专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2004076963A3 APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 审中-公开
标题翻译：用于使用散射检测来检测重叠错误的装置和方法
公开(公告)号：WO2004076963A3
公开(公告)日：2004-11-18
申请号：PCT/US2004005419
申请日：2004-02-23
申请人： KLA TENCOR TECH CORP , MIEHER WALTER D , LEVY ADY , GOLOVANEVSKY BORIS , FRIEDMANN MICHAEL , SMITH IAN , ADEL MICHAEL , FABRIKANT ANATOLY , BEVIS CHRISTOPHER F , FIELDEN JOHN , BAREKET NOAH , GROSS KEN , ZALICKI PIOTR , WACK DAN , DECECCO PAOLA , DZIURA THADDEUS G , GHINOVKER MARK
发明人： MIEHER WALTER D , LEVY ADY , GOLOVANEVSKY BORIS , FRIEDMANN MICHAEL , SMITH IAN , ADEL MICHAEL , FABRIKANT ANATOLY , BEVIS CHRISTOPHER F , FIELDEN JOHN , BAREKET NOAH , GROSS KEN , ZALICKI PIOTR , WACK DAN , DECECCO PAOLA , DZIURA THADDEUS G , GHINOVKER MARK
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatuses: a reflectometric, a ellipsomertic, imaging, interferometric, and/ or scanning angle system.
摘要翻译：公开了一种确定多层样本的两层之间的覆盖误差的方法。对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。在第一和第二结构之间有预定义的偏移。通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。光学系统包括以下装置中的任何一个或多个：反射测量，椭圆偏振，成像，干涉测量和/或扫描角度系统。

2. 发明申请

WO2007126559A3 APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 审中-公开
标题翻译：利用测距法检测覆盖误差的装置和方法
公开(公告)号：WO2007126559A3
公开(公告)日：2007-12-21
申请号：PCT/US2007006031
申请日：2007-03-08
申请人： KLA TENCOR TECH CORP , KANDEL DANIEL , MIEHER WALTER D , GOLOVANEVSKY BORIS
发明人： KANDEL DANIEL , MIEHER WALTER D , GOLOVANEVSKY BORIS
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.
摘要翻译：本发明的实施例包括用于确定衬底层之间的对准的散射测量目标。目标装置形成在衬底上并且包括多个目标单元。每个单元具有两层周期性特征，所述两层周期性特征构造成使得上层布置在下层之上并且被配置为使得上层的周期性特征具有与下层的周期性特征相比偏移和/或不同的间距。当目标暴露于照明源时，间距被安排成产生周期性信号。目标还包括排列在单元之间的消歧特征，并且被配置为解决由单元在暴露于照明源时产生的周期性信号引起的歧义。

3. 发明申请

WO2004066028A3 METHOD FOR PROCESS OPTIMIZATION AND CONTROL BY COMPARISON BETWEEN 2 OR MORE MEASURED SCATTEROMETRY SIGNALS 审中-公开
标题翻译：通过两个或更多测量的分析信号之间的比较进行优化和控制的方法
公开(公告)号：WO2004066028A3
公开(公告)日：2005-05-19
申请号：PCT/US2004001570
申请日：2004-01-20
申请人： KLA TENCOR TECH CORP , MIEHER WALTER D , MACK CHRIS , HANKINSON MATT
发明人： MIEHER WALTER D , MACK CHRIS , HANKINSON MATT
IPC分类号： G01B11/00 , G01B11/14 , G01B11/28 , G03C5/00 , G03F20060101 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70558 , G01N21/211 , G01N21/47 , G01N21/956 , G01N21/95607 , G01N2021/8416 , G03F7/70483 , G03F7/70533 , G03F7/70625 , G03F7/70641 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method for determining one or more process parameter settings of a photolithographic system is disclosed. The method is performed using a scatterometry tool (258) to measure a latent image of a pattern, a partially developed pattern, or a fully developed pattern. The scatterometry tool may be placed at the end of a stepper (254) or at the beginning of the resist developer (256).
摘要翻译：公开了一种用于确定光刻系统的一个或多个工艺参数设置的方法。使用散射测量工具（258）来执行该方法以测量图案的潜像，部分展开的图案或完全展开的图案。散射测量工具可以放置在步进器（254）的末端或抗蚀剂显影剂开始处（256）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式