , MAAYAH, Kais , ROUSE, Gordon , SHIFRIN, Eugene
IPC分类号： G06T7/00 , G01N21/00
CPC分类号： G06F17/5045 , G06T7/0006 , G06T7/33 , G06T2207/30148 , H01L21/67005
摘要： Various methods and systems for determining a position of inspection data in design data space are provided. One computer-implemented method includes determining a centroid of an alignment target formed on a wafer using an image of the alignment target acquired by imaging the wafer. The method also includes aligning the centroid to a centroid of a geometrical shape describing the alignment target. In addition, the method includes assigning a design data space position of the centroid of the alignment target as a position of the centroid of the geometrical shape in the design data space. The method further includes determining a position of inspection data acquired for the wafer in the design data space based on the design data space position of the centroid of the alignment target.
摘要翻译：提供了用于确定设计数据空间中检查数据位置的各种方法和系统。一种计算机实现的方法包括使用通过对晶片成像获得的对准目标的图像来确定形成在晶片上的对准目标的质心。该方法还包括将质心对准描述对准目标的几何形状的质心。此外，该方法包括将对准目标的质心的设计数据空间位置分配为设计数据空间中几何形状的质心的位置。该方法还包括基于对准目标的质心的设计数据空间位置确定在设计数据空间中为晶片获取的检查数据的位置。

8. 发明申请

WO2019046495A1 DESIGN CRITICALITY ANALYSIS AUGMENTED PROCESS WINDOW QUALIFICATION SAMPLING 审中-公开
公开(公告)号：WO2019046495A1
公开(公告)日：2019-03-07
申请号：PCT/US2018/048652
申请日：2018-08-30
申请人： KLA-TENCOR CORPORATION
发明人： SARASWATULA, Jagdish Chandra , BANERJEE, Saibal , KULKARNI, Ashok
IPC分类号： G03F7/20 , H01L21/67
摘要： Techniques are provided that can select defects based on criticality of design pattern as well as defect attributes for process window qualification (PWQ). Defects are sorted into categories based on process conditions and similarity of design. Shape based grouping can be performed on the random defects. Highest design based grouping scores can be assigned to the bins, which are then sorted. Particular defects can be selected from the bins. These defects may be reviewed.

9. 发明申请

WO2017035142A1 DETERMINING ONE OR MORE CHARACTERISTICS OF A PATTERN OF INTEREST ON A SPECIMEN 审中-公开
标题翻译：确定样本中一个或多个特征的特征
公开(公告)号：WO2017035142A1
公开(公告)日：2017-03-02
申请号：PCT/US2016/048199
申请日：2016-08-23
申请人： KLA-TENCOR CORPORATION
发明人： LENNEK, Michael , PARK, Allen , DUFFY, Brian , KULKARNI, Ashok
IPC分类号： H01L21/66
CPC分类号： G01N21/956 , G01N21/9501 , G05B19/41875 , H01L22/12 , H01L22/20
摘要： Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.
摘要翻译：提供了用于确定感兴趣模式（POI）特征的方法和系统。一个系统被配置为获取在POI实例处生成的检查系统的输出，而不检测POI实例的缺陷。然后，输出用于生成POI实例的选择。然后，系统从所选POI实例的输出采集子系统获取输出。该系统还使用从输出采集子系统获得的输出来确定POI的特性。

10. 发明申请

WO2014028513A1 AUTOMATED INSPECTION SCENARIO GENERATION 审中-公开
标题翻译：自动检测场景发生
公开(公告)号：WO2014028513A1
公开(公告)日：2014-02-20
申请号：PCT/US2013/054763
申请日：2013-08-13
申请人： KLA-TENCOR CORPORATION
发明人： MAHADEVAN, Mohan , THATTAISUNDARAM, Govind , GUPTA, Ajay , CHEN, Chien-Huei (Adam) , KIRKWOOD, Jason , KULKARNI, Ashok , RONG, Songnian , ESCORCIA, Ernesto , SHIFRIN, Eugene
IPC分类号： H01L21/66 , H01L21/00
CPC分类号： G06K9/6254 , G06T7/0004 , G06T2207/30148
摘要： Methods and systems for determining inspection scenarios without input from a user are presented. Inspection scenarios include at least one acquisition mode, defect detection parameter values, and classification parameter values. In one example, a number of defect events are determined by a hot inspection of a wafer surface. The defect events are classified and attributes associated with each defect event are identified. The defect events are labeled with this information. Based on the identified attributes and classification, inspection scenarios are determined. The inspection scenarios are solutions in a mathematical space formed by the identified attributes. In some examples, a plurality of inspection scenarios are determined and a desired inspection scenario is selected from the plurality based on the number of defects of interest and the number of nuisance events captured by the selected inspection scenario.
摘要翻译：介绍了无需用户输入来确定检测情景的方法和系统。检查情景包括至少一个采集模式，缺陷检测参数值和分类参数值。在一个示例中，通过晶片表面的热检查来确定许多缺陷事件。对缺陷事件进行分类，并且识别与每个缺陷事件相关联的属性。缺陷事件用该信息标记。根据确定的属性和分类，确定检验情况。检查情景是由所识别的属性形成的数学空间中的解决方案。在一些示例中，确定多个检查情景，并且基于所选择的检查情景捕获的感兴趣的缺陷的数量和滋扰事件的数量，从多个中选择期望的检查情景。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式